公开(公告)号：US4676868A

公开(公告)日：1987-06-30

申请号：US855207

申请日：1986-04-23

Applicant: Paul E. Riley ,  Alan B. Ray ,  Paul Bayer

Inventor： Paul E. Riley ,  Alan B. Ray ,  Paul Bayer

IPC: H01L21/302 ,  H01L21/3065 ,  H01L21/3105 ,  H01L21/311 ,  H01L21/3205 ,  H01L21/768 ,  B44C1/22 ,  B29C37/00 ,  C03C15/00 ,  C03C25/06

CPC classification number: H01L21/76819 ,  H01L21/31055 ,  H01L21/31116

Abstract: A method for planarizing an insulating layer overlying an irregular topographic substrate, e.g., a conductive layer, is planarized by use of a sacrificial planarization layer. The planarization layer is removed using an oxygen-containing plasma generated in a parallel electrode reactor operating at a low excitation frequency and high pressure. Once the interface between the planarization layer and the conductive layer is reached, a second plasma with a reduced oxygen content is employed to avoid overetching the planarization layer. It has been observed that oxidizing species liberated during the etching of the insulating layer, typically silicon dioxide, contribute to the oxidation and hence removal of the planarization layer. The process may be monitored by observing the spectral emissions from species generated or consumed during planarization or by changes in the optical interference pattern, allowing termination of the etch at the proper time to avoid over-etching and under-etching of the insulating layer.

Abstract translation: 通过使用牺牲平坦化平面化用于平坦化覆盖不规则形状衬底（例如导电层）的绝缘层的方法。 使用在低激发频率和高压下工作的并联电极反应器中产生的含氧等离子体来除去平坦化层。 一旦达到平坦化层和导电层之间的界面，则采用具有降低的氧含量的第二等离子体来避免过刻蚀平坦化层。 已经观察到，在绝缘层（通常是二氧化硅）的蚀刻期间释放的氧化物质有助于氧化并因此去除平坦化层。 可以通过观察在平坦化期间产生或消耗的物质的光谱发射或通过光学干涉图案的变化来监测该过程，从而允许在适当时间终止蚀刻，以避免绝缘层的过蚀刻和蚀刻不足。

公开(公告)号：US07545507B2

公开(公告)日：2009-06-09

申请号：US11686855

申请日：2007-03-15

Applicant: William Clay Schluchter ,  Miao Zhu ,  Geraint Owen ,  Alan B. Ray ,  Carol J. Courville

Inventor： William Clay Schluchter ,  Miao Zhu ,  Geraint Owen ,  Alan B. Ray ,  Carol J. Courville

IPC: G01B11/02

CPC classification number: G01D5/38 ,  G01D5/28 ,  G03F7/70775

Abstract: A displacement measurement apparatus includes a light source, a splitter grating, a measurement grating, and first a second detector arrays. The splitter grating splits a light beam into first and second measurement channels that each illuminates the measurement grating. The first and second measurement channels split into 0th and 1st order diffraction products at the measurement grating in a first pass and recombine at the measurement grating in a second pass before being measured at the first and second detector arrays.

Abstract translation: 位移测量装置包括光源，分离器光栅，测量光栅以及第一检测器阵列。 分离器光栅将光束分成第一和第二测量通道，每个测量通道照亮测量光栅。 第一和第二测量通道在第一次通过时在测量光栅处分裂为第0和第1级衍射产物，并且在第一和第二检测器阵列测量之前在第二遍中在测量光栅处重新组合。