公开(公告)号：US20060280106A1

公开(公告)日：2006-12-14

申请号：US10568370

申请日：2004-08-12

Applicant: Gert 'T Hooft ,  Robert Frans Maria Hendriks ,  Dirk Broer

Inventor： Gert 'T Hooft ,  Robert Frans Maria Hendriks ,  Dirk Broer

IPC: G11B7/24

CPC classification number: G11B7/007 ,  G11B7/13 ,  G11B7/1356 ,  G11B7/14 ,  G11B7/24 ,  G11B7/25

Abstract: The range of spatial frequencies of the information areas in an optical record carrier (130) that can be read by conventional means can be increased substantially by providing the information layer (1134) with a birefringent diffraction grating (136) and using a read beam (b) that comprises two mutually perpendicular polarised components (b1, b2) only one of which will be diffracted by the grating.

Abstract translation: 可以通过向信息层（1134）提供双折射衍射光栅（136）并使用读取光束（136）来大大增加可以通过传统手段读取的光学记录载体（130）中的信息区域的空间频率的范围 b）包括两个相互垂直的极化分量（b 1，B 2 2），其中仅一个将被光栅衍射。

公开(公告)号：US20060187383A1

公开(公告)日：2006-08-24

申请号：US10564327

申请日：2004-07-15

Applicant: Dirk Broer ,  Christiane De Witz ,  Ties Van Bommel

Inventor： Dirk Broer ,  Christiane De Witz ,  Ties Van Bommel

IPC: G02F1/1335

CPC classification number: G02B5/0215 ,  G02B5/0221 ,  G02B5/0268 ,  G02B5/0284 ,  G02B5/0289 ,  G02F1/133555 ,  G03F7/0007 ,  G03F7/001 ,  G03F7/30 ,  G03F7/36 ,  G03F7/40 ,  G03F7/405

Abstract: The invention relates to a method for manufacturing a diffusive reflector (450) for a reflective or transflective Liquid Crystal Display (400). The reflector comprises a surface (452) that is structured by means of a photo-embossing process. Herein, a layer (100) of a mixture is provided including a photo-diffusible monomer (102), which may be transported through the layer under the influence of selectively applied irradiation. A layer relief is thus formed, which is preferably developed further at an elevated temperature. The layer is fixed and stabilized by means of a cross-linking step, preferably including thermally induced and/or photo-induced polymerization. In a final step, the polymer relieved surface thus formed is provided with a reflective material (154).

Abstract translation: 本发明涉及一种制造用于反射或半透反射液晶显示器（400）的扩散反射器（450）的方法。 反射器包括通过光压印工艺构造的表面（452）。 这里，提供了包含可光扩散单体（102）的混合物层（100），其可以在选择性照射的影响下被输送通过该层。 因此形成了层状浮雕，其优选在升高的温度下进一步显影。 该层通过交联步骤固定和稳定，优选包括热诱导和/或光诱导的聚合。 在最终步骤中，由此形成的聚合物缓和表面设置有反射材料（154）。

公开(公告)号：US20060164571A1

公开(公告)日：2006-07-27

申请号：US10530448

申请日：2003-09-19

Applicant: Dirk Broer ,  Hendrik De Koning

Inventor： Dirk Broer ,  Hendrik De Koning

IPC: G02F1/1335

CPC classification number: G02B5/3033 ,  G02B27/288 ,  G02F1/133528 ,  H01L51/5281

Abstract: A polarizing arrangement comprises a first linear polarizer having a first extinction axis. The polarization contrast ratio of the first polarizer is dependent on the angle a light beam incident on the polarizer makes with the extinction axis, polarization being most efficient when the light beam is orthogonal to the first extinction axis. In order to improve the polarization contrast ratio, for light beams traveling in directions which make an angle with the first extinction axis of the first polarizer the polarizing arrangement comprises a second polarizer having a second extinction axis. The first and second polarizer are arranged relative to one another such that, in operation, a light beam traversing the first polarizer in a direction orthogonal to the first extinction axis traverses the second polarizer in a direction coincident with the second extinction axis. The second polarizer has a similar angular-dependent polarization contrast ratio which due the specific arrangement of the first extinction axis with respect to the second extinction axis compensates the reduction of polarization contrast ratio for the first polarizer for light beams which make an angle with the first extinction axis.

Abstract translation: 偏振装置包括具有第一消光轴线的第一线性偏振器。 第一偏振器的偏振对比度取决于入射到偏振器上的光束与消光轴的角度，当光束与第一消光轴正交时，极化最有效。 为了提高偏振对比度，对于与第一偏振片的第一消光轴形成角度的方向行进的光束，偏振装置包括具有第二消光轴的第二偏振器。 第一和第二偏振器相对于彼此布置，使得在操作中，沿与第一消光轴正交的方向穿过第一偏振器的光束在与第二消光轴线重合的方向上穿过第二偏振器。 第二偏振器具有类似的依赖于角度的偏振对比率，由于第一消光轴相对于第二消光轴的特定布置，补偿了与第一偏振轴成一定角度的光束的第一偏振器的偏振对比度的降低 消光轴。

公开(公告)号：US20060038769A1

公开(公告)日：2006-02-23

申请号：US10528501

申请日：2003-08-08

Applicant: Johannes Marra ,  Dirk Broer ,  Tijsbert Creemers ,  Peter Duine ,  Hendrik De Koning

Inventor： Johannes Marra ,  Dirk Broer ,  Tijsbert Creemers ,  Peter Duine ,  Hendrik De Koning

IPC: G09G3/36

CPC classification number: G02B6/0036 ,  G02B6/0031 ,  G02B6/0055 ,  G02B26/02 ,  G02F1/133604 ,  G02F2001/133607

Abstract: Display apparatus comprising an image-generating screen (46) repetitively scanned at a predetermined rate to display images, and a backlight for illuminating the screen. The backlight includes a light guide (10) arranged to constrain light by total internal reflection, the light guide having an output surface (22) with various locations from which light may be selectively coupled using a scanning arrangement (44). The scanning arrangement sequentially and repeatedly illuminates selected areas of said screen in synchronism with the repetitive scanning of the screen.

Abstract translation: 显示装置包括以预定速率重复扫描以显示图像的图像生成屏幕（46）和用于照亮屏幕的背光。 背光源包括布置成通过全内反射来限制光的光导（10），光导具有具有各种位置的输出表面（22），光可以使用扫描装置（44）从其中选择性地耦合。 扫描装置与屏幕的重复扫描同步地顺序地和重复地照亮所述屏幕的选定区域。

公开(公告)号：US20050226130A1

公开(公告)日：2005-10-13

申请号：US10517912

申请日：2003-06-12

Applicant: Emiel Peeters ,  Dirk Broer ,  Christopher Busch

Inventor： Emiel Peeters ,  Dirk Broer ,  Christopher Busch

IPC: B41M5/26 ,  G11B7/0045 ,  G11B7/0055 ,  G11B7/24 ,  G11B7/244 ,  G11B7/25 ,  G11B7/00

CPC classification number: G11B7/25 ,  G11B7/0045 ,  G11B7/00555 ,  G11B7/24

Abstract: Optical data storage method, device and storage medium, comprising storing data by modifying optical properties of polymer material, whereby writing is initiated by reorientation of photoorientable units, typically by illuminating with light at a wave-length that initiates the reorientation.

Abstract translation: 光学数据存储方法，设备和存储介质，包括通过改变聚合物材料的光学性质来存储数据，由此通常通过以可启动重定向的波长的光照射可光致定向单元的重新定向来启动写入。

公开(公告)号：US08568962B2

公开(公告)日：2013-10-29

申请号：US12936896

申请日：2009-04-07

Applicant: Ko Hermans ,  Itsuro Tomatsu ,  Rintje Pieter Sijbesma ,  Cornelis Wilhelmus Maria Bastiaansen ,  Jan Dirk Broer

Inventor： Ko Hermans ,  Itsuro Tomatsu ,  Rintje Pieter Sijbesma ,  Cornelis Wilhelmus Maria Bastiaansen ,  Jan Dirk Broer

IPC: G03F7/38

CPC classification number: G03F7/36 ,  G03F7/027 ,  G03F7/38

Abstract: The invention relates to a photo-embossing process for the preparation of a polymeric relief structure comprising the steps of: a) coating a substrate with a coating composition comprising one or more radiation-sensitive ingredients and less than 30 wt % polymeric binder material; b) locally treating the coated substrate with electromagnetic radiation having a periodic, non-periodic or random radiation-intensity pattern, forming a latent image, at a temperature below a transition temperature of the coating composition; and c) polymerizing and/or crosslinking the resulting coated substrate, at a temperature above said transition temperature, wherein the transition temperature is a temperature that defines a transition of the coating composition between a state of high viscosity and low viscosity and wherein the coating composition comprises a compound A comprising at least one radiation curable group and a photoinitiator, the coating composition having a transition temperature between 30° C. and 120° C.

Abstract translation: 本发明涉及一种用于制备聚合物浮雕结构的光压印方法，包括以下步骤：a）用包含一种或多种辐射敏感成分和小于30wt％聚合物粘合剂材料的涂料组合物涂覆基材; b）在低于涂层组合物的转变温度的温度下，用具有周期性，非周期性或随机辐射强度图案的电磁辐射局部处理涂覆的基底，形成潜像; 和c）在高于所述转变温度的温度下聚合和/或交联所得涂覆的基材，其中所述转变温度是限定所述涂料组合物在高粘度和低粘度状态之间的转变的温度，并且其中所述涂料组合物 包含包含至少一种可辐射固化基团和光引发剂的化合物A，该涂料组合物的转变温度在30℃至120℃之间。

公开(公告)号：US20060256244A1

公开(公告)日：2006-11-16

申请号：US10547807

申请日：2004-02-25

Applicant: Martin Jak ,  Hugo Cornelissen ,  Hendrik De Koning ,  Dirk Broer

Inventor： Martin Jak ,  Hugo Cornelissen ,  Hendrik De Koning ,  Dirk Broer

IPC: G02F1/133

CPC classification number: G02B6/0035 ,  G02F1/1326 ,  G02F1/133615 ,  G09G3/3426 ,  G09G2310/024 ,  G09G2320/0646 ,  G09G2320/066 ,  G09G2360/145 ,  G09G2360/16

Abstract: This invention relates to a display device (1), comprising a display panel (2) having a layer of electro-optical material (4), a first light-transmissive substrate (5) provided with electrodes (7) in an area of pixels arranged in rows and columns, a second light transmissive substrate (6), said layer of electro-optical material (4) being sandwiched between said first and second layer (5, 6), and an illumination system (3), being arranged on a side of the second substrate (6) being remote from said layer of electro-optical material (4), the illumination system comprising an optical waveguide (14) of an optically transparent material, having an exit face (15) facing said display panel (2). According to the invention, the illumination system (3) further comprises a matrix-addressable light-management member (27).

Abstract translation: 本发明涉及一种显示装置（1），包括具有电光材料层（4）的显示面板（2），在像素区域中设置有电极（7）的第一透光基板（5） 排列成行和列的第二透光基板（6），所述电光材料层（4）夹在所述第一和第二层（5,6）之间，照明系统（3）被布置在 所述第二基板（6）的远离所述电光材料层（4）的一侧，所述照明系统包括光学透明材料的光波导（14），所述光波导（14）具有面向所述显示面板 （2）。 根据本发明，照明系统（3）还包括矩阵寻址光管理部件（27）。

公开(公告)号：US20060014088A1

公开(公告)日：2006-01-19

申请号：US10534765

申请日：2003-10-27

Applicant: Dirk De Boer ,  Dirk Broer ,  Gerardus Karman ,  Armanda Nieuwkerk ,  Emiel Peeters ,  Blanca Van Der Zande

Inventor： Dirk De Boer ,  Dirk Broer ,  Gerardus Karman ,  Armanda Nieuwkerk ,  Emiel Peeters ,  Blanca Van Der Zande

IPC: C09K19/00

CPC classification number: G02B5/3016 ,  G02B5/305

Abstract: The invention relates to an optically anisotropic body, such as a compensation foil or a micro-lens array, having a desired pattern of optical properties. Said body is obtainable by a method wherein a non-uniform electric and/or magnetic field is applied over a body comprising a polymerizable electro-optical and/or magneto-optical material, such as a LC monomer, thus inducing a desired molecular pattern. The pattern is made permanent by polymerising the electro-optical and/or magnetooptical material.

Abstract translation: 本发明涉及具有期望的光学性质图案的光学各向异性体，例如补偿箔片或微透镜阵列。 所述体可以通过其中将不均匀的电场和/或磁场施加在包含诸如LC单体的可聚合电光和/或磁光材料的主体上的方法获得，从而诱导期望的分子图案。 通过聚合电光和/或磁光材料使图案变得永久。

公开(公告)号：US20050254405A1

公开(公告)日：2005-11-17

申请号：US10517927

申请日：2003-06-04

Applicant: Emiel Peeters ,  Dirk Broer ,  Christopher Busch

Inventor： Emiel Peeters ,  Dirk Broer ,  Christopher Busch

IPC: G02F1/13 ,  G02F1/1334 ,  G11B7/0045 ,  G11B7/24 ,  G11B7/25 ,  G11B7/26 ,  G11B7/00

CPC classification number: G11B7/25

Abstract: The invention relates to producing an optical memory which combines stability of written and non-written data with high writing speed and good sensitivity during writing, such an optical memory as well as a method of writing in such a memory. The optical memory has a liquid crystal (LC) layer with a first type of LC molecules (102) aligned in one direction, forming a polymer network (108), and a second type of LC molecules (104) oriented in a perpendicular direction, in which the orientation of said second type of LC molecules is meta-stable. By making use of a force, exerted on the second type of LC molecules (104), by the network of aligned crosslinked molecules, an increase in relaxation rate for the second type of molecules (104) from a meta-stable state of orientation, is achieved, which makes it possible to use said relaxation for writing data at an increased writing rate.

Abstract translation: 本发明涉及一种将写入和写入数据的稳定性与写入时的高写入速度和良好的灵敏度以及诸如此类的存储器之间写入的方法相结合的光存储器。 光学存储器具有液晶（LC）层，其具有在一个方向上排列的第一类型的LC分子（102），形成聚合物网络（108）和沿垂直方向取向的第二类型的LC分子（104） 其中所述第二类型的LC分子的取向是元稳定的。 通过利用由对准的交联分子的网络施加在第二类型的LC分子（104）上的力，第二类型的分子（104）从定向取向的松弛率增加， ，这使得可以以增加的写入速率使用所述松弛来写入数据。

公开(公告)号：US20110104445A1

公开(公告)日：2011-05-05

申请号：US12936896

申请日：2009-04-07

Applicant: Ko Hermans ,  Itsuro Tomatsu ,  Rintje Pieter Sijbesma ,  Cornelis Wilhelmus Maria Bastiaansen ,  Jan Dirk Broer

Inventor： Ko Hermans ,  Itsuro Tomatsu ,  Rintje Pieter Sijbesma ,  Cornelis Wilhelmus Maria Bastiaansen ,  Jan Dirk Broer

IPC: B32B3/30 ,  G03F7/20

CPC classification number: G03F7/36 ,  G03F7/027 ,  G03F7/38

Abstract: The invention relates to a photo-embossing process for the preparation of a polymeric relief structure comprising the steps of: a) coating a substrate with a coating composition comprising one or more radiation-sensitive ingredients and less than 30 wt % polymeric binder material; b) locally treating the coated substrate with electromagnetic radiation having a periodic, non-periodic or random radiation-intensity pattern, forming a latent image, at a temperature below a transition temperature of the coating composition; and c) polymerizing and/or crosslinking the resulting coated substrate, at a temperature above said transition temperature, wherein the transition temperature is a temperature that defines a transition of the coating composition between a state of high viscosity and low viscosity and wherein the coating composition comprises a compound A comprising at least one radiation curable group and a photoinitiator, the coating composition having a transition temperature between 30° C. and 120° C.

Abstract translation: 本发明涉及一种用于制备聚合物浮雕结构的光压印方法，包括以下步骤：a）用包含一种或多种辐射敏感成分和小于30wt％聚合物粘合剂材料的涂料组合物涂覆基材; b）在低于涂层组合物的转变温度的温度下，用具有周期性，非周期性或随机辐射强度图案的电磁辐射局部处理涂覆的基底，形成潜像; 和c）在高于所述转变温度的温度下聚合和/或交联所得涂覆的基材，其中所述转变温度是限定所述涂料组合物在高粘度和低粘度状态之间的转变的温度，并且其中所述涂料组合物 包含包含至少一种可辐射固化基团和光引发剂的化合物A，该涂料组合物的转变温度在30℃至120℃之间。