公开(公告)号：US5728449A

公开(公告)日：1998-03-17

申请号：US381917

申请日：1995-02-13

Applicant: Helmut Steininger ,  Peter Heilmann ,  Peter Hewkin

Inventor： Helmut Steininger ,  Peter Heilmann ,  Peter Hewkin

IPC: B41M3/14 ,  B42D25/42 ,  G03C5/08 ,  G03G21/00 ,  G03G21/04 ,  G09F3/00 ,  G09F3/02 ,  B32B3/00

CPC classification number: B42D25/47 ,  B41M3/148 ,  B42D25/30 ,  B42D25/42 ,  G03C5/08 ,  G03G21/043 ,  G09F3/0292 ,  B42D2033/04 ,  B42D2033/08 ,  B42D2033/14 ,  B42D2035/34 ,  B42D25/45 ,  Y10S428/913 ,  Y10S428/914 ,  Y10T428/24802 ,  Y10T428/24826 ,  Y10T428/24868 ,  Y10T428/31504

Abstract: An anti-copy film or layer for originals or documents comprises according to the invention transparent film material having a multiplicity of at least partially opaque and possibly reflective areas arranged at distances from one another which are arranged as screens on the film surfaces essentially in horizontal planes, in particular parallel to one another, but offset, so that information on an original lying under this film or layer is masked in an approximately vertical viewing direction and is visible in the direction of a predefined viewing angle. Expedient production methods enable the use of photographic techniques.

Abstract translation: PCT No.PCT / EP93 / 01891 Sec。 371日期1995年2月13日 102（e）日期1995年2月13日PCT提交1993年7月18日PCT公布。 公开号WO94 / 04367 日期1994年3月3日一种用于原件或文件的防复制膜或层包括根据本发明的透明膜材料，其具有多个至少部分不透明和可能反射的区域，该区域彼此间隔布置成在膜上布置成屏幕 表面基本上在水平平面中，特别是彼此平行但是偏移，使得位于该膜或层下面的原稿上的信息被屏蔽在大致垂直的观察方向上并且在预定视角的方向上可见。 便利的生产方法可以使用摄影技术。

公开(公告)号：US5585139A

公开(公告)日：1996-12-17

申请号：US355300

申请日：1994-12-12

Applicant: Helmut Steininger ,  Peter Heilmann

Inventor： Helmut Steininger ,  Peter Heilmann

IPC: G11B5/66 ,  C23C14/20 ,  C23C14/24 ,  G11B5/64 ,  G11B5/65 ,  G11B5/73 ,  G11B5/85

CPC classification number: C23C14/24 ,  C23C14/20 ,  G11B5/85

Abstract: The magnetic recording medium consists essentially of a polymeric substrate, a coherent, magnetic thin metal film applied to the surface of the substrate by a PVD method and, if required, a protective layer formed on the thin metal film. In order to achieve a large residual induction component in the plane of the film, in particular high residual induction in the transverse direction, the thin metal film contains a noble gas or noble gas mixture, preferably argon. During the coating of the polymeric substrate with the magnetic metal or with the magnetic alloy, the noble gas is fed directly and preferably tangentially to the substrate surface at a specific noble gas flow of from 1.0.multidot.10.sup.4 to 6.0.multidot.10.sup.4. In the plane of the thin metal film, the ratio of residual induction in the longitudinal direction to that in the transverse direction is from about 0.9 to about 1.8.

Abstract translation: 磁记录介质基本上由聚合物基底，通过PVD方法施加到基底表面的相干的磁性薄金属膜，如果需要，在薄金属膜上形成保护层。 为了在膜的平面中实现大的残留感应成分，特别是在横向上的高残留感应，薄金属膜含有惰性气体或惰性气体混合物，优选氩。 在用磁性金属或与磁性合金涂覆聚合物基材期间，惰性气体以1.0×10 4至6.0×10 4的特定惰性气体流直接且优选地切向地加到基材表面上。 在薄金属膜的平面中，纵向上的残留感应与横向上的残留感应比为约0.9至约1.8。

公开(公告)号：US5569522A

公开(公告)日：1996-10-29

申请号：US293953

申请日：1994-08-24

Applicant: Helmut Steininger ,  Alan Green ,  Michel Munch ,  Peter Heilmann

Inventor： Helmut Steininger ,  Alan Green ,  Michel Munch ,  Peter Heilmann

IPC: B41M3/14 ,  B44F1/12 ,  G03C5/08 ,  G03G21/04 ,  B32B3/00

CPC classification number: B41M3/148 ,  G03C5/08 ,  G03G21/043 ,  Y10S428/913 ,  Y10S428/914 ,  Y10T428/24802 ,  Y10T428/24826 ,  Y10T428/24868 ,  Y10T428/31504

Abstract: An anticopying film (2) for covering documents (1) appears opaque in vertical plan view (5) as a result of total reflection for protection against copying and appears transparent in the oblique viewing direction (6), the film having an irregular sawtooth structure (3). This makes it virtually impossible to produce an identical second film with the aid of which, by placing said second film on top, the effect of the anticopying film (2) might be eliminated.

Abstract translation: 用于覆盖文件（1）的防转染薄膜（2）在垂直平面图（5）中看起来不透明，作为防反复复制的全反射的结果，并且在倾斜观察方向（6）上看起来是透明的，该膜具有不规则的锯齿结构 （3）。 这使得几乎不可能产生相同的第二膜，借助于此，通过将所述第二膜放置在顶部，可以消除防转染膜（2）的效果。

公开(公告)号：US4994330A

公开(公告)日：1991-02-19

申请号：US492211

申请日：1990-03-13

Applicant: Helmut Steininger

Inventor： Helmut Steininger

IPC: G11B11/10 ,  G11B11/105

CPC classification number: G11B11/10582 ,  Y10S428/90 ,  Y10T428/265

Abstract: In a sheet-like, multilayer, magneto-optical recording material which has a base which is transparent to light, a thermally alterable recording layer of an amorphous lanthanide transition metal alloy and, on the base remote side of this recording layer, an anticorrosion layer containing carbides, nitrides and/or oxides, the anticorrosion layer(a) is from 30 to 250 nm thick and(b) consists of two or more components which(c) are present in four or more separate strata, each consisting of one of the components,(d) one or more of the components being selected from the group consisting of the elements boron, aluminum, silicon, titanium, zirconium, hafnium, vanadium, niobium, tantalum, chromium, molybdenum and tungsten and(e) one or more of the other components being selected from the group consisting of the carbides, nitrides and oxides of these elements (d) and(f) directly adjacent strata always consisting of components which differ from one another.

Abstract translation: 在具有对光透明的基底的片状，多层的磁光记录材料中，是非晶态镧系元素过渡金属合金的可热改变记录层，并且在该记录层的基底远侧，具有抗腐蚀层 含有碳化物，氮化物和/或氧化物的防腐层（a）的厚度为30〜250nm，（b）由两个以上成分组成，（c）存在于四个以上的分离层中， 组分，（d）一种或多种组分选自硼，铝，硅，钛，锆，铪，钒，铌，钽，铬，钼和钨中的一种或多种组分，和（e）一种或多种 更多的其它组分选自碳酸盐，氮化物和这些元素（d）和（f）的氧化物，直接相邻的层总是由彼此不同的组分组成。

公开(公告)号：US4959243A

公开(公告)日：1990-09-25

申请号：US300849

申请日：1989-01-24

Applicant: Helmut Steininger

Inventor： Helmut Steininger

IPC: G11B11/10 ,  G11B11/105

CPC classification number: G11B11/10586 ,  Y10S428/90

Abstract: A magneto-optical recording element comprising a film (C) consisting essentially of multiple separate carbide, nitride and/or oxide layers is produced on a surface to be covered by a process comprising the following steps:(I) application of a 30-500 nm thick film (C.sub.1) via the gas phase to the relevant surface to be covered, the said film (C.sub.1) having the following specifications:(C.sub.11) the film (C.sub.1) consists of two or more components;(C.sub.12) the said components are present in three or more separate elements and element carbide, nitride and oxide layers, each consisting of one or more of the said components;(C.sub.13) the components of the said element layers are selected from the group consisting of boron, aluminum, gallium, indium, silicon, germanium, tin, lead, antimony, bismuth, magnesium, titanium, zirconium, hafnium, vanadium, niobium, tantalum, chromium, molybdenum, tungsten, iron, cobalt, zinc, cadmium, lanthanum, cerium, praseodymium, neodymnium, samarium, europium, gadolinium, terbium, dysprosium, holmium, erbium, thulium, ytterbium, lutetium and thorium;(C.sub.14) the components of the said element carbide, nitride and oxide layers are selected from the group consisting of the carbides, nitrides and oxides of the said elements (C.sub.13);(C.sub.15) directly adjacent layers consisting of carbides, nitrides and/or oxides (C.sub.14) differ in composition from one another;(C.sub.16) two or more of the said layers (C.sub.14) are separated from one another by one or more 0.1-30 nm thick layers consisting of one or more of the elements (C.sub. 13); and(C.sub.17) that layer which is directly adjacent to the recording layer or which faces it is always one of the said layers (C.sub.14), by carrying out the following two process steps several times:(I1) application of one or more of the said layers (C.sub.14) to the relevant surface via the gas phase and(I2) application of one or more of the element layers (C.sub.13) to the surface of the layer (C.sub.14) produced beforehand,resulting in the said film (C.sub.1), followed by(II) reaction of the film (C hd 1) with reactants selected from the group consisting of oxygen, nitrogen and carbon, resulting in the said film (C).

公开(公告)号：US08759445B2

公开(公告)日：2014-06-24

申请号：US13000817

申请日：2009-06-23

Applicant: Matthias Müller ,  Konrad Knoll ,  Christof Mehler ,  Helmut Steininger ,  Norbert Güntherberg ,  Daniel Wagner ,  Michael Schuster ,  Geert Verlinden ,  Florian Greger

Inventor： Matthias Müller ,  Konrad Knoll ,  Christof Mehler ,  Helmut Steininger ,  Norbert Güntherberg ,  Daniel Wagner ,  Michael Schuster ,  Geert Verlinden ,  Florian Greger

IPC: C08L53/02 ,  C08F297/04

CPC classification number: C08L53/02 ,  C08F297/04 ,  C08L2666/02 ,  C08L2666/24

Abstract: A mixture which comprises a) from 5 to 95% by weight of a copolymer A which comprises one or more copolymer blocks (B/S)A each composed of from 65 to 95% by weight of vinylaromatic monomers and from 35 to 5% by weight of dienes and of a glass transition temperature TgA in the range from 40° to 90° C., b) from 95 to 5% by weight of a block copolymer B which comprises at least one hard block S composed of from 95 to 100% by weight of vinylaromatic monomers and of from 0 to 5 by weight of dienes, and comprises one or more copolymer blocks (B/S)A each composed of from 65 to 95% by weight of vinylaromatic monomers and of from 35 to 5% by weight of dienes and of a glass transition temperature TgA in the range from 40° to 90° C., and comprises one or more copolymer blocks (B/S)B each composed of from 20 to 60% by weight of vinylaromatic monomers and of from 80 to 40% by weight of dienes and of a glass transition temperature TgB in the range from −70° to 0° C., c) from 0 to 45% by weight of thermoplastic polymers C other than A and B, and d) from 0 to 6% by weight of processing aids D, where the entirety of A to D gives 100% by weight, and its use for the production of shrink films.

Abstract translation: 一种混合物，其包含a）5至95重量％的共聚物A，其包含一种或多种共聚物嵌段（B / S）A，每个共聚物嵌段（B / S）A由65至95重量％的乙烯基芳族单体和35至5重量％ 二烯的重量和玻璃化转变温度TgA在40℃至90℃的范围内，b）95至5重量％的嵌段共聚物B，其包含至少一种由95至100组成的硬质块S 重量百分比的乙烯基芳族单体和0至5重量份的二烯，并且包含一种或多种共聚物嵌段（B / S）A，各自由65至95重量％的乙烯基芳族单体和35至5重量％ 的二烯的玻璃化转变温度TgA和40〜90℃的玻璃化转变温度TgA，并且包含一种或多种共聚物嵌段（B / S）B，各自由20至60重量％的乙烯基芳族单体组成， 80〜40重量％的二烯，玻璃化转变温度TgB在-70℃〜0℃的范围内，c）0〜45％的重量 除了A和B之外的热塑性聚合物C，以及d）0至6重量％的加工助剂D，其中A至D的总量为100重量％，以及其用于生产收缩膜的用途。

公开(公告)号：US20110098401A1

公开(公告)日：2011-04-28

申请号：US13000817

申请日：2009-06-23

Applicant: Matthias Müller ,  Konrad Knoll ,  Christof Mehler ,  Helmut Steininger ,  Norbert Güntherberg ,  Daniel Wagner ,  Michael Schuster ,  Geert Verlinden ,  Florian Greger

Inventor： Matthias Müller ,  Konrad Knoll ,  Christof Mehler ,  Helmut Steininger ,  Norbert Güntherberg ,  Daniel Wagner ,  Michael Schuster ,  Geert Verlinden ,  Florian Greger

IPC: C08L53/02

CPC classification number: C08L53/02 ,  C08F297/04 ,  C08L2666/02 ,  C08L2666/24

Abstract: A mixture which comprisesa) from 5 to 95% by weight of a copolymer A which comprises one or more copolymer blocks (B/S)A each composed of from 65 to 95% by weight of vinylaromatic monomers and from 35 to 5% by weight of dienes and of a glass transition temperature TgA in the range from 40° to 90° C.,b) from 95 to 5% by weight of a block copolymer B which comprises at least one hard block S composed of from 95 to 100% by weight of vinylaromatic monomers and of from 0 to 5 by weight of dienes, and comprises one or more copolymer blocks (B/S)A each composed of from 65 to 95% by weight of vinylaromatic monomers and of from 35 to 5% by weight of dienes and of a glass transition temperature TgA in the range from 40° to 90° C., and comprises one or more copolymer blocks (B/S)B each composed of from 20 to 60% by weight of vinylaromatic monomers and of from 80 to 40% by weight of dienes and of a glass transition temperature TgB in the range from −70° to 0° C.,c) from 0 to 45% by weight of thermoplastic polymers C other than A and B, andd) from 0 to 6% by weight of processing aids D,where the entirety of A to D gives 100% by weight, and its use for the production of shrink films.

Abstract translation: 一种混合物，其包含a）5至95重量％的共聚物A，其包含一种或多种共聚物嵌段（B / S）A，每个共聚物嵌段（B / S）A由65至95重量％的乙烯基芳族单体和35至5重量％ 二烯的重量和玻璃化转变温度TgA在40℃至90℃的范围内，b）95至5重量％的嵌段共聚物B，其包含至少一种由95至100组成的硬质块S 重量百分比的乙烯基芳族单体和0至5重量份的二烯，并且包含一种或多种共聚物嵌段（B / S）A，各自由65至95重量％的乙烯基芳族单体和35至5重量％ 的二烯的玻璃化转变温度TgA和40〜90℃的玻璃化转变温度TgA，并且包含一种或多种共聚物嵌段（B / S）B，各自由20至60重量％的乙烯基芳族单体组成， 80〜40重量％的二烯，玻璃化转变温度TgB在-70℃〜0℃的范围内，c）0〜45％的重量 除了A和B之外的热塑性聚合物C，以及d）0至6重量％的加工助剂D，其中A至D的总量为100重量％，以及其用于生产收缩膜的用途。

公开(公告)号：US07910197B2

公开(公告)日：2011-03-22

申请号：US10519841

申请日：2003-07-16

Applicant: Frank Dietsche ,  Thomas Jaworek ,  Reinhold Schwalm ,  Martin Weber ,  Helmut Steininger

Inventor： Frank Dietsche ,  Thomas Jaworek ,  Reinhold Schwalm ,  Martin Weber ,  Helmut Steininger

IPC: B32B7/02

CPC classification number: B05D7/54 ,  B05D5/00 ,  B05D2701/00 ,  Y10T428/2495 ,  Y10T428/26 ,  Y10T428/31507 ,  Y10T428/31678 ,  Y10T428/31725 ,  Y10T428/31909 ,  Y10T428/31928 ,  Y10T428/31931 ,  Y10T428/31935 ,  Y10T428/31938 ,  Y10T428/31989

Abstract: A multicoat system on a substrate, comprising at least one radiation-curable coating system (F) and at least one elastic intercoat (D) which is located between substrate and radiation-curable coating system (F) and has a glass transition temperature (Tg) of −20° C. or less.

Abstract translation: 一种基片上的多中心系统，包括至少一个可辐射固化涂层系统（F）和至少一个位于基底和可辐射固化涂层系统（F）之间的弹性涂层（D），并具有玻璃化转变温度 ）为-20℃以下。

公开(公告)号：US20100152387A1

公开(公告)日：2010-06-17

申请号：US12601147

申请日：2008-05-07

Applicant: Helmut Steininger ,  Konrad Knoll ,  Rolf Mülhaupt ,  Barbara Gall ,  Frédéric Pelascini

Inventor： Helmut Steininger ,  Konrad Knoll ,  Rolf Mülhaupt ,  Barbara Gall ,  Frédéric Pelascini

IPC: C08F8/08 ,  C08F212/08 ,  C08F4/76 ,  C08F226/02 ,  C08F230/08 ,  C08F214/00 ,  C08F4/80

CPC classification number: C08F236/20 ,  C08F8/08 ,  C08F8/20 ,  C08F8/30 ,  C08F8/42 ,  C08F10/00 ,  C08F12/08 ,  C08F257/02 ,  C08F290/04 ,  C08F290/06 ,  C08F293/005 ,  C08F2438/01 ,  C08F2810/40 ,  C08G61/04 ,  C08G61/08 ,  C08L51/003 ,  C08L53/00 ,  C08L53/02 ,  C08F212/08 ,  C08L2666/02 ,  C08L2666/04 ,  C08F4/64196 ,  C08F112/08

Abstract: The present invention relates to a process for preparing functionalized isotactic polystyrene, functionalized isotactic polystyrene which can be prepared by the process of the invention, the use of the functionalized isotactic polystyrene of the invention as macromonomer, a process for preparing a macroinitiator, a macroinitiator which can be prepared by the abovementioned process, the use of the macroinitiator for controlled free-radical polymerization, the use of the functionalized isotactic polystyrene of the invention as macromonomer, preferably in copolymerization with olefins, ROMP with cycloolefins or for coupling with silicone segments, a process for epoxidizing the functionalized isotactic polystyrene of the invention, epoxidized isotactic polystyrene which can be prepared by the abovementioned process and a process for preparing soft thermoplastic elastomers (TPEs) by metathesis polymerization of the functionalized isotactic polystyrene of the invention with suitable polymers which have terminal double bonds and soft thermoplastic elastomers which can be prepared by the process of the invention.

Abstract translation: 本发明涉及一种制备官能化全同立构聚苯乙烯的方法，其可通过本发明方法制备的官能化全同立构聚苯乙烯，本发明的官能化全同立构聚苯乙烯作为大分子单体的用途，大分子引发剂的制备方法，大分子引发剂 可以通过上述方法制备，使用大分子引发剂进行受控的自由基聚合，使用本发明的官能化全同立构聚苯乙烯作为大分子单体，优选与烯烃共聚，ROMP与环烯烃或与硅氧烷链段偶联， 环氧化本发明的官能化全同立构聚苯乙烯的方法，可通过上述方法制备的环氧化全同立构聚苯乙烯和通过本发明的官能化全同立构聚苯乙烯与合适聚合物的复分解聚合制备软热塑性弹性体（TPE）的方法 其具有末端双键和可通过本发明的方法制备的软质热塑性弹性体。

公开(公告)号：US5108846A

公开(公告)日：1992-04-28

申请号：US551780

申请日：1990-07-12

Applicant: Helmut Steininger

Inventor： Helmut Steininger

IPC: C23C14/00 ,  C23C14/06 ,  G11B5/72 ,  G11B11/105

CPC classification number: C23C14/06 ,  C23C14/0036 ,  G11B11/10584 ,  G11B11/10586 ,  G11B5/722 ,  Y10S428/90

Abstract: The novel polycrystalline, unoriented or X-ray amorphous carbide, oxide and/or nitride ceramics which have the elemental composition I ##STR1## where M is at least one element from the group consisting of titanium, zirconium, hafnium, thorium, scandium, yttrium, lanthanum, cerium, praseodymium, neodymium, samarium, europium, gadolinium, terbium, dysprosium, holmium, erbium, thulium, ytterbium, lutetium, vanadium, niobium, tantalum, chromium, molybdenum, tungsten, manganese, rhenium, iron, cobalt, nickel, ruthenium, rhodium, copper, zinc, magnesium, calcium, strontium, barium, boron, aluminum, gallium, indium, thallium, tin, lead, phosphorus, arsenic, antimony, bismuth and tellurium and x is from 0.01 to 0.7, can be used, in the form of thin layers, as diffusion barriers, anticorrosion layers or interference layers, for protecting surfaces from mechanical abrasion or for protecting magneto-optical recording layers from corrosion. These novel thin polycrystalline, unoriented or X-ray amorphous layers of germanium ceramics can be prepared with the aid of reactive sputtering or reactive magnetron sputtering of a target which consists of the abovementioned elemental composition I.

Abstract translation: 具有元素组成I Ge1-xMx（I）的新型多晶，未取向或X射线无定形碳化物，氧化物和/或氮化物陶瓷，其中M是至少一种元素，由钛，锆，铪，钍， 钪，钇，镧，铈，镨，钕，钐，铕，钆，铽，镝，钬，铒，ium，镱，镥，钒，铌，钽，铬，钼，钨，锰，铼， 钴，镍，钌，铑，铜，锌，镁，钙，锶，钡，硼，铝，镓，铟，铊，锡，铅，磷，砷，锑，铋和碲，x为0.01〜0.7 可以以薄层的形式用作扩散阻挡层，防腐层或干涉层，用于保护表面免受机械磨损或用于保护磁光记录层免受腐蚀。 可以借助于由上述元素组合物I组成的靶的反应溅射或反应性磁控溅射来制备锗陶瓷的这些新型薄多晶，未取向或X射线非晶层。