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    Production of a thin x-ray amorphous aluminum nitride or aluminum silicon nitride film on a surface
    2.
    发明授权
    Production of a thin x-ray amorphous aluminum nitride or aluminum silicon nitride film on a surface 失效
    在表面上生产薄的x射线无定形氮化铝或氮化铝铝膜

    公开(公告)号：US4957604A

    公开(公告)日：1990-09-18

    申请号：US300975

    申请日：1989-01-24

    Applicant: Helmut Steininger

    Inventor： Helmut Steininger

    IPC: C23C14/00 ,  C23C14/06 ,  C23C14/34 ,  G02B6/122 ,  G11B7/243 ,  G11B7/253 ,  G11B7/2536 ,  G11B7/257 ,  G11B7/2578 ,  G11B11/105 ,  H01L21/318

    CPC classification number: H01L21/318 ,  C23C14/0036 ,  C23C14/0641 ,  G02B6/122 ,  G11B11/10589 ,  G11B11/10593 ,  G11B7/2578 ,  G11B2007/24306 ,  G11B2007/25706 ,  G11B2007/25708 ,  G11B2007/2571 ,  G11B2007/25713 ,  G11B7/2536

    Abstract: A thin X-ray amorphous aluminum nitride or aluminum silicon nitride film is produced on a surface by vaporization of aluminum or of aluminum and silicon by reactive sputtering or reactive magnetron sputtering under reduced pressure in a process gas atmosphere, so that a sputter gas results, and deposition of the aluminum nitride or of the aluminum silicon nitride from the sputter gas onto the said surface, resulting in the said thin X-ray amorphous aluminum nitride or aluminum silicon nitride film, by a process in which the said process gas atmosphere consists essentially of nitrogen and argon and one or more further noble gases selected from the group consisting of neon, krypton and xenon, the volume ratio of argon to the further noble gases being from 2:1 to 100:1 and the volume ratio of the further noble gases to nitrogen being from 2:1 to 10:1.

    Abstract translation: 通过在处理气体气氛中的减压下的反应溅射或反应性磁控溅射在铝或铝和硅的蒸发下在表面上产生薄的X射线无定形氮化铝或氮化铝膜，从而产生溅射气体， 以及将氮化铝或氮化铝铝从溅射气体沉积到所述表面上，通过其中所述工艺气体气氛基本上组成的方法产生所述薄X射线无定形氮化铝或氮化铝膜 的氮气和氩气以及一种或多种选自氖气，氪气和氙气的惰性气体，氩气与另外的惰性气体的体积比为2:1至100:1，另外的贵金属的体积比为 气体与氮气的比例为2：1至10：1。

    Carrier for the manufacture of abrasion-resistant catalysts, process for the production of the carrier and catalyst deposited on the carrier
    5.
    发明授权
    Carrier for the manufacture of abrasion-resistant catalysts, process for the production of the carrier and catalyst deposited on the carrier 失效
    用于制造耐磨催化剂的载体，用于生产沉积在载体上的载体和催化剂的方法

    公开(公告)号：US4703028A

    公开(公告)日：1987-10-27

    申请号：US763436

    申请日：1985-08-06

    Applicant: Helmut Steininger

    Inventor： Helmut Steininger

    IPC: B01J35/10 ,  B01J37/02 ,  B01J37/34 ,  C23C14/06 ,  B01J21/02 ,  B01J21/04 ,  B01J21/06

    CPC classification number: B01J37/34 ,  B01J37/0215 ,  B01J37/0238 ,  C23C14/06

    Abstract: A carrier for abrasion-resistant catalysts having a surface coated with high-fusion oxides, nitrides and/or carbides of at least one transition metal, or boron, of aluminum and/or of silicon or of combination of these compounds. The coating is carried out using physical vapor deposition techniques, such as evaporating coating ion plating or cathode sputtering. The layer thus produced consists of individual structures, such as stems and/or columns having different elevations which together produce a porous layer serving as an intermediate layer for the subsequent deposition of the catalytic material.

    Abstract translation: PCT No.PCT / EP84 / 00394 Sec。 371日期1985年8月6日 102（e）日期1985年8月6日PCT提交1984年12月8日PCT公布。 第WO85 / 02557号公报 1985年6月20日，1985年。一种用于耐磨催化剂的载体，其具有涂覆有至少一种过渡金属或硼的铝，和/或硅的高熔点氧化物，氮化物和/或碳化物的表面或者 这些化合物。 涂层使用物理气相沉积技术进行，例如蒸镀涂层离子镀或阴极溅射。 由此产生的层由单独的结构构成，例如具有不同高度的杆和/或柱，它们一起产生用作随后沉积催化材料的中间层的多孔层。

    Styrol/Butadiene Block Copolymer Mixtures for Shrink Films
    7.
    发明申请
    Styrol/Butadiene Block Copolymer Mixtures for Shrink Films 有权
    用于收缩膜的苯乙烯/丁二烯嵌段共聚物混合物

    公开(公告)号：US20080269414A1

    公开(公告)日：2008-10-30

    申请号：US11813742

    申请日：2005-12-31

    Applicant: Konrad Knoll ,  Helmut Steininger ,  Michael Schuster ,  Daniel Wagner ,  Peter Merkel

    Inventor： Konrad Knoll ,  Helmut Steininger ,  Michael Schuster ,  Daniel Wagner ,  Peter Merkel

    IPC: C08L53/02

    CPC classification number: C08L53/02 ,  C08L2666/24

    Abstract: A mixture which comprises a) from 5 to 50% by weight of a block copolymer A which comprises one or more oopolymer blocks (B/S)A each composed of from 65 to 95% by weight of vinylaromatic monomers and from 35 to 5% by weight of dienes and of a glass transtion temperature TgA in the range from 40° to 90° C. b) from 95 to 50% by weight of a block copolymer B which comprises at least one hard block S composed of vinylaromatic monomers and comprises one or more copolymer blocks (B/S)B each composed of from 20 to 60% by weight of vinylaromatic monomers and from 80 to 40% by weight of dienes and of a glass transition temperature TgB in the range from −70° to 0°C. c) from 0 to 45% by weight of polystyrene or of a block copolymer C other than A and B, and d) from 0 to 6% by weight of a plasticizer, and its use for production of shrink films.

    Abstract translation: 一种混合物，其包含a）5至50重量％的嵌段共聚物A，其包含一种或多种聚合物嵌段（B / S）A A，各自由65至95重量％的乙烯基芳族 单体和35至5重量％的二烯，玻璃化转变温度Tg A A在40℃至90℃的范围内。b）95至50重量％的嵌段共聚物 B，其包含至少一个由乙烯基芳族单体组成的硬块S，并且包含一个或多个共聚物嵌段（B / S）B，每个由20至60重量％的乙烯基芳族单体组成，80至 40重量％的二烯和玻璃化转变温度Tg B 在-70℃至0℃的范围内。 c）0至45重量％的聚苯乙烯或除A和B之外的嵌段共聚物C，以及d）0至6重量％的增塑剂，以及其用于生产收缩膜的用途。

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