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    Manufacture of masks and electronic parts
    11.
    发明申请
    Manufacture of masks and electronic parts 审中-公开
    面具和电子零件的制造

    公开(公告)号：US20030190533A1

    公开(公告)日：2003-10-09

    申请号：US10354838

    申请日：2003-01-30

    Applicant: Kodak Polychrome Graphics, LLC

    Inventor： Kevin Barry Ray ,  Anthony Paul Kitson ,  Eduard Kottmair ,  Hans-Horst Glatt ,  Stefan Hilgart

    IPC: G03F009/00

    CPC classification number: G03F1/68 ,  G03F7/023 ,  H05K3/0076 ,  H05K3/0082 ,  Y10S430/106 ,  Y10S430/145

    Abstract: Imageable precursors for masks and for electronic parts comprise a polymeric layer applied to a substrate. The layer comprises at least one polymer having infra-red absorbing groups carried as pendent groups on the polymer backbone. Certain infrared absorbing groups may also act to insolubilize the polymer in a developer, until it is imagewise exposed to infra-red radiation. Imagewise application of heat, resulting from imagewise exposure of the precursor to infra-red radiation, renders the polymer layer more soluble in the developer than prior to exposure to the infra-red radiation.

    Abstract translation: 用于掩模和电子部件的可成像前体包括施加到基底的聚合物层。 该层包含至少一种聚合物，其具有在聚合物主链上作为悬挂基团携带的红外线吸收基团。 某些红外吸收基团也可以起作用以使显影剂中的聚合物不溶解，直到其成像曝光于红外辐射。 由于将前体成像曝光到红外辐射而产生的图像上的热量使得聚合物层比暴露于红外线辐射之前更易于在显影剂中溶解。

    Method and equipment for using photo-or thermally imagable, negatively working patterning compositions
    13.
    发明申请
    Method and equipment for using photo-or thermally imagable, negatively working patterning compositions 失效
    使用光或热成像，负面工程图案化组合物的方法和设备

    公开(公告)号：US20030157429A1

    公开(公告)日：2003-08-21

    申请号：US10038740

    申请日：2002-01-03

    Applicant: Kodak Polychrome Graphics LLC, a corporation of the State of Connecticut.

    Inventor： Oliver Richard Blum ,  William Paul Heideman ,  Dean Ginther ,  Jeffrey James Collins

    IPC: G03F007/40

    CPC classification number: G03F7/203 ,  B41C1/1008 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/24 ,  B41C2210/262 ,  B41N1/083 ,  G03F7/038 ,  G03F7/38 ,  Y10S430/145 ,  Y10S430/146

    Abstract: A method for imaging patterning compositions comprising the steps of: (1) providing at least one patterning composition layer on a substrate; said patterning composition comprising: (a) at least one acid generator; (b) at least one cross linking resin or compound; (c) at least one binder resin comprising a polymer containing reactive pendant group selected from group consisting of hydroxyl, carboxylic acid, sulfonamide, active imide, alkoxymethylamides and mixtures thereof; and (d) at least one infrared absorber; (2) imagewise exposing the patterning composition layer to actinic radiation; (3) treating the imaged patterning composition layer with heat energy to treat the imaged portions of the composition layer; (4) flood exposing the heat-treated, imaged patterning composition layer with UV light for a predetermined time, said time being sufficient to promote the effective clear-out of non-imaged portions during the developing step without causing substantial deterioration of the imaged portions; and (5) developing the flood exposed, heat-treated imaged patterning composition with an aqueous alkaline developer to remove the non-imaged areas of the patterning composition layer and leaving the imaged areas substantially unaffected.

    Abstract translation: 一种用于成像图案化组合物的方法，包括以下步骤：（1）在基底上提供至少一个图案化组合物层; 所述图案化组合物包含：（a）至少一种酸发生剂; （b）至少一种交联树脂或化合物; （c）至少一种粘合剂树脂，其包含含有选自羟基，羧酸，磺酰胺，活性酰亚胺，烷氧基甲基酰胺及其混合物的反应性侧基的聚合物; 和（d）至少一个红外线吸收剂; （2）将图案化组合物层成像曝光于光化辐射; （3）用热能处理成像的图案化组合物层以处理组合物层的成像部分; （4）使用UV光曝光经热处理的成像图案化组合物层达预定时间，所述时间足以促进在显影步骤期间非成像部分的有效清除而不引起成像部分的显着劣化 ; 和（5）用含水碱性显影剂显影暴露于曝光的经热处理的成像图案化组合物以除去图案化组合物层的未成像区域，并使成像区域基本上不受影响。

    Spray coating matting method for printing plate precursors
    15.
    发明申请
    Spray coating matting method for printing plate precursors 失效
    用于印版前体的喷涂消光方法

    公开(公告)号：US20020086116A1

    公开(公告)日：2002-07-04

    申请号：US09751184

    申请日：2000-12-29

    Applicant: Kodak Polychrome Graphics LLC.

    Inventor： Gerhard Hauck ,  Nils Nessler ,  Heinfried Rudolph

    IPC: B05D001/04

    CPC classification number: B05D1/04 ,  C09D131/04 ,  C09D133/02 ,  C09D139/06

    Abstract: A method for applying a matting layer to a radiation-sensitive layer of a printing plate precursor comprises: (a) providing a matting composition comprising a polymer and a solvent, wherein the matting composition has a solid content of more than 10% and no more than 50% by weight based on the total composition; and (b) spraying the matting composition on the radiation-sensitive layer using an electrostatically aided rotary atomizer having a bell speed of more than 10,000 rpm, wherein the distance between the bell and the radiation-sensitive layer to be coated is less than 50 cm.

    Abstract translation: 将消光层施加到印版前体的辐射敏感层的方法包括：（a）提供包含聚合物和溶剂的消光组合物，其中所述消光组合物的固体含量大于10％且不超过 基于总组合物重量的50％; 和（b）使用具有大于10,000rpm钟速的静电辅助旋转雾化器将消光组合物喷射在辐射敏感层上，其中钟罩和待涂布的辐射敏感层之间的距离小于50cm 。

    Process for making a two layer thermal negative plate
    18.
    发明申请
    Process for making a two layer thermal negative plate 失效
    制造双层热负极板的工艺

    公开(公告)号：US20030118949A1

    公开(公告)日：2003-06-26

    申请号：US10016173

    申请日：2001-12-13

    Applicant: Kodak Polychrome Graphics LLC, a corporation of the State of Connecticut.

    Inventor： Kevin Barry Ray ,  Anthony Paul Kitson

    IPC: G03F007/00

    CPC classification number: B41C1/1016 ,  B41C2201/04 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/14 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  G03F7/022 ,  G03F7/2022 ,  G03F7/2055 ,  Y10S430/145

    Abstract: A negative-working image forming process which comprises the steps of: (1) flood exposing with actinic radiation a photosensitive assembly that comprises: (a) a hydrophilic support which can be used as a lithographic base and having thereon; (b) a first layer comprising: (i) at least one polymer that is soluble or dispersible in an aqueous alkaline solution; (c) a second layer on top of the first layer, the second layer comprising at least one o-quinonediazide compound; whereby the flood exposure causes the at least one o-quinonediazide compound to be converted to the corresponding indenecarboxylic acid compound; and (d) at least one photothermal conversion material in either the first layer or the second layer or both; (2) imagewise exposing the flood exposed photosensitive assembly with infrared radiation to thereby convert the indenecarboxylic acid compound in the second layer in the imagewise exposed areas to the corresponding indene compound; and (3) developing the imagewise exposed photosensitive assembly with an alkaline developing solution to dissolve out the imagewise unexposed areas of the second layer and the areas of the first layer underlying the imagewise unexposed areas of the second layer and thereby produce a negative working image.

    Abstract translation: 一种负型图像形成方法，其包括以下步骤：（1）用光化辐射曝光光敏组件，其包含：（a）可用作平版印刷基底并具有其上的亲水载体; （b）第一层，其包含：（i）至少一种可溶于或可分散在碱性水溶液中的聚合物; （c）在第一层顶部的第二层，第二层包含至少一种邻醌二叠氮化合物; 由此泛滥暴露导致至少一种邻醌二叠氮化合物转化为相应的茚羧酸化合物; 和（d）在第一层或第二层或两者中的至少一种光热转换材料; （2）用红外辐射成像地暴露暴露的感光组件，从而将图像曝光区域中的第二层中的茚酸羧酸化合物转化成相应的茚化合物; 和（3）用碱性显影液显影图像曝光的感光组件，以溶解第二层的成像未曝光区域和第二层的成像未曝光区域下方的第一层的区域，从而产生负作用图像。

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