公开(公告)号：US09307624B2

公开(公告)日：2016-04-05

申请号：US12484812

申请日：2009-06-15

Applicant: Denis Alexandrovich Glushkov ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Konstantin Nikolaevich Koshelev ,  Givi Georgievich Zukakishvili ,  Vladimir Mihailovitch Krivtsun ,  Yurii Victorovitch Sidelnikov ,  Kurt Gielissen ,  Oleg Yakushev

Inventor： Denis Alexandrovich Glushkov ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Konstantin Nikolaevich Koshelev ,  Givi Georgievich Zukakishvili ,  Vladimir Mihailovitch Krivtsun ,  Yurii Victorovitch Sidelnikov ,  Kurt Gielissen ,  Oleg Yakushev

IPC: G21K5/04 ,  H05G2/00 ,  G03F7/20

CPC classification number: H05G2/003 ,  G03F7/70033 ,  H05G2/008

Abstract: A discharge produced plasma radiation source includes a laser beam pulse generator configured to provide a laser beam pulse to trigger a pinch in a plasma of the discharge produced plasma radiation source. The laser beam pulse generator is arranged to provide a laser beam pulse having an energy greater than an optimum laser beam pulse energy that corresponds to a maximum output of a given wavelength of radiation for a given discharge energy.

Abstract translation: 放电产生的等离子体辐射源包括激光束脉冲发生器，其被配置为提供激光束脉冲以触发放电产生的等离子体辐射源的等离子体中的夹点。 激光束脉冲发生器被布置成提供具有大于对于给定放电能量的给定波长的辐射的最大输出的最佳激光束脉冲能量的能量的激光束脉冲。

公开(公告)号：US20130015373A1

公开(公告)日：2013-01-17

申请号：US13583986

申请日：2011-03-08

Applicant: Andrei Mikhailovich Yakunin ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Konstantin Nikolaevich Koshelev ,  Vladimir Mihailovitch Krivtsun ,  Denis Alexandrovich Glushkov

Inventor： Andrei Mikhailovich Yakunin ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Konstantin Nikolaevich Koshelev ,  Vladimir Mihailovitch Krivtsun ,  Denis Alexandrovich Glushkov

IPC: G21K5/00

CPC classification number: H05G2/008 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/003

Abstract: An EUV radiation source comprising a fuel supply (200) configured to deliver a droplet of fuel to a plasma generation location (201), a first laser beam source configured to provide a first beam of laser radiation (205) incident upon the fuel droplet at the plasma generation location and thereby vaporizes the fuel droplet, and a second laser beam source configured to subsequently provide a second beam of laser radiation (205) at the plasma generation location, the second beam of laser radiation being configured to vaporize debris particles (252) arising from incomplete vaporization of the fuel droplet.

Abstract translation: EUV辐射源包括被配置为将等离子体产生位置（201）的燃料液滴输送的燃料供应（200），第一激光束源被配置为提供入射在燃料液滴上的第一激光辐射束（205） 等离子体产生位置，从而蒸发燃料液滴，以及第二激光束源，其被配置为随后在等离子体产生位置处提供第二激光辐射束（205），第二激光辐射束被配置为使碎片颗粒（252 ）由燃料液滴的不完全蒸发引起。

公开(公告)号：US08294128B2

公开(公告)日：2012-10-23

申请号：US12890256

申请日：2010-09-24

Applicant: Vladimir Mihailovitch Krivtsun ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Evgeny Dmitrievich Korop ,  Konstantin Nikolaevich Koshelev ,  Yurii Victorovitch Sidelnikov ,  Oleg Yakushev

Inventor： Vladimir Mihailovitch Krivtsun ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Evgeny Dmitrievich Korop ,  Konstantin Nikolaevich Koshelev ,  Yurii Victorovitch Sidelnikov ,  Oleg Yakushev

IPC: G03B27/42

CPC classification number: G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70883 ,  G03F7/70983

Abstract: An apparatus for forming a beam of electromagnetic radiation. The apparatus includes a plasma radiation source, a foil trap provided with a plurality of thin foils that extend substantially parallel to the direction of radiation from the plasma source, and a grid disposed between the plasma radiation source and the foil trap. A space is located between the grid and the foil trap. An electrical potential application circuit is constructed and arranged to apply an electrical potential to the grid so that the grid repels electrons emitted by the plasma radiation source and creates a positive space charge between the grid and the foil trap to deflect ions emitted by the plasma radiation source to the foil trap. A distance between the grid and the foil trap is at least equal to one-half of a radius of the foil trap.

Abstract translation: 一种用于形成电磁辐射束的装置。 该装置包括等离子体辐射源，设置有基本上平行于来自等离子体源的辐射方向延伸的多个薄箔的箔陷阱以及设置在等离子体辐射源和箔捕获器之间的栅格。 一个空间位于网格和箔陷阱之间。 构造并布置电位施加电路以向电网施加电势，使得电网排斥由等离子体辐射源发射的电子，并在栅格和箔陷阱之间产生正空间电荷，以偏转由等离子体辐射发射的离子 来源于箔陷阱。 栅格和箔阱之间的距离至少等于箔阱的半径的一半。

公开(公告)号：US07825390B2

公开(公告)日：2010-11-02

申请号：US11705822

申请日：2007-02-14

Applicant: Vladimir Mihallovitch Krivtsun ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Evgeny Dmitrievich Korop ,  Konstantin Nikolaevich Koshelev ,  Yurii Victorovitch Sidelnikov ,  Oleg Yakushev

Inventor： Vladimir Mihallovitch Krivtsun ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Evgeny Dmitrievich Korop ,  Konstantin Nikolaevich Koshelev ,  Yurii Victorovitch Sidelnikov ,  Oleg Yakushev

IPC: G03B27/42

CPC classification number: G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70883 ,  G03F7/70983

Abstract: An apparatus for forming a beam of electromagnetic radiation includes a plasma radiation source, and a foil trap provided with a plurality of thin foils that extend substantially parallel to the direction of radiation from the plasma source. A grid is disposed between the plasma radiation source and the foil trap. A space is located between the grid and the foil trap. The apparatus also include an electrical potential application circuit that is constructed and arranged to apply an electrical potential to the grid so that the grid repels electrons emitted by the plasma radiation source and creates a positive space charge between the grid and the foil trap to deflect ions emitted by the plasma radiation source to the foil trap.

Abstract translation: 用于形成电磁辐射束的装置包括等离子体辐射源和设置有大致平行于来自等离子体源的辐射方向延伸的多个薄箔的箔阱。 栅格设置在等离子体辐射源和箔阱之间。 一个空间位于网格和箔陷阱之间。 该装置还包括电位施加电路，其构造和布置成向电网施加电势，使得电网排斥由等离子体辐射源发射的电子，并在栅格和箔陷阱之间产生正空间电荷以偏转离子 由等离子体辐射源发射到箔阱。

公开(公告)号：US20110013167A1

公开(公告)日：2011-01-20

申请号：US12890256

申请日：2010-09-24

Applicant: Vladimir Mihailovitch KRIVTSUN ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Evgeny Dmitrievich Korop ,  Konstantin Nikolaevich Koshelev ,  Yurii Victorovitch Sidelnikov ,  Oleg Yakushev

Inventor： Vladimir Mihailovitch KRIVTSUN ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Evgeny Dmitrievich Korop ,  Konstantin Nikolaevich Koshelev ,  Yurii Victorovitch Sidelnikov ,  Oleg Yakushev

IPC: G03B27/54 ,  H01J3/14 ,  G03B27/42

CPC classification number: G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70883 ,  G03F7/70983

Abstract: An apparatus for forming a beam of electromagnetic radiation. The apparatus includes a plasma radiation source, a foil trap provided with a plurality of thin foils that extend substantially parallel to the direction of radiation from the plasma source, and a grid disposed between the plasma radiation source and the foil trap. A space is located between the grid and the foil trap. An electrical potential application circuit is constructed and arranged to apply an electrical potential to the grid so that the grid repels electrons emitted by the plasma radiation source and creates a positive space charge between the grid and the foil trap to deflect ions emitted by the plasma radiation source to the foil trap. A distance between the grid and the foil trap is at least equal to one-half of a radius of the foil trap.

Abstract translation: 一种用于形成电磁辐射束的装置。 该装置包括等离子体辐射源，设置有基本上平行于来自等离子体源的辐射方向延伸的多个薄箔的箔陷阱以及设置在等离子体辐射源和箔捕获器之间的栅格。 一个空间位于网格和箔陷阱之间。 构造并布置电位施加电路以向电网施加电势，使得电网排斥由等离子体辐射源发射的电子，并在栅格和箔陷阱之间产生正空间电荷，以偏转由等离子体辐射发射的离子 来源于箔陷阱。 栅格和箔阱之间的距离至少等于箔阱的半径的一半。

公开(公告)号：US07872244B2

公开(公告)日：2011-01-18

申请号：US11889065

申请日：2007-08-08

Applicant: Vladimir Vitalevich Ivanov ,  Vadim Yevgenyevich Banine ,  Arno Jan Bleeker ,  Konstantin Nikolaevich Koshelev ,  Pavel Stanislavovich Antsiferov ,  Vladimir Mihailovitch Krivtsun ,  Dmitriy Victorovich Lopaev

Inventor： Vladimir Vitalevich Ivanov ,  Vadim Yevgenyevich Banine ,  Arno Jan Bleeker ,  Konstantin Nikolaevich Koshelev ,  Pavel Stanislavovich Antsiferov ,  Vladimir Mihailovitch Krivtsun ,  Dmitriy Victorovich Lopaev

IPC: A61N5/00 ,  G01N21/64

CPC classification number: H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  H05G2/005

Abstract: A source configured to generate radiation for a lithographic apparatus is disclosed. The source includes an anode, and a cathode. The cathode and the anode are configured to create a discharge in a fuel in a discharge space between the anode and the cathode so as to generate a plasma, the cathode and the anode positioned relative to each other so that, in use, current lines extending between the anode and the cathode are substantially curved so as to create a force that substantially radially compresses the plasma only in a region proximate an upper surface of the cathode or of the anode.

Abstract translation: 公开了一种被配置为产生用于光刻设备的辐射的源。 源包括阳极和阴极。 阴极和阳极被配置为在阳极和阴极之间的放电空间中的燃料中产生放电，以便产生等离子体，阴极和阳极相对于彼此定位，使得在使用中，电流线延伸 在阳极和阴极之间基本上是弯曲的，从而产生基本上径向压缩等离子体的力，仅在接近阴极或阳极的上表面的区域中。

公开(公告)号：US07772570B2

公开(公告)日：2010-08-10

申请号：US11643954

申请日：2006-12-22

Applicant: Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Konstantin Nikolaevich Koshelev ,  Vladimir Mihailovitch Krivtsun

Inventor： Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Konstantin Nikolaevich Koshelev ,  Vladimir Mihailovitch Krivtsun

IPC: A61N5/00

CPC classification number: G03F7/70291 ,  G03F7/70041 ,  G03F7/7055 ,  G03F7/70558

Abstract: An assembly is provided for blocking a beam of radiation. The assembly has a pipe arranged to transmit at least part of the beam of radiation. The pipe has an inner surface provided with an ablation material and encloses a volume. The assembly further has an ablation generation device. The ablation generation device is arranged to ablate at least a portion of the ablation material upon reception of a blocking signal. The assembly has a control unit, which is arranged to control the ablation generation device.

Abstract translation: 提供用于阻挡辐射束的组件。 组件具有布置成透射辐射束的至少一部分的管。 管道具有设置有消融材料并包围体积的内表面。 组件还具有消融产生装置。 消融产生装置被布置成在接收到阻塞信号时烧蚀消融材料的至少一部分。 组件具有控制单元，其被布置成控制消融产生装置。

公开(公告)号：US07518135B2

公开(公告)日：2009-04-14

申请号：US11641945

申请日：2006-12-20

Applicant: Vladimir Vital'evich Ivanov ,  Vadim Yevgenyevich Banine ,  Konstantin Nikolaevich Koshelev

Inventor： Vladimir Vital'evich Ivanov ,  Vadim Yevgenyevich Banine ,  Konstantin Nikolaevich Koshelev

IPC: H01J65/04

CPC classification number: H05G2/001 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70916

Abstract: A radiation source with an anode and a cathode to create a discharge in a discharge space between the anode and the cathode is disclosed. A plasma is formed in the radiation source which generates electromagnetic radiation, such as EUV radiation. The radiation source includes a first activation source to direct a first energy pulse onto a first spot in the radiation source near the discharge space to create a main plasma channel which triggers the discharge. The radiation source also has a second activation source to direct a second energy pulse onto a second spot in the radiation source near the discharge space to create an additional plasma channel. By directing the second energy pulse during the same discharge, a shortcutting of the main plasma current is realized which in turn may reduce the amount of fast ions produced.

Abstract translation: 公开了一种具有阳极和阴极以在阳极和阴极之间的放电空间中产生放电的辐射源。 在辐射源中形成等离子体，其产生诸如EUV辐射的电磁辐射。 辐射源包括第一激活源，用于将第一能量脉冲引导到放电空间附近的辐射源中的第一点上，以产生触发放电的主等离子体通道。 辐射源还具有第二激活源，以将第二能量脉冲引导到放电空间附近的辐射源中的第二点上，以产生附加的等离子体通道。 通过在相同的放电期间引导第二能量脉冲，实现了主等离子体电流的快捷方式，这又可以减少产生的快速离子的量。

公开(公告)号：US20080266654A1

公开(公告)日：2008-10-30

申请号：US11790681

申请日：2007-04-26

Applicant: Vadim Yevgenyevich Banine ,  Arno Jan Bleeker ,  Vladimir Vitalevich Ivanov ,  Konstantin Nikolaevich Koshelev ,  Frank Jeroen Pieter Schuurmans ,  Vladimir Mihailovitch Krivtsun ,  Maarten Marinus Johannes Wilhelmus Van Herpen

Inventor： Vadim Yevgenyevich Banine ,  Arno Jan Bleeker ,  Vladimir Vitalevich Ivanov ,  Konstantin Nikolaevich Koshelev ,  Frank Jeroen Pieter Schuurmans ,  Vladimir Mihailovitch Krivtsun ,  Maarten Marinus Johannes Wilhelmus Van Herpen

IPC: G02B21/00

CPC classification number: G21K7/00

Abstract: An extreme ultraviolet (EUV) microscope configured to analyze a sample. The microscope includes a source of EUV radiation constructed and arranged to generate the EUV radiation with a wavelength at least in a range of about 2-6 nm, and an optical system constructed and arranged to illuminate the sample with the EUV radiation and to collect a radiation emanating from the sample. The optical system is arranged with at least one mirror that includes a multilayer structure for in-phase reflection of at least a portion of the radiation in the range of about 2-6 nm.

Abstract translation: 配置用于分析样品的极紫外（EUV）显微镜。 显微镜包括EUV辐射源，其被构造和布置成产生具有至少在约2-6nm范围内的波长的EUV辐射，以及构造和布置成用EUV辐射照射样品并收集一个 样品发出的辐射。 光学系统布置有至少一个反射镜，该反射镜包括多层结构，用于至少部分辐射在约2-6nm范围内的同相反射。