公开(公告)号：US06502426B2

公开(公告)日：2003-01-07

申请号：US09997782

申请日：2001-11-28

Applicant: Lisa A. Moore ,  Charlene M. Smith

Inventor： Lisa A. Moore ,  Charlene M. Smith

IPC: C03B3200

CPC classification number: G03F7/70958 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/21 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2203/54 ,  G03F1/60

Abstract: High purity silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a “dry,” silicon oxyfluoride glass which contains doped O2 molecules and which exhibits very high transmittance and laser transmission durability in the vacuum ultraviolet (VUV) wavelength region. In addition to containing fluorine and having little or no OH content, the inventive silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm contains intersticial O2 molecules which provide improved endurance to laser exposure. Preferably the O2 doped silicon oxyfluoride glass is characterized by having less than 1×1017 molecules/cm3 of molecular hydrogen and low chlorine levels.

Abstract translation: 公开了适用于在低于190nm的VUV波长区域中用于光刻应用的光掩模基板的高纯度氟氧化硅玻璃。 本发明的氟氧化硅玻璃在157nm波长下是透射的，使其特别适用于157nm波长区域的光掩模衬底。 本发明的光掩模衬底是含有掺杂的O 2分子并且在真空紫外（VUV）波长区域中显示非常高的透射率和激光透射耐久性的“干式”氟氧化硅玻璃。 除了含氟并且具有很少或不具有OH含量之外，本发明的适用于157nm的光掩模衬底的氟氧化硅玻璃含有间隔的O 2分子，其提供了对激光曝光的改善的耐久性。 优选地，掺杂氧的氟氧化硅玻璃的特征在于具有小于1×10 17分子/ cm 3的分子氢和低氯水平。

公开(公告)号：US06782716B2

公开(公告)日：2004-08-31

申请号：US10702266

申请日：2003-11-05

Applicant: Lisa A. Moore ,  Charlene M. Smith

Inventor： Lisa A. Moore ,  Charlene M. Smith

IPC: C03C1500

CPC classification number: C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  G03F1/60

Abstract: High purity silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed with the silicon oxyfluoride glass having a preferred fluorine content

公开(公告)号：US06492072B2

公开(公告)日：2002-12-10

申请号：US09799987

申请日：2001-03-06

Applicant: Lisa A. Moore ,  Charlene Smith

Inventor： Lisa A. Moore ,  Charlene Smith

IPC: G03F900

CPC classification number: C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  G03F1/60 ,  Y02P40/57

Abstract: High purity silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a “dry,” silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1×1017 molecules/cm3 of molecular hydrogen and low chlorine levels.

Abstract translation: 公开了适用于在低于190nm的VUV波长区域中用于光刻应用的光掩模基板的高纯度氟氧化硅玻璃。 本发明的氟氧化硅玻璃在157nm波长下是透射的，使其特别适用于157nm波长区域的光掩模衬底。 本发明的光掩模基材是“真空”的氟氧化硅玻璃，其在真空紫外（VUV）波长区域中表现出非常高的透射率，同时保持通常与高纯度熔融石英相关的优异的热和物理性能。 除了含氟并且具有很少或不含OH含量之外，本发明的适合用作157nm的光掩模衬底的氟氧化硅玻璃的特征还在于具有小于1×10 17分子/ cm 3的分子氢和低氯水平。

公开(公告)号：US06418757B1

公开(公告)日：2002-07-16

申请号：US09318316

申请日：1999-05-25

Applicant: George E. Berkey ,  Polly W. Chu ,  Carl E. Crossland ,  Lisa A. Moore ,  Gang Qi ,  John W. Solosky

Inventor： George E. Berkey ,  Polly W. Chu ,  Carl E. Crossland ,  Lisa A. Moore ,  Gang Qi ,  John W. Solosky

IPC: C03B3702

CPC classification number: C03B37/0124 ,  C03B2201/31 ,  C03B2201/32

Abstract: A method of making a glass article such as an optical waveguide preform is disclosed. The method comprises drawing a rod in at least two steps. In the first step an elongated, consolidated preform having an aperture therethrough is drawn to a reduced diameter preform. The second step involves drawing the reduced diameter preform into a rod, preferably at a lower temperature than the first step. The method substantially reduces the formation of inclusions in the glass article during drawing.

Abstract translation: 公开了制造玻璃制品如光波导预制件的方法。 该方法包括在至少两个步骤中拉杆。 在第一步骤中，将具有穿过其中的孔的细长的，固结的预成型件拉制成直径缩径的预制件。 第二步涉及将直径缩小的预成型件拉制成棒，优选地在比第一步骤低的温度下。 该方法基本上减少拉制过程中玻璃制品中夹杂物的形成。

公开(公告)号：US06363746B1

公开(公告)日：2002-04-02

申请号：US09525409

申请日：2000-03-15

Applicant: Huailiang Wei ,  Lisa A. Moore ,  Jeffery L. Blackwell ,  Daniel W. Hawtof

Inventor： Huailiang Wei ,  Lisa A. Moore ,  Jeffery L. Blackwell ,  Daniel W. Hawtof

IPC: C03B1906

CPC classification number: C03B37/0142 ,  C03B2201/32 ,  C03B2201/36 ,  C03B2201/50 ,  C03B2201/54 ,  C03B2207/06 ,  C03B2207/12 ,  C03B2207/14 ,  C03B2207/20 ,  C03B2207/34 ,  C03B2207/46

Abstract: An apparatus for producing the glass soot used in the formation of optical fiber includes a burner with an internal atomizer. The atomizer includes an outer tube having a nozzle at an end thereof, and an inner tube located within the outer tube and having a closed end restricting fluid flow therethrough and defining a cylindrical sidewall having radially extending apertures spaced there along. The outer tube receives the glass-forming mixture in liquid form and the inner tube receives an atomizing gas which flows through the apertures in the sidewall of the inner tube and atomizes the glass-forming mixture as the glass-forming mixture travels through the outer tube.

Abstract translation: 用于生产用于形成光纤的玻璃烟灰的设备包括具有内部雾化器的燃烧器。 雾化器包括在其一端具有喷嘴的外管和位于外管内的内管，并且具有限制流过其中的流体流动的封闭端，并限定具有沿其间隔开的径向延伸的孔的圆柱形侧壁。 外管容纳液体形式的玻璃形成混合物，并且内管接收流过内管侧壁中的孔的雾化气体，并且当玻璃形成混合物通过外管时雾化玻璃形成混合物 。