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29 条记录 (耗时 0.012 秒)

    Piezoelectric ceramic composition and piezoelectric element containing the same
    14.
    发明授权
    Piezoelectric ceramic composition and piezoelectric element containing the same 失效
    压电陶瓷组合物和含有它的压电元件

    公开(公告)号：US06514427B2

    公开(公告)日：2003-02-04

    申请号：US10008890

    申请日：2001-11-13

    申请人： Masamitsu Nishida ,  Keiichi Takahashi ,  Kojiro Okuyama ,  Junichi Kato

    发明人： Masamitsu Nishida ,  Keiichi Takahashi ,  Kojiro Okuyama ,  Junichi Kato

    IPC分类号： C04B3500

    CPC分类号： C04B35/01 ,  C04B35/495 ,  H01L41/1873

    摘要： The present invention provides a piezoelectric ceramic composition that can be manufactured easily by an ordinary sintering method, is free from lead, and has a large frequency constant, a small grain size, and a high mechanical Q. This composition is expressed by a formula of (1-v-w)[(Li1-x-yNaxKy)zRO3].vLMnO3.wBi1/2Na1/2TiO3. The present invention also provides a piezoelectric ceramic composition, including at least one selected from Mn, Cr, and Co that is added to a composition expressed by a formula of (Li1-x-yNaxKy)zRO3 so as to have a ratio thereof to the whole of 0.01 to 1 wt % in terms of MnO2, Cr2O3, and CoO, respectively. In the above-mentioned formulae, 0≦v≦0.05, 0≦0.2, v+w>0, 0.2≦x≦0.97, 0≦y≦0.8, x+y≧0.8, 0.98≦z≦1, L indicates at least one element selected from the rare earth elements, and R denotes at least one element selected from Nb, Ta, and Sb.

    摘要翻译： 本发明提供一种压电陶瓷组合物，其可以通过常规烧结方法容易地制造，不含铅，具有大的频率常数，小的晶粒尺寸和高的机械Q.该组成由式 （1-vw）[（Li1-x-yNaxKy）zRO3] .vLMnO3.wBi1 / 2Na1 / 2TiO3。 本发明还提供一种压电陶瓷组合物，其包含选自Mn，Cr和Co中的至少一种，其被添加到由式（Li1-x-yNaxKy）zRO3表示的组成中，以使其与 分别为MnO 2，Cr 2 O 3和CoO的0.01〜1重量％。 在上述公式中，0 <= v <= 0.05,0 <= 0.2，v + w> 0,0.2 <= x <= 0.97,0 <= y <= 0.8，x + y> = 0.8,0.98 <= z <= 1，L表示选自稀土元素中的至少一种元素，R表示选自Nb，Ta和Sb中的至少一种元素。

    Dielectric ceramics
    18.
    发明授权
    Dielectric ceramics 失效
    电介质陶瓷

    公开(公告)号：US5246898A

    公开(公告)日：1993-09-21

    申请号：US973601

    申请日：1992-11-09

    申请人： Takuya Fujimaru ,  Masamitsu Nishida ,  Koichi Kugimiya

    发明人： Takuya Fujimaru ,  Masamitsu Nishida ,  Koichi Kugimiya

    IPC分类号： C04B35/495 ,  H01B3/12 ,  H01L23/15

    CPC分类号： C04B35/495 ,  H01B3/12 ,  H01L23/15 ,  H01L2924/0002

    摘要： High-frequency dielectric ceramics which contains the oxide of a complex perovskite structure as the main component, have a mean crystal gain size of sintered ceramic controlled to within the range of 5 .mu.m to 20 .mu.m and a porosity not exceeding 7% and provides high unloaded Q without requiring long-hour sintering or heat treatment.

    摘要翻译： 含有复合钙钛矿结构的氧化物作为主要成分的高频电介质陶瓷具有将烧结陶瓷的平均晶体增益尺寸控制在5μm〜20μm的范围内，孔隙率不超过7％ 高卸载Q，​​无需长时间烧结或热处理。

    Media agitating mill and method for milling ceramic powder
    19.
    发明授权
    Media agitating mill and method for milling ceramic powder 失效
    介质搅拌机和陶瓷粉末研磨方法

    公开(公告)号：US5065946A

    公开(公告)日：1991-11-19

    申请号：US381369

    申请日：1989-07-18

    申请人： Masamitsu Nishida ,  Hamae Ando ,  Koichi Kugimiya

    发明人： Masamitsu Nishida ,  Hamae Ando ,  Koichi Kugimiya

    IPC分类号： B02C17/16 ,  B02C17/20 ,  B02C23/06

    CPC分类号： B02C23/06 ,  B02C17/16 ,  B02C17/20 ,  Y10S977/776

    摘要： A method for milling ceramic powder and making a sintered body from the powder produced by such method are disclosed. A preferred embodiment includes wet-milling at least one ceramic powder by a media agitating mill wherein the volume of liquid is not more than 4 times the net-volume of the ceramic powder, a dispersing agent is added and milling is carried out using grinding media of not larger than 1 mm in diameter. A media agitating mill used for the above method is provided which includes a milling chamber, grinding media and an agitator wherein the peripheral speed of the agitator is at least 10 m/s, the grinding media having a diameter of not larger than 1 mm and the packing fraction of the grinding media is 65-85% by volume.

    摘要翻译： 公开了一种通过这种方法制造的粉末来研磨陶瓷粉末和制造烧结体的方法。 优选的实施方案包括通过介质搅拌研磨机湿磨研磨至少一种陶瓷粉末，其中液体的体积不超过陶瓷粉末的净体积的4倍，加入分散剂并使用研磨介质进行研磨 直径不大于1mm。 提供了用于上述方法的介质搅拌机，其包括研磨室，研磨介质和搅拌器，其中搅拌器的圆周速度为至少10m / s，研磨介质的直径不大于1mm， 研磨介质的填充率为65-85％（体积）。