公开(公告)号：US08314398B2

公开(公告)日：2012-11-20

申请号：US13091923

申请日：2011-04-21

Applicant: Norbert R. Bowering ,  Igor V. Fomenkov ,  Oleh V. Khodykin ,  Alexander N. Bykanov

Inventor： Norbert R. Bowering ,  Igor V. Fomenkov ,  Oleh V. Khodykin ,  Alexander N. Bykanov

IPC: G01J3/10

CPC classification number: G02B5/0891 ,  B82Y10/00 ,  G01J1/429 ,  G03F7/70941 ,  G03F7/70958 ,  G03F7/70975 ,  G21K2201/061 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

Abstract: A method is disclosed for in-situ monitoring of an EUV mirror to determine a degree of optical degradation. The method may comprise the steps/acts of irradiating at least a portion of the mirror with light having a wavelength outside the EUV spectrum, measuring at least a portion of the light after the light has reflected from the mirror, and using the measurement and a pre-determined relationship between mirror degradation and light reflectivity to estimate a degree of multi-layer mirror degradation. Also disclosed is a method for preparing a near-normal incidence, EUV mirror which may comprise the steps/acts of providing a metallic substrate, diamond turning a surface of the substrate, depositing at least one intermediate material overlying the surface using a physical vapor deposition technique, and depositing a multi-layer mirror coating overlying the intermediate material.

Abstract translation: 公开了一种用于EUV反射镜的原位监测以确定光学降解程度的方法。 该方法可以包括用具有波长在EUV谱以外的波长的光照射反射镜的至少一部分的步骤/动作，在光已经从反射镜反射之后测量光的至少一部分，并且使用该测量和 镜面退化和光反射率之间的预定关系，以估计多层镜面退化的程度。 还公开了一种用于制备近似法线入射的EUV反射镜的方法，该反射镜可以包括提供金属基底的步骤/动作，转动基底的表面的金刚石，使用物理气相沉积沉积覆盖表面的至少一种中间材料 技术，并沉积覆盖中间材料的多层镜面涂层。

公开(公告)号：US07960701B2

公开(公告)日：2011-06-14

申请号：US12004871

申请日：2007-12-20

Applicant: Norbert R. Bowering ,  Oleh V. Khodykin

Inventor： Norbert R. Bowering ,  Oleh V. Khodykin

IPC: G01J1/42

CPC classification number: G02B5/0891 ,  B82Y10/00 ,  G01J1/429 ,  G03F7/70941 ,  G03F7/70958 ,  G03F7/70975 ,  G21K2201/061 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

Abstract: A method is disclosed for in-situ monitoring of an EUV mirror to determine a degree of optical degradation. The method may comprise the steps/acts of irradiating at least a portion of the mirror with light having a wavelength outside the EUV spectrum, measuring at least a portion of the light after the light has reflected from the mirror, and using the measurement and a pre-determined relationship between mirror degradation and light reflectivity to estimate a degree of multi-layer mirror degradation. Also disclosed is a method for preparing a near-normal incidence, EUV mirror which may comprise the steps/acts of providing a metallic substrate, diamond turning a surface of the substrate, depositing at least one intermediate material overlying the surface using a physical vapor deposition technique, and depositing a multi-layer mirror coating overlying the intermediate material.

Abstract translation: 公开了一种用于EUV反射镜的原位监测以确定光学降解程度的方法。 该方法可以包括用具有波长在EUV谱以外的波长的光照射反射镜的至少一部分的步骤/动作，在光已经从反射镜反射之后测量光的至少一部分，并且使用该测量和 镜面退化和光反射率之间的预定关系，以估计多层镜面退化的程度。 还公开了一种用于制备近似法线入射的EUV反射镜的方法，该反射镜可以包括提供金属基底的步骤/动作，转动基底的表面的金刚石，使用物理气相沉积沉积覆盖表面的至少一种中间材料 技术，并沉积覆盖中间材料的多层镜面涂层。

公开(公告)号：US07476887B2

公开(公告)日：2009-01-13

申请号：US11725940

申请日：2007-03-19

Applicant: Norbert R. Bowering ,  Alexander I. Ershov ,  Timothy S. Dyer ,  Hugh R. Grinolds

Inventor： Norbert R. Bowering ,  Alexander I. Ershov ,  Timothy S. Dyer ,  Hugh R. Grinolds

IPC: G01J1/00 ,  G02B1/00

Abstract: Apparatus and methods are disclosed for forming plasma generated EUV light source optical elements, e.g., reflectors comprising MLM stacks employing various binary layer materials and capping layer(s) including single and binary capping layers for utilization in plasma generated EUV light source chambers, particularly where the plasma source material is reactive with one or more of the MLM materials.

公开(公告)号：US07394083B2

公开(公告)日：2008-07-01

申请号：US11177501

申请日：2005-07-08

Applicant: Norbert R. Bowering ,  Jerzy R. Hoffman

Inventor： Norbert R. Bowering ,  Jerzy R. Hoffman

IPC: G01J1/42

CPC classification number: G03F7/7085 ,  B82Y10/00 ,  G21K2201/061

Abstract: Systems and methods for EUV Light Source metrology are disclosed. In a first aspect, a system for measuring an EUV light source power output may include a photoelectron source material disposed along an EUV light pathway to expose the material and generate a quantity of photoelectrons. The system may further include a detector for detecting the photoelectrons and producing an output indicative of EUV power. In another aspect, a system for measuring an EUV light intensity may include a multi-layer mirror, e.g., Mo/Si, disposable along an EUV light pathway to expose the mirror and generate a photocurrent in the mirror. A current monitor may be connected to the mirror to measure the photocurrent and produce an output indicative of EUV power. In yet another aspect, an off-line EUV metrology system may include an instrument for measuring a light characteristic and MoSi2/Si multi-layer mirror.

Abstract translation: 披露了EUV光源计量系统和方法。 在第一方面，用于测量EUV光源功率输出的系统可以包括沿着EUV光路设置的光电子源材料，以暴露材料并产生一定量的光电子。 该系统还可以包括用于检测光电子并产生指示EUV功率的输出的检测器。 在另一方面，用于测量EUV光强度的系统可以包括多层反射镜，例如Mo / Si，沿着EUV光路径可弃，以暴露反射镜并在反射镜中产生光电流。 电流监视器可以连接到反射镜以测量光电流并产生指示EUV功率的输出。 在另一方面，离线EUV测量系统可以包括用于测量光特性和MoSi 2 / Si多层反射镜的仪器。

公开(公告)号：US20090159808A1

公开(公告)日：2009-06-25

申请号：US12004871

申请日：2007-12-20

Applicant: Norbert R. Bowering ,  Igor V. Fomenkov ,  Oleh V. Khodykin ,  Alexander N. Bykanov

Inventor： Norbert R. Bowering ,  Igor V. Fomenkov ,  Oleh V. Khodykin ,  Alexander N. Bykanov

IPC: G01J1/42 ,  C23C16/22

CPC classification number: G02B5/0891 ,  B82Y10/00 ,  G01J1/429 ,  G03F7/70941 ,  G03F7/70958 ,  G03F7/70975 ,  G21K2201/061 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

Abstract: A method is disclosed for in-situ monitoring of an EUV mirror to determine a degree of optical degradation. The method may comprise the steps/acts of irradiating at least a portion of the mirror with light having a wavelength outside the EUV spectrum, measuring at least a portion of the light after the light has reflected from the mirror, and using the measurement and a pre-determined relationship between mirror degradation and light reflectivity to estimate a degree of multi-layer mirror degradation. Also disclosed is a method for preparing a near-normal incidence, EUV mirror which may comprise the steps/acts of providing a metallic substrate, diamond turning a surface of the substrate, depositing at least one intermediate material overlying the surface using a physical vapor deposition technique, and depositing a multi-layer mirror coating overlying the intermediate material.

Abstract translation: 公开了一种用于EUV反射镜的原位监测以确定光学降解程度的方法。 该方法可以包括用具有波长在EUV谱以外的波长的光照射反射镜的至少一部分的步骤/动作，在光已经从反射镜反射之后测量光的至少一部分，并且使用该测量和 镜面退化和光反射率之间的预定关系，以估计多层镜面退化的程度。 还公开了一种用于制备近似法线入射的EUV反射镜的方法，该反射镜可以包括提供金属基底的步骤/动作，转动基底的表面的金刚石，使用物理气相沉积沉积覆盖表面的至少一种中间材料 技术，并沉积覆盖中间材料的多层镜面涂层。

公开(公告)号：US08198612B2

公开(公告)日：2012-06-12

申请号：US12221313

申请日：2008-07-31

Applicant: Juan Armando Chavez ,  Norbert R. Bowering

Inventor： Juan Armando Chavez ,  Norbert R. Bowering

IPC: H01J35/20

CPC classification number: G03F7/70958 ,  G03F7/70825 ,  G03F7/70891 ,  G03F7/70925

Abstract: As disclosed herein, a device may comprise a substrate made of a material comprising silicon, the substrate having a first side and an opposed second side; an EUV reflective multi-layer coating overlaying at least a portion of the first side; an infrared absorbing coating overlaying at least a portion of the second side; and a system generating infrared radiation to heat the absorbing coating and the substrate.

Abstract translation: 如本文所公开的，装置可包括由包括硅的材料制成的衬底，该衬底具有第一侧和相对的第二侧; 覆盖所述第一侧的至少一部分的EUV反射多层涂层; 覆盖所述第二侧的至少一部分的红外吸收涂层; 以及产生红外辐射以加热吸收涂层和基底的系统。

公开(公告)号：US20110192985A1

公开(公告)日：2011-08-11

申请号：US13091923

申请日：2011-04-21

Applicant: Norbert R. Bowering ,  Oleh V. Khodykin

Inventor： Norbert R. Bowering ,  Oleh V. Khodykin

IPC: G01J1/42 ,  G02B7/18 ,  G02B5/08 ,  G01J3/10 ,  B05D5/06

CPC classification number: G02B5/0891 ,  B82Y10/00 ,  G01J1/429 ,  G03F7/70941 ,  G03F7/70958 ,  G03F7/70975 ,  G21K2201/061 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

Abstract: A method is disclosed for in-situ monitoring of an EUV mirror to determine a degree of optical degradation. The method may comprise the steps/acts of irradiating at least a portion of the mirror with light having a wavelength outside the EUV spectrum, measuring at least a portion of the light after the light has reflected from the mirror, and using the measurement and a pre-determined relationship between mirror degradation and light reflectivity to estimate a degree of multi-layer mirror degradation. Also disclosed is a method for preparing a near-normal incidence, EUV mirror which may comprise the steps/acts of providing a metallic substrate, diamond turning a surface of the substrate, depositing at least one intermediate material overlying the surface using a physical vapor deposition technique, and depositing a multi-layer mirror coating overlying the intermediate material.

Abstract translation: 公开了一种用于EUV反射镜的原位监测以确定光学降解程度的方法。 该方法可以包括用具有波长在EUV谱以外的波长的光照射反射镜的至少一部分的步骤/动作，在光已经从反射镜反射之后测量光的至少一部分，并且使用该测量和 镜面退化和光反射率之间的预定关系，以估计多层镜面退化的程度。 还公开了一种用于制备近似法线入射的EUV反射镜的方法，该反射镜可以包括提供金属基底的步骤/动作，转动基底的表面的金刚石，使用物理气相沉积沉积覆盖表面的至少一种中间材料 技术，并沉积覆盖中间材料的多层镜面涂层。

公开(公告)号：US07843632B2

公开(公告)日：2010-11-30

申请号：US11505177

申请日：2006-08-16

Applicant: Norbert R. Bowering

Inventor： Norbert R. Bowering

IPC: G02B5/08 ,  G02B5/20 ,  G01J3/10 ,  H01J35/20

CPC classification number: G03F7/7015 ,  G02B5/0891 ,  G02B7/182 ,  G21K1/062 ,  Y10T29/49982

Abstract: In a first aspect, a method of fabricating an EUV light source mirror is disclosed which may comprise the acts/steps of providing a plurality of discrete substrates; coating each substrate with a respective multilayer coating; securing the coated substrates in an arrangement wherein each coated substrate is oriented to a common focal point; and thereafter polishing at least one of the multilayer coatings. In another aspect, an optic for use with EUV light is disclosed which may comprise a substrate; a smoothing layer selected from the group of materials consisting of Si, C, Si3N4, B4C, SiC and Cr, the smoothing layer material being deposited using highly energetic deposition conditions and a multilayer dielectric coating. In another aspect, a corrosion resistant, multilayer coating for an EUV mirror may comprise alternating layers of Si and a compound material having nitrogen and a 5th period transition metal.

Abstract translation: 在第一方面，公开了一种制造EUV光源反射镜的方法，其可以包括提供多个离散基板的动作/步骤; 用相应的多层涂层涂覆每个基材; 将涂覆的基底固定在其中每个涂覆的基底被定向到公共焦点的布置中; 然后抛光至少一个多层涂层。 在另一方面，公开了一种用于EUV光的光学元件，其可以包括基底; 选自由Si，C，Si 3 N 4，B 4 C，SiC和Cr组成的材料组中的平滑层，使用高能沉积条件沉积的平滑层材料和多层介电涂层。 另一方面，用于EUV反射镜的耐腐蚀多层涂层可以包括交替的Si层和具有氮和第五段过渡金属的复合材料。

公开(公告)号：US20090230326A1

公开(公告)日：2009-09-17

申请号：US12214736

申请日：2008-06-19

Applicant: Georgiy O. Vaschenko ,  Alexander N. Bykanov ,  Norbert R. Bowering ,  David C. Brandt ,  Alexander I. Ershov ,  Rodney D. Simmons ,  Oleh V. Khodykin ,  Igor V. Fomenkov

Inventor： Georgiy O. Vaschenko ,  Alexander N. Bykanov ,  Norbert R. Bowering ,  David C. Brandt ,  Alexander I. Ershov ,  Rodney D. Simmons ,  Oleh V. Khodykin ,  Igor V. Fomenkov

IPC: G21K5/00

CPC classification number: H05G2/003 ,  H05G2/006 ,  H05G2/008

Abstract: Devices are disclosed herein which may comprise an EUV reflective optic having a surface of revolution that defines a rotation axis and a circular periphery. The optic may be positioned to incline the axis at a nonzero angle relative to a horizontal plane, and to establish a vertical projection of the periphery in the horizontal plane with the periphery projection bounding a region in the horizontal plane. The device may further comprise a system delivering target material, the system having a target material release point that is located in the horizontal plane and outside the region, bounded by the periphery projection and a system generating a laser beam for irradiating the target material to generate an EUV emission.

Abstract translation: 本文公开的装置可以包括具有限定旋转轴线和圆形周边的旋转表面的EUV反射光学元件。 光学元件可以被定位成相对于水平面以非零角度倾斜轴，并且在水平面中建立周边的垂直投影，其中周边突起界定水平面中的一个区域。 该装置还可以包括传送目标材料的系统，该系统具有位于水平面内的区域外的外围突起的边界材料释放点和产生用于照射目标材料产生的激光束的系统 EUV排放。

公开(公告)号：US07589337B2

公开(公告)日：2009-09-15

申请号：US12075631

申请日：2008-03-12

Applicant: Alexander N. Bykanov ,  J. Martin Algots ,  Oleh V. Khodykin ,  Oscar Hemberg ,  Norbert R. Bowering

Inventor： Alexander N. Bykanov ,  J. Martin Algots ,  Oleh V. Khodykin ,  Oscar Hemberg ,  Norbert R. Bowering

IPC: A61N5/06 ,  G01J3/10 ,  H05G2/00

CPC classification number: H05G2/001

Abstract: An EUV light generation system and method is disclosed that may comprise a droplet generator producing plasma source material target droplets traveling toward the vicinity of a plasma source material target irradiation site; a drive laser; a drive laser focusing optical element having a first range of operating center wavelengths; a droplet detection radiation source having a second range of operating center wavelengths; a drive laser steering element comprising a material that is highly reflective within at least some part of the first range of wavelengths and highly transmissive within at least some part of the second range of center wavelengths; a droplet detection radiation aiming mechanism directing the droplet detection radiation through the drive laser steering element and the lens to focus at a selected droplet detection position intermediate the droplet generator and the irradiation site.

Abstract translation: 公开了一种EUV发光系统和方法，其可以包括产生等离子体源材料的液滴发生器，目标液滴朝向等离子体源材料目标照射位置附近行进; 驱动激光器 具有第一操作中心波长范围的驱动激光聚焦光学元件; 具有第二操作中心波长范围的液滴检测辐射源; 驱动激光操纵元件，其包括在第一波长范围的至少一部分内具有高度反射性的材料，并且在第二中心波长范围的至少一部分内具有高度透射性的材料; 液滴检测辐射瞄准机构，其引导液滴检测辐射通过驱动激光转向元件和透镜，以聚焦在液滴发生器和照射部位之间的选定液滴检测位置。