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1.发明申请EUV light source components and methods for producing, using and refurbishing same 有权EUV光源组件及其制造，使用和翻新方法公开(公告)号：US20090159808A1
公开(公告)日：2009-06-25
申请号：US12004871
申请日：2007-12-20
Applicant: Norbert R. Bowering , Igor V. Fomenkov , Oleh V. Khodykin , Alexander N. Bykanov
Inventor： Norbert R. Bowering , Igor V. Fomenkov , Oleh V. Khodykin , Alexander N. Bykanov
CPC classification number: G02B5/0891 , B82Y10/00 , G01J1/429 , G03F7/70941 , G03F7/70958 , G03F7/70975 , G21K2201/061 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/008
Abstract: A method is disclosed for in-situ monitoring of an EUV mirror to determine a degree of optical degradation. The method may comprise the steps/acts of irradiating at least a portion of the mirror with light having a wavelength outside the EUV spectrum, measuring at least a portion of the light after the light has reflected from the mirror, and using the measurement and a pre-determined relationship between mirror degradation and light reflectivity to estimate a degree of multi-layer mirror degradation. Also disclosed is a method for preparing a near-normal incidence, EUV mirror which may comprise the steps/acts of providing a metallic substrate, diamond turning a surface of the substrate, depositing at least one intermediate material overlying the surface using a physical vapor deposition technique, and depositing a multi-layer mirror coating overlying the intermediate material.
Abstract translation: 公开了一种用于EUV反射镜的原位监测以确定光学降解程度的方法。 该方法可以包括用具有波长在EUV谱以外的波长的光照射反射镜的至少一部分的步骤/动作，在光已经从反射镜反射之后测量光的至少一部分，并且使用该测量和 镜面退化和光反射率之间的预定关系，以估计多层镜面退化的程度。 还公开了一种用于制备近似法线入射的EUV反射镜的方法，该反射镜可以包括提供金属基底的步骤/动作，转动基底的表面的金刚石，使用物理气相沉积沉积覆盖表面的至少一种中间材料 技术，并沉积覆盖中间材料的多层镜面涂层。
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公开(公告)号：US08514486B2
公开(公告)日：2013-08-20
申请号：US12927012
申请日：2010-11-03
Applicant: Alexander I. Ershov , Igor V. Fomenkov , Norbert R. Bowering , Jerzy R. Hoffman
Inventor： Alexander I. Ershov , Igor V. Fomenkov , Norbert R. Bowering , Jerzy R. Hoffman
IPC: H01S3/00
CPC classification number: H01S3/105 , G03F7/70033 , H01S3/005 , H01S3/115 , H01S3/2232 , H01S3/225 , H01S3/2325 , H01S2301/02 , H05G2/003 , H05G2/008
Abstract: A device comprising a laser source producing a continuous output on a beam path and an amplifier is disclosed. The device further includes a partially transmissive, partially reflective optic disposed on said beam path between said laser source and said amplifier. The device further includes a droplet generator positioned to deliver a droplet moving on a path intersecting said beam path, the droplet reflecting light to establish an optical cavity with said optic.
Abstract translation: 公开了一种包括在光束路径上产生连续输出的激光源和放大器的装置。 该装置还包括设置在所述激光源和所述放大器之间的所述光束路径上的部分透射的部分反射光学元件。 该装置还包括液滴发生器，其定位成输送在与所述光束路径相交的路径上移动的液滴，液滴反射光以与所述光学器件建立光学腔。
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公开(公告)号：US20110075253A1
公开(公告)日：2011-03-31
申请号：US12927063
申请日：2010-11-05
Applicant: Norbert R. Bowering , Igor V. Fomenkov
Inventor： Norbert R. Bowering , Igor V. Fomenkov
CPC classification number: G03F7/7015 , G02B5/0891 , G02B7/182 , G21K1/062 , Y10T29/49982
Abstract: In a first aspect, a method of fabricating an EUV light source mirror is disclosed which may comprise the acts/steps of providing a plurality of discrete substrates; coating each substrate with a respective multilayer coating; securing the coated substrates in an arrangement wherein each coated substrate is oriented to a common focal point; and thereafter polishing at least one of the multilayer coatings. In another aspect, an optic for use with EUV light is disclosed which may comprise a substrate; a smoothing layer selected from the group of materials consisting of Si, C, Si3N4, B4C, SiC and Cr, the smoothing layer material being deposited using highly energetic deposition conditions and a multilayer dielectric coating. In another aspect, a corrosion resistant, multilayer coating for an EUV mirror may comprise alternating layers of Si and a compound material having nitrogen and a 5th period transition metal.
Abstract translation: 在第一方面，公开了一种制造EUV光源反射镜的方法，其可以包括提供多个离散基板的动作/步骤; 用相应的多层涂层涂覆每个基材; 将涂覆的基底固定在其中每个涂覆的基底被定向到公共焦点的布置中; 然后抛光至少一个多层涂层。 在另一方面，公开了一种用于EUV光的光学元件，其可以包括基底; 选自由Si，C，Si 3 N 4，B 4 C，SiC和Cr组成的材料组中的平滑层，使用高能沉积条件沉积的平滑层材料和多层介电涂层。 另一方面，用于EUV反射镜的耐腐蚀多层涂层可以包括交替的Si层和具有氮和第五段过渡金属的复合材料。
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4.发明授权Systems and methods for target material delivery in a laser produced plasma EUV light source 有权用于激光产生等离子体EUV光源的靶材料输送的系统和方法公开(公告)号：US07872245B2
公开(公告)日：2011-01-18
申请号：US12214736
申请日：2008-06-19
Applicant: Georgiy O. Vaschenko , Alexander N. Bykanov , Norbert R. Bowering , David C. Brandt , Alexander I. Ershov , Rodney D. Simmons , Oleh V. Khodykin , Igor V. Fomenkov
Inventor： Georgiy O. Vaschenko , Alexander N. Bykanov , Norbert R. Bowering , David C. Brandt , Alexander I. Ershov , Rodney D. Simmons , Oleh V. Khodykin , Igor V. Fomenkov
Abstract: Devices are disclosed herein which may comprise an EUV reflective optic having a surface of revolution that defines a rotation axis and a circular periphery. The optic may be positioned to incline the axis at a nonzero angle relative to a horizontal plane, and to establish a vertical projection of the periphery in the horizontal plane with the periphery projection bounding a region in the horizontal plane. The device may further comprise a system delivering target material, the system having a target material release point that is located in the horizontal plane and outside the region, bounded by the periphery projection and a system generating a laser beam for irradiating the target material to generate an EUV emission.
Abstract translation: 本文公开的装置可以包括具有限定旋转轴线和圆形周边的旋转表面的EUV反射光学元件。 光学元件可以被定位成相对于水平面以非零角度倾斜轴，并且在水平面中建立周边的垂直投影，其中周边突起界定水平面中的一个区域。 该装置还可以包括传送目标材料的系统，该系统具有位于水平面内的区域外的外围突起的边界材料释放点和产生用于照射目标材料产生的激光束的系统 EUV排放。
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公开(公告)号：US20100025600A1
公开(公告)日：2010-02-04
申请号：US12221313
申请日：2008-07-31
Applicant: Juan Armando Chavez , Norbert R. Bowering
Inventor： Juan Armando Chavez , Norbert R. Bowering
IPC: H05G2/00
CPC classification number: G03F7/70958 , G03F7/70825 , G03F7/70891 , G03F7/70925
Abstract: As disclosed herein, a device may comprise a substrate made of a material comprising silicon, the substrate having a first side and an opposed second side; an EUV reflective multi-layer coating overlaying at least a portion of the first side; an infrared absorbing coating overlaying at least a portion of the second side; and a system generating infrared radiation to heat the absorbing coating and the substrate.
Abstract translation: 如本文所公开的，装置可包括由包括硅的材料制成的衬底，该衬底具有第一侧和相对的第二侧; 覆盖第一侧的至少一部分的EUV反射多层涂层; 覆盖所述第二侧的至少一部分的红外吸收涂层; 以及产生红外辐射以加热吸收涂层和基底的系统。
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Patent Agency Ranking
公开(公告)号：US07193228B2
公开(公告)日：2007-03-20
申请号：US11021261
申请日：2004-12-22
Applicant: Norbert R. Bowering , Alexander I. Ershov , Timothy S. Dyer , Hugh R. Grinolds
Inventor： Norbert R. Bowering , Alexander I. Ershov , Timothy S. Dyer , Hugh R. Grinolds
CPC classification number: G21K1/062 , B82Y10/00 , G03F7/70175 , G03F7/70916
Abstract: Apparatus and methods are disclosed for forming plasma generated EUV light source optical elements, e.g., reflectors comprising MLM stacks employing various binary layer materials and capping layer(s) including single and binary capping layers for utilization in plasma generated EUV light source chambers, particularly where the plasma source material is reactive with one or more of the MLM materials.
Abstract translation: 公开了用于形成等离子体产生的EUV光源光学元件的装置和方法，例如，包括使用各种二元层材料的MLM堆叠的反射器和包括用于等离子体产生的EUV光源室中的单个和二进制封盖层的封盖层，特别是在 等离子体源材料与一种或多种MLM材料反应。
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公开(公告)号：US08598549B2
公开(公告)日：2013-12-03
申请号：US12927063
申请日：2010-11-05
Applicant: Norbert R. Bowering , Igor V. Fomenkov
Inventor： Norbert R. Bowering , Igor V. Fomenkov
IPC: H05G2/00
CPC classification number: G03F7/7015 , G02B5/0891 , G02B7/182 , G21K1/062 , Y10T29/49982
Abstract: In a first aspect, a method of fabricating an EUV light source mirror is disclosed which may comprise the acts/steps of providing a plurality of discrete substrates; coating each substrate with a respective multilayer coating; securing the coated substrates in an arrangement wherein each coated substrate is oriented to a common focal point; and thereafter polishing at least one of the multilayer coatings. In another aspect, an optic for use with EUV light is disclosed which may comprise a substrate; a smoothing layer selected from the group of materials consisting of Si, C, Si3N4, B4C, SiC and Cr, the smoothing layer material being deposited using highly energetic deposition conditions and a multilayer dielectric coating. In another aspect, a corrosion resistant, multilayer coating for an EUV mirror may comprise alternating layers of Si and a compound material having nitrogen and a 5th period transition metal.
Abstract translation: 在第一方面，公开了一种制造EUV光源反射镜的方法，其可以包括提供多个离散基板的动作/步骤; 用相应的多层涂层涂覆每个基材; 将涂覆的基底固定在其中每个涂覆的基底被定向到公共焦点的布置中; 然后抛光至少一个多层涂层。 在另一方面，公开了一种用于EUV光的光学元件，其可以包括基底; 选自由Si，C，Si 3 N 4，B 4 C，SiC和Cr组成的材料组中的平滑层，使用高能沉积条件沉积的平滑层材料和多层介电涂层。 另一方面，用于EUV反射镜的耐腐蚀多层涂层可以包括交替的Si层和具有氮和第五段过渡金属的复合材料。
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8.发明授权EUV light source components and methods for producing, using and refurbishing same 有权EUV光源组件及其制造，使用和翻新方法公开(公告)号：US08314398B2
公开(公告)日：2012-11-20
申请号：US13091923
申请日：2011-04-21
Applicant: Norbert R. Bowering , Igor V. Fomenkov , Oleh V. Khodykin , Alexander N. Bykanov
Inventor： Norbert R. Bowering , Igor V. Fomenkov , Oleh V. Khodykin , Alexander N. Bykanov
IPC: G01J3/10
CPC classification number: G02B5/0891 , B82Y10/00 , G01J1/429 , G03F7/70941 , G03F7/70958 , G03F7/70975 , G21K2201/061 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/008
Abstract: A method is disclosed for in-situ monitoring of an EUV mirror to determine a degree of optical degradation. The method may comprise the steps/acts of irradiating at least a portion of the mirror with light having a wavelength outside the EUV spectrum, measuring at least a portion of the light after the light has reflected from the mirror, and using the measurement and a pre-determined relationship between mirror degradation and light reflectivity to estimate a degree of multi-layer mirror degradation. Also disclosed is a method for preparing a near-normal incidence, EUV mirror which may comprise the steps/acts of providing a metallic substrate, diamond turning a surface of the substrate, depositing at least one intermediate material overlying the surface using a physical vapor deposition technique, and depositing a multi-layer mirror coating overlying the intermediate material.
Abstract translation: 公开了一种用于EUV反射镜的原位监测以确定光学降解程度的方法。 该方法可以包括用具有波长在EUV谱以外的波长的光照射反射镜的至少一部分的步骤/动作，在光已经从反射镜反射之后测量光的至少一部分，并且使用该测量和 镜面退化和光反射率之间的预定关系，以估计多层镜面退化的程度。 还公开了一种用于制备近似法线入射的EUV反射镜的方法，该反射镜可以包括提供金属基底的步骤/动作，转动基底的表面的金刚石，使用物理气相沉积沉积覆盖表面的至少一种中间材料 技术，并沉积覆盖中间材料的多层镜面涂层。
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9.发明授权EUV light source components and methods for producing, using and refurbishing same 有权EUV光源组件及其制造，使用和翻新方法公开(公告)号：US07960701B2
公开(公告)日：2011-06-14
申请号：US12004871
申请日：2007-12-20
Applicant: Norbert R. Bowering , Oleh V. Khodykin
Inventor： Norbert R. Bowering , Oleh V. Khodykin
IPC: G01J1/42
CPC classification number: G02B5/0891 , B82Y10/00 , G01J1/429 , G03F7/70941 , G03F7/70958 , G03F7/70975 , G21K2201/061 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/008
Abstract: A method is disclosed for in-situ monitoring of an EUV mirror to determine a degree of optical degradation. The method may comprise the steps/acts of irradiating at least a portion of the mirror with light having a wavelength outside the EUV spectrum, measuring at least a portion of the light after the light has reflected from the mirror, and using the measurement and a pre-determined relationship between mirror degradation and light reflectivity to estimate a degree of multi-layer mirror degradation. Also disclosed is a method for preparing a near-normal incidence, EUV mirror which may comprise the steps/acts of providing a metallic substrate, diamond turning a surface of the substrate, depositing at least one intermediate material overlying the surface using a physical vapor deposition technique, and depositing a multi-layer mirror coating overlying the intermediate material.
Abstract translation: 公开了一种用于EUV反射镜的原位监测以确定光学降解程度的方法。 该方法可以包括用具有波长在EUV谱以外的波长的光照射反射镜的至少一部分的步骤/动作，在光已经从反射镜反射之后测量光的至少一部分，并且使用该测量和 镜面退化和光反射率之间的预定关系，以估计多层镜面退化的程度。 还公开了一种用于制备近似法线入射的EUV反射镜的方法，该反射镜可以包括提供金属基底的步骤/动作，转动基底的表面的金刚石，使用物理气相沉积沉积覆盖表面的至少一种中间材料 技术，并沉积覆盖中间材料的多层镜面涂层。
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公开(公告)号：US07476887B2
公开(公告)日：2009-01-13
申请号：US11725940
申请日：2007-03-19
Applicant: Norbert R. Bowering , Alexander I. Ershov , Timothy S. Dyer , Hugh R. Grinolds
Inventor： Norbert R. Bowering , Alexander I. Ershov , Timothy S. Dyer , Hugh R. Grinolds
Abstract: Apparatus and methods are disclosed for forming plasma generated EUV light source optical elements, e.g., reflectors comprising MLM stacks employing various binary layer materials and capping layer(s) including single and binary capping layers for utilization in plasma generated EUV light source chambers, particularly where the plasma source material is reactive with one or more of the MLM materials.
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