公开(公告)号：US20060158636A1

公开(公告)日：2006-07-20

申请号：US11384448

申请日：2006-03-21

申请人： Masafumi Mizuguchi ,  Norio Komine

发明人： Masafumi Mizuguchi ,  Norio Komine

IPC分类号： G03B27/72

CPC分类号： G03F7/70958 ,  G03F7/70041 ,  G03F7/70591 ,  G03F7/70883 ,  G03F7/70941

摘要： In an exposure apparatus, an exposure object is exposed to light by applying pulsed light that has a wavelength of 300 nm or less and that has been passed through a plurality of optical components. At least one of the plurality of optical components is made of a synthetic silica glass component. In ultraviolet light applied to the synthetic silica glass component, a width between adjacent top portions of energy density inhomogeneity in a plane perpendicular to an optical axis is larger than 0.1 mm, and a difference between a top portion and a bottom portion of the energy density is 5% or less of an average energy density.

摘要翻译： 在曝光装置中，通过施加波长为300nm以下且已经通过多个光学部件的脉冲光使曝光对象物曝光。 多个光学部件中的至少一个由合成石英玻璃部件制成。 在施加到合成石英玻璃部件的紫外线中，与光轴垂直的面内的能量密度不均匀性的相邻顶部之间的宽度大于0.1mm，顶部与底部之间的能量密度 是平均能量密度的5％以下。

公开(公告)号：US06835683B2

公开(公告)日：2004-12-28

申请号：US10311233

申请日：2002-12-17

申请人： Norio Komine ,  Akiko Yoshida ,  Hiroki Jinbo ,  Seishi Fujiwara

发明人： Norio Komine ,  Akiko Yoshida ,  Hiroki Jinbo ,  Seishi Fujiwara

IPC分类号： C03C306

CPC分类号： C03C4/0071 ,  C03B19/1423 ,  C03B19/1453 ,  C03B19/1492 ,  C03B2201/07 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/00 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/44 ,  C03C2203/46 ,  C03C2203/52 ,  C03C2203/54 ,  G02B1/02 ,  G02B13/143 ,  G03F7/70241 ,  G03F7/70958

摘要： A silica glass member of the present invention is one wherein when a composition thereof is expressed by SiOx, x is not less than 1.85 nor more than 1.95, wherein a concentration of hydrogen molecules included therein is not less than 1×1016 molecules/cm3 nor more than 5×1018 molecules/cm3, and wherein a difference A−B between an absorption coefficient A immediately before an end of irradiation with 1×104 pulses of ArF excimer laser light in an average one-pulse energy density of 2 mJ/cm2 and a second absorption coefficient B at 600 seconds after a stop of the irradiation with the ArF excimer laser light is not more than 0.002 cm−1. When this silica glass member is applied to an illumination optical system and/or a projection optical system in projection exposure apparatus, it becomes feasible to implement uniform exposure while reducing variation in illuminance on a reticle surface and in an exposure area on a wafer.

摘要翻译： 本发明的石英玻璃构件是当其组成由SiO x表示时，x不小于1.85或不大于1.95，其中包含的氢分子的浓度不小于1×10 16分子/ cm <3>不超过5×10 18分子/ cm 3，并且其中在照射结束之前的吸收系数A与平均单脉冲中的1×10 4个ArF准分子激光脉冲之间的差AB 用ArF准分子激光照射停止600秒后的能量密度为2mJ / cm 2，第二吸收系数B为0.002cm -1以下。 当将该石英玻璃构件应用于投影曝光装置中的照明光学系统和/或投影光学系统时，可以实现均匀曝光，同时减小掩模版面和晶片上的曝光区域中的照度变化。

公开(公告)号：US06518210B1

公开(公告)日：2003-02-11

申请号：US09593441

申请日：2000-06-14

申请人： Hiroki Jinbo ,  Norio Komine ,  Hiroyuki Hiraiwa

发明人： Hiroki Jinbo ,  Norio Komine ,  Hiroyuki Hiraiwa

IPC分类号： C03C306

CPC分类号： G03F7/70958 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/36 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/42 ,  C03C2203/44 ,  C03C2203/52 ,  G03F7/70241 ,  Y02P40/57

摘要： A silica glass has a structure determination temperature of 1200 K or lower and an OH group concentration of at least 1,000 ppm. The silica glass is used for photolithography together with light in a wavelength region of 400 nm or shorter.

摘要翻译： 石英玻璃的结构测定温度为1200K以下，OH基浓度为1,000ppm以上。 石英玻璃与波长400nm以下的光一起用于光刻。

公开(公告)号：US06339033B2

公开(公告)日：2002-01-15

申请号：US09736279

申请日：2000-12-15

申请人： Hiroki Jinbo ,  Norio Komine ,  Seishi Fujiwara ,  Akiko Yoshida

发明人： Hiroki Jinbo ,  Norio Komine ,  Seishi Fujiwara ,  Akiko Yoshida

IPC分类号： C03C306

CPC分类号： C03B32/00 ,  C03B19/1453 ,  C03B2201/21 ,  C03B2207/32 ,  C03C3/06 ,  C03C2201/21 ,  C03C2203/40 ,  C03C2203/52 ,  C03C2203/54 ,  Y02P40/57

摘要： A silica glass is provided for use in an optical system processing an excimer laser beam. The silica glass has a molecular hydrogen concentration of about 5×1018 molecules/cm3 or less and is substantially free from defects which become precursors susceptible to an one-photon absorption process and a two-photon absorption process upon irradiation of the excimer laser beam to the silica glass.

摘要翻译： 提供石英玻璃用于处理准分子激光束的光学系统中。 二氧化硅玻璃的分子氢浓度约为5×1018分/ cm 3或更低，并且基本上没有成为对单光子吸收过程敏感的前体的缺陷和在将准分子激光束照射到二氧化硅上时的双光子吸收过程 玻璃。

公开(公告)号：US06269661B1

公开(公告)日：2001-08-07

申请号：US09347403

申请日：1999-07-06

申请人： Hiroki Jinbo ,  Akiko Moriya ,  Norio Komine

发明人： Hiroki Jinbo ,  Akiko Moriya ,  Norio Komine

IPC分类号： C03C1500

CPC分类号： C03C23/007 ,  C03C15/00 ,  C03C17/245 ,  C03C19/00 ,  C03C23/008 ,  Y10S65/08

摘要： The present invention provides a method for manufacturing an optical component that have increased transmittance in the ultraviolet region of the spectrum. The method includes the steps of cutting out a part from a block material; polishing optical sides of the part; subjecting the part to heat treatment at a temperature of between 100 and 900° C.; and subjecting the part to acid treatment.

摘要翻译： 本发明提供一种在光谱的紫外区域具有增加的透射率的光学部件的制造方法。 该方法包括从块材料切割零件的步骤; 抛光部分光学面; 在100至900℃的温度下对该部件进行热处理; 并对该部件进行酸处理。

公开(公告)号：US5958809A

公开(公告)日：1999-09-28

申请号：US915562

申请日：1997-08-21

申请人： Seishi Fujiwara ,  Hiroyuki Hiraiwa ,  Kazuhiro Nakagawa ,  Shouji Yajima ,  Norio Komine ,  Hiroki Jinbo

发明人： Seishi Fujiwara ,  Hiroyuki Hiraiwa ,  Kazuhiro Nakagawa ,  Shouji Yajima ,  Norio Komine ,  Hiroki Jinbo

IPC分类号： C03B8/04 ,  C03B19/14 ,  C03B37/014 ,  C03C3/06 ,  C03C4/00 ,  G03F7/20 ,  C03C13/04

CPC分类号： C03B19/14 ,  C03B37/014 ,  C03B37/0142 ,  C03C3/06 ,  C03C4/0085 ,  G03F7/2004 ,  C03B2201/07 ,  C03B2207/66 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/42 ,  C03C2203/46 ,  Y02P40/57 ,  Y10S501/905

摘要： The invention relates to fluorine-containing silica glasses, and methods of their production. The silica glass may be used for an ultraviolet light optical system in which light in a wavelength region of 200 nm or less, such as an ArF (193 nm) excimer laser, is used. The invention also relates to a projection exposure apparatus containing fluorine-containing glass of the invention.

摘要翻译： 本发明涉及含氟二氧化硅玻璃及其制造方法。 石英玻璃可以用于其中使用200nm以下的波长区域的光，例如ArF（193nm）准分子激光器的紫外线光学系统。 本发明还涉及包含本发明的含氟玻璃的投影曝光装置。

公开(公告)号：US07515247B2

公开(公告)日：2009-04-07

申请号：US11979516

申请日：2007-11-05

申请人： Osamu Tanitsu ,  Hirohisa Tanaka ,  Kenichi Muramatsu ,  Norio Komine ,  Hisashi Nishinaga ,  Tomoyuki Matsuyama ,  Takehito Kudo

发明人： Osamu Tanitsu ,  Hirohisa Tanaka ,  Kenichi Muramatsu ,  Norio Komine ,  Hisashi Nishinaga ,  Tomoyuki Matsuyama ,  Takehito Kudo

IPC分类号： G03B27/72

CPC分类号： G03F7/70566 ,  G03B27/42 ,  G03F7/70091

摘要： An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.

摘要翻译： 一种照明光学系统，当安装在曝光系统中时，通过根据掩模的图案特性改变照明光的偏振状态，同时抑制光的强度损失，实现合适的照明条件。 照明光学系统具有用于提供用于照射被照射的面的线偏振光的光源单元和用于将照明光的偏振状态从预定极化状态改变为非极化状态的偏振状态改变装置，反之亦然 。 偏光状态改变装置配置在光源单元与被照射面之间的光路中。 可以从照明光路去除偏振状态改变装置，并且具有去偏振器，用于选择性地使入射的线偏振光去极化。

公开(公告)号：US20060171138A1

公开(公告)日：2006-08-03

申请号：US10565412

申请日：2004-06-29

申请人： Kenichi Muramatsu ,  Norio Komine ,  Osamu Tanitsu ,  Hirohisa Tanaka

发明人： Kenichi Muramatsu ,  Norio Komine ,  Osamu Tanitsu ,  Hirohisa Tanaka

IPC分类号： G01D11/28

CPC分类号： G03F7/70566

摘要： An illuminating optical system capable of preventing a change in the polarized status of a linearly polarized light passing through a light transmitting member formed of a cubic-system crystal material such as fluorite. An illuminating optical system comprising a light source unit (1) for suppling a linearly polarized light to illuminate surfaces (M, W) to be illuminated with a light from the light source unit. The system is provided with a polarized status switching means (10, 20) disposed on a light path between the light source unit and the surfaces to be illuminated, for switching the polarized status of a light, that illuminates the surfaces to be illuminated, between a linearly polarized status and a non-linearly polarized status. The polarized status switching means has a phase member (10) for changing the polarization surface of an incident linearly polarized light as needed, and a depolarizer (20) for depolarizing an incident linearly polarized light as needed. A phase advancing axis direction in association with the double refraction variation of a light transmitting member formed of fluorite is so set as to almost agree with or cross almost perpendicularly to the field vibration direction of a linearly polarized light incident to a light transmitting member.

摘要翻译： 一种照明光学系统，其能够防止通过由诸如萤石的立方晶系晶体材料形成的透光构件的线偏振光的偏振状态的变化。 一种照明光学系统，包括用于提供线性偏振光以照射要被来自光源单元的光照射的表面（M，W）的光源单元（1）。 该系统设置有偏光状态切换装置（10,20），该偏振状态切换装置设置在光源单元和被照射表面之间的光路上，用于将照亮被照射的表面的光的偏振状态 线性极化状态和非线性极化状态。 极化状态切换装置具有用于根据需要改变入射的线偏振光的偏振面的相位构件（10）和根据需要对入射的线偏振光进行去偏振的消偏振器（20）。 与萤石形成的透光构件的双折射变化相关的相位推进轴方向设定为几乎与入射到透光构件的线偏振光的场振动方向一致或几乎垂直。

公开(公告)号：US20060055834A1

公开(公告)日：2006-03-16

申请号：US11140103

申请日：2005-05-31

申请人： Osamu Tanitsu ,  Hirohisa Tanaka ,  Kenichi Muramatsu ,  Norio Komine ,  Hisashi Nishinaga ,  Tomoyuki Matsuyama ,  Takehito Kudo

发明人： Osamu Tanitsu ,  Hirohisa Tanaka ,  Kenichi Muramatsu ,  Norio Komine ,  Hisashi Nishinaga ,  Tomoyuki Matsuyama ,  Takehito Kudo

IPC分类号： G02F1/1335

CPC分类号： G03F7/70566 ,  G03B27/42 ,  G03F7/70091

摘要： An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.

摘要翻译： 一种照明光学系统，当安装在曝光系统中时，通过根据掩模的图案特性改变照明光的偏振状态，同时抑制光的强度损失，实现合适的照明条件。 照明光学系统具有用于提供用于照射被照射的面的线偏振光的光源单元和用于将照明光的偏振状态从预定极化状态改变为非极化状态的偏振状态改变装置，反之亦然 。 偏光状态改变装置配置在光源单元与被照射面之间的光路中。 可以从照明光路去除偏振状态改变装置，并且具有去偏振器，用于选择性地使入射的线偏振光去极化。

公开(公告)号：US6075607A

公开(公告)日：2000-06-13

申请号：US166528

申请日：1998-10-06

申请人： Hiroki Jinbo ,  Norio Komine ,  Seishi Fujiwara

发明人： Hiroki Jinbo ,  Norio Komine ,  Seishi Fujiwara

IPC分类号： G01N21/88 ,  G01N17/00 ,  G01N21/59 ,  G01N21/958 ,  G01B11/00

CPC分类号： G01N17/004

摘要： A method is provided for estimating durability of an optical member against pulsed excimer laser beam irradiation. The method includes the steps of (a) irradiating a test sample for the optical member with a pulsed excimer laser beam to induce changes in transparency of the test sample with respect to the pulsed excimer laser beam, the irradiation being performed for such a time period as to cover not only a linear region and a saturation region and (b) measuring changes in the transparency of the test sample with respect to the pulsed excimer laser beam as a function of the cumulative number of the excimer laser pulses that have irradiated the test sample in step (a). The method further includes the step of (c) repeating steps (a) and (b) with a plurality of different first predetermined energy densities of the pulsed excimer laser beam to derive a correlation equation representing the changes in the transparency of the test sample in the linear region and the saturated region in terms of the energy density of the pulsed excimer laser beam and the cumulative number of the excimer laser pulses and (d) estimating the durability of the optical member under actual usage conditions using the derived correlation equation.

摘要翻译： 提供了一种用于估计光学构件对脉冲准分子激光束照射的耐久性的方法。 该方法包括以下步骤：（a）用脉冲准分子激光束照射光学部件的测试样品，以引起测试样品相对于脉冲准分子激光束的透明度变化，照射进行这样一段时间 不仅覆盖线性区域和饱和区域，并且（b）测量相对于脉冲准分子激光束的测试样品的透明度的变化，作为照射测试的准分子激光脉冲的累积数量的函数 步骤（a）中的样品。 该方法还包括以下步骤：（c）用脉冲准分子激光束的多个不同的第一预定能量密度重复步骤（a）和（b），以得出表示测试样品透明度变化的相关方程式 根据脉冲准分子激光束的能量密度和准分子激光脉冲的累积数量的线性区域和饱和区域，以及（d）使用导出的相关方程估计实际使用条件下的光学构件的耐久性。