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公开(公告)号:US07049158B2
公开(公告)日:2006-05-23
申请号:US10688731
申请日:2003-10-15
IPC分类号: H01L21/00
摘要: A method is disclosed for creating an emitter having a flat cathode emission surface: First a protective layer that is conductive is formed on the flat cathode emission surface. Then an electronic lens structure is created over the protective layer. Finally, the protective layer is etched to expose the flat cathode emission surface.
摘要翻译: 公开了一种用于产生具有平坦的阴极发射表面的发射体的方法:首先在平坦的阴极发射表面上形成导电的保护层。 然后在保护层上形成电子透镜结构。 最后,蚀刻保护层以暴露平坦的阴极发射表面。
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公开(公告)号:US06969667B2
公开(公告)日:2005-11-29
申请号:US10114392
申请日:2002-04-01
IPC分类号: H01L25/18 , B81B7/00 , H01L21/50 , H01L21/60 , H01L21/98 , H01L23/02 , H01L23/10 , H01L25/065 , H01L25/07 , H01L21/30
CPC分类号: H01L25/50 , B81B7/0006 , H01L21/50 , H01L23/10 , H01L24/81 , H01L25/0657 , H01L2224/05001 , H01L2224/05023 , H01L2224/05568 , H01L2224/16105 , H01L2224/81191 , H01L2224/81801 , H01L2225/06513 , H01L2225/06565 , H01L2924/01005 , H01L2924/01006 , H01L2924/01032 , H01L2924/01033 , H01L2924/01073 , H01L2924/01079 , H01L2924/01322 , H01L2924/01327 , H01L2924/014 , H01L2924/14 , H01L2224/05541 , H01L2224/05005
摘要: An electrical device includes a plurality of integrated circuits respectively fabricated in a first substrate bonded to a second substrate by a bond that deforms above, but not below, a deformation condition. The deformation condition can be a predetermined pressure from opposing surfaces on the first and second substrates or it can be a predetermined combination of temperature and pressure from opposing surfaces on the first and second substrates.
摘要翻译: 电气装置包括分别制造在第一基板中的多个集成电路,该第一基板通过在变形条件之上而不是在变形条件下变形的结合到第二基板上。 变形条件可以是来自第一和第二基板上的相对表面的预定压力,或者它可以是来自第一和第二基板上的相对表面的温度和压力的预定组合。
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公开(公告)号:US06753544B2
公开(公告)日:2004-06-22
申请号:US09846047
申请日:2001-04-30
申请人: Zhizhang Chen , Michael David Bice , Ronald L. Enck , Michael J. Regan , Thomas Novet , Paul J. Benning
发明人: Zhizhang Chen , Michael David Bice , Ronald L. Enck , Michael J. Regan , Thomas Novet , Paul J. Benning
IPC分类号: H01L2906
摘要: An emitter has an electron supply layer and a silicon-based dielectric layer formed on the electron supply layer. The silicon-based dielectric layer is preferably less than about 500 Angstroms. Optionally, an insulator layer is formed on the electron supply layer and has openings defined within which the silicon-based dielectric layer is formed. A cathode layer is formed on the silicon-based dielectric layer to provide a surface for energy emissions of electrons and/or photons. Preferably, the emitter is subjected to an annealing process thereby increasing the supply of electrons tunneled from the electron supply layer to the cathode layer.
摘要翻译: 发射体具有形成在电子供给层上的电子供给层和硅基电介质层。 硅基电介质层优选小于约500埃。 可选地,在电子供给层上形成绝缘体层,并且限定了形成硅基电介质层的开口。 在硅基电介质层上形成阴极层,以提供电子和/或光子能量发射的表面。 优选地,对发射极进行退火处理,从而增加从电子供给层隧穿到阴极层的电子的供应。
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公开(公告)号:US06741016B2
公开(公告)日:2004-05-25
申请号:US09882933
申请日:2001-06-14
IPC分类号: H01J146
摘要: An electron lens is used for focusing electrons from a cathode to an anode. The lens includes a first conductive layer with a first opening at a first distance from the cathode. The first conductive layer is held at a first voltage. The lens also includes a second conductive layer with a second opening at a second distance from the first conductive layer and a third distance from the anode. The second conductive layer is held at a second voltage substantially equal to the voltage of the anode. The first and second openings are chosen based on the first voltage, the second voltage, the first distance, the second distance and the third distance. The opening focuses the electrons emitted from the cathode onto the anode to a spot size preferably less than 40 nanometers. The force created between the cathode and anode is minimized by the structure of the lens.
摘要翻译: 电子透镜用于将电子从阴极聚焦到阳极。 透镜包括第一导电层,其具有距离阴极第一距离的第一开口。 第一导电层保持在第一电压。 透镜还包括第二导电层,其具有距离第一导电层第二距离的第二开口和离阳极的第三距离。 第二导电层被保持在基本上等于阳极电压的第二电压上。 基于第一电压,第二电压,第一距离,第二距离和第三距离来选择第一和第二开口。 开口将从阴极发射的电子聚焦到阳极上至优选小于40纳米的光斑尺寸。 通过透镜的结构,在阴极和阳极之间产生的力最小化。
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公开(公告)号:US06489084B1
公开(公告)日:2002-12-03
申请号:US09664484
申请日:2000-09-18
IPC分类号: B41J201
CPC分类号: B41J2/1404 , B41J2002/14387 , B41J2002/14403 , B41J2002/14467 , B41J2202/03
摘要: The photoresist barrier layer of an inkjet printer printhead is processed to enable channels narrower than a predetermined width in the barrier layer to be created without blockage. Relatively large volumes of photoresist which form a wall of the channel are exposed to a partial exposure of electromagnetic radiation to yield a reduced concentration of photoresist barrier layer in the large volume.
摘要翻译: 处理喷墨打印机打印头的光致抗蚀剂阻挡层,使阻挡层中预定宽度窄的通道无障碍地产生。 形成通道壁的相对大体积的光致抗蚀剂暴露于电磁辐射的部分曝光,从而在大体积内产生降低的光刻胶阻挡层的浓度。
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公开(公告)号:US06161923A
公开(公告)日:2000-12-19
申请号:US121258
申请日:1998-07-22
CPC分类号: B41J2/1404 , B41J2002/14387 , B41J2002/14403 , B41J2002/14467 , B41J2202/03
摘要: The photoresist barrier layer of an inkjet printer printhead is processed to enable channels narrower than a predetermined width in the barrier layer to be created without blockage. Relatively large volumes of photoresist which form a wall of the channel are exposed to a partial exposure of electomagnetic radiation to yield a reduced concentration of photoresist barrier layer in the large volume.
摘要翻译: 处理喷墨打印机打印头的光致抗蚀剂阻挡层,使阻挡层中预定宽度窄的通道无障碍地产生。 形成通道壁的相对较大体积的光致抗蚀剂暴露于电磁辐射的部分曝光,以产生大体积中光致抗蚀剂阻挡层的浓度降低。
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