PROJECTION OBJECTIVE FOR LITHOGRAPHY
    11.
    发明申请
    PROJECTION OBJECTIVE FOR LITHOGRAPHY 有权
    投影目标的图像

    公开(公告)号:US20080174858A1

    公开(公告)日:2008-07-24

    申请号:US12014496

    申请日:2008-01-15

    IPC分类号: G02B27/18

    摘要: In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.

    摘要翻译: 在一些实施例中,用于光刻的投影物镜包括在物平面和像平面之间的光学元件的光学布置。 该布置通常具有至少一个中间图像平面,该布置还具有用于校正像差的至少两个校正元件,其中第一校正元件至少在光瞳平面附近被光学地布置,并且第二校正元件布置在 在光瞳平面或场平面上不光学的区域。

    OBJECTIVES AS A MICROLITHOGRAPHY PROJECTION OBJECTIVE WITH AT LEAST ONE LIQUID LENS
    12.
    发明申请
    OBJECTIVES AS A MICROLITHOGRAPHY PROJECTION OBJECTIVE WITH AT LEAST ONE LIQUID LENS 有权
    目标作为目标与一个液晶镜头的微观图像投影

    公开(公告)号:US20080030869A1

    公开(公告)日:2008-02-07

    申请号:US11758363

    申请日:2007-06-05

    IPC分类号: G02B3/12

    摘要: The invention relates to an objective designed as a microlithography projection objective for an operating wavelength. The objective has a greatest adjustable image-side numerical aperture NA, at least one first lens made from a solid transparent body, in particular glass or crystal, with a refractive index nL and at least one liquid lens (F) made from a transparent liquid, with a refractive index nF. At the operating wavelength the first lens has the greatest refractive index nL of all solid lenses of the objective, the refractive index nF of the at least one liquid lens (F) is bigger than the refractive index nL of the first lens and the value of the numerical aperture NA is bigger than 1.

    摘要翻译: 本发明涉及被设计为用于工作波长的微光刻投射物镜的物镜。 目标具有最大的可调节图像侧数值孔径NA,由实心透明体,特别是玻璃或晶体制成的至少一个第一透镜,具有折射率n L L和至少一个液体透镜 (F)由透明液体制成,具有折射率n F F。 在工作波长下,第一透镜具有物镜的所有实心透镜的最大折射率n L L,所述至少一个液体透镜的折射率n F )大于第一透镜的折射率nLL ,并且数值孔径NA的值大于1。

    Illumination system or projection lens of a microlithographic exposure system
    17.
    发明授权
    Illumination system or projection lens of a microlithographic exposure system 有权
    微光曝光系统的照明系统或投影透镜

    公开(公告)号:US08031326B2

    公开(公告)日:2011-10-04

    申请号:US12042621

    申请日:2008-03-05

    IPC分类号: G03B27/54 G03B27/72

    摘要: In some embodiments, the disclosure provides an optical system, in particular an illumination system or a projection lens of a microlithographic exposure system, having an optical system axis and at least one element group including three birefringent elements each of which includes optically uniaxial material and having an aspheric surface, wherein a first birefringent element of the group has a first orientation of its optical crystal axis, a second birefringent element of the group has a second orientation of its optical crystal axis, wherein the second orientation can be described as emerging from a rotation of the first orientation, the rotation not corresponding to a rotation around the optical system axis by an angle of 90° or an integer multiple thereof, and a third birefringent element of the group has a third orientation of its optical crystal axis, wherein the third orientation can be described as emerging from a rotation of the second orientation, the rotation not corresponding to a rotation around the optical system axis by an angle of 90° or an integer multiple thereof.

    摘要翻译: 在一些实施例中,本公开提供了一种光学系统,特别是微光刻曝光系统的照明系统或投影透镜,其具有光学系统轴线和包括三个双折射元件的至少一个元件组,每个元件组包括光学单轴材料并具有 非球面表面,其中该组的第一双折射元件具有其光学晶体轴的第一取向,该组的第二双折射元件具有其光学晶轴的第二取向,其中第二取向可被描述为从 第一取向的旋转,旋转不对应于围绕光学系统轴的旋转90°的角度或其整数倍,并且该组的第三双折射元件具有其光学晶轴的第三取向,其中, 可以将第三取向描述为从第二取向旋转而出现,旋转不对准 以围绕光学系统轴旋转90°的角度或其整数倍。

    Projection objective adapted for use with different immersion fluids or liquids, method of conversion of such and production method
    20.
    发明授权
    Projection objective adapted for use with different immersion fluids or liquids, method of conversion of such and production method 失效
    适用于不同浸入液体或液体的投影物镜,转换方法及生产方法

    公开(公告)号:US07589903B2

    公开(公告)日:2009-09-15

    申请号:US11420103

    申请日:2006-05-24

    IPC分类号: G02B3/00 G02B3/12

    CPC分类号: G02B13/143 G03F7/70341

    摘要: The invention relates to a projection objective (6), in particular for applications in microlithography, serving to project an image of an object (3) arranged in an object plane (4) onto a substrate (18) arranged in an image plane (7). The projection objective (6) has an object-side-oriented part (10) which is arranged adjacent to the object plane (4) and includes a plurality of optical elements, and it also has an image-side-oriented part (11) of the objective which is arranged adjacent to the image plane (7) and includes a free space (16) serving to receive a fluid (13) and further includes at least a part of an optical end-position element (14) serving to delimit the free space (16) towards the object side. The projection objective (6) is operable in different modes of operation in which the free space (16) is filled with fluids (13) that differ in their respective indices of refraction.

    摘要翻译: 本发明涉及一种投影物镜(6),特别是用于微光刻中的用于将布置在物平面(4)中的物体(3)的图像投影到布置在图像平面(7)中的基底(18)上的投影物镜 )。 投影物镜(6)具有与物平面(4)相邻配置并具有多个光学元件的物体侧取向部(10),还具有图像侧取向部(11) 所述物镜布置成邻近所述图像平面(7)并且包括用于接收流体(13)的自由空间(16),并且还包括用于界定光学终点位置元件(14)的至少一部分 朝向物体侧的自由空间(16)。 投影物镜(6)可在不同的操作模式中操作,其中自由空间(16)填充有各自折射率不同的流体(13)。