Photobase Generator, Compound, Photoreactive Composition and Reaction Product

    公开(公告)号:US20230089021A1

    公开(公告)日:2023-03-23

    申请号:US17788770

    申请日:2020-12-24

    Inventor: Koji Arimitsu

    Abstract: A photobase generator, includes a compound including a first skeleton represented by the following formula (a); and a second skeleton including a nitrogen atom bonding to a bonding position of the first skeleton to form an amide group, and a pyridine skeleton in addition to the nitrogen atom, in which the compound generates a base in which a hydrogen atom is bonded with the nitrogen atom of the second skeleton by light irradiation. In formula (a), G is a divalent aromatic group, and * represents the bonding position with the nitrogen atom.

    Hydrogen chloride removing agent
    19.
    发明授权

    公开(公告)号:US11318441B2

    公开(公告)日:2022-05-03

    申请号:US16631595

    申请日:2017-07-20

    Abstract: The present invention provides a new hydrogen chloride removing agent that exhibits a good hydrogen chloride removal effect at a relatively low temperature. The present invention preferably provides a new hydrogen chloride removing agent for removing hydrogen chloride contained in a hydrogen-chloride-containing gas, such as a pyrolysis gas, a combustion exhaust gas, a dry distillation gas, etc., especially hydrogen chloride contained in a biomass pyrolysis gas. The present invention relates to a hydrogen chloride removing agent characterized by containing a mixture of a calcium carbonate and an imogolite and/or a synthetic imogolite, and relates to a method for removing, by using said hydrogen chloride removing agent, hydrogen chloride contained in a hydrogen-chloride-containing gas, especially hydrogen chloride contained in a biomass pyrolysis gas.

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