公开(公告)号：US08934092B2

公开(公告)日：2015-01-13

申请号：US13838460

申请日：2013-03-15

Applicant: Yoshimasa Oshima ,  Toshiyuki Nakao ,  Shigeru Matsui

Inventor： Yoshimasa Oshima ,  Toshiyuki Nakao ,  Shigeru Matsui

IPC: G01N21/00 ,  G01N21/88

CPC classification number: G01N21/9501 ,  G01N2021/4716

Abstract: A surface defect inspection apparatus and method for irradiating a beam multiple times to a same region on a surface of an inspection sample, detecting each scattered light from the same region by detection optical systems individually to produce plural signals, and wherein irradiating the beam includes performing a line illumination of the beam on a line illumination region of the sample surface. The line illumination region is moved in a longitudinal direction at a pitch shorter than a length of the line illumination region in the longitudinal direction.

Abstract translation: 一种表面缺陷检查装置和方法，用于将多个光束照射到检查样品的表面上的相同区域，分别通过检测光学系统检测来自相同区域的每个散射光以产生多个信号，并且其中照射光束包括执行 在样品表面的线照射区域上的光束的线照明。 线照明区域沿纵向方向以比线照明区域的长度方向的长度短的间距移动。

公开(公告)号：US08144337B2

公开(公告)日：2012-03-27

申请号：US12470505

申请日：2009-05-22

Applicant: Akira Hamamatsu ,  Yoshimasa Oshima ,  Shunji Maeda ,  Hisae Shibuya ,  Yuta Urano ,  Toshiyuki Nakao ,  Shigenobu Maruyama

Inventor： Akira Hamamatsu ,  Yoshimasa Oshima ,  Shunji Maeda ,  Hisae Shibuya ,  Yuta Urano ,  Toshiyuki Nakao ,  Shigenobu Maruyama

IPC: G01B11/30

CPC classification number: G01B11/303 ,  G01N21/47 ,  G01N21/94 ,  G01N21/9501

Abstract: To inspect a substrate such as a semiconductor substrate for surface roughness at high precision.The surface roughness of the substrate is measured in each frequency band of the surface roughness by applying a light to the substrate surface and detecting a scattered light or reflected light at a plurality of azimuth or elevation angles.

Abstract translation: 以高精度检查用于表面粗糙度的半导体基板等基板。 通过向基板表面施加光并以多个方位角或仰角检测散射光或反射光，测量表面粗糙度的每个频带中的基板的表面粗糙度。

公开(公告)号：US20100265494A1

公开(公告)日：2010-10-21

申请号：US12727752

申请日：2010-03-19

Applicant: Yoshimasa Oshima ,  Toshiyuki Nakao ,  Shigeru Matsui

Inventor： Yoshimasa Oshima ,  Toshiyuki Nakao ,  Shigeru Matsui

IPC: G01N21/88 ,  G01N21/00 ,  G01J3/00

CPC classification number: G01N21/9501 ,  G01N2021/4716

Abstract: A surface defect inspection apparatus and method for irradiating a beam multiple times to a same region on a surface of an inspection sample, detecting each scattered light from the same region by detection optical systems individually to produce plural signals, and wherein irradiating the beam includes performing a line illumination of the beam on a line illumination region of the sample surface. The line illumination region is moved in a longitudinal direction at a pitch shorter than a length of the line illumination region in the longitudinal direction.

Abstract translation: 一种表面缺陷检查装置和方法，用于将多个光束照射到检查样品的表面上的相同区域，分别通过检测光学系统检测来自相同区域的每个散射光以产生多个信号，并且其中照射光束包括执行 在样品表面的线照射区域上的光束的线照明。 线照明区域沿纵向方向以比线照明区域的长度方向的长度短的间距移动。

公开(公告)号：US20100225904A1

公开(公告)日：2010-09-09

申请号：US12771398

申请日：2010-04-30

Applicant: Yoshimasa Oshima ,  Toshiyuki Nakao

Inventor： Yoshimasa Oshima ,  Toshiyuki Nakao

IPC: G01N21/00

CPC classification number: G01N21/9501 ,  G01N2021/8864

Abstract: A defect inspection tool includes an illumination optical system for irradiating light to a surface of an object, and a detection optical system for detecting light scattered from the surface of the object which is irradiated. The detection optical system include an analyzer, a photoelectric converting device for receiving the scattering light passed through the analyzer, a member for saving a database prepared through an actual measurement or a calculation in correspondence with a condition of the illumination optical system, that of the detection optical system, a kind of an object to be inspected, and a rotation angle of the analyzer, and a member for adjusting an angle of the analyzer by selecting an angle of the analyzer from a database saved in the member for saving on a basis of an inspection recipe after receiving the inspection recipe to the defect inspection tool.

Abstract translation: 缺陷检查工具包括用于将光照射到物体的表面的照明光学系统和用于检测从被照射物体的表面散射的光的检测光学系统。 检测光学系统包括分析器，用于接收通过分析器的散射光的光电转换装置，用于保存根据照明光学系统的条件通过实际测量或计算准备的数据库的部件， 检测光学系统，被检查物体的种类以及分析仪的旋转角度，以及用于通过从保存在该成员中的数据库中选择分析器的角度来调整分析器的角度的部件 在将检查配方接收到缺陷检查工具之后的检查配方。

公开(公告)号：US20080304055A1

公开(公告)日：2008-12-11

申请号：US12109548

申请日：2008-04-25

Applicant: Yoshimasa OSHIMA ,  Toshiyuki Nakao ,  Shigeru Matsui

Inventor： Yoshimasa OSHIMA ,  Toshiyuki Nakao ,  Shigeru Matsui

IPC: G01N21/00

CPC classification number: G01N21/9501 ,  G01N2021/4716

Abstract: A surface defect inspection apparatus is structured to add detection signals of multi-directionally detected scattered lights to detect a tiny defect and to individually process the respective detection signals to prevent an error failing to detect an anisotropic defect.

Abstract translation: 表面缺陷检查装置被构造成添加多方向检测的散射光的检测信号以检测微小的缺陷，并且分别处理各个检测信号以防止错误检测各向异性缺陷。

公开(公告)号：US5046847A

公开(公告)日：1991-09-10

申请号：US262573

申请日：1988-10-25

Applicant: Toshihiko Nakata ,  Nobuyuki Akiyama ,  Yoshihiko Yamuchi ,  Mitsuyoshi Koizumi ,  Yoshimasa Oshima

Inventor： Toshihiko Nakata ,  Nobuyuki Akiyama ,  Yoshihiko Yamuchi ,  Mitsuyoshi Koizumi ,  Yoshimasa Oshima

IPC: G01N21/21 ,  G01N21/94 ,  G03F9/00

CPC classification number: G03F9/70 ,  G01N21/94 ,  G01N21/95623 ,  G01N2021/473 ,  G01N21/21

Abstract: A method and apparatus for detecting foreign matter on a sample by illuminating a stripe-shaped region with linearly polarized light. Some of the light reflected by the sample is intercepted by a light intercepting stage, and the rest of the light reflected by the sample, which passes through the light intercepting stage is directed to a detecting optical system, to be detected by a photo-detector. The sample is illuminated obliquely at a predetermined angle with respect to a group of straight lines constituting a primary pattern on the sample. The angle is selected so that the diffraction light reflected by the group of straight lines does not enter the detecting optical system. A polarizing spatial filter using a liquid crystal element may be disposed in a predetermined restricted region in a spacial frequency region, or Fourier transformation plane, within the detecting optical system. The light scattered by the sample may further be separated in the detecting optical system into partial beams having different wave orientation characteristics, which characteristics are detected by a number of one-dimensional solid state imaging elements. The signals are processed by a driver, adder, and quantizer in synchronism with the one-dimensional solid state imaging elements.

Abstract translation: 一种通过用线性偏振光照射条形区域来检测样品上的异物的方法和装置。 由样品反射的一些光被遮光阶段遮挡，并且通过遮光台的由样品反射的其余光指向检测光学系统，由光检测器检测 。 样品相对于构成样品上的主要图案的一组直线以预定角度倾斜照射。 选择该角度使得由直线组反射的衍射光不进入检测光学系统。 使用液晶元件的偏振空间滤光片可以设置在检测光学系统内的空间频率区域或傅立叶变换平面的预定限制区域中。 由样本散射的光可以在检测光学系统中进一步分离成具有不同波取向特性的部分光束，该特征由多个一维固态成像元件检测。 信号由驱动器，加法器和量化器与一维固态成像元件同步处理。

公开(公告)号：US20130208271A1

公开(公告)日：2013-08-15

申请号：US13838460

申请日：2013-03-15

Applicant: Yoshimasa OSHIMA ,  Toshiyuki NAKAO ,  Shigeru MATSUI

Inventor： Yoshimasa OSHIMA ,  Toshiyuki NAKAO ,  Shigeru MATSUI

IPC: G01N21/95

CPC classification number: G01N21/9501 ,  G01N2021/4716

Abstract: A surface defect inspection apparatus and method for irradiating a beam multiple times to a same region on a surface of an inspection sample, detecting each scattered light from the same region by detection optical systems individually to produce plural signals, and wherein irradiating the beam includes performing a line illumination of the beam on a line illumination region of the sample surface. The line illumination region is moved in a longitudinal direction at a pitch shorter than a length of the line illumination region in the longitudinal direction.

Abstract translation: 一种表面缺陷检查装置和方法，用于将多个光束照射到检查样品的表面上的相同区域，分别通过检测光学系统检测来自相同区域的每个散射光以产生多个信号，并且其中照射光束包括执行 在样品表面的线照射区域上的光束的线照明。 线照明区域沿纵向方向以比线照明区域的长度方向的长度短的间距移动。

公开(公告)号：US20130107247A1

公开(公告)日：2013-05-02

申请号：US13672742

申请日：2012-11-09

Applicant: Akira Hamamatsu ,  Yoshimasa Oshima ,  Shunji Maeda ,  Hisae Shibuya ,  Yuta Urano ,  Toshiyuki Nakao ,  Shigenobu Maruyama

Inventor： Akira Hamamatsu ,  Yoshimasa Oshima ,  Shunji Maeda ,  Hisae Shibuya ,  Yuta Urano ,  Toshiyuki Nakao ,  Shigenobu Maruyama

IPC: G01B11/30

CPC classification number: G01B11/303 ,  G01N21/47 ,  G01N21/94 ,  G01N21/9501

Abstract: An inspecting method and apparatus for inspecting a substrate surface includes illuminating a light to the substrate surface having a film, detection of a scattered light or reflected light from a plurality of positions of the substrate surface to obtain a plurality of electrical signals, comparison of the plurality of electrical signals and a database which indicates a relationship between the electrical signals and surface roughness, and calculation of a surface roughness value based on the result of comparison.

Abstract translation: 用于检查基板表面的检查方法和装置包括将光照射到具有膜的基板表面，从基板表面的多个位置检测散射光或反射光以获得多个电信号， 多个电信号和指示电信号和表面粗糙度之间的关系的数据库，以及基于比较结果的表面粗糙度值的计算。

公开(公告)号：US20120008138A1

公开(公告)日：2012-01-12

申请号：US13221314

申请日：2011-08-30

Applicant: Yoshimasa OSHIMA ,  Toshiyuki NAKAO ,  Shigeru MATSUI

Inventor： Yoshimasa OSHIMA ,  Toshiyuki NAKAO ,  Shigeru MATSUI

IPC: G01N21/88

CPC classification number: G01N21/9501 ,  G01N2021/4716

Abstract: A surface defect inspection apparatus and method for irradiating a beam multiple times to a same region on a surface of an inspection sample, detecting each scattered light from the same region by detection optical systems individually to produce plural signals, and wherein irradiating the beam includes performing a line illumination of the beam on a line illumination region of the sample surface. The line illumination region is moved in a longitudinal direction at a pitch shorter than a length of the line illumination region in the longitudinal direction.

Abstract translation: 一种表面缺陷检查装置和方法，用于将多个光束照射到检查样品的表面上的相同区域，分别通过检测光学系统检测来自相同区域的每个散射光以产生多个信号，并且其中照射光束包括执行 在样品表面的线照射区域上的光束的线照明。 线照明区域沿纵向方向以比线照明区域的长度方向的长度短的间距移动。

公开(公告)号：US20110128534A1

公开(公告)日：2011-06-02

申请号：US13021076

申请日：2011-02-04

Applicant: Toshiyuki NAKAO ,  Yoshimasa OSHIMA ,  Yuta URANO

Inventor： Toshiyuki NAKAO ,  Yoshimasa OSHIMA ,  Yuta URANO

IPC: G01N21/47

CPC classification number: G01N21/9501 ,  G01N2021/887

Abstract: A method and apparatus for inspecting a defect of a surface of a sample in which a laser beam is irradiated on a sample surface so that at least a part of an illumination field of the laser beam illuminates a first area of the sample surface, a plurality of scattered light rays from the first area caused by the irradiation in the irradiating is detected, errors of inclination of an illumination apparatus and a sensor for the plurality of scattered light rays detected are corrected, the plurality of scattered light rays corrected is at least one of added and averaged, a defect on the sample surface based on the plurality of scattered light rays in accordance with the correcting of errors of inclination of the illumination apparatus and the sensor is determined.

Abstract translation: 一种用于检查其中激光束照射在样品表面上的样品表面的缺陷的方法和装置，使得激光束的照明场的至少一部分照射样品表面的第一区域，多个 检测由照射中的照射引起的来自第一区域的散射光线，校正了用于所检测的多个散射光线的照明装置和传感器的倾斜误差，校正的多个散射光线为至少一个 并且根据照明装置和传感器的倾斜误差的校正，基于多个散射光线在样品表面上的缺陷被确定。