Vacuum deposition facility and method for coating a substrate

    公开(公告)号:US12139784B2

    公开(公告)日:2024-11-12

    申请号:US16770872

    申请日:2018-12-11

    Applicant: ArcelorMittal

    Abstract: A vacuum deposition facility for continuously depositing, on a running substrate, coatings formed from metal or metal alloy, and including: a central casing including a vapor jet coater, the inner walls of the central casing being suited to be heated at a temperature above the condensation temperature of the metal or metal alloy vapors, a vapor trap located at the substrate exit of the central casing, the inner walls of the vapor trap being suited to be maintained at a temperature below the condensation temperature of the metal or metal alloy vapors, the passage linking the central casing to the vapor trap including at least one thermal connector extending at least from the inner walls of the central casing to the inner walls of the vapor trap.

Patent Agency Ranking