公开(公告)号：US11874608B2

公开(公告)日：2024-01-16

申请号：US17283722

申请日：2019-10-21

Applicant: ASML Netherlands B.V.

Inventor： Yue Ma ,  Dzmitry Labetski ,  Andrew David LaForge

IPC: G03F7/00 ,  H05G2/00

CPC classification number: G03F7/70858 ,  G03F7/70033 ,  H05G2/008

Abstract: Disclosed is a source for and method of generating extreme ultraviolet radiation in which spitting of molten target material is hindered through depletion of the number of hydrogen radicals available to enter deposits of molten target material and create hydrogen bubbles therein by introducing an active gas that reacts with the hydrogen radicals.

公开(公告)号：US20210325791A1

公开(公告)日：2021-10-21

申请号：US17283722

申请日：2019-10-21

Applicant: ASML Netherlands B.V.

Inventor： Yue Ma ,  Dzmitry Labetski ,  Andrew David LaForge

IPC: G03F7/20 ,  H05G2/00

Abstract: Disclosed is a source for and method of generating extreme ultraviolet radiation in which spitting of molten target material is hindered through depletion of the number of hydrogen radicals available to enter deposits of molten target material and create hydrogen bubbles therein by introducing an active gas that reacts with the hydrogen radicals.

公开(公告)号：US10955749B2

公开(公告)日：2021-03-23

申请号：US16469689

申请日：2018-01-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Dzmitry Labetski ,  Christianus Wilhelmus Johannes Berendsen ,  Rui Miguel Duarte Rodriges Nunes ,  Alexander Igorevich Ershov ,  Kornelis Frits Feenstra ,  Igor Vladimirovich Fomenkov ,  Klaus Martin Hummler ,  Arun Johnkadaksham ,  Matthias Kraushaar ,  Andrew David Laforge ,  Marc Guy Langlois ,  Maksim Loginov ,  Yue Ma ,  Seyedmohammad Mojab ,  Kerim Nadir ,  Alexander Shatalov ,  John Tom Stewart, IV ,  Henricus Gerardus Tegenbosch ,  Chunguang Xia

IPC: G03F7/20 ,  H05G2/00

Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.

公开(公告)号：US09715174B2

公开(公告)日：2017-07-25

申请号：US14443965

申请日：2013-10-30

Applicant: ASML Netherlands B.V.

Inventor： Johan Frederik Dijksman ,  Ramin Badie ,  Ronald Johannes Hultermans ,  Dzmitry Labetski

IPC: G03B27/54 ,  G03F7/20 ,  H05G2/00 ,  B05B17/06

CPC classification number: G03F7/70033 ,  B05B17/06 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: A droplet generator, for an EUV radiation source, comprises: a capillary in which, in use, molten material flows; an actuator configured to modulate a pressure inside the capillary; and a controller configured to drive the actuator at a driving frequency; wherein the droplet generator is arranged such that, in use, the driving frequency is equal or about equal to a main resonance frequency of the molten material in the capillary.