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15 条记录 (耗时 0.019 秒)

    COLLECTOR FLOW RING
    2.
    发明申请
    COLLECTOR FLOW RING 有权

    公开(公告)号：US20230010251A1

    公开(公告)日：2023-01-12

    申请号：US17784951

    申请日：2020-12-09

    申请人： ASML Netherlands B.V.

    发明人： Taylor John Hartung ,  Yue Ma ,  Marc Guy Langlois ,  Jeremy Burke ,  Esteban Joseph Sandoval Johnson

    IPC分类号： G03F7/20

    摘要： Systems, apparatuses, and methods are provided for a collector flow ring (CFR) housing configured to mitigate an accumulation of fuel debris in an extreme ultraviolet (EUV) radiation system. An example CFR housing can include a plurality of showerhead flow channel outlets configured to output a plurality of first gaseous fluid flows over a plurality of portions of a plasma-facing surface of the CFR housing. The example CFR housing can further include a gutter purge flow channel outlet configured to output a second gaseous fluid flow over a fuel debris-receiving surface of the CFR housing. The example CFR housing can further include a shroud mounting structure configured to support a shroud assembly, a cooling flow channel configured to transport a fluid, and a plurality of optical metrology ports configured to receive a plurality of optical metrology tubes.

    Collector flow ring
    6.
    发明授权
    Collector flow ring 有权

    公开(公告)号：US11740565B2

    公开(公告)日：2023-08-29

    申请号：US17784951

    申请日：2020-12-09

    申请人： ASML Netherlands B.V.

    发明人： Taylor John Hartung ,  Yue Ma ,  Marc Guy Langlois ,  Jeremy Burke ,  Esteban Joseph Sandoval Johnson

    IPC分类号： G03F7/20 ,  G03F7/00

    CPC分类号： G03F7/70916 ,  G03F7/70033 ,  G03F7/7085 ,  G03F7/70808

    摘要： Systems, apparatuses, and methods are provided for a collector flow ring (CFR) housing configured to mitigate an accumulation of fuel debris in an extreme ultraviolet (EUV) radiation system. An example CFR housing can include a plurality of showerhead flow channel outlets configured to output a plurality of first gaseous fluid flows over a plurality of portions of a plasma-facing surface of the CFR housing. The example CFR housing can further include a gutter purge flow channel outlet configured to output a second gaseous fluid flow over a fuel debris-receiving surface of the CFR housing. The example CFR housing can further include a shroud mounting structure configured to support a shroud assembly, a cooling flow channel configured to transport a fluid, and a plurality of optical metrology ports configured to receive a plurality of optical metrology tubes.

    CLEANING A STRUCTURE SURFACE IN AN EUV CHAMBER
    8.
    发明申请
    CLEANING A STRUCTURE SURFACE IN AN EUV CHAMBER 有权

    公开(公告)号：US20220179328A1

    公开(公告)日：2022-06-09

    申请号：US17680784

    申请日：2022-02-25

    申请人： ASML Netherlands B.V.

    发明人： Chunguang Xia ,  Jonghoon Baek ,  John Tom Stewart, IV ,  Andrew David LaForge ,  Deniz Van Heijnsbergen ,  David Robert Evans ,  Nina Vladimirovna Dziomkina ,  Yue Ma

    IPC分类号： G03F7/20 ,  H01J37/32 ,  H05G2/00 ,  H05H1/46

    摘要： In some general aspects, a surface of a structure within a chamber of an extreme ultraviolet (EUV) light source is cleaned using a method. The method includes generating a plasma state of a material that is present at a location adjacent to a non-electrically conductive body that is within the chamber. The generation of the plasma state of the material includes electromagnetically inducing an electric current at the location adjacent the non-electrically conductive body to thereby transform the material that is adjacent the non-electrically conductive body from a first state into the plasma state. The plasma state of the material includes plasma particles, at least some of which are free radicals of the material. The method also includes enabling the plasma particles to pass over the structure surface to remove debris from the structure surface without removing the structure from the chamber of the EUV light source.