公开(公告)号：US11822252B2

公开(公告)日：2023-11-21

申请号：US17155951

申请日：2021-01-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Dzmitry Labetski ,  Christianus Wilhelmus Johannes Berendsen ,  Rui Miguel Duarte Rodreigues Nunes ,  Alexander Igorevich Ershov ,  Kornelis Frits Feenstra ,  Igor Vladimirovich Fomenkov ,  Klaus Martin Hummler ,  Arun Johnkadaksham ,  Matthias Kraushaar ,  Andrew David Laforge ,  Marc Guy Langlois ,  Maksim Loginov ,  Yue Ma ,  Seyedmohammad Mojab ,  Kerim Nadir ,  Alexander Shatalov ,  John Tom Stewart ,  Henricus Gerardus Tegenbosch ,  Chunguang Xia

IPC: G03F7/00 ,  H05G2/00

CPC classification number: G03F7/70033 ,  G03F7/70916 ,  H05G2/003 ,  H05G2/008

Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.

公开(公告)号：US10222701B2

公开(公告)日：2019-03-05

申请号：US15024815

申请日：2014-09-18

Applicant: ASML Netherlands B.V.

Inventor： Chuangxin Zhao ,  Sander Baltussen ,  Pär Mårten Lukas Broman ,  Richard Joseph Bruls ,  Cristian Bogdan Craus ,  Jan Groenewold ,  Dzmitry Labetski ,  Kerim Nadir ,  Hendrikus Gijsbertus Schimmel ,  Christian Felix Wählisch

IPC: G03B27/42 ,  G03F7/20 ,  H05G2/00

Abstract: A radiation source for a lithographic apparatus, in particular a laser-produced plasma source includes a fan unit surrounding but not obstructing the collected radiation beam that is operated to generate a flow in a buffer gas away from the optical axis. The fan unit can include a plurality of flat or curved blades generally parallel to the optical axis and driven to rotate about the optical axis.

公开(公告)号：US10955749B2

公开(公告)日：2021-03-23

申请号：US16469689

申请日：2018-01-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Dzmitry Labetski ,  Christianus Wilhelmus Johannes Berendsen ,  Rui Miguel Duarte Rodriges Nunes ,  Alexander Igorevich Ershov ,  Kornelis Frits Feenstra ,  Igor Vladimirovich Fomenkov ,  Klaus Martin Hummler ,  Arun Johnkadaksham ,  Matthias Kraushaar ,  Andrew David Laforge ,  Marc Guy Langlois ,  Maksim Loginov ,  Yue Ma ,  Seyedmohammad Mojab ,  Kerim Nadir ,  Alexander Shatalov ,  John Tom Stewart, IV ,  Henricus Gerardus Tegenbosch ,  Chunguang Xia

IPC: G03F7/20 ,  H05G2/00

Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.