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公开(公告)号：US10222701B2
公开(公告)日：2019-03-05
申请号：US15024815
申请日：2014-09-18
Applicant: ASML Netherlands B.V.
Inventor： Chuangxin Zhao , Sander Baltussen , Pär Mårten Lukas Broman , Richard Joseph Bruls , Cristian Bogdan Craus , Jan Groenewold , Dzmitry Labetski , Kerim Nadir , Hendrikus Gijsbertus Schimmel , Christian Felix Wählisch
Abstract: A radiation source for a lithographic apparatus, in particular a laser-produced plasma source includes a fan unit surrounding but not obstructing the collected radiation beam that is operated to generate a flow in a buffer gas away from the optical axis. The fan unit can include a plurality of flat or curved blades generally parallel to the optical axis and driven to rotate about the optical axis.
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2.发明申请DROPLET GENERATOR, EUV RADIATION SOURCE, LITHOGRAPHIC APPARATUS, METHOD FOR GENERATING DROPLETS AND DEVICE MANUFACTURING METHOD 有权DROPLET发生器，EUV辐射源，光刻设备，用于产生DROPLETS的方法和设备制造方法公开(公告)号：US20150293456A1
公开(公告)日：2015-10-15
申请号：US14443965
申请日：2013-10-30
Applicant: ASML NETHERLANDS B.V.
Inventor： Johan Frederik Dijksman , Ramin Badie , Ronald Johannes Hultermans , Dzmitry Labetski
CPC classification number: G03F7/70033 , B05B17/06 , H05G2/005 , H05G2/006 , H05G2/008
Abstract: A droplet generator, for an EUV radiation source, comprises: a capillary in which, in use, molten material flows; an actuator configured to modulate a pressure inside the capillary; and a controller configured to drive the actuator at a driving frequency; wherein the droplet generator is arranged such that, in use, the driving frequency is equal or about equal to a main resonance frequency of the molten material in the capillary.
Abstract translation: 用于EUV辐射源的液滴发生器包括：毛细管，其中在使用中熔融材料流动; 构造成调节毛细管内的压力的致动器; 以及控制器，其构造成以驱动频率驱动所述致动器; 其中所述液滴发生器被布置为使得在使用中，所述驱动频率等于或大致等于所述毛细管中的熔融材料的主共振频率。
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公开(公告)号：US11822252B2
公开(公告)日：2023-11-21
申请号：US17155951
申请日：2021-01-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Dzmitry Labetski , Christianus Wilhelmus Johannes Berendsen , Rui Miguel Duarte Rodreigues Nunes , Alexander Igorevich Ershov , Kornelis Frits Feenstra , Igor Vladimirovich Fomenkov , Klaus Martin Hummler , Arun Johnkadaksham , Matthias Kraushaar , Andrew David Laforge , Marc Guy Langlois , Maksim Loginov , Yue Ma , Seyedmohammad Mojab , Kerim Nadir , Alexander Shatalov , John Tom Stewart , Henricus Gerardus Tegenbosch , Chunguang Xia
CPC classification number: G03F7/70033 , G03F7/70916 , H05G2/003 , H05G2/008
Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.
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公开(公告)号：US20170322499A1
公开(公告)日：2017-11-09
申请号：US15661888
申请日：2017-07-27
Applicant: ASML Netherlands B.V.
Inventor： Michel RIEPEN , Dzmitry Labetski , Wilbert Jan Mestrom , Wim Ronald Kampinga , Jan Okke Nieuwenkamp , Jacob Brinkert , Henricus Jozef Castelijns , Nicolaas Ten Kate , Hendrikus Gijsbertus Schimmel , Hans Jansen , Dennis Jozef Maria Paulussen , Brian Vernon Virgo , Reinier Theodorus Martinus Jilisen , Ramin Badie , Albert Pieter Rijpma , Johannes Christiaan Leonardus Franken , Peter Van Putten , Gerrit Van Der Straaten
CPC classification number: G03F7/70983 , F15D1/0065 , G03F7/70008 , G03F7/70033 , G03F7/70916 , G21K1/06 , G21K5/08 , H05G2/005 , H05G2/008 , Y10T137/206
Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.
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公开(公告)号：US09753383B2
公开(公告)日：2017-09-05
申请号：US14409048
申请日：2013-06-13
Applicant: ASML Netherlands B.V.
Inventor： Michel Riepen , Dzmitry Labetski , Wilbert Jan Mestrom , Wim Ronald Kampinga , Jan Okke Nieuwenkamp , Jacob Brinkert , Henricus Jozef Castelijns , Nicolaas Ten Kate , Hendrikus Gijsbertus Schimmel , Hans Jansen , Dennis Jozef Maria Paulussen , Brian Vernon Virgo , Reinier Theodorus Martinus Jilisen , Ramin Badie , Albert Pieter Rijpma , Johannes Christiaan Leonardus Franken , Peter Van Putten , Gerrit Van Der Straaten
CPC classification number: G03F7/70983 , F15D1/0065 , G03F7/70033 , G03F7/70916 , G21K1/06 , G21K5/08 , H05G2/005 , H05G2/008 , Y10T137/206
Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.
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Patent Agency Ranking
6.发明公开公开(公告)号：US20240103387A1
公开(公告)日：2024-03-28
申请号：US18528933
申请日：2023-12-05
Applicant: ASML Netherlands B.V.
Inventor： Yue Ma , Dzmitry Labetski , Andrew David LaForge
CPC classification number: G03F7/70858 , G03F7/70033 , H05G2/008
Abstract: Disclosed is a source for and method of generating extreme ultraviolet radiation in which spitting of molten target material is hindered through depletion of the number of hydrogen radicals available to enter deposits of molten target material and create hydrogen bubbles therein by introducing an active gas that reacts with the hydrogen radicals.
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公开(公告)号：US09671698B2
公开(公告)日：2017-06-06
申请号：US14380217
申请日：2013-01-22
Applicant: ASML Netherlands B.V.
Inventor： Hendrikus Gijsbertus Schimmel , Dzmitry Labetski
CPC classification number: G03F7/70033 , B05B1/02 , H05G2/005 , H05G2/006 , H05G2/008 , Y10T137/0391 , Y10T137/218
Abstract: A fuel stream generator comprising a nozzle connected to a fuel reservoir, wherein the nozzle is provided with a gas inlet configured to provide a sheath of gas around fuel flowing along the nozzle is disclosed. Also disclosed are a method of generating fuel droplets and a lithography apparatus incorporating the fuel stream generator.
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公开(公告)号：US10394141B2
公开(公告)日：2019-08-27
申请号：US15661888
申请日：2017-07-27
Applicant: ASML Netherlands B.V.
Inventor： Michel Riepen , Dzmitry Labetski , Wilbert Jan Mestrom , Wim Ronald Kampinga , Jan Okke Nieuwenkamp , Jacob Brinkert , Henricus Jozef Castelijns , Nicolaas Ten Kate , Hendrikus Gijsbertus Schimmel , Hans Jansen , Dennis Jozef Maria Paulussen , Brian Vernon Virgo , Reinier Theodorus Martinus Jilisen , Ramin Badie , Albert Pieter Rijpma , Johannes Christiaan Leonardus Franken , Peter Van Putten , Gerrit Van Der Straaten
Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.
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公开(公告)号：US09363879B2
公开(公告)日：2016-06-07
申请号：US14532897
申请日：2014-11-04
Applicant: ASML NETHERLANDS B.V.
Inventor： Tjarko Adriaan Rudolf Van Empel , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van de Vijver , Gerardus Hubertus Petrus Maria Swinkels , Hendrikus Gijsbertus Schimmel , Dzmitry Labetski
CPC classification number: H05G2/008 , G03F7/70175 , G03F7/70891 , G03F7/70916 , G03F7/70983 , H05G2/003 , H05G2/006 , H05K7/2039
Abstract: A module for producing extreme ultraviolet radiation, including an extreme ultraviolet radiation-emitting source, the source being provided with a supply configured to supply a fluid of an ignition material to a predetermined target ignition position and a target-igniting mechanism constructed and arranged to produce a plasma from the ignition material at the target ignition position, the plasma emitting the extreme ultraviolet radiation; a collector mirror constructed and arranged to focus radiation emitted by the plasma at a focal point; and a heat sink having a thermal energy-diverting surface constructed and arranged to divert thermal energy away from the target ignition position, wherein the heat sink is located at a position proximate the target ignition position.
Abstract translation: 一种用于产生极紫外辐射源的模块，包括极紫外辐射发射源，该源提供有被配置为将点火材料的流体供应到预定的目标点火位置的供应，以及构造和布置以产生的点火机构 来自点火材料的等离子体在目标点火位置，等离子体发射极紫外线辐射; 收集器镜，构造和布置成将等离子体发射的辐射聚焦在焦点处; 以及散热器，其具有构造和布置成将热能转移离开目标点火位置的热能转向表面，其中散热器位于靠近目标点火位置的位置。
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10.发明申请Fuel Stream Generator, Source Collector Apparatus and Lithographic Apparatus 有权燃料流发生器，源收集器装置和平版印刷装置公开(公告)号：US20150029478A1
公开(公告)日：2015-01-29
申请号：US14380217
申请日：2013-01-22
Applicant: ASML Netherlands B.V.
Inventor： Hendrikus Gijsbertus Schimmel , Dzmitry Labetski
CPC classification number: G03F7/70033 , B05B1/02 , H05G2/005 , H05G2/006 , H05G2/008 , Y10T137/0391 , Y10T137/218
Abstract: A fuel stream generator comprising a nozzle connected to a fuel reservoir, wherein the nozzle is provided with a gas inlet configured to provide a sheath of gas around fuel flowing along the nozzle is disclosed. Also disclosed are a method of generating fuel droplets and a lithography apparatus incorporating the fuel stream generator.
Abstract translation: 公开了一种燃料流发生器，其包括连接到燃料储存器的喷嘴，其中所述喷嘴设置有气体入口，所述气体入口构造成围绕沿着所述喷嘴流动的燃料提供气体护套。 还公开了一种产生燃料液滴的方法和包含燃料流发生器的光刻设备。
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