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公开(公告)号：US11822252B2
公开(公告)日：2023-11-21
申请号：US17155951
申请日：2021-01-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Dzmitry Labetski , Christianus Wilhelmus Johannes Berendsen , Rui Miguel Duarte Rodreigues Nunes , Alexander Igorevich Ershov , Kornelis Frits Feenstra , Igor Vladimirovich Fomenkov , Klaus Martin Hummler , Arun Johnkadaksham , Matthias Kraushaar , Andrew David Laforge , Marc Guy Langlois , Maksim Loginov , Yue Ma , Seyedmohammad Mojab , Kerim Nadir , Alexander Shatalov , John Tom Stewart , Henricus Gerardus Tegenbosch , Chunguang Xia
CPC classification number: G03F7/70033 , G03F7/70916 , H05G2/003 , H05G2/008
Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.
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公开(公告)号：US20210263422A1
公开(公告)日：2021-08-26
申请号：US17277027
申请日：2019-08-12
Applicant: ASML Netherlands B.V.
Inventor： Robert Jay Rafac , Igor Vladimirovich Fomenkov
Abstract: Disclosed is a system and method for generating EUV radiation in which a laser is used in a multistage process to illuminate without altering a target material and then irradiate the target material to alter a target material with the illumination stage being used to determine the timing for firing during the irradiation stage or stages.
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公开(公告)号：US12078934B2
公开(公告)日：2024-09-03
申请号：US17277027
申请日：2019-08-12
Applicant: ASML Netherlands B.V.
Inventor： Robert Jay Rafac , Igor Vladimirovich Fomenkov
CPC classification number: G03F7/70133 , G03F7/70025 , G03F7/70033 , G03F7/70041 , G03F7/70558 , H05G2/008
Abstract: Disclosed is a system and method for generating EUV radiation in which a laser is used in a multistage process to illuminate without altering a target material and then irradiate the target material to alter a target material with the illumination stage being used to determine the timing for firing during the irradiation stage or stages.
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公开(公告)号：US20220291591A1
公开(公告)日：2022-09-15
申请号：US17715641
申请日：2022-04-07
Applicant: ASML Netherlands B.V.
Inventor： Yue Ma , Antonius Theodorus Wilhelmus Kempen , Klaus Martin Hummler , Johannes Hubertus Josephina Moors , Jeroen Hubert Rommers , Hubertus Johannes Van De Wiel , Andrew David Laforge , Fernando Brizuela , Rob Carlo Wieggers , Umesh Prasad Gomes , Elena Nedanovska , Celal Korkmaz , Alexander Downn Kim , Rui Miguel Duarte Rodrigues Nunes , Hendrikus Alphonsus Ludovicus Van Dijck , William Peter Van Drent , Peter Gerardus Jonkers , Qiushi Zhu , Parham Yaghoobi , Jan Steven Christiaan Westerlaken , Martinus Hendrikus Antonius Leenders , Alexander Igorevich Ershov , Igor Vladimirovich Fomenkov , Fei Liu , Johannes Henricus Wilhelmus Jacobs , Alexey Sergeevich Kuznetsov
IPC: G03F7/20
Abstract: Degradation of the reflectivity of one or more reflective optical elements in a system for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.
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公开(公告)号：US11340532B2
公开(公告)日：2022-05-24
申请号：US16977360
申请日：2019-02-28
Applicant: ASML Netherlands B.V.
Inventor： Yue Ma , Antonius Theodorus Wilhelmus Kempen , Klaus Martin Hummler , Johannes Hubertus Josephina Moors , Jeroen Hubert Rommers , Hubertus Johannes Van De Wiel , Andrew David Laforge , Fernando Brizuela , Rob Carlo Wieggers , Umesh Prasad Gomes , Elena Nedanovska , Celal Korkmaz , Alexander Downn Kim , Rui Miguel Duarte Rodrigues Nunes , Hendrikus Alphonsus Ludovicus Van Dijck , William Peter Van Drent , Peter Gerardus Jonkers , Qiushi Zhu , Parham Yaghoobi , Jan Steven Christiaan Westerlaken , Martinus Hendrikus Antonius Leenders , Alexander Igorevich Ershov , Igor Vladimirovich Fomenkov , Fei Liu , Johannes Henricus Wilhelmus Jacobs , Alexey Sergeevich Kuznetsov
IPC: G03F7/20
Abstract: Degradation of the reflectivity of one or more reflective optical elements in a system (SO) for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber (26) containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.
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Patent Agency Ranking
公开(公告)号：US20220151052A1
公开(公告)日：2022-05-12
申请号：US17583799
申请日：2022-01-25
Applicant: ASML Netherlands B.V.
Inventor： Michael Anthony Purvis , Klaus Martin Hummler , Chengyuan Ding , Robert Jay Rafac , Igor Vladimirovich Fomenkov
Abstract: An amplified optical beam is provided to a region that receives a target including target material, an interaction between the amplified optical beam and the target converting at least some of the target material from a first form to a second form to form a light-emitting plasma; first data comprising information related to the amplified optical beam is accessed; second data comprising information related to the light-emitting plasma is accessed; and an amount of the target material converted from the first form to the second form is determined. The determination is based on at least the first data and the second data, and the second form of the target material is less dense than the first form of the target material.
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公开(公告)号：US20160029471A1
公开(公告)日：2016-01-28
申请号：US14874164
申请日：2015-10-02
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Robert Jay Rafac , Igor Vladimirovich Fomenkov , Daniel John William Brown , Daniel James Golich
IPC: H05G2/00
Abstract: Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.
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公开(公告)号：US20220192000A1
公开(公告)日：2022-06-16
申请号：US17433007
申请日：2020-03-02
Applicant: ASML Netherlands B.V.
Inventor： Igor Vladimirovich Fomenkov , Yezheng Tao , Robert Jay Rafac
Abstract: Disclosed is an apparatus and a method in which multiple, e.g., two or more pulses from a single laser source are applied to source material prior to application of a main ionizing pulse in which the multiple pulses are generated by a common laser source. The first pulse is directed towards the source material when the source material is at a first position and the second pulse is directed towards the source material when the source material is at a second position.
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公开(公告)号：US11266002B2
公开(公告)日：2022-03-01
申请号：US16756185
申请日：2018-10-19
Applicant: ASML Netherlands B.V.
Inventor： Michael Anthony Purvis , Klaus Martin Hummler , Chengyuan Ding , Robert Jay Rafac , Igor Vladimirovich Fomenkov
Abstract: An amplified optical beam is provided to a region that receives a target including target material, an interaction between the amplified optical beam and the target converting at least some of the target material from a first form to a second form to form a light-emitting plasma; first data comprising information related to the amplified optical beam is accessed; second data comprising information related to the light-emitting plasma is accessed; and an amount of the target material converted from the first form to the second form is determined. The determination is based on at least the first data and the second data, and the second form of the target material is less dense than the first form of the target material.
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公开(公告)号：US20210109452A1
公开(公告)日：2021-04-15
申请号：US16977360
申请日：2019-02-28
Applicant: ASML Netherlands B.V.
Inventor： Yue Ma , Antonius Theodorus Wilhelmus Kempen , Klaus Martin Hummler , Johannes Hubertus Josephina Moors , Jeroen Hubert Rommers , Hubertus Johannes Van De Wiel , Andrew David Laforge , Fernando Brizuela , Rob Carlo Wieggers , Umesh Prasad Gomes , Elena Nedanovska , Celal Korkmaz , Alexander Downn Kim , Rui Miguel Duarte Rodrigues Nunes , Hendrikus Alphonsus Ludovicus Van Dijck , William Peter Van Drent , Peter Gerardus Jonkers , Qiushi Zhu , Parham Yaghoobi , Jan Steven Christiaan Westerlaken , Martinus Hendrikus Antonius Leenders , Alexander Igorevich Ershov , Igor Vladimirovich Fomenkov , Fei Liu , Johannes Henricus Wilhelmus Jacobs , Alexey Sergeevich Kuznetsov
IPC: G03F7/20
Abstract: Degradation of the reflectivity of one or more reflective optical elements in a system (SO) for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber (26) containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.
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