公开(公告)号：US20160231655A1

公开(公告)日：2016-08-11

申请号：US15131986

申请日：2016-04-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis LAFARRE ,  Nina Vladimirovna DZIOMKINA ,  Yogesh Pramod KARADE ,  Elisabeth Corinne RODENBURG ,  Peter VAN DELFT

IPC: G03F7/20 ,  B05D1/00

CPC classification number: G03F7/70716 ,  B05D1/005 ,  G03F7/70341 ,  G03F7/70691 ,  G03F7/707

Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The planarization layer is of substantially uniform thickness and/or its outer surface has a peak to valley distance of less than 10 μm. The planarization layer may be formed by applying two solutions of different concentration. A surface treatment may be applied to the burls to repel a solution of the planarization layer material.

Abstract translation: 用于光刻设备的衬底保持器具有设置在其表面上的平坦化层。 平坦化层为形成电子部件的薄膜叠层的形成提供光滑的表面。 平坦化层具有基本均匀的厚度和/或其外表面具有小于10μm的峰谷距离。 可以通过施加不同浓度的两种溶液来形成平坦化层。 表面处理可以施加到毛圈以排斥平坦化层材料的溶液。

公开(公告)号：US20150037595A1

公开(公告)日：2015-02-05

申请号：US14514019

申请日：2014-10-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Nina Vladimirovna DZIOMKINA

IPC: G03F7/20

CPC classification number: G03F7/7095 ,  G03F7/2041 ,  G03F7/2043 ,  G03F7/70341 ,  G03F7/70958

Abstract: A coating is disclosed. The coating may be used in an apparatus having a radiation source, e.g. a lithographic apparatus. The coating comprises the elements Si, O, F and, optionally, C and H. An article is also disclosed. The article may be any one of the group consisting of a substrate table, an optical element, a shutter member, a sensor, a projection system, and a confinement structure. At least a portion of a surface of the article is coated with a coating. The coating comprises the elements Si, O, F and, optionally, C and H. The coating may comprise the elements Si, O, C and H.

公开(公告)号：US20210278772A1

公开(公告)日：2021-09-09

申请号：US17313054

申请日：2021-05-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis LAFARRE ,  Nicolaas TEN KATE ,  Nina Vladimirovna DZIOMKINA ,  Yogesh Pramod KARADE

IPC: G03F7/20 ,  H01L21/687 ,  C23C16/44

Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.

公开(公告)号：US20210114101A1

公开(公告)日：2021-04-22

申请号：US17138480

申请日：2020-12-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis LAFARRE ,  Sjoerd Nicolaas Lambertus DONDERS ,  Nicolaas TEN KATE ,  Nina Vladimirovna DZIOMKINA ,  Yogesh Pramod KARADE ,  Elisabeth Corinne RODENBURG

IPC: B22F7/06 ,  B23K26/354 ,  B23K26/342 ,  G03F7/20 ,  B22F10/00 ,  B23Q3/18 ,  B05D3/06 ,  B05D5/00 ,  B33Y10/00 ,  B33Y80/00

Abstract: A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.

公开(公告)号：US20170312826A1

公开(公告)日：2017-11-02

申请号：US15654413

申请日：2017-07-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis LAFARRE ,  Sjoerd Nicolaas Lambertus DONDERS ,  Nicolaas TEN KATE ,  Nina Vladimirovna DZIOMKINA ,  Yogesh Pramod KARADE ,  Elisabeth Corinne RODENBURG

IPC: B22F7/06 ,  B33Y10/00 ,  G03F7/20 ,  B23Q3/18 ,  B23K26/00 ,  B22F3/105 ,  B05D5/00 ,  B05D3/06 ,  B23K26/342 ,  B33Y80/00

CPC classification number: B22F7/062 ,  B05D3/06 ,  B05D5/00 ,  B22F3/1055 ,  B23K26/342 ,  B23K26/354 ,  B23Q3/18 ,  B33Y10/00 ,  B33Y80/00 ,  G03F7/20 ,  G03F7/70341 ,  G03F7/70416 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70716 ,  G03F7/70733 ,  G03F7/708

Abstract: An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object is formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.

公开(公告)号：US20170036272A1

公开(公告)日：2017-02-09

申请号：US15296968

申请日：2016-10-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis LAFARRE ,  Sjoerd Nicolaas Lambertus DONDERS ,  Nicolaas TEN KATE ,  Nina Vladimirovna DZIOMKINA ,  Yogesh Pramod KARADE ,  Elisabeth Corinne RODENBURG

IPC: B22F7/06 ,  B33Y80/00 ,  B33Y10/00 ,  G03F7/20 ,  B22F3/105

CPC classification number: B22F7/062 ,  B05D3/06 ,  B05D5/00 ,  B22F3/1055 ,  B23K26/342 ,  B23K26/354 ,  B23Q3/18 ,  B33Y10/00 ,  B33Y80/00 ,  G03F7/20 ,  G03F7/70341 ,  G03F7/70416 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70716 ,  G03F7/70733 ,  G03F7/708

Abstract: An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object is formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.

Abstract translation: 用于光刻设备的物体保持器具有具有表面的主体。 在薄膜堆叠的表面上或孔中形成有用于支撑物体的多个毛刺。 通过激光烧结形成至少一个毛刺。 通过激光烧结形成的毛刺中的至少一个可以是先前通过激光烧结形成的损坏的隆起的修复或其他方法。

公开(公告)号：US20160349632A1

公开(公告)日：2016-12-01

申请号：US15233775

申请日：2016-08-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis LAFARRE ,  Nicolaas TEN KATE ,  Nina Vladimirovna DZIOMKINA ,  Yogesh Pramod KARADE

IPC: G03F7/20 ,  C23C16/44

CPC classification number: G03F7/70716 ,  C23C16/44 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70975 ,  H01L21/6875 ,  Y10T29/49

Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.

Abstract translation: 用于光刻设备的衬底保持器具有设置在其表面上的平坦化层。 平坦化层提供用于形成诸如薄膜电子部件的电子部件的光滑表面。 平坦化层可以设置在多个子层中。 平坦化层可以平滑超过由坯料去除材料而形成的粗糙度，以在衬底保持器上形成毛刺。

公开(公告)号：US20160170314A1

公开(公告)日：2016-06-16

申请号：US15014829

申请日：2016-02-03

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis LAFARRE ,  Nicolaas TEN KATE ,  Nina Vladimirovna DZIOMKINA ,  Yogesh Pramod KARADE ,  Siegfried Alexander TROMP ,  Jacobus Josephus LEIJSSEN ,  Elisabeth Corinne RODENBURG ,  Maurice Wilhelmus Leonardus Hendricus FEIJTS ,  Hendrik HUISMAN

IPC: G03F7/20 ,  B05D3/02

CPC classification number: G03F7/70716 ,  B05D3/02 ,  G01J5/0285 ,  G01J5/20 ,  G03F7/70341 ,  G03F7/70708

Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The thin film stack comprises an (optional) isolation layer, a metal layer forming an electrode, a sensor, a heater, a transistor or a logic device, and a top isolation layer.

Abstract translation: 用于光刻设备的衬底保持器具有设置在其表面上的平坦化层。 平坦化层为形成电子部件的薄膜叠层的形成提供光滑的表面。 薄膜堆叠包括（可选）隔离层，形成电极的金属层，传感器，加热器，晶体管或逻辑器件以及顶部隔离层。