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    Heating and Cooling Systems in a Lithographic Apparatus
    11.
    发明申请
    Heating and Cooling Systems in a Lithographic Apparatus 审中-公开
    光刻设备中的加热和冷却系统

    公开(公告)号：US20150192856A1

    公开(公告)日：2015-07-09

    申请号：US14662138

    申请日：2015-03-18

    Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

    Inventor： Johannes Onvlee ,  Christopher J. Mason ,  Earl William Ebert, JR. ,  Peter A. Delmastro ,  Christopher Charles Ward ,  Thomas Venturino ,  Geoffrey Alan Schultz ,  Daniel Nathan Burbank

    IPC: G03F7/20

    CPC classification number: G03F7/70875 ,  G03F7/708

    Abstract: A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a cooling system and a heating system. The cooling system is configured to direct a gas flow along a first direction across a surface of the patterning device to remove heat from the patterning device prior to exposing the patterning device or during exposure of the patterning device. The heating system is configured to selectively heat areas on the surface of the patterning device prior to exposing the patterning device or during exposure of the patterning device. The selective heating and the heat removal achieve a substantially uniform temperature distribution in the patterning.

    Abstract translation: 讨论了用于控制光刻设备中的图案形成装置的温度的系统。 该系统包括冷却系统和加热系统。 冷却系统被配置为沿着图案形成装置的表面沿着第一方向引导气流，以在暴露图案形成装置之前或在图案形成装置的曝光期间从图案形成装置移除热量。 加热系统被配置为在曝光图案形成装置之前或在图案形成装置的曝光期间选择性地加热图案形成装置的表面上的区域。 选择性加热和除热在图案化中实现基本均匀的温度分布。

    Determining position and curvature information directly from a surface of a patterning device
    14.
    发明授权
    Determining position and curvature information directly from a surface of a patterning device 有权
    从图案形成装置的表面直接确定位置和曲率信息

    公开(公告)号：US09377700B2

    公开(公告)日：2016-06-28

    申请号：US14357514

    申请日：2013-05-31

    Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

    Inventor： Mark Josef Schuster ,  Santiago E. Del Puerto ,  Daniel Nathan Burbank ,  Duncan Walter Bromley ,  Franciscus Godefridus Casper Bijnen

    IPC: G03B27/32 ,  G03B27/62 ,  G03F7/20 ,  G03F1/00 ,  G03F1/38

    CPC classification number: G03F7/70775 ,  G03F1/14 ,  G03F1/142 ,  G03F1/38 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70783 ,  G03F7/7085

    Abstract: Position and curvature information of a patterning device may be determined directly from the patterning device and controlled based on the determined information. In an embodiment, a lithographic apparatus includes a position determining system operative to determine a relative position of the patterning device. The patterning device may be configured to create a patterned radiation beam from a radiation beam incident on a major surface of the patterning device. The patterning device may have a side surface having an edge in common with the major surface. The position determining system may include an interferometer operative to transmit light to the side surface and to receive the transmitted light after the transmitted light has been reflected at the side surface. The position determining system is operative to determine a quantity representative of the relative position of the patterning device from the received reflected transmitted light.

    Abstract translation: 图案形成装置的位置和曲率信息可以直接从图案形成装置确定并基于所确定的信息进行控制。 在一个实施例中，光刻设备包括位置确定系统，其可操作以确定图案形成装置的相对位置。 图案形成装置可以被配置为从入射在图案形成装置的主表面上的辐射束产生图案化的辐射束。 图案形成装置可以具有与主表面共同的边缘的侧表面。 位置确定系统可以包括干涉仪，其操作以将光透射到侧表面，并且在透射光已经在侧表面被反射之后接收透射光。 位置确定系统用于确定代表图案形成装置相对于所接收的反射透射光的相对位置的量。

    Patterning Device Manipulating System and Lithographic Apparatuses
    15.
    发明申请
    Patterning Device Manipulating System and Lithographic Apparatuses 有权
    图案设备操纵系统和平版印刷设备

    公开(公告)号：US20150277241A1

    公开(公告)日：2015-10-01

    申请号：US14437294

    申请日：2013-09-20

    Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

    Inventor： Christiaan Louis Valentin ,  Erik Roelof Loopstra ,  Christopher Charles Ward ,  Daniel Nathan Burbank ,  Mark Josef Schuster ,  Peter James Graffeo

    IPC: G03F7/20

    CPC classification number: G03F7/70783 ,  G03F7/70266 ,  G03F7/70433 ,  G03F7/707 ,  G03F7/70725 ,  G03F7/70758 ,  G03F7/70775 ,  G03F7/70825

    Abstract: A system (300) for supporting an exchangeable object (302) can include a movable structure (304) and an object holder (306) configured to be movable relative to the movable structure. The object holder can be configured to hold the exchangeable object. The system can also include a first actuator assembly (308) and second actuator assembly (316). The first actuator assembly can be configured to apply a force to the object holder to translate the exchangeable object generally along a plane. The second actuator assembly can be configured to apply a bending moment to the object holder. The exchangeable object can be a patterning device of a lithographic apparatus.

    Abstract translation: 用于支撑可更换物体（302）的系统（300）可以包括可移动结构（304）和被配置为相对于可移动结构可移动的物体保持器（306）。 对象保持器可以被配置为保持可更换对象。 系统还可以包括第一致动器组件（308）和第二致动器组件（316）。 第一致动器组件可以被配置成向对象支架施加力，以大致沿着平面平移可交换对象。 第二致动器组件可以被配置为向对象保持器施加弯矩。 可交换对象可以是光刻设备的图案形成装置。

    Reticle clamping device
    16.
    发明授权
    Reticle clamping device 有权

    公开(公告)号：US10761435B2

    公开(公告)日：2020-09-01

    申请号：US16484677

    申请日：2018-01-17

    Applicant: ASML Holding N.V.

    Inventor： Enrico Zordan ,  Brandon Adam Evans ,  Daniel Nathan Burbank ,  Ankur Ramesh Baheti ,  Samir A. Nayfeh

    IPC: G03F7/20

    Abstract: Systems and methods are disclosed that provide a support system in the Z direction for patterning devices that can function under high acceleration and deceleration with minimal effect on travel and hysteresis in the X and Y directions. A reticle clamping system includes a support device and a holding device. The holding device is configured to releasably couple a reticle to the support device. The holding device includes a plurality of burls. The reticle clamping system further includes a metallic support system coupled to the support device. The metallic support system provides a vacuum path from a vacuum channel to the holding device.

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