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公开(公告)号：US20150192856A1
公开(公告)日：2015-07-09
申请号：US14662138
申请日：2015-03-18
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Johannes Onvlee , Christopher J. Mason , Earl William Ebert, JR. , Peter A. Delmastro , Christopher Charles Ward , Thomas Venturino , Geoffrey Alan Schultz , Daniel Nathan Burbank
IPC: G03F7/20
CPC classification number: G03F7/70875 , G03F7/708
Abstract: A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a cooling system and a heating system. The cooling system is configured to direct a gas flow along a first direction across a surface of the patterning device to remove heat from the patterning device prior to exposing the patterning device or during exposure of the patterning device. The heating system is configured to selectively heat areas on the surface of the patterning device prior to exposing the patterning device or during exposure of the patterning device. The selective heating and the heat removal achieve a substantially uniform temperature distribution in the patterning.
Abstract translation: 讨论了用于控制光刻设备中的图案形成装置的温度的系统。 该系统包括冷却系统和加热系统。 冷却系统被配置为沿着图案形成装置的表面沿着第一方向引导气流，以在暴露图案形成装置之前或在图案形成装置的曝光期间从图案形成装置移除热量。 加热系统被配置为在曝光图案形成装置之前或在图案形成装置的曝光期间选择性地加热图案形成装置的表面上的区域。 选择性加热和除热在图案化中实现基本均匀的温度分布。
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公开(公告)号：US10459354B2
公开(公告)日：2019-10-29
申请号：US15565082
申请日：2016-03-24
Applicant: ASML Netherlands B.V.
Inventor： Kevin Van De Ruit , Bart Dinand Paarhuis , Jean-Philippe Xavier Van Damme , Johannes Onvlee , Cornelis Melchior Brouwer
Abstract: A lithographic apparatus including a support to support a patterning device, a substrate table to hold a substrate, and a projection system to project a radiation beam patterned by the patterning device onto a target portion of the substrate. A transparent layer is provided to protect the pattering device. The apparatus further includes a transparent layer deformation-determining device to determine a deformation profile of the transparent layer, the deformation profile of the transparent layer expressing a deformation of the transparent layer during a scanning movement of the lithographic apparatus, and a compensator device which is configured to control the projection system, the substrate table and/or the support in response to the deformation profile of the transparent layer to compensate for the deformation of the transparent layer during the scanning movement of the apparatus.
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公开(公告)号：US10444647B2
公开(公告)日：2019-10-15
申请号：US16307512
申请日：2017-06-01
Applicant: ASML NETHERLANDS B.V.
Inventor： Franciscus Godefridus Casper Bijnen , Augustinus Hubert Maria Boshouwers , Johannes Onvlee
Abstract: A target structure such as an alignment mark on a semiconductor substrate becomes obscured by an opaque layer so that it cannot be located by an alignment sensor. A position for the mark is determined using an edge position sensor and relative position information that defines the position of the mark relative to one or more edge portions of the substrate is stored prior to formation of the opaque layer. A window can be opened in the opaque layer, based on the determined position. After revealing the target structure, the alignment sensor can, if desired, measure more accurately the position of the target structure, for use in controlling a further lithographic step. The edge position sensor may be a camera having an angle-selective behavior. The edge position sensor may be integrated within the alignment sensor hardware.
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Patent Agency Ranking
公开(公告)号：US20150241797A1
公开(公告)日：2015-08-27
申请号：US14423089
申请日：2013-07-30
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Johannes Onvlee , Christopher J. Mason , Peter A. Delmastro , Sanjeev Kumar Singh , Ronald Peter Albright
CPC classification number: G03F7/70925 , A47L25/005 , B08B7/0028 , G03F1/82 , G03F7/70916 , H01L21/02041
Abstract: Methods and systems are described for cleaning contamination from the surface of an object within a lithographic apparatus. A lithographic apparatus is provided that includes an illumination system configured to condition a radiation beam, a support constructed to hold a patterning device (302), the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further includes a cleaning system (500) for cleaning particles off of a surface of either the support or the patterning device. The cleaning system includes a cleaning surface (502) designed to contact the surface of either the support or the patterning device.
Abstract translation: 描述了用于清洁光刻设备内物体表面的污染物的方法和系统。 提供了一种光刻设备，其包括被配置为调节辐射束的照明系统，构造成保持图案形成装置（302）的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成 图案化的辐射束，构造成保持衬底的衬底台，以及被配置为将图案化的辐射束投影到衬底的目标部分上的投影系统。 光刻设备还包括用于从支撑体或图案形成装置的表面清除颗粒的清洁系统（500）。 清洁系统包括设计成接触支撑件或图案形成装置的表面的清洁表面（502）。
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公开(公告)号：US20150212432A1
公开(公告)日：2015-07-30
申请号：US14429340
申请日：2013-08-26
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Johannes Onvlee , Christopher J. Mason , Earl William Ebert , Peter A. Delmastro
IPC: G03F7/20
CPC classification number: G03F7/70875 , G03F7/708
Abstract: Systems and methods are disclosed for controlling the heating of a reticle. In one embodiment, a plurality of radiation sources generates a plurality of radiation beams (206) and delivers them to a patterning device (210) that absorbs a portion of the radiation from the beams and develops a spatially dependent heating profile. In a further embodiment, a plurality of resistive heating sources (906) generates heat in response to an applied voltage or current. The generated heat is absorbed by the patterning device from the resistive heating sources and leads to the development of a spatially dependent heating profile. Thermal stresses, strains, and deformations can be controlled by controlling the spatially dependent heating profile.
Abstract translation: 公开了用于控制掩模版加热的系统和方法。 在一个实施例中，多个辐射源产生多个辐射束（206）并且将它们传送到图案形成装置（210），该图案形成装置吸收来自光束的一部分辐射并产生空间上依赖的加热曲线。 在另一实施例中，多个电阻加热源（906）响应于所施加的电压或电流产生热量。 产生的热量被图案形成装置从电阻加热源吸收并导致空间依赖的加热曲线的发展。 可以通过控制空间依赖的加热曲线来控制热应力，应变和变形。
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公开(公告)号：US10423081B2
公开(公告)日：2019-09-24
申请号：US15540649
申请日：2015-12-02
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Thomas Venturino , Geoffrey Alan Schultz , Daniel Nicholas Galburt , Daniel Nathan Burbank , Santiago E. Delpuerto , Herman Vogel , Johannes Onvlee , Laurentius Johannes Adrianus Van Bokhoven , Christopher Charles Ward
IPC: G03F7/20
Abstract: An apparatus, system, and method cool a patterning device by supplying a non-uniform gas flow. The apparatus and system include a gas supply structure that supplies a gas flow across the first surface of the patterning device. The gas supply structure includes a gas supply nozzle specially configured to create a non-uniform gas flow distribution. A greater volume or velocity of the gas flow is directed to desired portion of the patterning device.
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公开(公告)号：US09857694B2
公开(公告)日：2018-01-02
申请号：US15122772
申请日：2015-03-05
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Bearrach Moest , Peter A. Delmastro , Johannes Onvlee , Adrianus Martinus Van Der Wielen , Christopher Charles Ward
CPC classification number: G03F7/70616 , G01B11/14 , G03F7/70058 , G03F7/70775 , G03F7/70783 , G03F7/70875
Abstract: A system and method are provided for determining deformation of a patterning device and/or shift position of the patterning device relative. The system includes a first sensing sub-system that measures respective positions of a plurality of reference marks on the patterning device, and a second sensing sub-system that measures positions of the edge of the patterning device relative to the support. The system further includes a controller to determine an absolute position of the patterned portion and change in the absolute position based on measured respective positions of marks on the patterning device, determine a change in a relative position of the edge of the patterned device based on the measured edge positions, and estimate a change in a position of the patterning device relative to the support and a change in a pattern distortion of the patterned portion of the patterning device over a time period.
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公开(公告)号：US09632434B2
公开(公告)日：2017-04-25
申请号：US14699468
申请日：2015-04-29
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Earl William Ebert, Jr. , Johannes Onvlee , Samir A. Nayfeh , Mark Josef Schuster , Peter A. Delmastro , Christopher Charles Ward , Frank Johannes Jacobus Van Boxtel , Abdullah Alikhan , Daniel Nathan Burbank , Daniel Nicholas Galburt , Justin Matthew Verdirame , Thomas Venturino
CPC classification number: G03F7/70875 , G03F7/70341 , G03F7/70716 , G03F7/70808 , G03F7/70858 , G03F7/70866
Abstract: A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a patterning device support configured to support a patterning device and a reticle cooling system configured to provide substantially uniform temperature distribution across the patterning device. The reticle cooling system includes a first and second array of gas inlets configured to provide a first and second gas flow along a first and second direction across a surface of the patterning device, respectively, where first and second directions are opposite to each other. The reticle cooling system further includes a switching control system configured to control operation of the first and second arrays of gas inlets.
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