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    Power deposition control in inductively coupled plasma (ICP) reactors
    11.
    发明授权
    Power deposition control in inductively coupled plasma (ICP) reactors 有权

    公开(公告)号：US10553398B2

    公开(公告)日：2020-02-04

    申请号：US14463205

    申请日：2014-08-19

    Applicant: APPLIED MATERIALS, INC.

    Inventor： Samer Banna ,  Tza-Jing Gung ,  Vladimir Knyazik ,  Kyle Tantiwong ,  Dan A. Marohl ,  Valentin N. Todorow ,  Stephen Yuen

    IPC: H01J37/32

    Abstract: Embodiments of inductively coupled plasma (ICP) reactors are provided herein. In some embodiments, a dielectric window for an inductively coupled plasma reactor includes: a body including a first side, a second side opposite the first side, an edge, and a center, wherein the dielectric window has a dielectric coefficient that varies spatially. In some embodiments, an apparatus for processing a substrate includes: a process chamber having a processing volume disposed beneath a lid of the process chamber; and one or more inductive coils disposed above the lid to inductively couple RF energy into and to form a plasma in the processing volume above a substrate support disposed within the processing volume; wherein the lid is a dielectric window comprising a first side and an opposing second side that faces the processing volume, and wherein the lid has a dielectric coefficient that spatially varies to provide a varied power coupling of RF energy from the one or more inductive coils to the processing volume.

    Metrology system for substrate deformation measurement
    14.
    发明授权
    Metrology system for substrate deformation measurement 有权

    公开(公告)号：US10923371B2

    公开(公告)日：2021-02-16

    申请号：US16079961

    申请日：2017-03-30

    Applicant: Applied Materials, Inc.

    Inventor： Mehdi Vaez-Iravani ,  Todd Egan ,  Samer Banna ,  Kyle Tantiwong

    IPC: G06K9/00 ,  H01L21/67 ,  G01B11/24 ,  G01B11/30 ,  H01L21/66 ,  G01N21/956 ,  G06T7/00

    Abstract: Embodiments of the disclosure provide methods and system for inspecting and treating a substrate. In one embodiment, a method is provided including transmitting a first plurality of beams from a diffractive beam splitter to a first surface of a substrate to generate a reflection of a second plurality of beams, wherein the first plurality of beams are spaced apart from each other upon arriving at the first surface of the substrate; receiving the second plurality of beams on a recording surface of an optical device, wherein the second plurality of beams are spaced apart from each other upon arriving at the recording surface; measuring positional information of the second plurality of beams on the recording surface; comparing the positional information of the second plurality of beams to positional information stored in a memory; and storing a result of the comparison in the memory.

    Electrostatic chuck with concentric cooling base
    18.
    发明授权
    Electrostatic chuck with concentric cooling base 有权

    公开(公告)号：US09659803B2

    公开(公告)日：2017-05-23

    申请号：US14162510

    申请日：2014-01-23

    Applicant: Applied Materials, Inc.

    Inventor： Dmitry Lubomirsky ,  Kyle Tantiwong ,  Samer Banna

    IPC: H05B3/68 ,  H01L21/683 ,  H01L21/67

    CPC classification number: H01L21/6831 ,  H01L21/67 ,  H01L21/67098

    Abstract: Embodiments of the present disclosure generally provide apparatus and method for cooling a substrate support in a uniform manner. One embodiment of the present disclosure provides a cooling assembly for a substrate support. The cooling assembly includes a cooling base having a first side for contacting the substrate support and providing cooling to the substrate support, a diffuser disposed on a second side of the cooling base, wherein the diffuser defines a plurality of cooling paths for delivering a cooling fluid towards the cooling base in a parallel manner, and an inlet/outlet plate disposed under the diffuser, wherein the inlet/outlet plate is provides an interface between the diffuser and an inlet and outlet of a cooling fluid.

    Tunable gas delivery assembly with internal diffuser and angular injection
    19.
    发明授权
    Tunable gas delivery assembly with internal diffuser and angular injection 有权
    具有内部扩散器和角度注入的可调气体输送组件

    公开(公告)号：US09536710B2

    公开(公告)日：2017-01-03

    申请号：US13959801

    申请日：2013-08-06

    Applicant: Applied Materials, Inc.

    Inventor： Vladimir Knyazik ,  Kyle Tantiwong ,  Samer Banna ,  Waheb Bishara

    IPC: F26B21/00 ,  H01J37/32

    CPC classification number: H01J37/32449 ,  F26B21/004 ,  H01J37/3244

    Abstract: An apparatus for providing processing gases to a process chamber with improved uniformity is disclosed. One embodiment provides a gas delivery assembly. The gas delivery assembly includes a hub, a nozzle, and one or more gas diffusers disposed in the nozzle. The nozzle has a cylindrical body with a side wall and a top surface. A plurality of injection passages are formed inside the nozzle to deliver processing gases into the process chamber via a plurality of outlets disposed in the side wall. The injection passages are configured to direct process gases out of each outlet disposed in the side wall in a direction which is not radially aligned with a centerline of the hub.

    Abstract translation: 公开了一种用于向具有改进的均匀性的处理室提供处理气体的装置。 一个实施例提供了气体输送组件。 气体输送组件包括轮毂，喷嘴和设置在喷嘴中的一个或多个气体扩散器。 喷嘴具有带有侧壁和顶面的圆柱体。 在喷嘴内部形成多个喷射通道，通过设置在侧壁中的多个出口将处理气体输送到处理室中。 喷射通道构造成将处理气体从设置在侧壁中的每个出口沿着不与轮毂的中心线径向对准的方向引导。

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