公开(公告)号：US20210262099A1

公开(公告)日：2021-08-26

申请号：US17313858

申请日：2021-05-06

Applicant: Applied Materials, Inc.

Inventor： David BRITZ ,  Pravin K. NARWANKAR ,  David THOMPSON ,  Yuriy MELNIK ,  Sukti CHATTERJEE

IPC: C23C28/00 ,  F01D5/28 ,  F01D5/18 ,  C23C16/455

Abstract: Using the systems and methods discussed herein, CMAS corrosion is inhibited via CMAS interception in an engine environment and/or is prevented or reduced by the formation of a metal oxide protective coating on a hot engine section component. The CMAS interception can occur while the engine is in operation in flight or in a testing or quality control environment. The metal oxide protective coating can be applied over other coatings, including Gd-zirconates (GZO) or yttria-stabilized zirconia (YSZ). The metal oxide protective coating is applied at original equipment manufacturers (OEM) and can also be applied in-situ using a gas injection system during engine use in-flight or during maintenance or quality testing. The metal oxide protective coating contains a rare earth element, aluminum, zirconium, chromium, or combinations thereof.

公开(公告)号：US20210071299A1

公开(公告)日：2021-03-11

申请号：US16670555

申请日：2019-10-31

Applicant: Applied Materials, Inc.

Inventor： Kenichi OHNO ,  Eric H. LIU ,  Sukti CHATTERJEE ,  Yuriy MELNIK ,  Thomas KNISLEY ,  David Alexander BRITZ ,  Lance A. SCUDDER ,  Pravin K. NARWANKAR

IPC: C23C16/455 ,  C23C16/02 ,  C23C16/40 ,  C23C16/56

Abstract: Embodiments of the present disclosure generally relate to protective coatings on substrates and methods for depositing the protective coatings. In one or more embodiments, a method of forming a protective coating on a substrate includes depositing a chromium oxide layer containing amorphous chromium oxide on a surface of the substrate during a first vapor deposition process and heating the substrate containing the chromium oxide layer comprising the amorphous chromium oxide to convert at least a portion of the amorphous chromium oxide to crystalline chromium oxide during a first annealing process. The method also includes depositing an aluminum oxide layer containing amorphous aluminum oxide on the chromium oxide layer during a second vapor deposition process and heating the substrate containing the aluminum oxide layer disposed on the chromium oxide layer to convert at least a portion of the amorphous aluminum oxide to crystalline aluminum oxide during a second annealing process.

公开(公告)号：US20200240018A1

公开(公告)日：2020-07-30

申请号：US16843358

申请日：2020-04-08

Applicant: Applied Materials, Inc.

Inventor： Yuriy MELNIK ,  Sukti CHATTERJEE ,  Kaushal GANGAKHEDKAR ,  Jonathan FRANKEL ,  Lance A. SCUDDER ,  Pravin K. NARWANKAR ,  David Alexander BRITZ ,  Thomas KNISLEY ,  Mark SALY ,  David THOMPSON

IPC: C23C16/455 ,  C23C16/34 ,  C23C16/40 ,  C23C16/30 ,  C23C16/56 ,  F01D5/28 ,  F01D9/02 ,  F01D25/12 ,  F01D25/14 ,  F01D25/28 ,  F23R3/28

Abstract: Protective coatings on an aerospace component are provided. An aerospace component includes a surface containing nickel, nickel superalloy, aluminum, chromium, iron, titanium, hafnium, alloys thereof, or any combination thereof, and a coating disposed on the surface, where the coating contains a nanolaminate film stack having two or more pairs of a first deposited layer and a second deposited layer. The first deposited layer contains chromium oxide, chromium nitride, aluminum oxide, aluminum nitride, or any combination thereof, the second deposited layer contains aluminum oxide, aluminum nitride, silicon oxide, silicon nitride, silicon carbide, yttrium oxide, yttrium nitride, yttrium silicon nitride, hafnium oxide, hafnium nitride, hafnium silicide, hafnium silicate, titanium oxide, titanium nitride, titanium silicide, titanium silicate, or any combination thereof, and the first deposited layer and the second deposited layer have different compositions from each other.

公开(公告)号：US20190330746A1

公开(公告)日：2019-10-31

申请号：US16283567

申请日：2019-02-22

Applicant: Applied Materials, Inc.

Inventor： David BRITZ ,  Pravin K. NARWANKAR ,  David THOMPSON ,  Yuriy MELNIK ,  Sukti CHATTERJEE

IPC: C23C28/04 ,  C23C16/40 ,  C23C14/08 ,  F01D5/28

Abstract: Using the systems and methods discussed herein, CMAS corrosion is inhibited via CMAS interception in an engine environment and/or is prevented or reduced by the formation of a metal oxide protective coating on a hot engine section component. The CMAS interception can occur while the engine is in operation in flight or in a testing or quality control environment. The metal oxide protective coating can be applied over other coatings, including Gd-zirconates (GZO) or yttria-stabilized zirconia (YSZ). The metal oxide protective coating is applied at original equipment manufacturers (OEM) and can also be applied in-situ using a gas injection system during engine use in-flight or during maintenance or quality testing. The metal oxide protective coating contains a rare earth element, aluminum, zirconium, chromium, or combinations thereof, and is from 1 nm to 3 microns in thickness.

公开(公告)号：US20190119810A1

公开(公告)日：2019-04-25

申请号：US16137797

申请日：2018-09-21

Applicant: Applied Materials, Inc.

Inventor： Ranga Rao ARNEPALLI ,  Colin Costano NEIKIRK ,  Yuriy MELNIK ,  Suresh Chand SETH ,  Pravin K. NARWANKAR ,  Sukti CHATTERJEE ,  Lance A. SCUDDER

IPC: C23C16/02 ,  C23C16/455 ,  C23C16/50

Abstract: Methods of removing native oxide layers and depositing dielectric layers having a controlled number of active sites on MEMS devices for biological applications are disclosed. In one aspect, a method includes removing a native oxide layer from a surface of the substrate by exposing the substrate to one or more ligands in vapor phase to volatize the native oxide layer and then thermally desorbing or otherwise etching the volatized native oxide layer. In another aspect, a method includes depositing a dielectric layer selected to provide a controlled number of active sites on the surface of the substrate. In yet another aspect, a method includes both removing a native oxide layer from a surface of the substrate by exposing the substrate to one or more ligands and depositing a dielectric layer selected to provide a controlled number of active sites on the surface of the substrate.

公开(公告)号：US20180164245A1

公开(公告)日：2018-06-14

申请号：US15833552

申请日：2017-12-06

Applicant: APPLIED MATERIALS, INC.

Inventor： Colin NEIKIRK ,  Yuriy MELNIK ,  Pravin K. NARWANKAR

IPC: G01N27/414 ,  C23C16/46 ,  C23C16/52 ,  H01L21/02 ,  H01L23/29

Abstract: The present disclosure relates to a method of depositing a polymer layer, including: providing a substrate, having a sensor structure disposed on the substrate, to a substrate support within a hot wire chemical vapor deposition (HWCVD) chamber; providing a process gas comprising an initiator gas and a monomer gas and a carrier gas to the HWCVD chamber; heating a plurality of filaments disposed in the HWCVD chamber to a first temperature sufficient to activate the initiator gas without decomposing the monomer gas; and exposing the substrate to initiator radicals from the activated initiator gas and to the monomer gas to deposit a polymer layer atop the sensor structure.

公开(公告)号：US20170317225A1

公开(公告)日：2017-11-02

申请号：US15532001

申请日：2015-12-07

Applicant: APPLIED MATERIALS, INC.

Inventor： Takao YONEHARA ,  Pravin K. NARWANKAR ,  Jonathan S. FRANKEL

IPC: H01L31/18 ,  H01L21/683

CPC classification number: H01L31/1804 ,  H01L21/6833 ,  H01L21/6838 ,  H01L21/68785 ,  H01L31/1876

Abstract: Methods and systems for all wrap around porous silicon formation are provided herein. In some embodiments, a substrate holder used for all wrap around porous silicon formation may include a body having a tapered opening along a first edge of the body, wherein the tapered opening is configured to release byproduct gases produced during porous silicon formation on a substrate supported by the substrate holder, a first vacuum channel formed in the body and extending to a first surface of the body, and a first sealing element disposed on the first surface of the body and fluidly coupled to the first vacuum channel, where in the first sealing element supports the substrate when disposed thereon.