公开(公告)号：US10156785B2

公开(公告)日：2018-12-18

申请号：US15177226

申请日：2016-06-08

Applicant: Applied Materials Israel Ltd.

Inventor： Alon Litman ,  Nir Ben-David Dodzin ,  Albert Karabekov ,  Alex Goldenshtein

IPC: G03F1/86 ,  H01J37/28 ,  G03F1/62 ,  G21K1/06

Abstract: A system and a method for evaluating a lithography mask, the system may include: (a) electron optics for directing primary electrons towards a pellicle that is positioned between the electron optics and the lithography mask; wherein the primary electrons exhibit an energy level that allows the primary electrons to pass through the pellicle and to impinge on the lithographic mask; (b) at least one detector for detecting detected emitted electrons and for generating detection signals; wherein detected emitted electrons are generated as a result of an impingement of the primary electrons on the lithographic mask; and (c) a processor for processing the detection signals to provide information about the lithography mask.

公开(公告)号：US20160282714A1

公开(公告)日：2016-09-29

申请号：US15177226

申请日：2016-06-08

Applicant: Applied Materials Israel Ltd.

Inventor： Alon Litman ,  Nir Ben-David Dodzin ,  Albert Karabekov ,  Alex Goldenshtein

IPC: G03F1/86 ,  G03F1/62

CPC classification number: G03F1/86 ,  G03F1/62 ,  G21K1/062 ,  H01J37/28 ,  H01J2237/164 ,  H01J2237/2002 ,  H01J2237/244 ,  H01J2237/2449 ,  H01J2237/2809 ,  H01J2237/2817

Abstract: A system and a method for evaluating a lithography mask, the system may include: (a) electron optics for directing primary electrons towards a pellicle that is positioned between the electron optics and the lithography mask; wherein the primary electrons exhibit an energy level that allows the primary electrons to pass through the pellicle and to impinge on the lithographic mask; (b) at least one detector for detecting detected emitted electrons and for generating detection signals; wherein detected emitted electrons are generated as a result of an impingement of the primary electrons on the lithographic mask; and (c) a processor for processing the detection signals to provide information about the lithography mask

公开(公告)号：US20150332451A1

公开(公告)日：2015-11-19

申请号：US14279192

申请日：2014-05-15

Applicant: Applied Materials Israel Ltd.

Inventor： Moshe Amzaleg ,  Nir Ben-David Dodzin

IPC: G06T7/00 ,  G06T7/40

CPC classification number: G06T7/001 ,  G01N2021/95615 ,  G06T7/0002 ,  G06T7/0004 ,  G06T7/0006 ,  G06T7/0008 ,  G06T2207/20076 ,  G06T2207/30148

Abstract: A system configured to detect defects in an inspection image generated by collecting signals arriving from an article, the system comprising a tangible processor which includes: (i) a distribution acquisition module, configured to acquire a distribution of comparison values, each of the comparison values being indicative of a relationship between a value associated with a pixel of the inspection image and a corresponding reference value; (ii) a fitting module, configured to fit to the distribution an approximation function out of a predefined group of functions; and (iii) a defect detection module, configured to: (a) set a defect detection criterion based on a result of the fitting; and to (b) determine a presence of a defect in the inspection image, based on the defect detection criterion.

Abstract translation: 一种被配置为检测通过收集从物品到达的信号产生的检查图像中的缺陷的系统，所述系统包括有形处理器，该有形处理器包括：（i）配置获取模块，被配置为获取比较值的分布，每个比较值 指示与检查图像的像素相关联的值与相应的参考值之间的关系; （ii）拟合模块，其被配置为适合于所述分布中的预定义功能组中的近似函数; 以及（iii）缺陷检测模块，被配置为：（a）基于所述拟合的结果来设置缺陷检测标准; 以及（b）基于缺陷检测标准确定检查图像中的缺陷的存在。

公开(公告)号：US09070180B2

公开(公告)日：2015-06-30

申请号：US13773549

申请日：2013-02-21

Applicant: Applied Materials Israel Ltd.

Inventor： Moshe Amzaleg ,  Yehuda Cohen ,  Nir Ben-David Dodzin ,  Efrat Rozenman

IPC: G06K9/00 ,  G06T7/00 ,  H01L21/67

CPC classification number: G06T7/001 ,  G06T7/0002 ,  G06T2207/30148 ,  H01L21/67288

Abstract: A defect detection system for computerized detection of defects in an inspected object based on processing of an inspection image generated by collecting signals arriving from the inspected object, the system including: an interface for obtaining an inspected noise-indicative value and multiple reference noise-indicative values, the inspected noise-indicative value representative of an analyzed pixel and each of the reference noise-indicative values representative of a reference pixel among a plurality of reference pixels; and a processor, including: a noise analysis module, configured to compute a representative noise-indicative value based on a plurality of noise-indicative values which includes the inspected noise-indicative value and the multiple reference noise-indicative values; and a defect analysis module, configured to calculate a defect-indicative value based on an inspected value representative of the analyzed pixel, and to determine a presence of a defect in the analyzed pixel based on the representative noise-indicative value and the defect-indicative value.

Abstract translation: 一种用于基于通过收集从被检查对象到达的信号产生的检查图像的处理来对被检查对象中的缺陷进行计算机化检测的缺陷检测系统，所述系统包括：用于获得被检查的噪声指示值和多个参考噪声指示值的接口 值，表示分析像素的被检查噪声指示值和表示多个参考像素中的参考像素的每个参考噪声指示值; 以及处理器，包括：噪声分析模块，被配置为基于包括所检查的噪声指示值和所述多个参考噪声指示值的多个噪声指示值来计算代表性噪声指示值; 以及缺陷分析模块，被配置为基于代表所分析的像素的检查值来计算缺陷指示值，并且基于代表性的噪声指示值和缺陷指示值来确定所分析的像素中的缺陷的存在 值。