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    SYSTEM AND METHOD FOR ATTACHING A MASK TO A MASK HOLDER
    1.
    发明申请
    SYSTEM AND METHOD FOR ATTACHING A MASK TO A MASK HOLDER 有权
    用于将掩码连接到掩蔽座的系统和方法

    公开(公告)号：US20160161869A1

    公开(公告)日：2016-06-09

    申请号：US15040908

    申请日：2016-02-10

    Applicant: APPLIED MATERIALS ISRAEL LTD.

    Inventor： Israel Avneri ,  Igor Krivts (Krayvitz) ,  Yoram Uziel ,  Nir Ben-David Dodzin ,  Ido Holcman

    IPC: G03F9/00

    CPC classification number: G03F9/7096 ,  G03F7/0002 ,  H01L21/67359 ,  H01L21/67775 ,  H01L21/67778

    Abstract: A system for coupling a mask to a mask holder. The system includes a base, an aperture; mask holder cover supporting elements arranged to move between a first position and a third position while supporting the mask holder cover; mask supporting elements arranged to move between a fourth position and a sixth position while supporting the mask; mask holder base supporting elements arranged to support the mask holder base. When the mask holder cover supporting elements are at the first position and the mask supporting elements are at the third position the mask holder cover, the mask and the base are spaced apart from each other. When the mask holder cover supporting elements are at the third position and the mask supporting elements are at the sixth position the mask holder cover, the mask and the base are connected to each other.

    Abstract translation: 一种用于将掩模与掩模支架结合的系统。 该系统包括基座，孔径; 掩模保持器盖支撑元件，布置成在支撑掩模保持器盖的同时在第一位置和第三位置之间移动; 掩模支撑元件，布置成在支撑所述掩模的同时在第四位置和第六位置之间移动; 布置用于支撑掩模支架基座的掩模支架基座支撑元件。 当掩模支架覆盖支撑元件处于第一位置并且掩模支撑元件处于第三位置时，掩模保持器盖，掩模和基座彼此间隔开。 当掩模保持器覆盖支撑元件处于第三位置并且掩模支撑元件处于第六位置时，掩模保持器盖，掩模和基座彼此连接。

    INSPECTION OF A LITHOGRAPHIC MASK THAT IS PROTECTED BY A PELLICLE
    2.
    发明申请
    INSPECTION OF A LITHOGRAPHIC MASK THAT IS PROTECTED BY A PELLICLE 有权
    检查由PELLICLE保护的LITHOGRAPHIC MASK

    公开(公告)号：US20150028203A1

    公开(公告)日：2015-01-29

    申请号：US13948975

    申请日：2013-07-23

    Applicant: Applied Materials Israel, Ltd.

    Inventor： Alon Litman ,  Nir Ben-David Dodzin ,  Albert Karabekov ,  Alex Goldenshtein

    IPC: G03F1/86 ,  H01J37/26

    CPC classification number: G03F1/86 ,  G03F1/62 ,  G21K1/062 ,  H01J37/28 ,  H01J2237/164 ,  H01J2237/2002 ,  H01J2237/244 ,  H01J2237/2449 ,  H01J2237/2809 ,  H01J2237/2817

    Abstract: A system and a method for evaluating a lithography mask, the system may include: (a) electron optics for directing primary electrons towards a pellicle that is positioned between the electron optics and the lithography mask; wherein the primary electrons exhibit an energy level that allows the primary electrons to pass through the pellicle and to impinge on the lithographic mask; (b) at least one detector for detecting detected emitted electrons and for generating detection signals; wherein detected emitted electrons are generated as a result of an impingement of the primary electrons on the lithographic mask; and (c) a processor for processing the detection signals to provide information about the lithography mask

    Abstract translation: 一种用于评估光刻掩模的系统和方法，该系统可以包括：（a）用于将一次电子引导到位于电子光学器件和光刻掩模之间的防护薄膜的电子光学器件; 其中所述一次电子表现出允许所述一次电子通过所述防护薄膜并撞击所述光刻掩模的能级; （b）至少一个检测器，用于检测检测到的发射电子并产生检测信号; 其中由于一次电子撞击在光刻掩模上而产生检测到的发射电子; 和（c）用于处理检测信号以提供关于光刻掩模的信息的处理器

    System, a method and a computer program product for fitting based defect detection
    3.
    发明授权
    System, a method and a computer program product for fitting based defect detection 有权

    公开(公告)号：US10290092B2

    公开(公告)日：2019-05-14

    申请号：US14279192

    申请日：2014-05-15

    Applicant: Applied Materials Israel Ltd.

    Inventor： Moshe Amzaleg ,  Nir Ben-David Dodzin

    IPC: G06K9/00 ,  G06T7/00 ,  G01N21/956

    Abstract: A system configured to detect defects in an inspection image generated by collecting signals arriving from an article, the system comprising a tangible processor which includes: (i) a distribution acquisition module, configured to acquire a distribution of comparison values, each of the comparison values being indicative of a relationship between a value associated with a pixel of the inspection image and a corresponding reference value; (ii) a fitting module, configured to fit to the distribution an approximation function out of a predefined group of functions; and (iii) a defect detection module, configured to: (a) set a defect detection criterion based on a result of the fitting; and to (b) determine a presence of a defect in the inspection image, based on the defect detection criterion.

    System, method and computer program product for defect detection based on multiple references
    4.
    发明授权
    System, method and computer program product for defect detection based on multiple references 有权
    基于多重参考的缺陷检测系统，方法和计算机程序产品

    公开(公告)号：US09070014B2

    公开(公告)日：2015-06-30

    申请号：US13773535

    申请日：2013-02-21

    Applicant: Applied Materials Israel Ltd.

    Inventor： Moshe Amzaleg ,  Yehuda Cohen ,  Nir Ben-David Dodzin ,  Efrat Rozenman

    IPC: G06K9/00

    CPC classification number: G06K9/00536 ,  G06T7/001 ,  G06T2207/10061 ,  G06T2207/30148

    Abstract: A defect detection system for computerized detection of defects, the system including: an interface for receiving inspection image data including information of an analyzed pixel and of a plurality of reference pixels; and a processor, including: a differences analysis module, configured to: (a) calculate differences based on an inspected value representative of the analyzed pixel and on multiple reference values, each of which is representative of a reference pixel among the plurality of reference pixels; wherein the differences analysis module is configured to calculate for each of the reference pixels a difference between the reference value of the reference pixel and the inspected value; and (b) compute a representative difference value based on a plurality of the differences; and a defect analysis module, configured to determine a presence of a defect in the analyzed pixel based on the representative difference value.

    Abstract translation: 一种用于计算机检测缺陷的缺陷检测系统，所述系统包括：用于接收包括所分析的像素和多个参考像素的信息的检查图像数据的接口; 以及处理器，包括：差异分析模块，被配置为：（a）基于代表所分析的像素的检查值和多个参考值计算差异，所述多个参考值代表所述多个参考像素中的参考像素 ; 其中所述差异分析模块被配置为针对每个参考像素计算所述参考像素的参考值和所述被检测值之间的差; 和（b）基于多个差异来计算代表性差值; 以及缺陷分析模块，被配置为基于所述代表性差值来确定所分析的像素中的缺陷的存在。

    Inspection of a lithographic mask that is protected by a pellicle
    6.
    发明授权
    Inspection of a lithographic mask that is protected by a pellicle 有权
    检查由防护薄膜组件保护的光刻掩模

    公开(公告)号：US09366954B2

    公开(公告)日：2016-06-14

    申请号：US13948975

    申请日：2013-07-23

    Applicant: Applied Materials Israel, Ltd.

    Inventor： Alon Litman ,  Nir Ben-David Dodzin ,  Albert Karabekov ,  Alex Goldenshtein

    IPC: G01N23/00 ,  G03F1/86 ,  H01J37/28 ,  G21K1/06

    CPC classification number: G03F1/86 ,  G03F1/62 ,  G21K1/062 ,  H01J37/28 ,  H01J2237/164 ,  H01J2237/2002 ,  H01J2237/244 ,  H01J2237/2449 ,  H01J2237/2809 ,  H01J2237/2817

    Abstract: A system and a method for evaluating a lithography mask, the system may include: (a) electron optics for directing primary electrons towards a pellicle that is positioned between the electron optics and the lithography mask; wherein the primary electrons exhibit an energy level that allows the primary electrons to pass through the pellicle and to impinge on the lithographic mask; (b) at least one detector for detecting detected emitted electrons and for generating detection signals; wherein detected emitted electrons are generated as a result of an impingement of the primary electrons on the lithographic mask; and (c) a processor for processing the detection signals to provide information about the lithography mask.

    Abstract translation: 一种用于评估光刻掩模的系统和方法，该系统可以包括：（a）用于将一次电子引导到位于电子光学器件和光刻掩模之间的防护薄膜的电子光学器件; 其中所述一次电子显示出允许所述一次电子通过所述防护薄膜并撞击所述光刻掩模的能级; （b）至少一个检测器，用于检测检测到的发射电子并产生检测信号; 其中由于一次电子撞击在光刻掩模上而产生检测到的发射电子; 和（c）用于处理检测信号以提供关于光刻掩模的信息的处理器。

    System, a method and a computer program product for size estimation
    10.
    发明授权
    System, a method and a computer program product for size estimation 有权

    公开(公告)号：US10545020B2

    公开(公告)日：2020-01-28

    申请号：US13831446

    申请日：2013-03-14

    Applicant: Applied Materials Israel Ltd.

    Inventor： Moshe Amzaleg ,  Nir Ben-David Dodzin

    IPC: G01B21/02

    Abstract: A computerized method for estimating a size of a nanometric part of an inspected article, the method including: (a) acquiring inspection results generated by processing an inspection image which was generated by collecting signals arriving from a portion of the article which includes the part by an inspection system; (b) fitting to the inspection results an approximation function from a group of functions which is related to a response pattern of the inspection system; and (c) determining an estimated size of the part, based on at least one parameter of the approximation function.

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