公开(公告)号：US10787738B2

公开(公告)日：2020-09-29

申请号：US16063603

申请日：2017-01-17

Applicant: BASF SE

Inventor： Falko Abels ,  Daniel Loeffler ,  Hagen Wilmer ,  Robert Wolf ,  Christian Roedl ,  Philipp Bueschelberger

IPC: C23C16/18 ,  C23C16/448 ,  C07F15/06 ,  C23C16/455 ,  C07F9/6568 ,  C23C16/34 ,  C23C16/40 ,  C01B21/06 ,  C01G51/04 ,  C01G53/04

Abstract: Processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. In particular, a process of bringing a compound of general formula (I) into the gaseous or aerosol state Ln - - - M - - - Xm  (I) and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein M is a metal, L is a ligand which coordinates to M and contains at least one phosphorus-carbon multiple bond, wherein L contains a phosphorus-containing heterocyclic ring or a phosphorus-carbon triple bond, X is a ligand which coordinates to M, n is 1 to 5, and m is 0 to 5.

公开(公告)号：US10344381B2

公开(公告)日：2019-07-09

申请号：US15325840

申请日：2015-07-22

Applicant: BASF SE

Inventor： Julia Strautmann ,  Rocco Paciello ,  Thomas Schaub ,  Felix Eickemeyer ,  Daniel Loeffler ,  Hagen Wilmer ,  Udo Radius ,  Johannes Berthel ,  Florian Hering

IPC: C23C16/455 ,  C23C16/18 ,  C07F15/04 ,  C07F15/06 ,  C30B25/10 ,  C30B25/08

Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. In detail the present invention relates a process comprising bringing a compound of general formula (I) into the gaseous or aerosol state (Fig.) and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein R1 and R4 are independent of each other an alkyl group, an aryl group or a trialkylsilyl group, R2, R3, R5 and R6 are independent of each other hydrogen, an alkyl group, an aryl group or a trialkylsilyl group, n is an integer from 1 to 3, M is Ni or Co, X is a ligand which coordinates M, and m is an integer from 0 to 4.

公开(公告)号：US10106888B2

公开(公告)日：2018-10-23

申请号：US15501631

申请日：2015-07-24

Applicant: BASF SE

Inventor： Julia Strautmann ,  Rocco Paciello ,  Thomas Schaub ,  Kerstin Schierle-Arndt ,  Daniel Loeffler ,  Hagen Wilmer ,  Felix Eickemeyer ,  Florian Blasberg ,  Carolin Limburg

IPC: C23C16/06 ,  C23C16/18 ,  C23C16/455

Abstract: A process of bringing a compound of general formula (I) into the gaseous or aerosol state and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein R11, R12, R13, R14, R15, R16, R17, R18 are independent of each other hydrogen, an alkyl group, an aryl group, or a trialkylsilyl group, R21, R22, R23, R24 are independent of each other an alkyl group, an aryl group, or a trialkylsilyl group, n is 1 or 2, M is a metal or semimetal, X is a ligand which coordinates M, and m is an integer from 0 to 3.