METHOD FOR MANUFACTURING TOUCHING-TYPE ELECTRONIC PAPER
    11.
    发明申请
    METHOD FOR MANUFACTURING TOUCHING-TYPE ELECTRONIC PAPER 审中-公开
    制造触摸式电子纸的方法

    公开(公告)号:US20140024152A1

    公开(公告)日:2014-01-23

    申请号:US14035277

    申请日:2013-09-24

    CPC classification number: H01L29/66742 G06F3/0412 H01L27/1214

    Abstract: The present invention relates to a touching-type electronic paper and method for manufacturing the same. The touching-type electronic paper includes a TFT substrate and a transparent electrode substrate which are disposed as a cell. The transparent electrode substrate includes a common electrode, microcapsule electronic ink and light guiding poles as light transmitting passages, all of which are formed on a first substrate. The TFT substrate comprises displaying electrodes, first TFTs for driving the displaying electrodes, second TFTs for detecting lights transmitting through the light guiding poles and for producing level signals, and third TFTs for reading the level signals and sending the level signals to a back-end processing system, all of which are formed on a second substrate. The light guiding poles are opposite to the second TFTs respectively. The present invention makes the natural lights or other lights outside transmitted to the second TFTs through the light guiding poles by disposing the light guiding poles as light transmitting passages and disposing the second TFTs as light sensor units. The present invention has many advantages such as simple structure, simple manufacturing process and low cost, so as to have a wide application prospect.

    Abstract translation: 触摸式电子纸及其制造方法技术领域本发明涉及触摸式电子纸及其制造方法。 触摸型电子纸包括作为单元设置的TFT基板和透明电极基板。 透明电极基板包括公共电极,微胶囊电子墨水和作为透光通道的导光柱,所有这些都形成在第一基板上。 TFT基板包括显示电极,用于驱动显示电极的第一TFT,用于检测通过导光极传输的光的第二TFT和用于产生电平信号的第三TFT,以及用于读取电平信号并将电平信号发送到后端的第三TFT 处理系统,它们都形成在第二基板上。 光导极分别与第二TFT相对。 本发明通过将导光柱设置为透光通道,并且将第二TFT设置为光传感器单元,使外部的自然光或其它光通过导光杆传输到第二TFT。 本发明具有结构简单,制造工艺简单,成本低等优点,具有广泛的应用前景。

    ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF, DISPLAY PANEL AND DISPLAY DEVICE

    公开(公告)号:US20220320221A1

    公开(公告)日:2022-10-06

    申请号:US17419389

    申请日:2020-09-22

    Abstract: Embodiments of the present disclosure disclose an array substrate and a manufacturing method thereof, a display panel and a display device. The array substrate includes a substrate; a first metal layer located on the substrate and including a luminous control signal line; a second metal layer located on one side, departing from the substrate, of the first metal layer and including an anode overlap electrode, where the anode overlap electrode and the luminous control signal line have a first overlapping area; and a shielding structure located between the first metal layer and the second metal layer and mutually insulated from the first metal layer and the second metal layer, wherein the orthographic projection of the shielding structure on the substrate at least partially covers the orthographic projection of the first overlapping area on the substrate; and the shielding structure is coupled to a fixed potential.

    LIGHT-EMITTING DEVICE, ARRAY SUBSTRATE, DISPLAY DEVICE AND MANUFACTURING METHOD OF LIGHT-EMITTING DEVICE
    17.
    发明申请
    LIGHT-EMITTING DEVICE, ARRAY SUBSTRATE, DISPLAY DEVICE AND MANUFACTURING METHOD OF LIGHT-EMITTING DEVICE 有权
    发光装置,阵列基板,显示装置和发光装置的制造方法

    公开(公告)号:US20160035802A1

    公开(公告)日:2016-02-04

    申请号:US14420736

    申请日:2014-06-30

    CPC classification number: H01L27/3246 H01L51/56

    Abstract: The present invention discloses a light-emitting device, array substrate, display device and manufacturing method of light-emitting device. The light-emitting device comprises a substrate and a pixel define layer provided on the substrate, the pixel define layer defines at least one pixel unit, each of which comprises a plurality of first electrodes, an organic layer provided on the plurality of first electrodes, and a second electrode provided on the organic layer. The light-emitting device, array substrate, display device and manufacturing method provided by the present invention can allow the formed film of the organic layer on the first electrodes to have good flatness and allow portions of the organic layer on different first electrodes to have substantially the same thickness, thus flatness and uniformity of the formed film of the organic layer in the light-emitting device is improved and further display quality of the light-emitting device is improved.

    Abstract translation: 本发明公开了一种发光装置,阵列基板,显示装置及发光装置的制造方法。 发光装置包括衬底和设置在衬底上的像素限定层,像素限定层限定至少一个像素单元,每个像素单元包括多个第一电极,设置在多个第一电极上的有机层, 以及设置在有机层上的第二电极。 本发明提供的发光装置,阵列基板,显示装置和制造方法可以使第一电极上形成的有机层的膜具有良好的平坦度,并且允许不同第一电极上的有机层的部分基本上 因此,发光装置中的有机层的形成膜的平坦度和均匀性提高,发光元件的显示品质提高。

    ARRAY SUBSTRATE AND METHOD FOR FABRICATING THE SAME
    18.
    发明申请
    ARRAY SUBSTRATE AND METHOD FOR FABRICATING THE SAME 有权
    阵列基板及其制造方法

    公开(公告)号:US20160027819A1

    公开(公告)日:2016-01-28

    申请号:US14430310

    申请日:2014-05-12

    Abstract: An array substrate and a method for fabricating the same are disclosed. The method includes steps of providing a substrate (20), a first metal layer including patterns of gate electrodes (21, 24) of a first and second TFTs, an active layer (27) and a gate insulation layer (28) are formed on the substrate; forming an etch stop layer film and a photoresist sequentially on the substrate (20), and allowing the photoresist to form a first, second and third regions through gray-scale exposing and developing; forming a pattern of an etch stop layer (29), a connection via hole (30), and a contact via hole (31) respectively in the first, second and third regions through a patterning process; and forming source electrodes and drain electrodes (22, 23,25, 26) of the first and second TFTs. Photoresist of different thicknesses are disposed according to etch depths, thereby avoiding the over-etch of relatively shallow via holes.

    Abstract translation: 公开了阵列基板及其制造方法。 该方法包括提供衬底(20)的步骤,包括第一和第二TFT的栅电极(21,24)的图案的第一金属层,有源层(27)和栅极绝缘层(28)形成在 基材; 在衬底(20)上依次形成蚀刻停止层膜和光致抗蚀剂,并且通过灰度曝光和显影使光致抗蚀剂形成第一,第二和第三区域; 通过图案化工艺在第一,第二和第三区域分别形成蚀刻停止层(29),连接通孔(30)和接触通孔(31)的图案; 以及形成所述第一和第二TFT的源电极和漏电极(22,23,25,26)。 根据蚀刻深度设置不同厚度的光刻胶,从而避免相对浅的通孔的过度蚀刻。

    COMPLEMENTARY THIN FILM TRANSISTOR DRIVING BACK PLATE AND PREPARING METHOD THEREOF, AND DISPLAY DEVICE
    19.
    发明申请
    COMPLEMENTARY THIN FILM TRANSISTOR DRIVING BACK PLATE AND PREPARING METHOD THEREOF, AND DISPLAY DEVICE 有权
    补充薄膜晶体管驱动背板及其制备方法及显示装置

    公开(公告)号:US20150325605A1

    公开(公告)日:2015-11-12

    申请号:US14416872

    申请日:2014-05-27

    Abstract: A complementary thin film transistor driving back plate and a preparing method thereof, and a display device are disclosed. The preparing method comprises: forming a lower electrode (102) on a base substrate (101); sequentially disposing a continuously grown dielectric layer (103), a semiconductor layer (104), and a diffusion protection layer (105); sequentially forming a no-photoresist region (107), an N-type thin film transistor preparation region (108), and a P-type thin film transistor preparation region (109); removing a photoresist layer (114) of the N-type thin film transistor preparation region (108); removing a diffusion protection layer (105) of the N-type thin film transistor preparation region (105); removing a photoresist layer (114) of the P-type thin film transistor preparation region (109); performing an oxidation treatment to the base substrate (101); disposing a passivation layer (111) on the base substrate (101); and forming an upper electrode (113) on the passivation layer (111).

    Abstract translation: 互补薄膜晶体管驱动背板及其制备方法和显示装置。 制备方法包括:在基底(101)上形成下电极(102); 顺序地设置连续生长的介电层(103),半导体层(104)和扩散保护层(105); 依次形成无光致抗蚀剂区域(107),N型薄膜晶体管制备区域(108)和P型薄膜晶体管制备区域(109); 去除所述N型薄膜晶体管制备区域(108)的光致抗蚀剂层(114); 去除N型薄膜晶体管制备区域(105)的扩散保护层(105); 去除P型薄膜晶体管制备区域(109)的光致抗蚀剂层(114); 对所述基底基板进行氧化处理; 在所述基底基板(101)上设置钝化层(111); 以及在所述钝化层(111)上形成上电极(113)。

    ARRAY SUBSTRATE, METHOD FOR FABRICATING THE SAME, AND DISPLAY DEVICE
    20.
    发明申请
    ARRAY SUBSTRATE, METHOD FOR FABRICATING THE SAME, AND DISPLAY DEVICE 有权
    阵列基板,其制造方法和显示装置

    公开(公告)号:US20140131715A1

    公开(公告)日:2014-05-15

    申请号:US14079134

    申请日:2013-11-13

    Inventor: Xiang LIU Gang WANG

    Abstract: Embodiments of the present application provide an array substrate and a method for fabricating the same. The array substrate comprises: a base substrate, a plurality of thin film transistors formed on the base substrate; the array substrate also comprising: a buffer layer formed on the substrate between the substrate and the film transistors; wherein, the buffer layer is a metal oxide film layer. Embodiments of the present application also provide a display device having such array substrate.

    Abstract translation: 本申请的实施例提供阵列基板及其制造方法。 阵列基板包括:基底基板,形成在基底基板上的多个薄膜晶体管; 所述阵列基板还包括:形成在所述基板上的所述基板和所述薄膜晶体管之间的缓冲层; 其中,缓冲层是金属氧化物膜层。 本申请的实施例还提供了具有这种阵列基板的显示装置。

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