Abstract:
A display apparatus and a pixel circuit. The pixel circuit includes: a first storage sub-circuit, connected between a first node and a second node; a data writing sub-circuit, configured to charge the second node; a driving sub-circuit, configured to control connection or disconnection between a third node and a fourth node under control of the first node; a compensation sub-circuit, configured to control connection or disconnection between the first node and the fourth node under control of a first scan signal end; a luminous control sub-circuit, configured to control connection or disconnection between a first power end and the third node under control of a first luminous control signal end, and further configured to control connection or disconnection between the fourth node and a first electrode of a sub-pixel under control of a second luminous control signal. The present disclosure can improve display effect.
Abstract:
In the pixel circuit, the data writing-in circuit is configured to control to connect the data line and the second terminal of the driving circuit under the control of a first scanning signal provided by the first scanning line; the compensation control circuit is configured to control to connect the first terminal of the driving circuit and the connection node under the control of a second scanning signal provided by the second scanning line; the first control circuit is configured to control to connect the control terminal of the driving circuit and the connection node under the control of the first scanning signal.
Abstract:
A thin film transistor, a manufacturing method thereof, and a display device are provided. The thin film transistor includes a gate electrode (21), an active layer (23), a source electrode (241) and a drain electrode (242). The source electrode (241) and the drain electrode (242) are formed of at least two materials, the forming materials of the source electrode (241) and the drain electrode (242) can create a cell reaction in a corresponding etching solution so as to be etched, and material of the active layer (23) is not corroded by the etching solution. With the thin film transistor and manufacturing method thereof according to embodiments of the invention, a problem that an active layer is liable to be corroded in an etching procedure of a source electrode and a drain electrode can be solved, and thus the thin film transistor device can be manufactured by using a back channel etch process. Consequently, the process number for manufacture of the thin film transistor is decreased, and the manufacturing cost is saved.
Abstract:
A thin film transistor is provided. An active layer (3) of the thin film transistor is made of an amorphous phosphide semiconductor material. Due to high carrier mobility of the phosphide semiconductor material, a thin film transistor with a high carrier mobility can be obtained by employing the amorphous phosphide semiconductor material to prepare the active layer of the thin film transistor. A method for manufacturing such a thin film transistor, and an array substrate and a display panel each comprising such a thin film transistor, are further provided.
Abstract:
In the pixel circuit, the data writing-in circuit is configured to control to connect the data line and the second terminal of the driving circuit under the control of a first scanning signal provided by the first scanning line; the compensation control circuit is configured to control to connect the first terminal of the driving circuit and the connection node under the control of a second scanning signal provided by the second scanning line; the first control circuit is configured to control to connect the control terminal of the driving circuit and the connection node under the control of the first scanning signal.
Abstract:
Disclosed are a thin film transistor, an array substrate and a display device. The thin film transistor comprises a gate electrode, a gate insulating layer, an active layer, a source electrode and a drain electrode, wherein the active layer comprises at least two layers of semiconductor thin films, and the at least two layers of semiconductor thin films comprise at least one layer of monocrystalline semiconductor thin film.
Abstract:
A display panel comprises: a base substrate; a first electrode layer, which is located on one side of the base substrate, and comprises a plurality of first electrodes; a pixel defining layer, which is located on the side of the first electrode layer that faces away from the base substrate, and comprises a plurality of sub-pixel opening regions; a common layer, which is located on the sides of the first electrodes that face away from the base substrate, covers the pixel defining layer, and is used for transferring a hole or an electron; and a second electrode layer, which is located on the side of the common layer that faces away from the base substrate. The display panel further comprises an extension structure, which is located on the side of the pixel defining layer that faces away from the base substrate, is located between adjacent sub-pixel opening regions.
Abstract:
An attaching apparatus is provided and includes: a base and a cover pivotally connected to the base. The base includes a to-be-attached object positioning portion for positioning and fixing the to-be-attached object. The cover includes an adhesive positioning portion for positioning and fixing the adhesive. The cover is rotatable relative to the base between an opening position and a closing position where the adhesive in the adhesive positioning portion is pressed against the to-be-attached object in the to-be-attached object positioning portion.
Abstract:
Embodiments of the present invention disclose a thin film transistor and an array substrate, manufacturing methods thereof, and a display device, which relate to the field of display technology, and can improve drifting of a threshold voltage of a thin film transistor and enhance the stability and reliability of an array substrate. The thin film transistor comprises an active layer and a gate insulating layer, wherein the material of the active layer is a metal oxide semiconductor, and during forming the thin film transistor, the gate insulating layer conveys oxygen to the active layer so as to reduce an interface state density and a movable impurity concentration of a. contact interface between the active layer and the gate insulating layer.
Abstract:
The present invention provides a complementary thin film transistor and a manufacturing method thereof, an array substrate and a display apparatus, relates to the field of manufacturing technology of thin film transistor, and can solve the problem that active layer materials of first and second thin film transistors in a complementary thin film transistor of the prior art have influence with each other. The manufacturing method of the present invention comprises steps of: forming a pattern comprising an active layer of a first thin film transistor and a protective layer on a base by a patterning process, and the protective layer is at least located above the active layer of the thin film transistor; and forming a pattern of an active layer of a second thin film transistor on the base subjected to above step by a patterning process. The present invention may be applied to various circuits and systems.