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11.
公开(公告)号:US08564760B2
公开(公告)日:2013-10-22
申请号:US12904617
申请日:2010-10-14
申请人: Martinus Hendrikus Antonius Leenders , Sjoerd Nicolaas Lambertus Donders , Nicolaas Rudolf Kemper
发明人: Martinus Hendrikus Antonius Leenders , Sjoerd Nicolaas Lambertus Donders , Nicolaas Rudolf Kemper
IPC分类号: G03B27/42 , B01D57/02 , B01D59/42 , B01D59/50 , B01D61/42 , B01D61/58 , C02F1/469 , C07K1/26 , C08F2/58 , C25B15/00 , C25B7/00 , G01F1/64 , G01L1/20 , G01L9/18
CPC分类号: G03F7/70341
摘要: A capillary passage is formed between a substrate holder and an edge structure. Along the capillary passage are arranged a plurality of electrodes which, when charged, become liquidphilic. The electrodes may be used to split droplets of liquid and pump the liquid along the capillary passage.
摘要翻译: 在基板保持器和边缘结构之间形成毛细通道。 沿着毛细通道布置有多个电极,当被带电时,它们变成液晶。 电极可用于分离液体液滴并沿着毛细通道泵送液体。
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12.
公开(公告)号:US07839483B2
公开(公告)日:2010-11-23
申请号:US11319215
申请日:2005-12-28
申请人: Martinus Hendrikus Antonius Leenders , Sjoerd Nicolaas Lambertus Donders , Nicolaas Rudolf Kemper
发明人: Martinus Hendrikus Antonius Leenders , Sjoerd Nicolaas Lambertus Donders , Nicolaas Rudolf Kemper
IPC分类号: G03B27/42 , B01D57/02 , B01D59/42 , B01D59/50 , B01D61/42 , B01D61/58 , C02F1/469 , C07K1/26 , C08F2/58 , C25B15/00 , C25B7/00 , G01F1/64 , G01L1/20 , G01L9/18
CPC分类号: G03F7/70341
摘要: A capillary passage is formed between a substrate holder and an edge structure. Along the capillary passage are arranged a plurality of electrodes which, when charged, become liquidphilic. The electrodes may be used to split droplets of liquid and pump the liquid along the capillary passage.
摘要翻译: 在基板保持器和边缘结构之间形成毛细通道。 沿着毛细通道布置有多个电极,当被带电时,它们变成液晶。 电极可用于分离液体液滴并沿着毛细通道泵送液体。
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公开(公告)号:US20090303455A1
公开(公告)日:2009-12-10
申请号:US12541755
申请日:2009-08-14
申请人: Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel , Martinus Hendrikus Antonius Leenders , Joost Jeroen Ottens
发明人: Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel , Martinus Hendrikus Antonius Leenders , Joost Jeroen Ottens
IPC分类号: G03B27/54
CPC分类号: G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
摘要: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
摘要翻译: 在浸没式光刻投影装置的液体去除系统中使用多孔构件来平滑不均匀的流动。 多孔构件上的压差可以保持在多孔构件的起泡点以下,从而获得单相液体流。 或者,多孔构件可以用于减少两相流中的不均匀性。
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公开(公告)号:US07602470B2
公开(公告)日:2009-10-13
申请号:US11212921
申请日:2005-08-29
申请人: Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christian Alexander Hoogendam , Nicolaas Ten Kate , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Joost Jeroen Ottens , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel
发明人: Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christian Alexander Hoogendam , Nicolaas Ten Kate , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Joost Jeroen Ottens , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel
CPC分类号: G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
摘要: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
摘要翻译: 在浸没式光刻投影装置的液体去除系统中使用多孔构件来平滑不均匀的流动。 多孔构件上的压差可以保持在多孔构件的起泡点以下,从而获得单相液体流。 或者,多孔构件可以用于减少两相流中的不均匀性。
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公开(公告)号:US08446563B2
公开(公告)日:2013-05-21
申请号:US12541755
申请日:2009-08-14
申请人: Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Joost Jeroen Ottens , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Johannes Petrus Maria Smeulers , Stefan Philip Christiaan Belfroid , Herman Vogel
发明人: Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Joost Jeroen Ottens , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Johannes Petrus Maria Smeulers , Stefan Philip Christiaan Belfroid , Herman Vogel
CPC分类号: G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
摘要: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
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公开(公告)号:US20110273675A1
公开(公告)日:2011-11-10
申请号:US13186123
申请日:2011-07-19
申请人: Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederick De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelius Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel , Martinus Hendrikus Antonius Leenders , Joost Jeroen Ottens
发明人: Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederick De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelius Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel , Martinus Hendrikus Antonius Leenders , Joost Jeroen Ottens
IPC分类号: G03B27/52
CPC分类号: G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
摘要: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
摘要翻译: 在浸没式光刻投影装置的液体去除系统中使用多孔构件来平滑不均匀的流动。 多孔构件上的压差可以保持在多孔构件的起泡点以下,从而获得单相液体流。 或者,多孔构件可以用于减少两相流中的不均匀性。
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公开(公告)号:US08988651B2
公开(公告)日:2015-03-24
申请号:US13242125
申请日:2011-09-23
申请人: Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
发明人: Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
CPC分类号: G03F7/70716 , G03F7/70341 , G03F7/70808
摘要: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
摘要翻译: 用于浸没式光刻设备的液体供应系统在投影系统的最终元件和基底之间提供浸液的层流。 控制系统使溢出的机会最小化,并且提取器包括被配置为使振动最小化的出口阵列。
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公开(公告)号:US20080212051A1
公开(公告)日:2008-09-04
申请号:US12081168
申请日:2008-04-11
申请人: Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
发明人: Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
IPC分类号: G03B27/52
CPC分类号: G03F7/70716 , G03F7/70341 , G03F7/70808
摘要: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
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公开(公告)号:US08976334B2
公开(公告)日:2015-03-10
申请号:US13240908
申请日:2011-09-22
申请人: Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
发明人: Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
CPC分类号: G03F7/70716 , G03F7/70341 , G03F7/70808
摘要: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
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公开(公告)号:US08259287B2
公开(公告)日:2012-09-04
申请号:US12081168
申请日:2008-04-11
申请人: Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
发明人: Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
CPC分类号: G03F7/70716 , G03F7/70341 , G03F7/70808
摘要: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
摘要翻译: 用于浸没式光刻设备的液体供应系统在投影系统的最终元件和基底之间提供浸液的层流。 控制系统使溢出的机会最小化,并且提取器包括被配置为使振动最小化的出口阵列。
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