摘要:
A method and clamp system for use on an ion implanter system for aligning a cathode and filament relative to one another in-situ are disclosed. The invention includes a clamp system having a clamp including a first clamp member separably coupled to a second clamp member, and an opening to a mount portion of one of the cathode and the filament in at least one of the clamp members. Each clamp member includes a surface to engage a mount portion of one of the cathode and the filament. The opening is adapted to receive a positioning tool to position the cathode and the filament relative to one another by moving the mount portion when the clamp is released. The mount portion may include a tool receiving member to facilitate accurate positioning.
摘要:
A method and clamp system for use on an ion implanter system for aligning a cathode and filament relative to one another in-situ are disclosed. The invention includes a clamp system having a clamp including a first clamp member separably coupled to a second clamp member, and an opening to a mount portion of one of the cathode and the filament in at least one of the clamp members. Each clamp member includes a surface to engage a mount portion of one of the cathode and the filament. The opening is adapted to receive a positioning tool to position the cathode and the filament relative to one another by moving the mount portion when the clamp is released. The mount portion may include a tool receiving member to facilitate accurate positioning.
摘要:
A technique for providing an inductively coupled radio frequency plasma flood gun is disclosed. In one particular exemplary embodiment, the technique may be realized as a plasma flood gun in an ion implantation system. The plasma flood gun may comprise: a plasma chamber having one or more apertures; a gas source capable of supplying at least one gaseous substance to the plasma chamber; and a power source capable of inductively coupling radio frequency electrical power into the plasma chamber to excite the at least one gaseous substance to generate a plasma. Entire inner surface of the plasma chamber may be free of metal-containing material and the plasma may not be exposed to any metal-containing component within the plasma chamber. In addition, the one or more apertures may be wide enough for at least one portion of charged particles from the plasma to flow through.