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公开(公告)号：US20080072413A1
公开(公告)日：2008-03-27
申请号：US11194260
申请日：2005-08-01
申请人： Stephen Krause , Eric R. Cobb , Russell Low
发明人： Stephen Krause , Eric R. Cobb , Russell Low
CPC分类号： H01J9/18 , Y10T29/49895 , Y10T29/49899 , Y10T29/53909
摘要： A method and clamp system for use on an ion implanter system for aligning a cathode and filament relative to one another in-situ are disclosed. The invention includes a clamp system having a clamp including a first clamp member separably coupled to a second clamp member, and an opening to a mount portion of one of the cathode and the filament in at least one of the clamp members. Each clamp member includes a surface to engage a mount portion of one of the cathode and the filament. The opening is adapted to receive a positioning tool to position the cathode and the filament relative to one another by moving the mount portion when the clamp is released. The mount portion may include a tool receiving member to facilitate accurate positioning.
摘要翻译： 公开了一种用于离子注入机系统的方法和夹紧系统，用于将阴极和细丝相对于彼此原位排列。 本发明包括具有夹具的夹具系统，该夹具包括可分离地联接到第二夹紧构件的第一夹紧构件以及至少一个夹紧构件中的阴极和细丝之一的安装部分的开口。 每个夹持构件包括与阴极和细丝之一的安装部分接合的表面。 开口适于接收定位工具以通过在夹具被释放时移动安装部分来相对于彼此定位阴极和灯丝。 安装部分可以包括工具接收构件以便于精确定位。
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公开(公告)号：US07887034B2
公开(公告)日：2011-02-15
申请号：US11194260
申请日：2005-08-01
申请人： Stephen Krause , Eric R. Cobb , Russell Low
发明人： Stephen Krause , Eric R. Cobb , Russell Low
IPC分类号： B25B3/00
CPC分类号： H01J9/18 , Y10T29/49895 , Y10T29/49899 , Y10T29/53909
摘要： A method and clamp system for use on an ion implanter system for aligning a cathode and filament relative to one another in-situ are disclosed. The invention includes a clamp system having a clamp including a first clamp member separably coupled to a second clamp member, and an opening to a mount portion of one of the cathode and the filament in at least one of the clamp members. Each clamp member includes a surface to engage a mount portion of one of the cathode and the filament. The opening is adapted to receive a positioning tool to position the cathode and the filament relative to one another by moving the mount portion when the clamp is released. The mount portion may include a tool receiving member to facilitate accurate positioning.
摘要翻译： 公开了一种用于离子注入机系统的方法和夹紧系统，用于将阴极和细丝相对于彼此原位排列。 本发明包括具有夹具的夹具系统，该夹具包括可分离地联接到第二夹紧构件的第一夹紧构件以及至少一个夹紧构件中的阴极和细丝之一的安装部分的开口。 每个夹持构件包括与阴极和细丝之一的安装部分接合的表面。 开口适于接收定位工具以通过在夹具被释放时移动安装部分来相对于彼此定位阴极和灯丝。 安装部分可以包括工具接收构件以便于精确定位。
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3.发明申请Technique for providing an inductively coupled radio frequency plasma flood gun 审中-公开提供电感耦合射频等离子体喷枪的技术公开(公告)号：US20070137576A1
公开(公告)日：2007-06-21
申请号：US11376850
申请日：2006-03-16
CPC分类号： H01J37/3171 , H01J37/026 , H01J2237/0041 , H01J2237/0044
摘要： A technique for providing an inductively coupled radio frequency plasma flood gun is disclosed. In one particular exemplary embodiment, the technique may be realized as a plasma flood gun in an ion implantation system. The plasma flood gun may comprise: a plasma chamber having one or more apertures; a gas source capable of supplying at least one gaseous substance to the plasma chamber; and a power source capable of inductively coupling radio frequency electrical power into the plasma chamber to excite the at least one gaseous substance to generate a plasma. Entire inner surface of the plasma chamber may be free of metal-containing material and the plasma may not be exposed to any metal-containing component within the plasma chamber. In addition, the one or more apertures may be wide enough for at least one portion of charged particles from the plasma to flow through.
摘要翻译： 公开了一种用于提供电感耦合射频等离子体喷枪的技术。 在一个特定的示例性实施例中，该技术可以被实现为离子注入系统中的等离子体喷枪。 等离子体喷枪可以包括：具有一个或多个孔的等离子体室; 能够向所述等离子体室供给至少一种气态物质的气体源; 以及能够将射频电力感应耦合到等离子体室中以激发至少一种气态物质以产生等离子体的电源。 等离子体室的整个内表面可以没有含金属的材料，并且等离子体可能不暴露于等离子体室内的任何含金属的组分。 此外，一个或多个孔可以足够宽以使来自等离子体的带电粒子的至少一部分流过。
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公开(公告)号：US20080169427A1
公开(公告)日：2008-07-17
申请号：US11776217
申请日：2007-07-11
IPC分类号： B01J37/30
CPC分类号： H01J27/02 , C23C14/246 , C23C14/48 , H01J37/08 , H01J37/3171 , H01J2237/006
摘要： Techniques for providing ion source feed materials are disclosed. In one particular exemplary embodiment, the techniques may be realized as a container for supplying an ion source feed material. The container may comprise an internal cavity to be pre-filled with an ion source feed material. The container may also comprise an outer body configured to be removably loaded into a corresponding housing that is coupled to an ion source chamber via a nozzle assembly. The container may further comprise an outlet to seal in the pre-filled ion source feed material, the outlet being further configured to engage with the nozzle assembly to establish a flow path between the internal cavity and the ion source chamber. The container may be configured to be a disposable component.
摘要翻译： 公开了提供离子源进料的技术。 在一个特定的示例性实施例中，这些技术可以被实现为用于提供离子源进料的容器。 容器可以包括预先填充有离子源进料的内部空腔。 容器还可以包括被配置为可移除地装载到经由喷嘴组件耦合到离子源室的相应壳体中的外主体。 容器还可包括密封在预填充的离子源进料中的出口，该出口进一步构造成与喷嘴组件接合以在内腔和离子源室之间建立流路。 容器可以被配置为一次性部件。
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5.发明授权Source arc chamber for ion implanter having repeller electrode mounted to external insulator 有权用于离子注入机的源弧室，其具有安装到外部绝缘体的排斥电极公开(公告)号：US07102139B2
公开(公告)日：2006-09-05
申请号：US11044659
申请日：2005-01-27
申请人： Russell J. Low , Eric R. Cobb , Joseph C. Olson , Leo V. Klos
发明人： Russell J. Low , Eric R. Cobb , Joseph C. Olson , Leo V. Klos
IPC分类号： H01J7/24
CPC分类号： H01J27/08
摘要： An ion implanter has a source arc chamber including a conductive end wall at a repeller end of the arc chamber, the end wall having a central portion surrounding an opening. A ceramic insulator is secured to an outer surface of the end wall, such as by peripheral screw threads engaging mating threads at the periphery of a recessed area of the end wall. A conductive repeller has a narrow shaft secured to the insulator and extending through the end wall opening, and a body disposed within the source arc chamber adjacent to the end wall. The end wall, insulator and repeller are configured to form a continuous vacuum gap between the central portion of the end wall and (i) the repeller body, (ii) the repeller shaft, and (iii) the insulator. The insulator interior surface can have a ridged cross section.
摘要翻译： 离子注入机具有源电弧室，该电弧室包括在电弧室的排斥端处的导电端壁，端壁具有包围开口的中心部分。 陶瓷绝缘体固定在端壁的外表面上，例如通过外周螺纹与端壁的凹陷区域的周边处的配合螺纹啮合。 导电排斥器具有固定到绝缘体并延伸通过端壁开口的窄轴，以及设置在源弧室内与主体壁相邻的主体。 端壁，绝缘体和推斥器构造成在端壁的中心部分与（i）推斥体之间形成连续的真空间隙，（ii）推斥轴，和（iii）绝缘体。 绝缘体内表面可以具有脊状横截面。
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公开(公告)号：US07655932B2
公开(公告)日：2010-02-02
申请号：US11776217
申请日：2007-07-11
CPC分类号： H01J27/02 , C23C14/246 , C23C14/48 , H01J37/08 , H01J37/3171 , H01J2237/006
摘要： Techniques for providing ion source feed materials are disclosed. In one particular exemplary embodiment, the techniques may be realized as a container for supplying an ion source feed material. The container may comprise an internal cavity to be pre-filled with an ion source feed material. The container may also comprise an outer body configured to be removably loaded into a corresponding housing that is coupled to an ion source chamber via a nozzle assembly. The container may further comprise an outlet to seal in the pre-filled ion source feed material, the outlet being further configured to engage with the nozzle assembly to establish a flow path between the internal cavity and the ion source chamber. The container may be configured to be a disposable component.
摘要翻译： 公开了提供离子源进料的技术。 在一个特定的示例性实施例中，这些技术可以被实现为用于提供离子源进料的容器。 容器可以包括预先填充有离子源进料的内部空腔。 容器还可以包括被配置为可移除地装载到经由喷嘴组件耦合到离子源室的相应壳体中的外主体。 容器还可包括密封在预填充的离子源进料中的出口，该出口进一步构造成与喷嘴组件接合以在内腔和离子源室之间建立流路。 容器可以被配置为一次性部件。
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7.发明授权公开(公告)号：US06984831B2
公开(公告)日：2006-01-10
申请号：US10794850
申请日：2004-03-05
IPC分类号： H01J37/08
CPC分类号： H01J37/08 , H01J37/3171 , H01J2237/006 , H01J2237/061 , H01J2237/06308 , H01J2237/082
摘要： A cathode system having a cathode element configured to extend through an aperture in a wall of an arc chamber of an ion implanter system. A gas flow through a spacing between the cathode element and the aperture is restricted by a restriction member. A method of ionizing a source gas and a cathode element incorporating the restriction member are also provided.
摘要翻译： 一种具有阴极元件的阴极系统，其被配置为延伸穿过离子注入系统的电弧室的壁中的孔。 通过限制部件限制通过阴极元件和孔之间的间隔的气流。 还提供了一种电离源气体和结合有限制构件的阴极元件的方法。
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公开(公告)号：US20090314951A1
公开(公告)日：2009-12-24
申请号：US12143247
申请日：2008-06-20
CPC分类号： H01J37/08 , H01J37/3171 , H01J2237/022 , H01J2237/024 , H01J2237/0458 , H01J2237/061
摘要： In a cleaning process for an ion source chamber, an electrode positioned outside of the ion source chamber includes a suppression plug. When the cleaning gas is introduced into the source chamber, the suppression plug may engage an extraction aperture of the source chamber to adjust the gas pressure within the chamber to enhance chamber cleaning via. plasma-enhanced chemical reaction. The gas conductance between the source chamber aperture and the suppression plug can be adjusted during the cleaning process to provide optimum cleaning conditions and to exhaust unwanted deposits.
摘要翻译： 在离子源室的清洁处理中，位于离子源室外的电极包括抑制塞。 当清洁气体被引入源室中时，抑制塞可以接合源室的提取孔以调节室内的气体压力以增强室清洁。 等离子体增强化学反应。 在清洁过程中可以调节源室孔和抑制塞之间的气体传导，以提供最佳的清洁条件并排出不需要的沉积物。
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9.发明授权公开(公告)号：US08466431B2
公开(公告)日：2013-06-18
申请号：US12370555
申请日：2009-02-12
申请人： James S. Buff , Svetlana Radovanov , Bon-Woong Koo , Wilhelm Platow , Frank Sinclair , D. Jeffrey Lischer , Craig R. Chaney , Steven Borichevsky , Eric R. Cobb , Mayur Jagtap , Kenneth H. Purser , Victor Benveniste , Shardul S. Patel
发明人： James S. Buff , Svetlana Radovanov , Bon-Woong Koo , Wilhelm Platow , Frank Sinclair , D. Jeffrey Lischer , Craig R. Chaney , Steven Borichevsky , Eric R. Cobb , Mayur Jagtap , Kenneth H. Purser , Victor Benveniste , Shardul S. Patel
CPC分类号： H01J37/3171 , H01J27/024 , H01J37/08 , H01J37/09 , H01J37/304 , H01J2237/0453 , H01J2237/0458 , H01J2237/083 , H01J2237/24542
摘要： Techniques for improving extracted ion beam quality using high-transparency electrodes are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for ion implantation. The apparatus may comprise an ion source for generating an ion beam, wherein the ion source comprises a faceplate with an aperture for the ion beam to travel therethrough. The apparatus may also comprise a set of extraction electrodes comprising at least a suppression electrode and a high-transparency ground electrode, wherein the set of extraction electrodes may extract the ion beam from the ion source via the faceplate, and wherein the high-transparency ground electrode may be configured to optimize gas conductance between the suppression electrode and the high-transparency ground electrode for improved extracted ion beam quality.
摘要翻译： 公开了使用高透明电极提高离子束质量的技术。 在一个特定的示例性实施例中，技术可以被实现为用于离子注入的装置。 该装置可以包括用于产生离子束的离子源，其中离子源包括具有离子束穿过其中的孔的面板。 该装置还可以包括至少包括抑制电极和高透明度接地电极的一组提取电极，其中所述提取电极组可以经由面板从离子源提取离子束，并且其中高透明度接地 电极可以被配置为优化抑制电极和高透明度接地电极之间的气体传导，以改善提取的离子束质量。
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公开(公告)号：US08263944B2
公开(公告)日：2012-09-11
申请号：US12340812
申请日：2008-12-22
申请人： John Bon-Woong Koo , David J. Twiss , Chris Campbell , Frank Sinclair , Alexander S. Perel , Craig R. Chaney , Wilhelm P. Platow , Eric R. Cobb
发明人： John Bon-Woong Koo , David J. Twiss , Chris Campbell , Frank Sinclair , Alexander S. Perel , Craig R. Chaney , Wilhelm P. Platow , Eric R. Cobb
IPC分类号： H01J27/00
CPC分类号： H01J27/08 , H01J37/08 , H01J37/3171 , H01J2237/006 , H01J2237/022 , H01J2237/061
摘要： In an ion implanter, an inert gas is directed at a cathode assembly near an ion source chamber via a supply tube. The inert gas is provided with a localized directional flow toward the cathode assembly to reduce unwanted concentrations of cleaning or dopant gases introduced into the ion source chamber, thereby reducing the effects of unwanted filament growth in the cathode assembly and extending the manufacturing life of the ion source.
摘要翻译： 在离子注入机中，惰性气体通过供应管被引导到离子源室附近的阴极组件。 向惰性气体提供朝向阴极组件的局部定向流，以减少引入离子源室的清洁或掺杂气体的不期望浓度，从而减少阴极组件中不想要的细丝生长的影响并延长离子的制造寿命 资源。
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