公开(公告)号：US20070012241A1

公开(公告)日：2007-01-18

申请号：US11525666

申请日：2006-09-22

申请人： Eric Blomiley ,  Nirmal Ramaswamy ,  Ross Dando ,  Joel Drewes ,  Alan Colwell ,  Eduardo Tovar

发明人： Eric Blomiley ,  Nirmal Ramaswamy ,  Ross Dando ,  Joel Drewes ,  Alan Colwell ,  Eduardo Tovar

IPC分类号： C30B23/00 ,  C30B25/00 ,  C30B28/12 ,  C30B28/14

CPC分类号： H01L21/67248 ,  C23C16/481 ,  C23C16/52 ,  C30B25/165 ,  C30B31/18

摘要： The invention includes deposition apparatuses configured to monitor the temperature of a semiconductor wafer substrate by utilizing conduits which channel radiation from the substrate to a detector/signal processor system. In particular aspects, the temperature of the substrate can be measured while the substrate is spinning within a reaction chamber. The invention also includes deposition apparatuses in which flow of mixed gases is controlled by mass flow controllers provided downstream of the location where the gases are mixed and/or where flow of gases is measured with mass flow measurement devices provided downstream of the location where the gases are mixed. Additionally, the invention encompasses deposition apparatuses in which mass flow controllers and/or mass flow measurement devices are provided upstream of a header which splits a source gas into multiple paths directed toward multiple different reaction chambers.

摘要翻译： 本发明包括沉积设备，其被配置为通过利用将辐射从衬底传送到检测器/信号处理器系统的管道来监测半导体晶片衬底的温度。 在特定方面，可以在衬底在反应室内旋转的同时测量衬底的温度。 本发明还包括沉积装置，其中混合气体的流动由设置在气体混合位置下游的质量流量控制器控制，和/或在气体流量测量时，质量流量测量装置设置在气体的位置的下游 混合 此外，本发明还包括沉积装置，其中质量流量控制器和/或质量流量测量装置设置在将源气体分成多个指向多个不同反应室的路径的集管的上游。

公开(公告)号：US20050217585A1

公开(公告)日：2005-10-06

申请号：US10816691

申请日：2004-04-01

申请人： Eric Blomiley ,  Joel Drewes ,  Nirmal Ramaswamy ,  Ross Dando

发明人： Eric Blomiley ,  Joel Drewes ,  Nirmal Ramaswamy ,  Ross Dando

IPC分类号： C23C16/00 ,  C23C16/458

CPC分类号： C23C16/4586

摘要： This invention includes substrate susceptors which receive substrates to be deposited upon. In one implementation, a substrate susceptor includes a body having a substrate receiving side. The substrate receiving side has a face having a substrate receiving recess formed therein. The recess has an outer peripheral sidewall. At least three projections extend outwardly from a portion of the face. The projections respectively comprise a radially inner sidewall which extends outwardly from the recess outer peripheral sidewall to a projection upper surface. Other aspects and implementations are contemplated.

摘要翻译： 本发明包括接收要沉积的衬底的衬底感受体。 在一个实施方式中，衬底基座包括具有衬底接收侧的本体。 基板接收侧具有形成有基板容纳凹部的面。 凹部具有外周侧壁。 至少三个突起从面部的一部分向外延伸。 突起分别包括从凹部外周侧壁向外延伸到突起上表面的径向内侧壁。 考虑了其他方面和实现。

公开(公告)号：US20060216840A1

公开(公告)日：2006-09-28

申请号：US11445032

申请日：2006-05-31

申请人： Eric Blomiley ,  Nirmal Ramaswamy ,  Ross Dando ,  Joel Drewes

发明人： Eric Blomiley ,  Nirmal Ramaswamy ,  Ross Dando ,  Joel Drewes

IPC分类号： H01L21/66 ,  C23C14/54 ,  C23C16/52

CPC分类号： H01L21/67115 ,  C23C16/481 ,  C23C16/52

摘要： The invention includes deposition apparatuses having reflectors with rugged reflective surfaces configured to disperse light reflected therefrom, and/or having dispersers between lamps and a substrate. The invention also includes optical methods for utilization within a deposition apparatus for assessing the alignment of a substrate within the apparatus and/or for assessing the thickness of a layer of material deposited within the apparatus.

摘要翻译： 本发明包括具有反射器的沉积设备，其具有凹凸反射表面，其被配置为分散从其反射的光，和/或在灯和基板之间具有分散器。 本发明还包括用于在沉积设备中利用的光学方法，用于评估设备内的衬底的对准和/或用于评估沉积在设备内的材料层的厚度。

公开(公告)号：US20060191483A1

公开(公告)日：2006-08-31

申请号：US11400009

申请日：2006-04-07

申请人： Eric Blomiley ,  Joel Drewes ,  Nirmal Ramaswamy ,  Ross Dando

发明人： Eric Blomiley ,  Joel Drewes ,  Nirmal Ramaswamy ,  Ross Dando

IPC分类号： C23C16/00

CPC分类号： C23C16/4586

摘要： This invention includes substrate susceptors which receive substrates to be deposited upon. In one implementation, a substrate susceptor includes a body having a substrate receiving side. The substrate receiving side has a face having a substrate receiving recess formed therein. The recess has an outer peripheral sidewall. At least three projections extend outwardly from a portion of the face. The projections respectively comprise a radially inner sidewall which extends outwardly from the recess outer peripheral sidewall to a projection upper surface. Other aspects and implementations are contemplated.

摘要翻译： 本发明包括接收要沉积的衬底的衬底感受体。 在一个实施方式中，衬底基座包括具有衬底接收侧的本体。 基板接收侧具有形成有基板容纳凹部的面。 凹部具有外周侧壁。 至少三个突起从面部的一部分向外延伸。 突起分别包括从凹部外周侧壁向外延伸到突起上表面的径向内侧壁。 考虑了其他方面和实现。

公开(公告)号：US20050223993A1

公开(公告)日：2005-10-13

申请号：US10822060

申请日：2004-04-08

申请人： Eric Blomiley ,  Nirmal Ramaswamy ,  Ross Dando ,  Joel Drewes

发明人： Eric Blomiley ,  Nirmal Ramaswamy ,  Ross Dando ,  Joel Drewes

IPC分类号： B05D1/00 ,  C23C16/00 ,  C23C16/48 ,  C23C16/52 ,  H01L21/00

CPC分类号： H01L21/67115 ,  C23C16/481 ,  C23C16/52

摘要： The invention includes deposition apparatuses having reflectors with rugged reflective surfaces configured to disperse light reflected therefrom, and/or having dispersers between lamps and a substrate. The invention also includes optical methods for utilization within a deposition apparatus for assessing the alignment of a substrate within the apparatus and/or for assessing the thickness of a layer of material deposited within the apparatus.

摘要翻译： 本发明包括具有反射器的沉积设备，其具有凹凸反射表面，其被配置为分散从其反射的光，和/或在灯和基板之间具有分散器。 本发明还包括用于在沉积设备中利用的光学方法，用于评估设备内的衬底的对准和/或用于评估沉积在设备内的材料层的厚度。

公开(公告)号：US20050028734A1

公开(公告)日：2005-02-10

申请号：US10932470

申请日：2004-09-01

申请人： Craig Carpenter ,  Ross Dando ,  Danny Dynka

发明人： Craig Carpenter ,  Ross Dando ,  Danny Dynka

IPC分类号： C23C16/44 ,  C23C16/455 ,  C23C16/54 ,  C23C16/00

CPC分类号： C23C16/54 ,  C23C16/4401 ,  C23C16/45519 ,  C23C16/45544

摘要： Reactors having gas distributors for depositing materials onto micro-device workpieces, systems that include such reactors, and methods for depositing materials onto micro-device workpieces are disclosed herein. In one embodiment, a reactor for depositing materials onto a micro-device workpiece includes a reaction chamber, a passageway, and a door assembly. The reaction chamber includes a gas distributor configured to provide a flow of gas(es) to a micro-device workpiece on a workpiece holder. The passageway, which has a first end open to the reaction chamber and a second end apart from the reaction chamber, is configured to provide ingression to and egression from the chamber for processing the micro-device workpiece. The door assembly is configured to open and sealably close a door at the second end of the passageway. A gas conditioning system positioned in the door is configured to maintain a desired concentration and phase of gas constituents in the passageway.

公开(公告)号：US20080212303A1

公开(公告)日：2008-09-04

申请号：US11681340

申请日：2007-03-02

申请人： Warren Farnworth ,  Ross Dando

发明人： Warren Farnworth ,  Ross Dando

IPC分类号： H05K9/00

CPC分类号： H05K9/0043 ,  G06K19/07327

摘要： A device that is adapted to receive a card including information, such as confidential information, in machine-readable form is disclosed. The device includes a body, wherein at least a portion of the body is made of a material that is adapted to attenuate or disrupt an interrogating signal sent toward the card or a return signal sent from the card to thereby at least reduce the likelihood that the confidential information is read from the card.

摘要翻译： 公开了一种适于以机器可读形式接收包括诸如机密信息等信息的卡的设备。 该装置包括主体，其中主体的至少一部分由适于衰减或破坏朝向卡发送的询问信号的材料或从卡发送的返回信号，从而至少降低了可能性 从卡中读取机密信息。

公开(公告)号：US20070062465A1

公开(公告)日：2007-03-22

申请号：US11198560

申请日：2004-08-10

申请人： Ross Dando ,  Allen Mardian ,  Raynald Cantin ,  Gurtej Sandhu

发明人： Ross Dando ,  Allen Mardian ,  Raynald Cantin ,  Gurtej Sandhu

IPC分类号： F22B37/10

CPC分类号： H01L21/6708 ,  C23C16/4481

摘要： The present invention is generally directed to a vaporizer with positive liquid shut-off. In one illustrative embodiment, the vaporizer is comprised of a body, a liquid inlet and a carrier gas inlet coupled to the body, a nozzle positioned within the body, the nozzle having at least one opening formed therethrough that defines a vaporized liquid exit, and a positive shut-off valve, a portion of which is adapted to engage the vaporized liquid exit of the nozzle. In another illustrative embodiment, the vaporizer is comprised of a body, a liquid inlet and a carrier gas inlet coupled to-the body and a plurality of peltier cells coupled to the body.

摘要翻译： 本发明一般涉及具有正液体截止的汽化器。 在一个说明性实施例中，蒸发器包括主体，液体入口和连接到主体的载气入口，位于主体内的喷嘴，喷嘴具有限定蒸发的液体出口的至少一个通过其形成的开口，以及 正截止阀，其一部分适于接合喷嘴的汽化液体出口。 在另一示例性实施例中，蒸发器包括主体，液体入口和连接到主体的载气入口以及耦合到主体的多个珀耳帖细胞。

公开(公告)号：US20060097849A1

公开(公告)日：2006-05-11

申请号：US11312669

申请日：2005-12-19

申请人： Ross Dando

发明人： Ross Dando

IPC分类号： H04Q5/22

CPC分类号： G06K19/07749 ,  H01L23/49855 ,  H01L2224/16 ,  H01L2924/0102 ,  H01L2924/01079 ,  H01L2924/3025

摘要： The present invention relates to wireless communication devices and methods of forming and operating the same. The present invention provides a wireless communication device including a substrate having a support surface, wireless communication circuitry upon the support surface of the substrate, at least one antenna electrically coupled with the wireless communication circuitry, a conductive layer configured to interact with the antenna, and an insulative layer intermediate the conductive layer and the antenna. A method of forming a wireless communication device includes providing a substrate having a support surface, forming an antenna upon the support surface, conductively coupling wireless communication circuitry with the antenna, forming an insulative layer over at least a portion of the antenna, and providing a conductive layer over at least a portion of the insulative layer.

摘要翻译： 本发明涉及无线通信装置及其形成和操作方法。 本发明提供了一种无线通信设备，其包括具有支撑表面的基板，在基板的支撑表面上的无线通信电路，与无线通信电路电耦合的至少一个天线，被配置为与天线相互作用的导电层，以及 在导电层和天线之间的绝缘层。 一种形成无线通信设备的方法包括提供具有支撑表面的基板，在支撑表面上形成天线，将无线通信电路与天线导电耦合，在天线的至少一部分上形成绝缘层，并提供 绝缘层的至少一部分上的导电层。

公开(公告)号：US20060027326A1

公开(公告)日：2006-02-09

申请号：US11208964

申请日：2005-08-22

申请人： Craig Carpenter ,  Ross Dando ,  Allen Mardian ,  Kevin Hamer ,  Raynald Cantin ,  Philip Campbell ,  Kimberly Tschepen ,  Randy Mercil

发明人： Craig Carpenter ,  Ross Dando ,  Allen Mardian ,  Kevin Hamer ,  Raynald Cantin ,  Philip Campbell ,  Kimberly Tschepen ,  Randy Mercil

IPC分类号： C23F1/00

CPC分类号： H01L21/67126 ,  C23C16/4409 ,  C23C16/54 ,  Y10S414/139

摘要： A semiconductor substrate processor includes a substrate transfer chamber and a plurality of substrate processing chambers connected therewith. An interfacial structure is received between at least one of the processing chambers and the transfer chamber. The interfacial structure includes a substantially non-metallic, thermally insulative mass of material interposed between the one processing chamber and the transfer chamber. The mass is of sufficient volume to effectively reduce heat transfer from the processing chamber to the transfer chamber than would otherwise occur in the absence of said mass of material. An interfacial structure includes a body having a substrate passageway extending therethrough. The passageway includes walls at least a portion of which are substantially metallic. The body includes material peripheral of the walls which is substantially non-metallic and thermally insulative. The substantially non-metallic material has mounting openings extending at least partially therein.

摘要翻译： 半导体衬底处理器包括衬底传送室和与之连接的多个衬底处理室。 在至少一个处理室和传送室之间接收界面结构。 界面结构包括插入在一个处理室和传送室之间的基本上非金属的绝热材料块。 质量足够的体积以有效地减少从处理室到传送室的传热比否则不存在所述材料块的情况。 界面结构包括具有延伸穿过其中的基底通道的主体。 该通道包括其至少一部分基本上是金属的壁。 主体包括基本上非金属和热绝缘的壁的材料周边。 基本上非金属材料具有其中至少部分延伸的安装开口。