公开(公告)号：US20180180996A1

公开(公告)日：2018-06-28

申请号：US15904439

申请日：2018-02-26

Applicant: FUJIFILM Corporation

Inventor： Hideaki Tsubaki ,  Wataru Nihashi ,  Toru Tsuchihashi ,  Kei Yamamoto

IPC: G03F7/038 ,  G03F7/039 ,  G03F7/11 ,  G03F7/32 ,  H01L21/027

Abstract: The pattern forming method includes forming an actinic ray-sensitive or radiation-sensitive film using an actinic ray-sensitive or radiation-sensitive composition, forming an upper layer film using a composition for forming an upper layer film on the actinic ray-sensitive or radiation-sensitive film, exposing the actinic ray-sensitive or radiation-sensitive film having the upper layer film formed thereon, and developing the exposed actinic ray-sensitive or radiation-sensitive film using a developer containing an organic solvent, in which the composition for forming an upper layer film includes a resin and at least one of a compound capable of generating an acid with actinic rays or radiation, a compound capable of generating an acid with heat, and an acid, in which the resin includes a repeating unit represented by General Formula (II). The method for manufacturing an electronic device includes the pattern forming method. A laminate includes the film and the upper layer film.

公开(公告)号：US10599038B2

公开(公告)日：2020-03-24

申请号：US15849689

申请日：2017-12-21

Applicant: FUJIFILM Corporation

Inventor： Hideaki Tsubaki ,  Toru Tsuchihashi ,  Wataru Nihashi

IPC: G03F7/00 ,  G03F7/32 ,  G03F7/40 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039

Abstract: Provided are a rinsing liquid which is used for rinsing a resist film obtained from an actinic ray-sensitive or radiation-sensitive composition and includes a hydrocarbon-based solvent having a branched alkyl group. The hydrocarbon-based solvent having a branched alkyl group contains at least one of isodecane or isododecane.

公开(公告)号：US09417530B2

公开(公告)日：2016-08-16

申请号：US14497616

申请日：2014-09-26

Applicant: FUJIFILM Corporation

Inventor： Ikuo Takano ,  Toru Tsuchihashi ,  Tomokazu Seki

IPC: G03F7/004 ,  G03F7/32 ,  H01L21/033 ,  G11B5/82 ,  G03F7/039 ,  G03F7/00

CPC classification number: G03F7/32 ,  G03F7/0002 ,  G03F7/0017 ,  G03F7/039 ,  G03F7/325 ,  G11B5/82 ,  H01L21/0337

Abstract: A method for developing a non chemically amplified resist employs a developing fluid having a carboxylic acid compound, which is a carboxylic acid ester having branched chain alkyl groups and a total carbon number of 8 or greater, as a main component. It is particularly preferable for the carboxylic acid compound to be at least one of isobutyl butyrate, butyl isobutyrate, isobutyl isobutyrate, isoamyl isobutyrate, and 2-methylbutyrate 2-methylbutyl. It is also preferable for the non chemically amplified resist to be a resist having a copolymer of an α-chloroacrylate ester compound and an α-methylstyrene compound as a main component.

Abstract translation: 用于开发非化学放大抗蚀剂的方法采用具有羧酸化合物的显影液，其是具有支链烷基和总碳数为8以上的羧酸酯作为主要成分。 特别优选羧酸化合物为丁酸异丁酯，异丁酸丁酯，异丁酸异丁酯，异丁酸异戊酯和2-甲基丁酸2-甲基丁酯中的至少一种。 非化学放大型抗蚀剂也优选为具有α-氯代丙烯酸酯化合物和α-甲基苯乙烯化合物的共聚物作为主要成分的抗蚀剂。