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公开(公告)号：US11198234B2
公开(公告)日：2021-12-14
申请号：US16391341
申请日：2019-04-23
Applicant: FUJIFILM Corporation
Inventor： Yoshiki Sakazaki , Kenichiro Tamaki , Toshihiro Usa , Ikuo Takano
Abstract: Provided are a mold case that prevents deformation of a microneedle array, and a manufacturing method of a microneedle array. The problems are solved by the manufacturing method of a microneedle array including: a filling step of filling needle-like recessed portions of a mold having flexibility and having a plurality of the needle-like recessed portions on a front surface, with a liquid material; and a drying step of drying the liquid material in a state where the mold filled with the liquid material is stored in the mold case which causes an edge portion of the mold to be sandwiched between the lid and the pedestal.
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2.发明授权Method for developing resist, method for forming a resist pattern, method for producing a mold, and developing fluid utilized in these methods 有权用于形成抗蚀剂的方法，用于形成抗蚀剂图案的方法，用于制造模具的方法和在这些方法中使用的显影液公开(公告)号：US09417530B2
公开(公告)日：2016-08-16
申请号：US14497616
申请日：2014-09-26
Applicant: FUJIFILM Corporation
Inventor： Ikuo Takano , Toru Tsuchihashi , Tomokazu Seki
CPC classification number: G03F7/32 , G03F7/0002 , G03F7/0017 , G03F7/039 , G03F7/325 , G11B5/82 , H01L21/0337
Abstract: A method for developing a non chemically amplified resist employs a developing fluid having a carboxylic acid compound, which is a carboxylic acid ester having branched chain alkyl groups and a total carbon number of 8 or greater, as a main component. It is particularly preferable for the carboxylic acid compound to be at least one of isobutyl butyrate, butyl isobutyrate, isobutyl isobutyrate, isoamyl isobutyrate, and 2-methylbutyrate 2-methylbutyl. It is also preferable for the non chemically amplified resist to be a resist having a copolymer of an α-chloroacrylate ester compound and an α-methylstyrene compound as a main component.
Abstract translation: 用于开发非化学放大抗蚀剂的方法采用具有羧酸化合物的显影液，其是具有支链烷基和总碳数为8以上的羧酸酯作为主要成分。 特别优选羧酸化合物为丁酸异丁酯，异丁酸丁酯，异丁酸异丁酯，异丁酸异戊酯和2-甲基丁酸2-甲基丁酯中的至少一种。 非化学放大型抗蚀剂也优选为具有α-氯代丙烯酸酯化合物和α-甲基苯乙烯化合物的共聚物作为主要成分的抗蚀剂。
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公开(公告)号：US11452854B2
公开(公告)日：2022-09-27
申请号：US16391338
申请日：2019-04-23
Applicant: FUJIFILM Corporation
Inventor： Yoshiki Sakazaki , Ikuo Takano , Satoshi Wakamatsu , Keio Okano , Kenichiro Tamaki
Abstract: Provided is a method of manufacturing a microneedle array in which an active ingredient is concentrated at a tip while an active ingredient content is guaranteed. In order to achieve the object, a method of manufacturing a microneedle array in which needle-like recessed portions of a mold are filled with a liquid to form one dose of a patch includes determining a filling amount of the liquid from a difference in mass of the mold before and after filling of the liquid, determining a filling state of the liquid in the mold filled with the liquid, sucking the mold in which the filling amount and the filling state of the liquid are determined to be normal from a rear face, and evaporating and drying a solvent of the liquid of the sucked mold.
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