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    MODIFIED RELEASE COMPOSITION OF AT LEAST ONE FORM OF VENLAFAXINE
    12.
    发明申请
    MODIFIED RELEASE COMPOSITION OF AT LEAST ONE FORM OF VENLAFAXINE 审中-公开
    至少一种芬替康的形式的改性释放组合物

    公开(公告)号：US20080175873A1

    公开(公告)日：2008-07-24

    申请号：US11947883

    申请日：2007-11-30

    Applicant: Fang Zhou ,  Paul Maes ,  Steven Frisbee

    Inventor： Fang Zhou ,  Paul Maes ,  Steven Frisbee

    IPC: A61K9/00 ,  A61K31/137 ,  A61P25/24

    CPC classification number: A61K9/2018 ,  A61K9/2027 ,  A61K9/2054 ,  A61K9/284 ,  A61K9/2866

    Abstract: The present invention relates to a modified release composition of at least one form of venlafaxine, which is an enhanced absorption delayed controlled release composition. The composition comprises a core comprising at least one form of venlafaxine, less than 10% of a gelling agent and a pharmaceutically acceptable excipient. The composition further comprises a modified release coating which substantially surrounds the core which provides a delayed controlled release of the at least one form of venlafaxine.

    Abstract translation: 本发明涉及至少一种形式的文拉法辛的改进释放组合物，其是增强的吸收延迟控释组合物。 组合物包含包含至少一种形式的文拉法辛，小于10％的胶凝剂和药学上可接受的赋形剂的核心。 所述组合物还包含基本上围绕所述芯的改性释放涂层，其提供所述至少一种形式的文拉法辛的延迟控制释放。

    DEVICE AND METHOD FOR SELECTING AN EMISSION AREA OF AN EMISSION PATTERN
    15.
    发明申请
    DEVICE AND METHOD FOR SELECTING AN EMISSION AREA OF AN EMISSION PATTERN 有权
    用于选择排放模式的排放区域的装置和方法

    公开(公告)号：US20070085018A1

    公开(公告)日：2007-04-19

    申请号：US11469753

    申请日：2006-09-01

    Applicant: Fang Zhou ,  Jurgen Frosien

    Inventor： Fang Zhou ,  Jurgen Frosien

    IPC: H01J3/14

    CPC classification number: H01J37/06 ,  H01J2237/045 ,  H01J2237/06316 ,  H01J2237/15

    Abstract: A charged particle beam apparatus and a method for measuring an emission pattern of such an apparatus are provided. The apparatus comprises an emitter with an emission pattern including at least two emission peaks, a gun lens, and a diaphragm, wherein the gun lens comprises a deflector unit and the deflector unit is adapted to direct an emission peak of the at least two emission peaks to an opening of the diaphragm to thereby select the emission peak of the at least two emission peaks from the emission pattern.

    Abstract translation: 提供一种带电粒子束装置和用于测量这种装置的发射图案的方法。 该装置包括具有包括至少两个发射峰值的发射图案的发射器，枪式透镜和隔膜，其中枪形透镜包括偏转器单元，偏转器单元适于引导至少两个发射峰的发射峰 到所述隔膜的开口，从而从所述发射图案中选择所述至少两个发射峰的发射峰。

    Beam current calibration system
    18.
    发明授权
    Beam current calibration system 有权
    光束电流校准系统

    公开(公告)号：US07982179B2

    公开(公告)日：2011-07-19

    申请号：US12366465

    申请日：2009-02-05

    Applicant: Pavel Adamec ,  Fang Zhou

    Inventor： Pavel Adamec ,  Fang Zhou

    IPC: H01J23/00 ,  G12B13/00

    CPC classification number: H01J37/244 ,  H01J37/261 ,  H01J2237/2443 ,  H01J2237/24507 ,  H01J2237/2826

    Abstract: A charged particle beam device is described. The charged particle beam device includes an emitter adapted for emitting a primary charged particle beam, a specimen location adapted for holding a specimen, from which secondary and/or backscattered charged particles are released on impingement of the primary charged particle beam, a detection unit adapted for detecting the secondary particles and/or secondary particles, and a beam guiding unit adapted for guiding the primary charged particle beam to the detection unit for impingement of a primary charged particle beam on the detection unit.

    Abstract translation: 描述带电粒子束装置。 带电粒子束装置包括适于发射初级带电粒子束的发射器，适于保持试样的试样位置，从而从初级带电粒子束的冲击中释放辅助和/或反向散射的带电粒子，检测单元适于 用于检测二次粒子和/或二次粒子的光束引导单元，以及用于将初级带电粒子束引导到检测单元的光束引导单元，用于将一次带电粒子束撞击在检测单元上。

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