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11.Formation of thin films of gold,nickel or copper by photolytic deposition 失效
Title translation: 通过光刻沉积法形成金,镍或铜薄膜公开(公告)号:US3529961A
公开(公告)日:1970-09-22
申请号:US3529961D
申请日:1966-12-27
Applicant: GEN ELECTRIC
Inventor: SCHAEFER DONALD L , BURGESS JAMES F
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公开(公告)号:US3415681A
公开(公告)日:1968-12-10
申请号:US41833964
申请日:1964-12-14
Applicant: GEN ELECTRIC
Inventor: BURGESS JAMES F
CPC classification number: H04N5/82 , G03G5/022 , G03G5/102 , G03G5/14704 , Y10S430/143 , Y10S430/165 , Y10T428/263
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公开(公告)号:US3203836A
公开(公告)日:1965-08-31
申请号:US13470061
申请日:1961-08-29
Applicant: GEN ELECTRIC
Inventor: JOSEPH GAYNOR , BURGESS JAMES F , WAGNER BERNARD C
CPC classification number: C23C14/562 , C03C17/22 , C03C2217/288 , C03C2218/151 , C03C2218/32 , C23C8/08 , C23C14/0021 , C23C14/0623 , C23C14/20 , C23C14/58 , C23C14/5866 , C23C26/00 , G03G5/104 , H01B1/00 , Y10T428/24 , Y10T428/31507 , Y10T428/3154 , Y10T428/31681 , Y10T428/31696 , Y10T428/3171
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