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20 条记录 (耗时 0.036 秒)

    Method of exocasting an article of semiconducting material
    12.
    发明授权
    Method of exocasting an article of semiconducting material 有权
    分离半导体材料制品的方法

    公开(公告)号：US08591795B2

    公开(公告)日：2013-11-26

    申请号：US12631054

    申请日：2009-12-04

    申请人： Prantik Mazumder ,  Balram Suman

    发明人： Prantik Mazumder ,  Balram Suman

    IPC分类号： C30B28/04

    CPC分类号： C30B15/007 ,  C30B11/00 ,  C30B19/062 ,  C30B29/06

    摘要： A method of making an article of a semiconducting material involves selecting a target thickness for the article and then submerging a mold into a molten semiconducting material for a submersion time effective to form a solid layer of semiconducting material over an external surface of the mold where the thickness of the solid layer is substantially equal to the target thickness. The submersion time is selected to be substantially equal to a transition time, which is determined from a plot of solid layer thickness versus submersion time for a mold having particular attributes, including mold composition, mold thickness and initial mold temperature. The transition time, and thus the submersion time, corresponds to a maximum in solid layer thickness in the solid layer thickness versus submersion time curve for the particular mold.

    摘要翻译： 制造半导体材料制品的方法包括选择制品的目标厚度，然后将模具浸入熔融半导体材料中以便浸入时间有效地在模具的外表面上形成半导体材料的固体层，其中 固体层的厚度基本上等于目标厚度。 浸入时间被选择为基本上等于转变时间，其从具有特定属性的模具的实心层厚度对浸没时间的图确定，包括模具成分，模具厚度和初始模具温度。 过渡时间，从而浸没时间对应于固体层厚度对于特定模具的固体层厚度与浸没时间曲线的最大值。

    METHOD OF EXOCASTING AN ARTICLE OF SEMICONDUCTING MATERIAL
    13.
    发明申请
    METHOD OF EXOCASTING AN ARTICLE OF SEMICONDUCTING MATERIAL 有权
    出售半导体材料的方法

    公开(公告)号：US20110135902A1

    公开(公告)日：2011-06-09

    申请号：US12631054

    申请日：2009-12-04

    申请人： Prantik Mazumder ,  Balram Suman

    发明人： Prantik Mazumder ,  Balram Suman

    IPC分类号： B28B1/30

    CPC分类号： C30B15/007 ,  C30B11/00 ,  C30B19/062 ,  C30B29/06

    摘要： A method of making an article of a semiconducting material involves selecting a target thickness for the article and then submerging a mold into a molten semiconducting material for a submersion time effective to form a solid layer of semiconducting material over an external surface of the mold where the thickness of the solid layer is substantially equal to the target thickness. The submersion time is selected to be substantially equal to a transition time, which is determined from a plot of solid layer thickness versus submersion time for a mold having particular attributes, including mold composition, mold thickness and initial mold temperature. The transition time, and thus the submersion time, corresponds to a maximum in solid layer thickness in the solid layer thickness versus submersion time curve for the particular mold.

    摘要翻译： 制造半导体材料制品的方法包括选择制品的目标厚度，然后将模具浸入熔融半导体材料中以便浸入时间有效地在模具的外表面上形成半导体材料的固体层，其中 固体层的厚度基本上等于目标厚度。 浸入时间被选择为基本上等于转变时间，其从具有特定属性的模具的实心层厚度对浸没时间的图确定，包括模具成分，模具厚度和初始模具温度。 过渡时间，从而浸没时间对应于固体层厚度对于特定模具的固体层厚度与浸没时间曲线的最大值。

    Method and apparatus for inspecting ceramic wall flow filters
    14.
    发明授权
    Method and apparatus for inspecting ceramic wall flow filters 有权
    检查陶瓷壁流滤器的方法和装置

    公开(公告)号：US08234909B2

    公开(公告)日：2012-08-07

    申请号：US12548057

    申请日：2009-08-26

    申请人： Balram Suman ,  Srinivasa Rao Vaddiraju ,  Wei Xu

    发明人： Balram Suman ,  Srinivasa Rao Vaddiraju ,  Wei Xu

    IPC分类号： G01N15/08

    CPC分类号： G01M3/38 ,  B01D46/2418 ,  B01D46/42 ,  G01N15/082 ,  G01N21/95692

    摘要： Methods are disclosed for inspecting a cylindrical porous ceramic body by positioning a diffuser near, and spaced apart from, the first end of a ceramic body; flowing a tracer flow toward the diffuser, wherein a first portion of the tracer flow passes through the diffuser, and a second portion of the tracer flow does not pass through the diffuser, the first and second portions of the tracer flow then entering the first end of the ceramic body, wherein the average velocity of the first portion of the tracer flow entering the ceramic body VAVG1 is lower than the average velocity of the second portion of the tracer flow entering the ceramic body VAVG2; directing light toward the second end of the ceramic body; and detecting reflected light coming from a location proximate the second transverse face at the second end of the ceramic body.

    摘要翻译： 公开了用于通过将陶瓷体的第一端附近和间隔开设置扩散器来检查圆柱形多孔陶瓷体的方法; 使示踪剂流向扩散器流动，其中示踪剂流的第一部分通过扩散器，并且示踪剂流的第二部分不通过扩散器，示踪剂流的第一和第二部分然后进入第一端 其中进入陶瓷体VAVG1的示踪剂流的第一部分的平均速度低于进入陶瓷体VAVG2的示踪剂流的第二部分的平均速度; 将光引向陶瓷体的第二端; 以及检测来自陶瓷体的第二端处靠近第二横向面的位置的反射光。

    APPARATUS FOR MIXING VAPORIZED PRECURSOR AND GAS AND METHOD THEREFOR
    16.
    发明申请
    APPARATUS FOR MIXING VAPORIZED PRECURSOR AND GAS AND METHOD THEREFOR 有权
    用于混合蒸发前体和气体及其方法的装置

    公开(公告)号：US20130011319A1

    公开(公告)日：2013-01-10

    申请号：US13176804

    申请日：2011-07-06

    申请人： Lewis A. Bernstein ,  Dana Craig Bookbinder ,  Jason A. Dillard ,  Jennifer L. Porter ,  Balram Suman ,  Pushkar Tandon

    发明人： Lewis A. Bernstein ,  Dana Craig Bookbinder ,  Jason A. Dillard ,  Jennifer L. Porter ,  Balram Suman ,  Pushkar Tandon

    IPC分类号： C01B33/12 ,  B01J19/00

    CPC分类号： C01B33/183 ,  B01J12/00 ,  C03B37/01413 ,  C03B2207/42 ,  C03B2207/46

    摘要： An apparatus for mixing a vaporized precursor with a gas for producing silica particles is provided. The apparatus includes a mixer housing, a precursor delivery chamber having an output in communication with the mixer housing for delivering a vaporized precursor in the mixer housing, and an oxidizing gas delivery chamber having an output in communication with the mixer housing for delivering an oxidizing gas to be mixed with the vaporized precursor. The apparatus further includes a flashback member disposed within the mixer housing and between the output of the precursor delivery chamber and the output of the oxidizing gas delivery chamber. The flashback member is located at a minimum distance from the output of the oxidizing gas delivery chamber defined by Lminimum (cm)=0.453 U (Re)−0.5567, wherein U is the flow rate in cm/sec of precursor and Re is the flow Reynolds number. The flashback member may include a tapered surface on at least one side to reduce recirculation of vaporized gas.

    摘要翻译： 提供了一种用于混合蒸发的前体与用于生产二氧化硅颗粒的气体的装置。 该装置包括混合器壳体，前体输送室，其具有与混合器壳体连通的输出，用于将混合器壳体内的蒸发前体输送;以及氧化气体输送室，具有与混合器壳体连通的输出，用于输送氧化气体 与蒸发的前体混合。 该装置还包括设置在混合器壳体内并且在前体输送室的输出和氧化气体输送室的输出之间的回火构件。 回闪构件位于距离最小（cm）= 0.453U（Re）-0.5567所限定的氧化气体输送室的输出的最小距离处，其中U是前体的流速（cm / sec），Re是流量 雷诺数。 闪回构件可以在至少一侧上包括锥形表面以减少气化气体的再循环。

    Method And Apparatus For Inspecting Ceramic Wall Flow Filters
    17.
    发明申请
    Method And Apparatus For Inspecting Ceramic Wall Flow Filters 有权
    陶瓷墙流量过滤器检测方法及装置

    公开(公告)号：US20110048109A1

    公开(公告)日：2011-03-03

    申请号：US12548057

    申请日：2009-08-26

    申请人： Balram Suman ,  Srinivasa Rao Vaddiraju ,  Wei Xu

    发明人： Balram Suman ,  Srinivasa Rao Vaddiraju ,  Wei Xu

    IPC分类号： G01N15/08 ,  G01M3/02

    CPC分类号： G01M3/38 ,  B01D46/2418 ,  B01D46/42 ,  G01N15/082 ,  G01N21/95692

    摘要： Methods are disclosed for inspecting a cylindrical porous ceramic body by positioning a diffuser near, and spaced apart from, the first end of a ceramic body; flowing a tracer flow toward the diffuser, wherein a first portion of the tracer flow passes through the diffuser, and a second portion of the tracer flow does not pass through the diffuser, the first and second portions of the tracer flow then entering the first end of the ceramic body, wherein the average velocity of the first portion of the tracer flow entering the ceramic body VAVG1 is lower than the average velocity of the second portion of the tracer flow entering the ceramic body VAVG2; directing light toward the second end of the ceramic body; and detecting reflected light coming from a location proximate the second transverse face at the second end of the ceramic body.

    摘要翻译： 公开了用于通过将陶瓷体的第一端附近和间隔开设置扩散器来检查圆柱形多孔陶瓷体的方法; 使示踪剂流朝向扩散器流动，其中示踪剂流的第一部分通过扩散器，并且示踪剂流的第二部分不通过扩散器，示踪剂流的第一和第二部分然后进入第一端 其中进入陶瓷体VAVG1的示踪剂流的第一部分的平均速度低于进入陶瓷体VAVG2的示踪剂流的第二部分的平均速度; 将光引向陶瓷体的第二端; 以及检测来自陶瓷体的第二端处靠近第二横向面的位置的反射光。

    Apparatus for mixing vaporized precursor and gas and method therefor
    19.
    发明授权
    Apparatus for mixing vaporized precursor and gas and method therefor 有权
    用于混合蒸发的前体和气体的装置及其方法

    公开(公告)号：US08840858B2

    公开(公告)日：2014-09-23

    申请号：US13176804

    申请日：2011-07-06

    申请人： Lewis A Bernstein ,  Dana Craig Bookbinder ,  Jason A Dillard ,  Jennifer L Porter ,  Balram Suman ,  Pushkar Tandon

    发明人： Lewis A Bernstein ,  Dana Craig Bookbinder ,  Jason A Dillard ,  Jennifer L Porter ,  Balram Suman ,  Pushkar Tandon

    IPC分类号： C01B33/12 ,  C03B37/014

    CPC分类号： C01B33/183 ,  B01J12/00 ,  C03B37/01413 ,  C03B2207/42 ,  C03B2207/46

    摘要： An apparatus for mixing a vaporized precursor with a gas for producing silica particles is provided. The apparatus includes a mixer housing, a precursor delivery chamber having an output in communication with the mixer housing for delivering a vaporized precursor in the mixer housing, and an oxidizing gas delivery chamber having an output in communication with the mixer housing for delivering an oxidizing gas to be mixed with the vaporized precursor. The apparatus further includes a flashback member disposed within the mixer housing and between the output of the precursor delivery chamber and the output of the oxidizing gas delivery chamber. The flashback member is located at a minimum distance from the output of the oxidizing gas delivery chamber defined by Lminimum (cm)=0.453 U (Re)−0.5567, wherein U is the flow rate in cm/sec of precursor and Re is the flow Reynolds number. The flashback member may include a tapered surface on at least one side to reduce recirculation of vaporized gas.

    摘要翻译： 提供了一种用于混合蒸发的前体与用于生产二氧化硅颗粒的气体的装置。 该装置包括混合器壳体，前体输送室，其具有与混合器壳体连通的输出，用于将混合器壳体内的蒸发前体输送;以及氧化气体输送室，具有与混合器壳体连通的输出，用于输送氧化气体 与蒸发的前体混合。 该装置还包括设置在混合器壳体内并且在前体输送室的输出和氧化气体输送室的输出之间的回火构件。 回闪构件位于距离最小（cm）= 0.453U（Re）-0.5567所限定的氧化气体输送室的输出的最小距离处，其中U是前体的流速（cm / sec），Re是流量 雷诺数。 闪回构件可以在至少一侧上包括锥形表面以减少气化气体的再循环。