公开(公告)号：US20170207061A1

公开(公告)日：2017-07-20

申请号：US15365545

申请日：2016-11-30

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Wen LI ,  Kazuki IKEDA ,  Takuma NISHIMOTO ,  Hiroyuki TAKAHASHI ,  Hajime KAWANO

IPC: H01J37/22 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/2448

Abstract: In an image forming method of charged particle beam apparatus for scanning a sample by irradiating the sample with a converged charged particle beam and detecting secondary charged particles generated from the sample by a detection unit, receiving and processing an output signal from the detection unit, and receiving the processed signal and forming an image of the sample, receiving and processing the output signal are performed by analogically processing the output signal and by performing pulse-count processing on the output signal, and pulse-count processing is performed by removing a ringing pulse in the output signal and counting pulses in the signal from which the ringing pulse has been removed.

公开(公告)号：US20190341225A1

公开(公告)日：2019-11-07

申请号：US16473957

申请日：2016-12-27

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Takuma NISHIMOTO ,  Wen LI ,  Hiroyuki TAKAHASHI ,  Wataru MORI ,  Hajime KAWANO

IPC: H01J37/22

Abstract: Provided is a charged particle beam device to enable determination of a noise source of a charged particle beam device that can cause a noise frequency component superimposed on a measurement image. The charged particle beam device includes a unit that extracts information regarding a noise source. The unit that extracts information regarding a noise source includes: a control signal monitoring unit that observes a control signal of a control unit which controls an electron optical system of the charged particle beam device and outputs the observed signal; a first frequency conversion processing unit that executes frequency conversion processing on the signal output from the control signal monitoring unit; a second frequency conversion processing unit that executes frequency conversion processing on an image signal output from a detector of the electron optical system; and a frequency analysis and comparison processing unit that receives an output signal of the first frequency conversion processing unit and an image signal of the second frequency conversion processing unit, and associates a peak frequency of a superimposed noise of the image signal with a noise source of the control unit which generates a noise having a peak frequency corresponding to the peak frequency of the superimposed noise within the image signal.

公开(公告)号：US20190318906A1

公开(公告)日：2019-10-17

申请号：US16251563

申请日：2019-01-18

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Wen LI ,  Shinichi MURAKAMI ,  Hiroyuki TAKAHASHI ,  Yuko SASAKI ,  Minoru YAMAZAKI ,  Hajime KAWANO

IPC: H01J37/147 ,  H01J37/04 ,  H01L21/66 ,  G01N23/2251

Abstract: A low noise blanking unit corresponds to a wide range of acceleration voltages (from several times higher than related voltages to low acceleration voltages) of an electron beam. A blanking unit of the measurement and inspection device includes a blanking control circuit, in which (i) an upper and a lower blanking electrodes are arranged in the irradiation direction of an electron beam; electrodes on the reverse sides of two opposing electrodes in each of the blanking electrodes arranged in the same direction are connected with the ground, (ii) when blanking is ON, positive voltages are output to remaining electrodes of the upper blanking electrode and negative voltages are output to remaining electrodes of the lower blanking electrode, and (iii) when the blanking is OFF, the same ground reference signal is output to the remaining electrodes of the upper blanking electrode and to the remaining electrodes of the lower blanking electrode.

公开(公告)号：US20170271121A1

公开(公告)日：2017-09-21

申请号：US15613941

申请日：2017-06-05

Applicant: Hitachi High-Technologies Corporation

Inventor： Wen LI ,  Ryo KADOI ,  Kazuki IKEDA ,  Hiroyuki TAKAHASHI ,  Hajime KAWANO

IPC: H01J37/147 ,  H01J37/28 ,  H01J37/244

Abstract: A processing apparatus and a processing method are provided, which use a charged particle beam device that achieves defection of secondary electrons/reflected electrons at a large angle and cancels out noises of an electromagnetic deflector and an electrostatic deflector to suppress a position shift of a primary electron beam caused by circuit noises of a primary beam/secondary beam separation circuit. In the charged particle beam device that includes an electronic optical system radiating a concentrated electron beam onto a sample placed on a stage to perform scanning and captures an image of the sample, a reference signal and a signal generation unit of a voltage-source control signal applied to the electrostatic deflector generating the electrostatic deflector and a reference signal and a signal generation unit of a current-source control signal applied to the electromagnetic deflector generating a magnetic field are made common in an overlapping-electromagnetic-deflector control unit that controls a path of the secondary electrons/reflected electrons incident on a detector, and frequency characteristics and phase characteristics of the voltage control signal are coincident with those of the current-source control signal.