公开(公告)号：US20190341225A1

公开(公告)日：2019-11-07

申请号：US16473957

申请日：2016-12-27

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Takuma NISHIMOTO ,  Wen LI ,  Hiroyuki TAKAHASHI ,  Wataru MORI ,  Hajime KAWANO

IPC: H01J37/22

Abstract: Provided is a charged particle beam device to enable determination of a noise source of a charged particle beam device that can cause a noise frequency component superimposed on a measurement image. The charged particle beam device includes a unit that extracts information regarding a noise source. The unit that extracts information regarding a noise source includes: a control signal monitoring unit that observes a control signal of a control unit which controls an electron optical system of the charged particle beam device and outputs the observed signal; a first frequency conversion processing unit that executes frequency conversion processing on the signal output from the control signal monitoring unit; a second frequency conversion processing unit that executes frequency conversion processing on an image signal output from a detector of the electron optical system; and a frequency analysis and comparison processing unit that receives an output signal of the first frequency conversion processing unit and an image signal of the second frequency conversion processing unit, and associates a peak frequency of a superimposed noise of the image signal with a noise source of the control unit which generates a noise having a peak frequency corresponding to the peak frequency of the superimposed noise within the image signal.

公开(公告)号：US20180374674A1

公开(公告)日：2018-12-27

申请号：US16118891

申请日：2018-08-31

Applicant: Hitachi High-Technologies Corporation

Inventor： Hideki ITAI ,  Kumiko SHIMIZU ,  Wataru MORI ,  Hajime KAWANO ,  Shahedul HOQUE

IPC: H01J37/28 ,  H01J37/147 ,  H01J37/22

Abstract: A charged particle beam device is provided which minimizes the beam irradiation amount while maintaining a high measurement success rate. The charged particle beam device includes a control device for controlling a scan deflector on the basis of selection of a predetermined number n of frames, wherein the control device controls the scan deflector so that a charged particle beam is selectively scanned on a portion on a sample corresponding to a pixel satisfying a predetermined condition or a region including the portion on the sample from an image obtained by scanning the charged particle beam for a number m of frames (m≥1), the number m of frames being smaller than the number n of frames.

公开(公告)号：US20200043695A1

公开(公告)日：2020-02-06

申请号：US16491819

申请日：2017-03-06

Applicant: Hitachi High-Technologies Corporation

Inventor： Kazuki IKEDA ,  Wen LI ,  Takuma NISHIMOTO ,  Hiroyuki TAKAHASHI ,  Wataru MORI ,  Makoto SUZUKI ,  Hajime KAWANO

IPC: H01J37/147 ,  H01J37/22 ,  H01J37/28

Abstract: A charged particle beam device includes a deflection unit that deflects a charged particle beam released from a charged particle source to irradiate a sample, a reflection plate that reflects secondary electrons generated from the sample, and a control unit that controls the deflection unit based on an image generated by detecting the secondary electrons reflected from the reflection plate. The deflection unit includes an electromagnetic deflection unit that electromagnetically scans with the charged particle beam by a magnetic field and an electrostatic deflection unit that electrostatically scans with the charged particle beam by an electric field. The control unit controls the electromagnetic deflection unit and the electrostatic deflection unit, superimposes an electromagnetic deflection vector generated by the electromagnetic scanning and an electrostatic deflection vector generated by the electrostatic scanning, and controls at least a trajectory of the charged particle beam.

公开(公告)号：US20190206654A1

公开(公告)日：2019-07-04

申请号：US16325662

申请日：2016-08-31

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Noritsugu TAKAHASHI ,  Makoto SAKAKIBARA ,  Wataru MORI ,  Hajime KAWANO ,  Yuko SASAKI

IPC: H01J37/12 ,  H01J37/20 ,  H01J37/21 ,  H01J37/244 ,  H01J37/141

Abstract: A measuring device for measuring a sample by emitting a charged particle beam includes a particle source, an electronic lens, a detector, a stage, a sensor for measuring the environment, and a control device, in which the control device includes a control module having a height calculation module configured to calculate a height estimation value indicating an estimated height of the sample at a measurement position; and a correction value calculation module configured to calculate a correction value reflecting a change of the environment based on the measurement position of the sample and an amount of change of the environment measured by the sensor, and the control module corrects the height estimation value based on the correction value, and sets a control value for controlling focus adjustment using the electronic lens based on the corrected height estimation value.

公开(公告)号：US20190311875A1

公开(公告)日：2019-10-10

申请号：US16354670

申请日：2019-03-15

Applicant: Hitachi High-Technologies Corporation

Inventor： Wataru YAMANE ,  Minoru YAMAZAKI ,  Yuko SASAKI ,  Wataru MORI ,  Takashi DOI

IPC: H01J37/147 ,  H01J37/244 ,  H01J37/22 ,  H01J37/28 ,  H01J37/10

Abstract: An object of the present disclosure is to propose a charged particle beam device capable of appropriately evaluating and setting a beam aperture angle. As one aspect for achieving the above-described object, provided is a charged particle beam device which includes a plurality of lenses and controls the plurality of lenses so as to set a focus at a predetermined height of a sample and to adjust the beam aperture angle. The charged particle beam device generates a first signal waveform based on a detection signal obtained by scanning with the beam in a state where the focus is set at a first height that is a bottom portion of a pattern formed on the sample, calculates a feature amount of a signal waveform on a bottom edge of the pattern based on the first signal waveform, and calculates the beam aperture angle based on the calculated feature amount.

公开(公告)号：US20170323763A1

公开(公告)日：2017-11-09

申请号：US15329468

申请日：2015-07-27

Applicant: Hitachi High-Technologies Corporation

Inventor： Hideki ITAI ,  Kumiko SHIMIZU ,  Wataru MORI ,  Hajime KAWANO ,  Shahedul HOQUE

IPC: H01J37/28 ,  H01J37/147

CPC classification number: H01J37/28 ,  H01J37/147 ,  H01J37/1474 ,  H01J37/22 ,  H01J2237/221 ,  H01J2237/2806 ,  H01J2237/2817

Abstract: The purpose of the present invention is to provide a charged particle beam device with which it is possible to minimize the beam irradiation amount while maintaining a high measurement success rate. The present invention is a charged particle beam device provided with a control device for controlling a scan deflector on the basis of selection of a predetermined number n of frames, wherein the control device controls the scan deflector so that a charged particle beam is selectively scanned on a portion on a sample corresponding to a pixel satisfying a predetermined condition or a region including the portion on the sample from an image obtained by scanning the charged particle beam for a number m of frames (m≧1), the number m of frames being smaller than the number n of frames.

公开(公告)号：US20170092459A1

公开(公告)日：2017-03-30

申请号：US15310438

申请日：2015-04-28

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Noritsugu TAKAHASHI ,  Yasunari SOHDA ,  Wataru MORI ,  Yuko SASAKI ,  Hajime KAWANO

IPC: H01J37/05 ,  H01J37/12 ,  H01J37/153 ,  H01J37/244 ,  H01J37/21

CPC classification number: H01J37/05 ,  H01J37/12 ,  H01J37/147 ,  H01J37/153 ,  H01J37/21 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/1532 ,  H01J2237/2448

Abstract: A charged-particle-beam device used for measuring the dimensions, etc., of fine circuit patterns in a semiconductor manufacturing process, wherein corrections are made in the defocusing and astigmatism generated during changes in the operating conditions of a Wien filter acting as a deflector of secondary signals such as secondary electrons, and the display dimensions of obtained images are kept constant. In the charged-particle-beam device, the Wien filter (23) is arranged between a detector and a lens (11) arranged on the test-sample side among two stages of lenses for converging a charged-particle beam, and a computing device (93) is provided for the interlocked control of the Wien filter (23) and a lens (12) arranged on the charged-particle-source side among the two stages of lenses.