公开(公告)号：US4218410A

公开(公告)日：1980-08-19

申请号：US902475

申请日：1978-05-03

申请人： Herbert Stephan ,  Hans Aichert ,  Joseph Heimerl

发明人： Herbert Stephan ,  Hans Aichert ,  Joseph Heimerl

IPC分类号： B22F9/10 ,  B22F9/14 ,  B22D23/08

CPC分类号： B22F9/10 ,  B22F9/14 ,  B22F2009/084

摘要： High-purity metal powder is made by the electron beam melting of a starting material in rod form in a vacuum wherein the molten metal is momentarily caught on a spinning plate rotating at high speed and flung therefrom and thereafter solidified by cooling. The metal on the spinning plate is bombarded with an electron beam that is so focused and periodically deflected that its focal spot is many times smaller than the diameter of the spinning plate. The beam deflection between the rotational center of the spinning plate and its marginal area is performed such that the spinning plate is scanned in a zone that extends radially of the axis of rotation of the spinning plate and is small in relation to its diameter. Cooling of the metal particles to the point of solidification is accomplished by radiation loss.

摘要翻译： 通过在真空中以棒状的原料电子束熔融形成高纯度金属粉末，其中熔融金属被瞬间捕获在高速旋转并从其中溅出的纺丝板上，然后通过冷却固化。 纺丝板上的金属被电子束轰击，电子束如此聚焦并周期性地偏转，使其焦斑比纺丝板的直径小许多倍。 进行纺丝板的旋转中心与其边缘区域之间的梁偏转，使得纺丝板在纺丝板的旋转轴线的径向延伸的区域中扫描，并且相对于其直径小。 将金属颗粒冷却至凝固点是通过辐射损失来实现的。

公开(公告)号：US4226587A

公开(公告)日：1980-10-07

申请号：US963061

申请日：1978-11-22

申请人： Hans Aichert ,  Otto-Horst Hoffmann ,  Friedrich Stark ,  Herbert Stephan

发明人： Hans Aichert ,  Otto-Horst Hoffmann ,  Friedrich Stark ,  Herbert Stephan

IPC分类号： C23C14/54 ,  C23C16/54 ,  F27B9/14

CPC分类号： C23C14/541 ,  C23C16/54

摘要： Pass-through heating device for vacuum coating apparatus having a heating chamber with at least one heating device, a thermal barrier positioned between the walls of the heating chamber and the heating device parallel to the longitudinal axis of the coating apparatus.

摘要翻译： 具有具有至少一个加热装置的加热室的真空镀膜装置的直通式加热装置，位于加热室的壁和加热装置之间的隔热板，该加热室平行于涂覆装置的纵向轴线。

公开(公告)号：US4648347A

公开(公告)日：1987-03-10

申请号：US738739

申请日：1985-05-29

申请人： Hans Aichert ,  Volker Bauer ,  Albert Feuerstein ,  Horst Ranke

发明人： Hans Aichert ,  Volker Bauer ,  Albert Feuerstein ,  Horst Ranke

IPC分类号： C23C14/24 ,  C23C14/56 ,  C23C13/08

CPC分类号： C23C14/24 ,  C23C14/562

摘要： In vacuum depositing apparatus, especially for the manufacture of magnetic tapes, a substrate holder is disposed in the form of a cooling cylinder, and in the path of the vapor stream there is a mask for the purpose of geometrically restricting the vapor stream. In order to prevent any condensation of vaporized material in solid form, the surface of the mask facing the vapor stream is not aligned horizontally, and its lowermost edge lies within the projected surface of the crucible opening. The surface of the mask can be heated up to a temperature that is between the vaporizing temperature and the solidification temperature of the vaporized material. In an especially advantageous manner, the surface of the mask is formed by tiles of a ceramic material.

摘要翻译： 在真空沉积设备中，特别是用于制造磁带的情况下，衬底保持器以冷却筒的形式设置，并且在蒸气流的路径中存在用于几何限制蒸气流的掩模。 为了防止固体形式的气化材料的任何冷凝，面对蒸汽流的掩模的表面不是水平对准的，并且其最下边缘位于坩埚开口的投影表面内。 掩模的表面可以被加热到蒸发温度和汽化材料的凝固温度之间的温度。 以特别有利的方式，掩模的表面由陶瓷材料的瓷砖形成。

公开(公告)号：US4572776A

公开(公告)日：1986-02-25

申请号：US678597

申请日：1984-12-05

申请人： Hans Aichert ,  Jorg Kieser ,  Reiner Kukla

发明人： Hans Aichert ,  Jorg Kieser ,  Reiner Kukla

IPC分类号： C23C14/36 ,  C23C14/35 ,  H01J37/34 ,  C23C14/34

CPC分类号： H01J37/3441 ,  H01J37/3408 ,  H01J37/3426 ,  H01J37/3497

摘要： A magnetron cathode for sputtering ferromagnetic targets. The magnet system consists of magnet poles of opposite polarity lying one within the other disposed on a basic cathode body. Between the target and the pole shoes, which consist of target material, two circumferential air gaps in the direction of the depth of the system are formed. The surfaces of projection of the magnet poles and target do not overlap. For the purpose of making the target ablation uniform while simultaneously achieving high sputtering rates, the pole shoes are separated, in accordance with the invention, each by a distance S from the magnet poles. The magnet poles lie in an area which runs from a plane passing through the sputtering surface in the direction of the depth of the system. Between the pole shoes and the target, on the one hand, and the magnet poles on the other, there is disposed a thermally conductive metal body which is in communication with at least one coolant passage and consists of a nonferromagnetic material.

摘要翻译： 用于溅射铁磁靶的磁控管阴极。 磁体系统由相反极性的磁极组成，位于另一个设置在基本阴极体上的磁极。 在由目标材料组成的目标和极靴之间形成在系统深度方向上的两个圆周气隙。 磁极和靶的投影面不重叠。 为了使目标消融均匀，同时实现高溅射速率，根据本发明，极靴与磁极分开距离S。 磁极位于从系统深度方向穿过溅射表面的平面延伸的区域。 一方面，在极靴和目标之间以及另一方面的磁极之间设置有导热金属体，其与至少一个冷却剂通道连通并由非铁磁材料构成。

公开(公告)号：US4966677A

公开(公告)日：1990-10-30

申请号：US344244

申请日：1989-04-27

申请人： Hans Aichert ,  Rainer Gegenwart ,  Reiner Kukla ,  Klaus Wilmes ,  Jorg Kieser

发明人： Hans Aichert ,  Rainer Gegenwart ,  Reiner Kukla ,  Klaus Wilmes ,  Jorg Kieser

IPC分类号： C23C14/34 ,  H01J37/34

CPC分类号： C23C14/3407 ,  H01J37/3405

摘要： Cathode sputtering apparatus having a hollow cathode on the magnetron principle with a cathode base (5) in which a hollow target (9) with a cylindrical sputtering surface (10) and a cylindrical outer surface is disposed. The cathode base (5) has a cooling passage (6). The target is externally surrounded by a magnet system (18) with magnet poles for the production of a rotationally symmetrical tunnel of magnetic lines of force closed on the circumference and over the sputtering surface. Outside of the space surrounded by the sputtering surface (10) there is disposed at least one anode (3, 4). A transport path for a substrate to be coated passes through the target (9) and the at least one anode.The cooling passage (6) is sealed off from the target (9) by a wall (7). Due to a narrow clearance, as soon as the target (9) reaches its operating temperature it comes in thermal contact with the wall (7). The [north] pole faces (N) of the magnet system (18) are on one side and the other [south] pole faces (S) lie on the other side of the end faces of the target (9) and radially on a radius which is equal to or greater than the radius of the sputtering surface (10). The magnet system (18) is held at a freely adjustable ("floating") potential in operation by insulating spaces (11, 19, 10).

摘要翻译： 在具有阴极基体（5）的磁控管原理上具有空心阴极的阴极溅射装置设置有具有圆柱形溅射表面（10）的中空靶（9）和圆柱形外表面。 阴极基座（5）具有冷却通道（6）。 目标被具有磁极的磁体系统（18）外部包围，用于产生在圆周上和溅射表面上的磁力线的旋转对称的隧道。 在由溅射表面（10）围绕的空间的外部设置有至少一个阳极（3,4）。 待涂覆的基底的输送路径穿过靶（9）和至少一个阳极。 冷却通道（6）通过壁（7）与靶（9）密封。 由于狭窄的间隙，只要目标（9）达到其工作温度，它就与墙壁（7）热接触。 磁体系（18）的[北]极面（N）位于一侧，另一[南]极面（S）位于靶（9）端面的另一侧， 半径等于或大于溅射表面（10）的半径。 磁体系统（18）通过绝缘空间（11,19,10）保持在操作中可自由调节（“浮动”）的电位。

公开(公告)号：US4885070A

公开(公告)日：1989-12-05

申请号：US197040

申请日：1988-05-20

申请人： Gregor A. Campbell ,  Robert W. Conn ,  Dan M. Goebel ,  Rolf Adam ,  Hans Aichert ,  Hans Betz ,  Anton Dietrich ,  Gonde Dittmer ,  Klaus Hartig ,  Friedrich Hass ,  Rainer Ludwig ,  Max Mayr ,  Alfred Thelen

发明人： Gregor A. Campbell ,  Robert W. Conn ,  Dan M. Goebel ,  Rolf Adam ,  Hans Aichert ,  Hans Betz ,  Anton Dietrich ,  Gonde Dittmer ,  Klaus Hartig ,  Friedrich Hass ,  Rainer Ludwig ,  Max Mayr ,  Alfred Thelen

IPC分类号： C23C14/00 ,  C23C14/46 ,  H01J37/34

CPC分类号： C23C14/46 ,  C23C14/0036 ,  H01J37/3402

摘要： An apparatus to apply materials to a substrate disposed in a vacuum chamber is disclosed. A separate generator chamber containing an electron emitter is connected to the vacuum chamber by a process chamber so that a plasma of controllable cross-sectional shape and large area is formed and guided by magnets toward a target system. Positive ions may be accelerated against the target by applying an adjustable negative voltage.

摘要翻译： 公开了一种将材料施加到设置在真空室中的基板的装置。 包含电子发射器的单独的发生器室通过处理室连接到真空室，使得具有可控横截面形状和大面积的等离子体由磁体形成并被引导到目标系统。 通过施加可调节的负电压，正离子可以相对于目标加速。