公开(公告)号：US20070261383A1

公开(公告)日：2007-11-15

申请号：US11663779

申请日：2005-09-22

申请人： Werner Hartmann ,  Jorg Kieser

发明人： Werner Hartmann ,  Jorg Kieser

IPC分类号： F02C3/00

CPC分类号： F23C99/001 ,  F23C2900/99005 ,  F23R2900/00013

摘要： An embodiment of the invention relates to the use of electromagnetic fields for influencing combustion processes. According to an embodiment of the invention, the flame is controlled by the coupling of repeated, inductive, pulsed energy. The associated device uses at least one induction coil that at least partially surrounds the flame and the device is equipped with a controllable switch or a high frequency generator.

摘要翻译： 本发明的一个实施例涉及电磁场用于影响燃烧过程的用途。 根据本发明的实施例，火焰通过重复的，感应的，脉冲能量的耦合来控制。 相关联的装置使用至少一个至少部分地围绕火焰的感应线圈，并且该装置配备有可控开关或高频发生器。

公开(公告)号：US5747984A

公开(公告)日：1998-05-05

申请号：US525796

申请日：1995-09-22

申请人： Dietrich Amft ,  David-Walter Branston ,  Jorg Kieser ,  Reinhard Maier

发明人： Dietrich Amft ,  David-Walter Branston ,  Jorg Kieser ,  Reinhard Maier

IPC分类号： G01R31/327 ,  G01R31/333 ,  H01H1/00 ,  H01H1/20 ,  H01H33/00 ,  G01R31/00 ,  H01H71/04

CPC分类号： H01H1/20 ,  H01H1/0015

摘要： Switching components with contact parts that are mounted on a contact carrier in a switch housing may include devices for monitoring the contact erosion. The contact carrier may be split (sub-divided) and contact parts can be slotted at the rear and mounted on the sub-divided contact carrier. Thus, the oscillation response (vibration response) of the contact carrier in particular can be used as a measure of the erosion of the contact parts.

摘要翻译： PCT No.PCT / DE94 / 00244 Sec。 371日期1995年9月22日 102（e）日期1995年9月22日PCT 1994年3月10日PCT公布。 WO94 / 22153 PCT出版物 日期1994年9月29日具有安装在开关壳体中的触点支架上的接触部件的开关元件可能包括用于监测触点侵蚀的装置。 接触载体可以分开（分分割），接触部分可以在后部开槽并安装在分分离的载体上。 因此，接触载体的振动响应（振动响应）特别可以用作接触部件的侵蚀的量度。

公开(公告)号：US4939424A

公开(公告)日：1990-07-03

申请号：US355886

申请日：1989-05-23

申请人： Jorg Kieser ,  Michael Geisler ,  Rolf Wilhelm ,  Eberhard Rauchle

发明人： Jorg Kieser ,  Michael Geisler ,  Rolf Wilhelm ,  Eberhard Rauchle

IPC分类号： H05H1/46 ,  C23C16/40 ,  C23C16/44 ,  C23C16/50 ,  C23C16/511 ,  H01J37/32

CPC分类号： H01J37/32275 ,  C23C16/511 ,  H01J37/32192 ,  H01J37/32366 ,  H01J37/32678

摘要： The plasma produced by means of microwaves in the presence of a magnetic field and a gas serves to coat a substrate which is situated in a chamber having metal walls. The microwaves are repeatedly reflected at the metal walls, so that the chamber has numerous microwave modes. By means of permanent magnets, which are placed either inside the chamber or outside the chamber in the vicinity of the substrate that is to be coated, it is possible to produce within this chamber an electron-cyclotron resonance which permits a locally controlled ignition of the plasma.

摘要翻译： 在存在磁场和气体的情况下通过微波产生的等离子体用于涂覆位于具有金属壁的室中的衬底。 微波在金属壁处反复反射，使得腔室具有许多微波模式。 通过将永磁体放置在腔室内或室内的待涂覆衬底附近的永磁体，可以在该室内产生电子回旋共振，其允许局部控制点火 等离子体。

公开(公告)号：US4661409A

公开(公告)日：1987-04-28

申请号：US797635

申请日：1985-11-13

申请人： Jorg Kieser ,  Michael Neusch

发明人： Jorg Kieser ,  Michael Neusch

IPC分类号： C23C16/50 ,  C03C17/22 ,  C23C16/02 ,  C23C16/26 ,  C23C16/511 ,  H01L23/29 ,  B32B9/00 ,  C01B31/00

CPC分类号： C23C16/511 ,  C03C17/22 ,  C23C16/0272 ,  C23C16/26 ,  H01L23/29 ,  C03C2217/282 ,  C03C2218/153 ,  H01L2924/0002 ,  Y10T428/30 ,  Y10T428/31645 ,  Y10T428/31663 ,  Y10T428/31696

摘要： A method for producing amorphous carbon coatings on substrates by degrading a gaseous hydrocarbon compound in an ionized gas atmosphere within a reaction chamber. An electromagnetic alternating field is used for the excitation of the plasma. To achieve the object of increasing the deposition rate and permitting substrates even of great surface area to be uniformly coated, the frequency of the electromagnetic alternating field is selected in the microwave region (915 to 2,540 MHz). Furthermore, the microwave energy is put into the gaseous atmosphere by means of at least one ladder-type waveguide situated outside of the reaction chamber. The invention also relates to a substance provided with an amorphous carbon coating, in which an adhesion-mediating coating consisting of a polymer from the group of the siloxanes or silazanes is provided between the substrate and the amorphous carbon coating.

摘要翻译： 一种通过在反应室内的电离气体气氛中降解气态烃化合物来在基底上生产无定形碳涂层的方法。 电磁场用于等离子体的激发。 为了实现提高沉积速率并允许均匀涂覆大面积的基板的目的，在微波区域（915-2,540MHz）中选择电磁交变场的频率。 此外，通过位于反应室外部的至少一个梯形波导将微波能量放入气体气氛中。 本发明还涉及具有无定形碳涂层的物质，其中在基体和无定形碳涂层之间提供由来自硅氧烷或硅氮烷的聚合物组成的粘附介质涂层。

公开(公告)号：US4515675A

公开(公告)日：1985-05-07

申请号：US624940

申请日：1984-06-27

申请人： Jorg Kieser ,  Reiner Kukla ,  Gerd Deppisch

发明人： Jorg Kieser ,  Reiner Kukla ,  Gerd Deppisch

IPC分类号： C23C14/36 ,  C23C14/35 ,  H01J37/34 ,  C23C15/00

CPC分类号： H01J37/3441 ,  H01J37/3408 ,  H01J37/3423

摘要： A magnetron cathode for cathodic evaporation apparatus with a target holder (10) for releasably securing a plate-like target (9). The associated magnet arrangement (7) has pole faces (7c, 7d) for producing at least one circumferentially closed tunnel of magnetic field lines which overlaps the target. The magnet arrangement (7) is accommodated in a housing of non-ferromagnetic material which extends over the pole faces. To increase the utilization factor of the target material without the pole faces or housing parts participating in the atomization process,(a) the projections of the target (9 ) and the pole faces (7c, 7d) in a common plane parallel to the target face (9a) do not intersect each other,(b) in the zone of the pole faces (7c, 7d), the housing (16) is extended in the atomization direction in front of the target face (9a) or in the extreme case lies in the plane of the target face (9a), and(c) the housing (16) together with the magnet system (7) is electrically insulated as regards both the target holder (10) and earth (4).

摘要翻译： 一种用于阴极蒸发装置的磁控管阴极，具有用于可释放地固定板状靶（9）的靶保持器（10）。 相关联的磁体布置（7）具有用于产生与目标重叠的磁场线的至少一个周向闭合的通道的极面（7c，7d）。 磁体布置（7）容纳在非磁性材料的壳体上，该壳体在极面上延伸。 为了增加目标材料的利用率，而没有参与雾化过程的极面或壳体部分，（a）靶（9）和极面（7c，7d）在平行于靶的公共平面中的突起 （9a）彼此不相交，（b）在极面（7c，7d）的区域中，壳体（16）在目标面（9a）的前方沿着雾化方向延伸，或者在极端 壳体位于目标面（9a）的平面内，（c）与磁体系统（7）一起的壳体（16）与目标支架（10）和地球（4）都是电绝缘的。

公开(公告)号：US6119455A

公开(公告)日：2000-09-19

申请号：US259375

申请日：1999-02-26

申请人： Thomas Hammer ,  Jorg Kieser

发明人： Thomas Hammer ,  Jorg Kieser

IPC分类号： B01D53/32 ,  B01D53/94 ,  F01N3/08 ,  F01N3/10

CPC分类号： F01N3/0892 ,  B01D53/32 ,  B01D2257/404

摘要： In particular for exhaust-gas purification, different processes have been proposed. According to the invention, the polluted exhaust gas flows through a reactor volume to which non-thermal gas discharges are applied, while being brought into contact with a solid reducing agent at least once, and preferably several times. The reducing agent can, in particular, consist of carbon fibers. A suitable device for combining dielectric barrier discharges with the reduction has means for field enhancement substantially periodically spaced in the reactor.

摘要翻译： 特别是对于废气净化，已经提出了不同的方法。 根据本发明，被污染的废气流过施加非热气体的反应器体积，同时与固体还原剂接触至少一次，优选数次。 还原剂特别可以由碳纤维组成。 用于将介电阻挡放电与该还原组合的合适装置具有在反应器中基本上周期性间隔的场增强的装置。

公开(公告)号：US4767641A

公开(公告)日：1988-08-30

申请号：US881706

申请日：1986-07-03

申请人： Jorg Kieser ,  Michael Sellschopp ,  Michael Geisler

发明人： Jorg Kieser ,  Michael Sellschopp ,  Michael Geisler

IPC分类号： H01L21/302 ,  B29C59/14 ,  C23C16/02 ,  C23F4/00 ,  H01J37/32 ,  H01L21/3065 ,  H05H1/46 ,  C23C14/00 ,  C23C16/00

CPC分类号： H01J37/32009 ,  B29C59/14 ,  H01J37/32082 ,  H01J37/32541

摘要： Device for the plasma treatment of substrates (7) in a high frequency-excited plasma discharge between two electrodes (3, 8), supplied by a high-frequency source (6). The first electrode is constructed as a hollow anode (3) and the second electrode (8), which carries the substrate (7), is deposited in front of the hollow space (10) of the hollow anode or can be passed by this. Moreover, the hollow anode (3) has an edge (9), which is drawn out in the direction of the second electrode (8) and which, relative to the second electrode, forms a gap s.sub.1 all around that does not exceed 10 mm in width. In order to form the electrode so that the gap width is not a critical feature, projections (12) are disposed in the hollow space (10) of the hollow anode (3), said projections increasing the internal surface area (11) of the hollow anode (3). Preferably, these projections (12) are constructed as rib structures, which may also assume a honeycomb form.

摘要翻译： 用于在由高频源（6）提供的两个电极（3,8）之间的高频激发等离子体放电中等离子体处理衬底（7）的装置。 第一电极被构造为中空阳极（3），并且承载基板（7）的第二电极（8）沉积在中空阳极的中空空间（10）的前面，或者可以通过该中空阳极。 此外，空心阳极（3）具有沿着第二电极（8）的方向拉出的边缘（9），并且相对于第二电极形成间隙s1，其周围不超过10mm 宽度。 为了形成电极，使得间隙宽度不是关键特征，突起（12）设置在中空阳极（3）的中空空间（10）中，所述突起增加了中空阳极（3）的内表面积（11） 空心阳极（3）。 优选地，这些突起（12）构造为肋结构，其也可以呈现蜂窝形式。

公开(公告)号：US4630568A

公开(公告)日：1986-12-23

申请号：US736556

申请日：1985-05-21

申请人： Jorg Kieser

发明人： Jorg Kieser

IPC分类号： C08F2/00 ,  B01J19/08 ,  B01J19/12 ,  B05D7/24 ,  C08G85/00 ,  C23C14/22 ,  C23C16/50 ,  C23C16/511 ,  H01J37/32 ,  C23C16/00

CPC分类号： B05D1/62 ,  B01J19/126 ,  C23C16/511 ,  H01J37/32192 ,  H01J37/32229 ,  H01J37/32238 ,  H01J37/32275 ,  B01J2219/0894 ,  H01J2237/3382

摘要： Apparatus for coating substrates by means of a reaction for depositing atoms or molecules which is initiated by a plasma. A reaction chamber (1) is equipped with at least one window (22, 23), penetrable by microwaves, with at least one wave-guide structure (16, 17), arranged outside the chamber (1) and in front of the window (22, 23), and with a distributing means (25) discharging into the chamber.According to the invention and for the purpose of achieving the object of facilitating inspection and repairs, the window (22, 23) penetrable by microwaves, the one or more wave-guide structures (16, 17) and the distributing means (25) are all secured in or on a support frame (10), which can be removed, or swung away, from the reaction chamber (1) as a single unit.

摘要翻译： 用于通过用于沉积由等离子体引发的原子或分子的反应来涂覆基底的装置。 反应室（1）装备有可被微波穿透的至少一个窗口（22,23），其中至少一个波导结构（16,17）布置在室（1）的外部和窗口的前面 （22,23），并且具有排出到所述室中的分配装置（25）。 根据本发明，为了实现便于检查和修理的目的，可以由微波穿透的窗口（22,23），一个或多个波导结构（16,17）和分配装置（25）是 全部固定在可作为单个单元从反应室（1）移除或摆动的支撑框架（10）中或上。

公开(公告)号：US4572776A

公开(公告)日：1986-02-25

申请号：US678597

申请日：1984-12-05

申请人： Hans Aichert ,  Jorg Kieser ,  Reiner Kukla

发明人： Hans Aichert ,  Jorg Kieser ,  Reiner Kukla

IPC分类号： C23C14/36 ,  C23C14/35 ,  H01J37/34 ,  C23C14/34

CPC分类号： H01J37/3441 ,  H01J37/3408 ,  H01J37/3426 ,  H01J37/3497

摘要： A magnetron cathode for sputtering ferromagnetic targets. The magnet system consists of magnet poles of opposite polarity lying one within the other disposed on a basic cathode body. Between the target and the pole shoes, which consist of target material, two circumferential air gaps in the direction of the depth of the system are formed. The surfaces of projection of the magnet poles and target do not overlap. For the purpose of making the target ablation uniform while simultaneously achieving high sputtering rates, the pole shoes are separated, in accordance with the invention, each by a distance S from the magnet poles. The magnet poles lie in an area which runs from a plane passing through the sputtering surface in the direction of the depth of the system. Between the pole shoes and the target, on the one hand, and the magnet poles on the other, there is disposed a thermally conductive metal body which is in communication with at least one coolant passage and consists of a nonferromagnetic material.

摘要翻译： 用于溅射铁磁靶的磁控管阴极。 磁体系统由相反极性的磁极组成，位于另一个设置在基本阴极体上的磁极。 在由目标材料组成的目标和极靴之间形成在系统深度方向上的两个圆周气隙。 磁极和靶的投影面不重叠。 为了使目标消融均匀，同时实现高溅射速率，根据本发明，极靴与磁极分开距离S。 磁极位于从系统深度方向穿过溅射表面的平面延伸的区域。 一方面，在极靴和目标之间以及另一方面的磁极之间设置有导热金属体，其与至少一个冷却剂通道连通并由非铁磁材料构成。

公开(公告)号：US4521717A

公开(公告)日：1985-06-04

申请号：US445339

申请日：1982-11-29

申请人： Jorg Kieser

发明人： Jorg Kieser

IPC分类号： C08F2/00 ,  B01J19/08 ,  B01J19/12 ,  B05D7/24 ,  C08F2/46 ,  C08F2/52 ,  C08G85/00 ,  C23C14/22 ,  C23C16/50 ,  C23C16/511 ,  C23C16/54 ,  H01J37/32 ,  H05H1/46 ,  H01J7/46 ,  H01J19/80

CPC分类号： B05D1/62 ,  B01J19/126 ,  C23C16/511 ,  H01J37/32192 ,  H01J37/32229 ,  H01J37/32266 ,  B01J2219/0894 ,  H01J2237/3382

摘要： The invention relates to apparatus for producing a microwave plasma for the treatment of substrates, and in particular for the plasma polymerization of monomers for coating substrates. The apparatus consists of a reaction chamber with a carrier for conveying the substrates and a way for maintaining an atmosphere of ionizable gases and monomers. The apparatus also has a first and at least one second wave-guide structure which are arranged at opposite acute setting angles to the surface of the substrate carrier and are each connected at one end to a microwave transmitter by way of a hollow conductor. Thus, the treatment intensities, i.e. the rates of deposition, are superposed, and this leads to greater uniformity in the properties of the product. The apparatus may also include angling the wave-guide structures toward each other and staggering crossbar structures in the wave-guides for further improvement.

摘要翻译： 本发明涉及用于生产用于处理衬底的微波等离子体的设备，特别涉及用于涂覆衬底的单体的等离子体聚合。 该装置由具有用于输送基板的载体的反应室和用于维持可离子化气体和单体的气氛的方式组成。 该装置还具有第一和至少一个第二波导结构，其以与衬底载体的表面相对的锐角设置角度布置，并且其一端通过空心导体连接到微波发射器。 因此，处理强度，即沉积速率被叠加，并且这导致产品的性质更均匀。 该装置还可以包括将波导结构朝向彼此倾斜并且在波导中交错的横梁结构进一步改进。