公开(公告)号：US09683284B2

公开(公告)日：2017-06-20

申请号：US13982051

申请日：2012-03-23

申请人： Shin-ichi Ogino ,  Yuichiro Nakamura

发明人： Shin-ichi Ogino ,  Yuichiro Nakamura

IPC分类号： C23C14/34 ,  C22C1/04 ,  C22C1/10 ,  C22C5/04 ,  C22C30/00 ,  C22C33/02 ,  G11B5/851 ,  C22C38/00 ,  C22F1/14 ,  C22C1/00 ,  C22C1/02

CPC分类号： C23C14/3407 ,  C22C1/00 ,  C22C1/02 ,  C22C1/0466 ,  C22C1/10 ,  C22C5/04 ,  C22C30/00 ,  C22C33/0228 ,  C22C33/0278 ,  C22C38/002 ,  C22F1/14 ,  C23C14/3414 ,  G11B5/851

摘要： A sputtering target for a magnetic recording film which contains carbon, the sputtering target is characterized in that the ratio (IG/ID) of peak intensities of the G-band to the D-band in Raman scattering spectrometry is 5.0 or less. The sputtering target for a magnetic recording film, which contains carbon powders dispersed therein, makes it possible to produce a magnetic thin film having a granular structure without using an expensive apparatus for co-sputtering; and in particular, the target is an Fe—Pt-based sputtering target. Carbon is a material which is difficult to sinter and has a problem that carbon particles are apt to form agglomerates. There is hence a problem that carbon masses are readily detached during sputtering to generate a large number of particles on the film after sputtering. The high-density sputtering target can solve these problems.

公开(公告)号：US20130341184A1

公开(公告)日：2013-12-26

申请号：US14003621

申请日：2012-05-22

申请人： Yuto Morishita ,  Shin-ichi Ogino ,  Yuichiro Nakamura

发明人： Yuto Morishita ,  Shin-ichi Ogino ,  Yuichiro Nakamura

IPC分类号： C23C14/16 ,  C22F1/16

CPC分类号： C23C14/165 ,  C22C1/02 ,  C22C19/07 ,  C22F1/10 ,  C22F1/16 ,  C23C14/3414 ,  G11B5/851

摘要： Provided is a Co—Cr—Pt—B-based alloy sputtering target having no more than 10 cracks of 0.1 to 20 μm in a B-rich phase in a 100 μm×100 μm area (field of view). Additionally provided is a method for producing this Co—Cr—Pt—B-based alloy sputtering target including the steps of hot forging or hot rolling a Co—Cr—Pt—B-based alloy cast ingot, thereafter performing cold rolling or cold forging thereto at an elongation rate of 4% or less, and machining the ingot to prepare a target having no more than 10 cracks of 0.1 to 20 μm in a B-rich phase in a 100 μm×100 μm area (field of view), or, hot forging or hot rolling the ingot, thereafter quenching the ingot to −196° C. to 100° C., and machining the ingot to prepare a target. The target of the present invention has high magnetic flux density and few microcracks in a B-rich layer, and thus stabilizes discharge and minimizes arcing.

摘要翻译： 提供一种Co-Cr-Pt-B系合金溅射靶，其在100mum×100mum面积（视野）的富B相中不超过10个0.1〜20个的裂纹。 另外提供了一种用于制造该Co-Cr-Pt-B系合金溅射靶的方法，其包括热锻或热轧Co-Cr-Pt-B基合金铸锭的步骤，然后进行冷轧或冷锻 以4％以下的伸长率进行加工，并且在100mum×100mum面积（视野）的B富相中，机加工锭以制备不超过10个0.1〜20个的裂纹的靶， 或热锻造或热轧锭，然后将锭淬火至-196℃至100℃，并加工锭以制备靶材。 本发明的目标在富B层中具有高磁通密度和微裂纹，从而稳定放电并使电弧放电最小化。

公开(公告)号：US09144021B2

公开(公告)日：2015-09-22

申请号：US13640686

申请日：2011-04-12

申请人： Kenichiro Aoyagi ,  Yasuhiro Kawabe ,  Yuichiro Nakamura ,  Hideyuki Matsutani

发明人： Kenichiro Aoyagi ,  Yasuhiro Kawabe ,  Yuichiro Nakamura ,  Hideyuki Matsutani

IPC分类号： G08C17/00 ,  H04W52/02

CPC分类号： H04W52/0248 ,  Y02D70/1224 ,  Y02D70/1244 ,  Y02D70/1246 ,  Y02D70/1262 ,  Y02D70/1264 ,  Y02D70/142 ,  Y02D70/146 ,  Y02D70/24

摘要： A controller in a mobile communication system includes a management unit (151) configured to manage a resource usage condition in the mobile communication system and a determination unit (152) configured to determine to which an idle state or a power saving state different from the idle state a user equipment (10) is to transition after completion of communication of a data signal depending on the resource usage condition, and the state determined by the determination unit (152) is indicated to the user equipment (10).

摘要翻译： 移动通信系统中的控制器包括：管理单元，被配置为管理移动通信系统中的资源使用状态;以及确定单元，其被配置为确定与空闲状态不同的空闲状态或省电状态 指示用户设备（10）将根据资源使用条件在完成数据信号的通信之后转换，并且由用户设备（10）指示由确定单元（152）确定的状态。

公开(公告)号：US09034154B2

公开(公告)日：2015-05-19

申请号：US13119867

申请日：2010-02-24

申请人： Yuichiro Nakamura ,  Akira Hisano ,  Junnosuke Sekiguchi

发明人： Yuichiro Nakamura ,  Akira Hisano ,  Junnosuke Sekiguchi

IPC分类号： C23C14/34

CPC分类号： C23C14/3414

摘要： A sputtering target with low generation of particles in which oxides, carbides, nitrides, borides, intermetallic compounds, carbonitrides, and other substances without ductility exist in a matrix phase made of a highly ductile substance at a volume ratio of 1 to 50%, wherein a highly ductile and conductive metal coating layer is formed on an outermost surface of the target. Provided are a sputtering target capable of improving the target surface in which numerous substances without ductility exist and preventing or inhibiting the generation of nodules and particles during sputtering, and a method of producing such a sputtering target.

摘要翻译： 在体积比为1〜50％的高延展性物质的基体相中，存在低产生粒子的溅射靶，其中氧化物，碳化物，氮化物，硼化物，金属间化合物，碳氮化物和其他物质不具有延性，其中 在目标的最外表面上形成高度延展且导电的金属涂层。 提供能够改善目前表面的溅射靶，其中存在许多无延展性的物质，并且防止或抑制溅射过程中的结核和颗粒的产生，以及制造溅射靶的方法。

公开(公告)号：US20130310047A1

公开(公告)日：2013-11-21

申请号：US13983733

申请日：2011-12-27

申请人： Kenichiro Aoyagi ,  Yasuyuki Watanabe ,  Hideyuki Matsutani ,  Kiminobu Sugano ,  Yuichiro Nakamura

发明人： Kenichiro Aoyagi ,  Yasuyuki Watanabe ,  Hideyuki Matsutani ,  Kiminobu Sugano ,  Yuichiro Nakamura

IPC分类号： H04W36/20

CPC分类号： H04W36/20 ,  H04W36/00837 ,  H04W48/12

摘要： An RNC 200 includes a cell information acquisition unit 201 configured to acquire cell information of a first cell and a second cell, a threshold determination unit 203 configured to determine, based on the acquired cell information, a cell reselection threshold which causes the mobile station to reselect the second cell in place of the first cell and to camp on the second cell, and a camp on cell instruction unit 205 configured to broadcast, to the mobile station, system information in which the determined cell reselection threshold or a camp on frequency determined based on the cell reselection threshold is set.

摘要翻译： RNC 200包括小区信息获取单元201，其被配置为获取第一小区和第二小区的小区信息;阈值确定单元203，被配置为基于获取的小区信息来确定使移动站的小区重选阈值 重新选择第二小区代替第一小区并驻留在第二小区上，并且小区指令单元205的阵营被配置为向移动台广播系统信息，其中所确定的小区重选阈值或阵营频率确定 基于小区重选阈值设置。

公开(公告)号：US20130109381A1

公开(公告)日：2013-05-02

申请号：US13261496

申请日：2011-04-28

申请人： Hideaki Takahashi ,  Yuichiro Nakamura ,  Kenichiro Aoyagi ,  Tadashi Uchiyama ,  Minami Ishii

发明人： Hideaki Takahashi ,  Yuichiro Nakamura ,  Kenichiro Aoyagi ,  Tadashi Uchiyama ,  Minami Ishii

IPC分类号： H04W48/12

CPC分类号： H04W48/12 ,  H04W48/02

摘要： Provided is a mobile communication system wherein a radio base station eNB in E-UTRAN is configured to transmit a downlink carrier frequency (EARFCN) and a physical cell ID (PCI) of a blacklisted cell, which is a cell to which access is forbidden in the downlink carrier frequency, to a radio network controller RNC in UTRAN.

摘要翻译： 提供了一种移动通信系统，其中E-UTRAN中的无线基站eNB被配置为发送作为禁止接入的小区的黑名单小区的下行链路载波频率（EARFCN）和物理小区ID（PCI） 下行链路载波频率到UTRAN中的无线电网络控制器RNC。

公开(公告)号：US20110132757A1

公开(公告)日：2011-06-09

申请号：US13025207

申请日：2011-02-11

申请人： Yuichiro Nakamura ,  Akira Hisano

发明人： Yuichiro Nakamura ,  Akira Hisano

IPC分类号： C23C14/34

CPC分类号： C23C14/3414 ,  C23C14/3407 ,  Y10T29/49989

摘要： A sputtering target and surface processing method is provided. Intermetallic compounds, oxides, carbides, carbonitrides and other substances without ductility exist in the target surface in a highly ductile matrix phase at a volume ratio of 1 to 50%. The target surface is preliminarily subjected to primary processing of cutting work, and then subsequently subjected to finish processing via polishing. The sputtering target subject to this surface processing has an improved target surface with numerous substances without ductility and prevents or suppresses the generation of nodules and particles upon sputtering.

摘要翻译： 提供溅射靶和表面处理方法。 金属间化合物，氧化物，碳化物，碳氮化物和其他没有延展性的物质以高达延性基体相的体积比为1〜50％存在于靶表面。 目标表面预先进行切割加工的一次加工，然后通过研磨进行精加工。 受到这种表面处理的溅射靶具有改进的目标表面，具有许多没有延展性的物质，并且防止或抑制溅射时产生结节和颗粒。

公开(公告)号：US20070163878A1

公开(公告)日：2007-07-19

申请号：US11687765

申请日：2007-03-19

申请人： Yuichiro Nakamura

发明人： Yuichiro Nakamura

IPC分类号： C23C14/00

CPC分类号： C22F1/16 ,  C22C5/02 ,  C22C5/04 ,  C22C22/00 ,  C22F1/18 ,  C23C14/3414 ,  G11B5/851

摘要： A manganese alloy sputtering target characterized in that oxygen is 1000 ppm or less, sulfur is 200 ppm or less and a forged texture is provided, and a method for producing a forged manganese alloy target stably by eliminating the drawbacks of manganese alloy that it is susceptible to cracking and has a low rupture strength. A manganese alloy sputtering target which can form a thin film exhibiting high characteristics and high corrosion resistance while suppressing generation of nodules or particles is thereby obtained.

摘要翻译： 一种锰合金溅射靶，其特征在于，氧为1000ppm以下，硫为200ppm以下，锻造结构为特征，通过消除锰合金易受损的缺点，稳定地制造锻造锰合金靶的方法 破裂，破裂强度低。 从而可以得到能够抑制结瘤或颗粒的产生而形成表现出高特性，高耐腐蚀性的薄膜的锰合金溅射靶。

公开(公告)号：US20060116045A1

公开(公告)日：2006-06-01

申请号：US10541550

申请日：2003-12-24

申请人： Sadao Nishibori ,  Iwao Kouno ,  Yuichiro Nakamura

发明人： Sadao Nishibori ,  Iwao Kouno ,  Yuichiro Nakamura

IPC分类号： B29C63/00 ,  D04H13/00 ,  D04H1/00 ,  D04H3/00

CPC分类号： B29C47/885 ,  B29C47/0014 ,  B29C47/0016 ,  B29C47/0019 ,  B29C47/30 ,  B29C47/8895 ,  D04H3/03 ,  D04H3/037 ,  Y10T442/60 ,  Y10T442/612 ,  Y10T442/627

摘要： The present invention relates to a resin-molded article with a spring structure, and to a method and apparatus for preparing a superficial layer of such a resin-molded article with a spring structure which has surfaces free from undulations, comprises fused filaments whose fusion is resistant to separation, maintains its cushioning activity and strength even after long use. A water flows from a cooling water outlet 53b into a space between a water-permeating sheet 55 and an inclined plate 51a. Some part of the flowing water C penetrates the water-permeating sheet 55 to appear on its top surface to form there an overlying current M on which receives lengthwise arranged peripheral continuous filaments, and agitates them to cause adjacent filaments to contact each other, to be entwined and gathered, thereby enabling the formation of a superficial layer of the three-dimensional structure 3.

摘要翻译： 本发明涉及一种具有弹簧结构的树脂模塑制品，以及用于制备具有弹性结构的这种树脂模塑制品的表面层的方法和装置，所述弹性结构具有没有波纹的表面，其包括熔融长丝， 耐分离，即使长时间使用后仍能保持其缓冲活性和强度。 水从冷却水出口53b流入透水片55和倾斜板51a之间的空间。 流水C的一部分穿透透水板55，出现在其上表面上，形成上覆电流M，其上接收长度方向布置的外围连续长丝，并搅拌它们以使相邻的细丝彼此接触，成为 缠结和收集，从而能够形成三维结构3的表层。

公开(公告)号：US10098046B2

公开(公告)日：2018-10-09

申请号：US13816413

申请日：2011-08-10

申请人： Kenichiro Aoyagi ,  Kiminobu Sugano ,  Yuichiro Nakamura

发明人： Kenichiro Aoyagi ,  Kiminobu Sugano ,  Yuichiro Nakamura

IPC分类号： H04W36/00 ,  H04W48/18 ,  H04W48/02 ,  H04W88/06

摘要： The communication system according to the present invention includes: a mobile device 300 connectable to an LTE system and a 3G system; and an RNC 210 configured to control mobility of the mobile device 300 between the LTE system and the 3G system. When the mobile device sends the RNC 210 a request for connection to the 3G system instead of the LTE system because the LTE system imposes access restriction to restrict communication performed by the mobile device 300, the mobile device 300 incorporates mobility information in the request for connection, the mobility information indicating that the mobile device hands over from the LTE system. In addition, when acquiring the mobility information from the mobile device 300, the RNC 210 restrains the mobile device 300 from handing over to the LTE system.