公开(公告)号：US08985929B2

公开(公告)日：2015-03-24

申请号：US13611555

申请日：2012-09-12

申请人： Suguru Enokida ,  Masahiro Nakaharada ,  Akira Miyata ,  Hidekazu Kiyama ,  Naruaki Iida

发明人： Suguru Enokida ,  Masahiro Nakaharada ,  Akira Miyata ,  Hidekazu Kiyama ,  Naruaki Iida

IPC分类号： H01L21/677 ,  H01L21/67 ,  H01L21/687

CPC分类号： H01L21/67178 ,  H01L21/67745 ,  H01L21/67766 ,  H01L21/67769 ,  H01L21/67781 ,  H01L21/68707 ,  Y10S414/137 ,  Y10S414/139

摘要： A substrate processing apparatus includes: a carrier block including first and second carrier placement units spaced apart in a right and left direction; a processing block having a layered structure in which a plurality of layered parts are vertically arranged, the layered parts each including a substrate transport mechanism for transporting a substrate and a processing module for processing a substrate; a tower unit including plural substrate placement units located at height positions where a substrate is transferred by the substrate transport mechanism of the layered part corresponding to the substrate placement unit; a first substrate transfer mechanism configured to transfer a substrate between the carrier on the first carrier placement unit and the substrate placement unit of the tower unit; and a second substrate transfer mechanism configured to transfer a substrate between the carrier on the second substrate placement unit and the substrate placement unit of the tower unit.

摘要翻译： 基板处理装置包括：载体块，其包括沿左右方向间隔开的第一和第二载体放置单元; 具有层叠结构的处理块，其中多个层叠部分垂直布置，所述层叠部分各自包括用于输送基板的基板传送机构和用于处理基板的处理模块; 塔架单元，其包括多个基板放置单元，位于基板通过与基板放置单元对应的层叠部的基板输送机构转印的高度位置; 第一基板传送机构，被配置为在第一载体放置单元上的载体和塔单元的基板放置单元之间传送基板; 以及第二基板输送机构，被配置为将基板转移到第二基板放置单元上的载体和塔单元的基板放置单元之间。

公开(公告)号：US20070160454A1

公开(公告)日：2007-07-12

申请号：US11616484

申请日：2006-12-27

申请人： Naruaki Iida

发明人： Naruaki Iida

IPC分类号： B65H1/00 ,  C23F1/00 ,  C23C16/00

CPC分类号： B65G49/065 ,  B65G2249/02 ,  B65G2249/04 ,  H01L21/67784

摘要： A substrate carrying device capable of causing a substrate to float by a gas can be manufactured at a low manufacturing cost and can suppress the consumption of a gas for carrying the substrate. The substrate carrying device includes a carrying passage forming member forming a carrying passage along which a substrate is carried, exhaust grooves extending parallel to the carrying passage in the upper surface of the carrying passage forming member, a plurality of pairs each of right and left carrying gas flow grooves formed in the upper surface of the carrying passage forming member, inclined to a substrate carrying direction so as to approach the exhaust grooves from the right-hand side and the left-hand side of the exhaust grooves, respectively, and having inner ends joined to the exhaust grooves, respectively, and gas spouting pores formed near outer ends of the carrying gas flow grooves to spout a gas for causing the substrate to float and for creating substrate carrying gas flows flowing from the outer ends of the carrying gas flow grooves toward the inner ends of the carrying gas flow grooves. The gas spouted through the gas spouting pores causes the substrate to float and creates gas flows in the carrying gas flow grooves to propel the substrate in a carrying direction. The carrying passage is divided with respect to the carrying direction into passage sections, and the spouting of the gas through groups of the gas spouting pores assigned respectively to the passage sections is controlled to suppress the consumption of the gas.

摘要翻译： 能够以低的制造成本制造能够使基板由气体漂浮的基板承载装置，并且可以抑制用于承载基板的气体的消耗。 基板承载装置包括：承载通道形成构件，其形成承载基板的承载通道，在承载通道形成构件的上表面中平行于输送通道延伸的排出槽，多个左右的承载通道 形成在输送通道形成部件的上表面中的气体流动槽分别倾斜到基板输送方向，以便从排气槽的右侧和左侧接近排气槽，并且具有内部 分别连接到排气槽的端部和在承载气体流动槽的外端附近形成的气体喷出孔，以喷出用于使基板浮起的气体，以及用于产生从承载气体流的外端流动的衬底承载气体流 凹槽朝向承载气流槽的内端。 通过气体喷出的气体喷出的气体导致基板浮起并在承载气体流动槽中产生气体流动，从而沿着输送方向推进基板。 输送通道相对于输送方向被分割成通道部分，并且通过分配到通道部分的气体喷出孔的组中的气体的喷射被控制以抑制气体的消耗。

公开(公告)号：US06709545B2

公开(公告)日：2004-03-23

申请号：US10035122

申请日：2002-01-04

申请人： Naruaki Iida

发明人： Naruaki Iida

IPC分类号： C23F0100

CPC分类号： H01L21/67706 ,  H01L21/67017 ,  Y10S414/135 ,  Y10S414/139

摘要： In order to alleviate the affect of particles generated during operation of an elevation mechanism of a substrate conveyer means on the substrate that is transported in a substrate processing apparatus, a partition wall having a slit-like hole is provided in a casing that forms the outer housing of the elevation mechanism, whereby the casing is divided into a first chamber and a second chamber. A conveyer main unit holding a wafer is fixed to a rod-like support member. The support member has its end supported by a guide shaft. The guide shaft and a driving mechanism to move the support member upwards and downwards are provided in the first chamber. The support member descends and ascends along the guide shaft. A fan is disposed in the second chamber. A discharge outlet is formed at the bottom plane of the second chamber. By driving the fan, the atmosphere in the first chamber is attracted via the hole of the partition wall, whereby particles generated during the elevation of the conveyer main unit are discharged from the discharge outlet via the second chamber.

摘要翻译： 为了减轻在基板处理装置中输送的基板上的基板输送装置的升降机构的运转时产生的粒子的影响，在形成外部的壳体中设置有具有狭缝状的孔的分隔壁 升降机构的壳体，由此将壳体分成第一室和第二室。 保持晶片的输送机主体固定在棒状支撑部件上。 支撑构件的端部由导向轴支撑。 引导轴和用于使支撑构件向上和向下移动的驱动机构设置在第一室中。 支撑构件沿导向轴下降并上升。 风扇设置在第二室中。 排出口形成在第二室的底面。 通过驱动风扇，第一室中的气氛通过分隔壁的孔而被吸引，由此在输送机主单元的升高期间产生的颗粒经由第二室从排出口排出。

公开(公告)号：US6050389A

公开(公告)日：2000-04-18

申请号：US118830

申请日：1998-07-20

申请人： Naruaki Iida ,  Seiji Kozawa

发明人： Naruaki Iida ,  Seiji Kozawa

IPC分类号： B65G43/02 ,  B65G43/08 ,  B65G49/07 ,  H01L21/027 ,  H01L21/677 ,  B65G43/00

CPC分类号： H01L21/67742 ,  H01L21/67748 ,  Y10S414/137

摘要： A carrier apparatus is provided with a first carrier mechanism, a second carrier mechanism, and a sensor. The first carrier mechanism has a holding portion holding a substrate, a driving pulley, an idler pulley, and a first endless belt, the first endless belt being provided between the driving pulley and the idler pulley and the holding portion being attached to the first endless belt. The second carrier mechanism has a driving source with a rotation output shaft, a speed reducing pulley fixed on the driving pulley and more than one second endless belts, the above more than one second endless belts being provided between the rotation output shaft and the speed reducing pulley. A sensor detects the state of the second endless belt, for example, the occurrence of cutting. As a result, even if the state of a carrier belt deteriorates, the holding portion is prevented from falling.

摘要翻译： 载体装置设置有第一载体机构，第二载体机构和传感器。 第一承载机构具有保持基板，驱动带轮，惰轮和第一环形带的保持部，第一环形带设置在驱动带轮和惰轮之间，保持部附接到第一环 带。 第二承载机构具有驱动源，其具有旋转输出轴，固定在驱动滑轮上的减速轮和多于一个的第二环形带，上述多于一个的第二环形带设置在旋转输出轴与减速之间 滑轮。 传感器检测第二环形带的状态，例如发生切割。 结果，即使载体带的状态劣化，也可以防止保持部落下。

公开(公告)号：US5460478A

公开(公告)日：1995-10-24

申请号：US403138

申请日：1995-03-13

申请人： Masami Akimoto ,  Kazutoshi Yoshioka ,  Naruaki Iida

发明人： Masami Akimoto ,  Kazutoshi Yoshioka ,  Naruaki Iida

IPC分类号： B65G1/00 ,  B65G1/07 ,  B65G49/07 ,  H01L21/677 ,  H01L21/683

CPC分类号： H01L21/67781 ,  H01L21/6838 ,  Y10S414/137 ,  Y10S414/141

摘要： An apparatus for coating and developing a resist on a wafer comprises a carrier station provided with a plurality of carriers for receiving wafers and transfer tables, a processing section having a plurality of processing units, and a transfer robot provided between the carrier station and the processing section. The robot comprises a plate-shaped arm for transferring wafers between the carriers and the transfer tables, and two horseshoe-shaped forks for transferring wafers between the processing units and transfer tables. The robot is movable along a transfer path so as to make the arm and forks face the carriers, processing units and transfer tables.

摘要翻译： 一种用于在晶片上涂覆和显影抗蚀剂的设备包括：载体站，设置有用于接收晶片和转印台的多个载体，具有多个处理单元的处理部分和设置在载体站和处理之间的传送机器人 部分。 机器人包括用于在载体和转印台之间传送晶片的板状臂，以及用于在处理单元和转印台之间转印晶片的两个马蹄形叉。 机器人可以沿传送路径移动，以使臂和叉面向载体，处理单元和传送台。

公开(公告)号：USD701498S1

公开(公告)日：2014-03-25

申请号：US29414723

申请日：2012-03-02

申请人： Naruaki Iida ,  Hideki Kajiwara

设计人： Naruaki Iida ,  Hideki Kajiwara

公开(公告)号：USD695240S1

公开(公告)日：2013-12-10

申请号：US29414720

申请日：2012-03-02

申请人： Naruaki Iida ,  Hideki Kajiwara

设计人： Naruaki Iida ,  Hideki Kajiwara

公开(公告)号：USD674761S1

公开(公告)日：2013-01-22

申请号：US29414719

申请日：2012-03-02

申请人： Naruaki Iida ,  Hideki Kajiwara

设计人： Naruaki Iida ,  Hideki Kajiwara

公开(公告)号：US07470098B2

公开(公告)日：2008-12-30

申请号：US11871422

申请日：2007-10-12

申请人： Naruaki Iida

发明人： Naruaki Iida

IPC分类号： H01L21/677 ,  G03D5/00

CPC分类号： H01L21/67265 ,  Y10S414/139

摘要： An optical sensor for detecting the housing state such as the thickness of a substrate in the present invention is provided at supporting arms. The supporting arms are attached to a supporting shaft. The supporting arms are in a vertical state in a state before detection of the substrate, but when detecting, the supporting shaft rotates to bring the supporting arms into a horizontal state so that the optical sensor enters a substrate housing body and is set at a predetermined detection position. Accordingly, a space for moving the optical sensor in the horizontal direction becomes unnecessary to reduce the space required for the detecting operation and the like, making it possible to reduce the size of a substrate processing apparatus in which the detecting apparatus is incorporated.

摘要翻译： 在支撑臂上设有用于检测本发明的基板厚度等壳体状态的光学传感器。 支撑臂连接到支撑轴。 支撑臂在检测到基板之前的状态处于垂直状态，但是当检测到支撑轴旋转以使支撑臂处于水平状态，使得光学传感器进入基板壳体时并被设定在预定的 检测位置。 因此，不需要用于在水平方向上移动光学传感器的空间来减少检测操作等所需的空间，从而可以减小其中结合有检测装置的基板处理装置的尺寸。

公开(公告)号：US08528889B2

公开(公告)日：2013-09-10

申请号：US12748652

申请日：2010-03-29

申请人： Seiji Nakano ,  Michiaki Matsushita ,  Naruaki Iida ,  Suguru Enokida ,  Katsuhiro Morikawa

发明人： Seiji Nakano ,  Michiaki Matsushita ,  Naruaki Iida ,  Suguru Enokida ,  Katsuhiro Morikawa

IPC分类号： B23Q3/00 ,  B25B1/00

CPC分类号： H01L21/67742 ,  H01L21/68707

摘要： A substrate support device including a support member having a lower-surface support section to support a lower surface of a substrate; and a position restriction section provided on the lower-surface support section, the position restriction section being formed to surround a periphery of the substrate supported on the lower-surface support section and restrict a position of the substrate. At least one of the lower-surface support section and the position restriction section includes a base material and a protective film formed to cover the base material and prevent at least one of wear and chemical erosion to which the base material will be subject. The substrate support device further includes, for example, a base that supports the support member, and a driving structure that moves the support member in a relative fashion with respect to the base, and is constructed as a substrate transport device.

摘要翻译： 一种基板支撑装置，包括：支撑构件，具有用于支撑基板的下表面的下表面支撑部分; 以及设置在所述下表面支撑部上的位置限制部，所述位置限制部形成为围绕支撑在所述下表面支撑部上的所述基板的周围，并限制所述基板的位置。 下表面支撑部和位置限制部中的至少一个包括基材和保护膜，所述基材和保护膜形成为覆盖基材并防止基材将受到的磨损和化学侵蚀中的至少一种。 基板支撑装置还包括例如支撑支撑构件的基座和相对于基座相对移动支撑构件的驱动结构，并且被构造为基板输送装置。