公开(公告)号：US20210389671A1

公开(公告)日：2021-12-16

申请号：US17458783

申请日：2021-08-27

Applicant: JSR CORPORATION

Inventor： Tetsurou KANEKO ,  Hiromitsu NAKASHIMA ,  Yuushi MATSUMURA ,  Junya SUZUKI ,  Shuto MORI ,  Hiroyuki ISHII

IPC: G03F7/038 ,  G03F7/20 ,  G03F7/004 ,  G03F7/32 ,  G03F7/38 ,  G03F7/40

Abstract: A radiation-sensitive resin composition includes: a first polymer having a first structural unit which includes a phenolic hydroxyl group, and a second structural unit which includes an acid-labile group and a carboxy group which is protected by the acid-labile group; a second polymer having a third structural unit represented by the following formula (S-1), and a fourth structural unit which is a structural unit other than the third structural unit and is represented by the following formula (S-2); and a radiation-sensitive acid generator, wherein the acid-labile group includes a monocyclic or polycyclic ring structure having no fewer than 3 and no more than 20 ring atoms.

公开(公告)号：US20200272053A1

公开(公告)日：2020-08-27

申请号：US16871131

申请日：2020-05-11

Applicant: JSR CORPORATION

Inventor： Naoya NOSAKA ,  Yuushi MATSUMURA ,  Hiroki NAKATSU ,  Kazunori TAKANASHI ,  Hiroki NAKAGAWA

IPC: G03F7/11 ,  C09D7/63 ,  C07D251/24 ,  H01L21/027

Abstract: A composition for resist underlayer film formation, includes a compound represented by formula (1) and a solvent. Ar1 represents an aromatic heterocyclic group having a valency of m and having 5 to 20 ring atoms; m is an integer of 1 to 11; Ar2 is a group bonding to a carbon atom of the aromatic heteroring in Ar1 and represents an aromatic carbocyclic group having 6 to 20 ring atoms and having a valency of (n+1) or an aromatic heterocyclic group having 5 to 20 ring atoms and having a valency of (n+1); n is an integer of 0 to 12; and R1 represents a monovalent organic group having 1 to 20 carbon atoms, a hydroxy group, a halogen atom, or a nitro group. Ar1Ar2R1)n)m   (1)

公开(公告)号：US20190264035A1

公开(公告)日：2019-08-29

申请号：US16388267

申请日：2019-04-18

Applicant: JSR CORPORATION

Inventor： Shun AOKI ,  Kang-go CHUNG ,  Yuushi MATSUMURA ,  Tomohiro MATSUKI ,  Yoshio TAKIMOTO

IPC: C09D5/00 ,  C09D161/06 ,  C09D161/18 ,  C09D161/34 ,  C09D125/06 ,  C09D161/12 ,  C09D125/18 ,  H01L21/02 ,  H01L21/311

Abstract: A substrate-treating method includes applying a treatment agent directly or indirectly on one face of a substrate to form a substrate pattern collapse-inhibitory film. The substrate includes a pattern on the one face. The substrate pattern collapse-inhibitory film is removed by dry etching after forming the substrate pattern collapse-inhibitory film. The treatment agent includes a compound including an aromatic ring, and a hetero atom-containing group that bonds to the aromatic ring; and a solvent.

公开(公告)号：US20170137663A9

公开(公告)日：2017-05-18

申请号：US15059372

申请日：2016-03-03

Applicant: JSR CORPORATION

Inventor： Goji WAKAMATSU ,  Naoya NOSAKA ,  Yuushi MATSUMURA ,  Yoshio TAKIMOTO ,  Tsubasa ABE ,  Toru KIMURA

IPC: C09D161/14 ,  G03F7/36 ,  G03F7/11

CPC classification number: C09D161/14 ,  C08G8/20 ,  C08G8/36 ,  C08G14/04 ,  C08G14/12 ,  C09D161/34 ,  G03F7/11 ,  G03F7/36

Abstract: A composition comprises a compound and a solvent. The compound comprises a carbon-carbon triple bond-containing group, and at least one partial structure having an aromatic ring. A total number of benzene nuclei constituting the aromatic ring in the at least one partial structure is no less than 4. The at least one partial structure preferably comprises a partial structure represented by formula (1). The sum of p1, p2, p3 and p4 is preferably no less than 1. At least one of R1 to R4 preferably represents a monovalent carbon-carbon triple bond-containing group. The at least one partial structure also preferably comprises a partial structure represented by formula (2). The sum of q1, q2, q3 and q4 is preferably no less than 1. At least one of R5 to R8 preferably represents a monovalent carbon-carbon triple bond-containing group.