公开(公告)号：US20190094695A1

公开(公告)日：2019-03-28

申请号：US16205502

申请日：2018-11-30

Applicant: JSR CORPORATION

Inventor： Naoya NOSAKA ,  Gouji WAKAMATSU ,  Tsubasa ABE ,  Yuushi MATSUMURA ,  Masayuki MIYAKE ,  Yoshio TAKIMOTO

IPC: G03F7/11 ,  C09D165/00 ,  G03F7/26 ,  C07D405/14 ,  C07D311/74 ,  C07D311/92 ,  C08G61/10 ,  H01L21/027

Abstract: The composition for film formation includes a compound including a group of the formula (1) and a solvent. In the formula (1), R1 to R4 each independently represent a hydrogen atom, a monovalent organic group having 1 to 20 carbon atoms, or R1 to R4 taken together represent a cyclic structure having 3 to 20 ring atoms together with the carbon atom or a carbon chain to which R1 to R4 bond. Ar1 represents a group obtained by removing (n+3) hydrogen atoms from an aromatic ring of an arene having 6 to 20 carbon atoms. n is an integer of 0 to 9. R5 represents a hydroxy group, a halogen atom, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms.

公开(公告)号：US20170154782A1

公开(公告)日：2017-06-01

申请号：US14955473

申请日：2015-12-01

Applicant: JSR Corporation

Inventor： Shin-ya NAKAFUJI ,  Goji WAKAMATSU ,  Tsubasa ABE ,  Kazunori SAKAI

IPC: H01L21/308 ,  H01L21/027 ,  H01L21/306 ,  C08G65/40

CPC classification number: C08G65/4043 ,  C08G65/40 ,  C08G65/4031 ,  G03F7/094 ,  H01L21/0271 ,  H01L21/0274 ,  H01L21/30604 ,  H01L21/3081

Abstract: A composition comprises a compound comprising a partial structure represented by formula (1) and comprising an intermolecular bond-forming group; and a solvent. X1 and X2 each independently represent a substituted or unsubstituted ring structure having 4 to 10 ring atoms constituted taken together with a spiro carbon atom and carbon atoms of an aromatic ring. R1 and R2 each independently represent a halogen atom, a hydroxy group, a nitro group or a monovalent organic group. a1 and a2 are each independently an integer of 0 to 8. n1 and n2 are each independently an integer of 0 to 2; k1 and k2 are each independently an integer of 0 to 8. A sum of k1 and k2 is no less than 1, and a sum of a1 and k1. A sum of a2 and k2 are no greater than 8.

公开(公告)号：US20180114698A2

公开(公告)日：2018-04-26

申请号：US14955473

申请日：2015-12-01

Applicant: JSR Corporation

Inventor： Shin-ya NAKAFUJI ,  Goji WAKAMATSU ,  Tsubasa ABE ,  Kazunori SAKAI

IPC: H01L21/308 ,  C08G65/40 ,  H01L21/027 ,  H01L21/306

CPC classification number: C08G65/4043 ,  C08G65/40 ,  C08G65/4031 ,  G03F7/094 ,  H01L21/0271 ,  H01L21/0274 ,  H01L21/30604 ,  H01L21/3081

Abstract: A composition comprises a compound comprising a partial structure represented by formula (1) and comprising an intermolecular bond-forming group; and a solvent. X1 and X2 each independently represent a substituted or unsubstituted ring structure having 4 to 10 ring atoms constituted taken together with a spiro carbon atom and carbon atoms of an aromatic ring. R1 and R2 each independently represent a halogen atom, a hydroxy group, a nitro group or a monovalent organic group. a1 and a2 are each independently an integer of 0 to 8. n1 and n2 are each independently an integer of 0 to 2; k1 and k2 are each independently an integer of 0 to 8. A sum of k1 and k2 is no less than 1, and a sum of a1 and k1. A sum of a2 and k2 are no greater than 8.

公开(公告)号：US20160257842A1

公开(公告)日：2016-09-08

申请号：US15059372

申请日：2016-03-03

Applicant: JSR CORPORATION

Inventor： Goji WAKAMATSU ,  Naoya NOSAKA ,  Yuushi MATSUMURA ,  Yoshio TAKIMOTO ,  Tsubasa ABE ,  Toru KIMURA

IPC: C09D161/14 ,  G03F7/36 ,  G03F7/11

CPC classification number: C09D161/14 ,  C08G8/20 ,  C08G8/36 ,  C08G14/04 ,  C08G14/12 ,  C09D161/34 ,  G03F7/11

Abstract: A composition comprises a compound and a solvent. The compound comprises a carbon-carbon triple bond-containing group, and at least one partial structure having an aromatic ring. A total number of benzene nuclei constituting the aromatic ring in the at least one partial structure is no less than 4. The at least one partial structure preferably comprises a partial structure represented by formula (1). The sum of p1, p2, p3 and p4 is preferably no less than 1. At least one of R1 to R4 preferably represents a monovalent carbon-carbon triple bond-containing group. The at least one partial structure also preferably comprises a partial structure represented by formula (2). The sum of q1, q2, q3 and q4 is preferably no less than 1. At least one of R5 to R8 preferably represents a monovalent carbon-carbon triple bond-containing group.

Abstract translation: 组合物包含化合物和溶剂。 该化合物包含含碳 - 碳三键的基团和至少一个具有芳环的部分结构。 在至少一个部分结构中构成芳环的苯核总数不小于4.至少一个部分结构优选包含由式（1）表示的部分结构。 p1，p2，p3和p4的总和优选为1以上.R 1〜R 4中的至少一个优选表示含有一价碳 - 碳三键的基团。 所述至少一种部分结构还优选包含由式（2）表示的部分结构。 q1，q2，q3和q4的总和优选为1以上.R5至R8中的至少一个优选表示含有一价碳 - 碳三键的基团。

公开(公告)号：US20220197144A1

公开(公告)日：2022-06-23

申请号：US17689193

申请日：2022-03-08

Applicant: JSR CORPORATION

Inventor： Naoya NOSAKA ,  Tsubasa ABE ,  Masato DOBASHI ,  Kazunori TAKANASHI

IPC: G03F7/11 ,  C07C13/567 ,  C07C13/62 ,  C07C13/66 ,  C07C69/616 ,  C07D209/08 ,  C07D317/50

Abstract: A composition includes: a compound including an aromatic hydrocarbon ring structure, and a partial structure represented by formula (1) which bonds to the aromatic hydrocarbon ring structure; and a solvent. The aromatic hydrocarbon ring structure has no fewer than 25 carbon atoms. In the formula (1), X represents a group represented by formula (i), (ii), (iii), or (iv); and *'s denote binding sites to two adjacent carbon atoms constituting the aromatic hydrocarbon ring structure. A method of producing a patterned substrate, includes applying the composition directly or indirectly on a substrate to form a resist underlayer film; forming a resist pattern directly or indirectly on the resist underlayer film; and carrying out etching using the resist pattern as a mask.

公开(公告)号：US20180046081A1

公开(公告)日：2018-02-15

申请号：US15672660

申请日：2017-08-09

Applicant: JSR CORPORATION

Inventor： Masayuki MIYAKE ,  Goji WAKAMATSU ,  Tsubasa ABE ,  Kazunori TAKANASHI ,  Kazunori SAKAI

IPC: G03F7/09 ,  G03F7/004 ,  C08G8/20 ,  H01L21/027 ,  H01L21/033 ,  G03F7/11 ,  H01L21/02 ,  H01L21/768

Abstract: A resist underlayer film-forming composition includes a solvent, and a compound comprising an aromatic ring. The solvent includes a first solvent having a normal boiling point of less than 156° C., and a second solvent having a normal boiling point of no less than 156° C. and less than 300° C. The resist underlayer film-forming composition is for use in forming a resist underlayer film to be overlaid on a patterned substrate. A production method of a patterned substrate includes applying the resist underlayer film-forming composition on a patterned substrate to obtain a coating film on the patterned substrate. The coating film is heated to obtain a resist underlayer film. A resist pattern is formed on an upper face side of the resist underlayer film. The resist underlayer film and the substrate are etched using the resist pattern as a mask.

公开(公告)号：US20170137663A9

公开(公告)日：2017-05-18

申请号：US15059372

申请日：2016-03-03

Applicant: JSR CORPORATION

Inventor： Goji WAKAMATSU ,  Naoya NOSAKA ,  Yuushi MATSUMURA ,  Yoshio TAKIMOTO ,  Tsubasa ABE ,  Toru KIMURA

IPC: C09D161/14 ,  G03F7/36 ,  G03F7/11

CPC classification number: C09D161/14 ,  C08G8/20 ,  C08G8/36 ,  C08G14/04 ,  C08G14/12 ,  C09D161/34 ,  G03F7/11 ,  G03F7/36

Abstract: A composition comprises a compound and a solvent. The compound comprises a carbon-carbon triple bond-containing group, and at least one partial structure having an aromatic ring. A total number of benzene nuclei constituting the aromatic ring in the at least one partial structure is no less than 4. The at least one partial structure preferably comprises a partial structure represented by formula (1). The sum of p1, p2, p3 and p4 is preferably no less than 1. At least one of R1 to R4 preferably represents a monovalent carbon-carbon triple bond-containing group. The at least one partial structure also preferably comprises a partial structure represented by formula (2). The sum of q1, q2, q3 and q4 is preferably no less than 1. At least one of R5 to R8 preferably represents a monovalent carbon-carbon triple bond-containing group.