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公开(公告)号:US20110279800A1
公开(公告)日:2011-11-17
申请号:US13194136
申请日:2011-07-29
申请人: Joeri Lof , Erik Theodorus Maria Bijlaart , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van De Kerkhof , Aleksey Yurievich Kolesnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人: Joeri Lof , Erik Theodorus Maria Bijlaart , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van De Kerkhof , Aleksey Yurievich Kolesnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
IPC分类号: G03B27/42
CPC分类号: G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
摘要: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
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公开(公告)号:US20110157570A1
公开(公告)日:2011-06-30
申请号:US12850487
申请日:2010-08-04
申请人: Christiaan Alexander Hoogendam , Bob Streefkerk , Johannes Catharinus Hubertus Mulkens , Erik Theodorus Maria Bijlaart , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Helmar Van Santen
发明人: Christiaan Alexander Hoogendam , Bob Streefkerk , Johannes Catharinus Hubertus Mulkens , Erik Theodorus Maria Bijlaart , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Helmar Van Santen
CPC分类号: G03F7/70866 , G03F7/70341 , G03F7/70808
摘要: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
摘要翻译: 通过入口将液体供给到投影系统和基板之间的空间。 在一个实施例中,溢流区域去除高于给定水平的液体。 溢流区域可以布置在入口的上方,因此液体可以不断刷新,并且液体中的压力可能保持基本恒定。
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公开(公告)号:US07868998B2
公开(公告)日:2011-01-11
申请号:US12216126
申请日:2008-06-30
申请人: Christiaan Alexander Hoogendam , Bob Streefkerk , Johannes Catharinus Hubertus Mulkens , Erik Theodorus Maria Bijlaart , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Helmar Van Santen
发明人: Christiaan Alexander Hoogendam , Bob Streefkerk , Johannes Catharinus Hubertus Mulkens , Erik Theodorus Maria Bijlaart , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Helmar Van Santen
CPC分类号: G03F7/70866 , G03F7/70341 , G03F7/70808
摘要: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
摘要翻译: 通过入口将液体供给到投影系统和基板之间的空间。 在一个实施例中,溢流区域去除高于给定水平的液体。 溢流区域可以布置在入口的上方,因此液体可以不断刷新,并且液体中的压力可能保持基本恒定。
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公开(公告)号:US07708924B2
公开(公告)日:2010-05-04
申请号:US11185971
申请日:2005-07-21
IPC分类号: B28B11/08
CPC分类号: B29C43/021 , B29C35/0888 , B29C43/003 , B29C2035/0827 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要: A lithographic apparatus is disclosed that has a template holder configured to hold an imprint template, a substrate table arranged to receive a substrate, a radiation output arranged to illuminate a part of the imprint template, and a detector configured to detect radiation scattered from an interface between the imprint template and imprintable material provided on the substrate.
摘要翻译: 公开了一种光刻设备,其具有被配置为保持压印模板的模板保持器,布置成接收衬底的衬底台,布置成照射压印模板的一部分的辐射输出;以及被配置为检测从界面散射的辐射的检测器 在压印模板和设置在基板上的可压印材料之间。
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公开(公告)号:US20100008196A1
公开(公告)日:2010-01-14
申请号:US11722186
申请日:2005-12-19
CPC分类号: G11B7/1369 , G02B3/14 , G02B26/005 , G11B7/13925 , G11B2007/0006 , G11B2020/1288 , G11B2220/2541
摘要: In optical disc systems, read-out is hampered because of spherical aberrations resulting from cover layer thickness variations or because discs consists of multiple layers. The aberration correcting apparatus (1) of the present invention is arranged to correct such an optical aberration. Therefore, the aberration correcting apparatus (1) comprises a fluid chamber containing a first fluid and a second fluid having different indices of refraction. The first (5) and second fluid (6) are in contact over a meniscus (7) acting as a refractive surface, wherein the shape of the meniscus (7) can be influenced by a magnetic field generated by a magnetizing coil (20).
摘要翻译: 在光盘系统中,由于覆盖层厚度变化导致的球面像差或由于光盘由多层组成,所以读出受阻。 本发明的像差校正装置(1)被配置为校正这种光学像差。 因此,像差校正装置(1)包括含有第一流体和具有不同折射率的第二流体的流体室。 第一流体(5)和第二流体(6)在用作折射表面的弯月面(7)上接触,其中弯月面(7)的形状可以受到由磁化线圈(20)产生的磁场的影响, 。
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公开(公告)号:US07593093B2
公开(公告)日:2009-09-22
申请号:US11710408
申请日:2007-02-26
申请人: Joeri Lof , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Aleksey Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Helmar Van Santen
发明人: Joeri Lof , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Aleksey Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Helmar Van Santen
CPC分类号: G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866
摘要: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.
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公开(公告)号:US07411653B2
公开(公告)日:2008-08-12
申请号:US10966110
申请日:2004-10-18
申请人: Christiaan Alexander Hoogendam , Bob Streefkerk , Johannes Catharinus Hubertus Mulkens , Erik Theodorus Maria Bijlaart , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Helmar Van Santen
发明人: Christiaan Alexander Hoogendam , Bob Streefkerk , Johannes Catharinus Hubertus Mulkens , Erik Theodorus Maria Bijlaart , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Helmar Van Santen
CPC分类号: G03F7/70866 , G03F7/70341 , G03F7/70808
摘要: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
摘要翻译: 通过入口将液体供给到投影系统和基板之间的空间。 在一个实施例中,溢流区域去除高于给定水平的液体。 溢流区域可以布置在入口的上方,因此液体可以不断刷新,并且液体中的压力可能保持基本恒定。
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公开(公告)号:US07399978B2
公开(公告)日:2008-07-15
申请号:US10539351
申请日:2003-11-20
CPC分类号: G03F7/70341 , G11B7/122 , G11B7/1374 , G11B7/261
摘要: For irradiating a layer a radiation beam is directed and focussed to a spot on the layer, relative movement of the layer relative to the optical element is caused so that, successively, different portions of the layer are irradiated and an interspace between a surface of the optical element nearest to the layer is maintained. Furthermore, at least a portion of the interspace through which the radiation irradiates the spot on the layer is maintained filled with a liquid, the liquid being supplied via a supply conduit and flowing out of an outflow opening through a total projected cross-sectional passage area in a plane parallel to the layer. The outflow opening or a plurality of the outflow openings are positioned such that, seen in a direction perpendicular to the layer, the total cross-sectional area has a centre in the portion of the interspace through which the radiation irradiates the spot.
摘要翻译: 为了照射层,辐射束被引导并聚焦到层上的斑点,引起层相对于光学元件的相对运动,使得相继地照射该层的不同部分和在该层的表面之间的间隙 保持最靠近层的光学元件。 此外,辐射照射到层上的斑点的间隙的至少一部分保持充满液体,液体经由供应管道供给,并通过总投影横截面通过面积流出流出开口 在与平面平行的平面上。 流出开口或多个流出开口定位成使得从垂直于该层的方向看,总横截面积在该空间部分中的中心,辐射辐射穿过该点。
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公开(公告)号:US07388648B2
公开(公告)日:2008-06-17
申请号:US11239493
申请日:2005-09-30
申请人: Joeri Lof , Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人: Joeri Lof , Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
CPC分类号: G03F7/70341 , G03F7/707 , G03F7/7085 , G03F9/7088
摘要: A lithographic projection apparatus includes a liquid confinement structure extending along at least a part of a boundary of a space between a projection system and a substrate table. The liquid confinement structure is positioned adjacent a final surface of the projection system and includes a first inlet configured to supply a liquid, through which a patterned beam is to be projected, to the space, and a second inlet configured to supply gas and formed in a face of the structure. The face is arranged to oppose a surface of the substrate and the second inlet is located radially outward, with respect to an optical axis of the projection system, of the space and has a porous member to evenly distribute gas flow over an area of the second inlet.
摘要翻译: 光刻投影装置包括沿着投影系统和基板台之间的空间的边界的至少一部分延伸的液体限制结构。 液体限制结构位于投影系统的最终表面附近,并且包括第一入口,该第一入口构造成将待图案化的梁待投射的液体供应到该空间;以及第二入口,其构造成供应气体并形成 一个面的结构。 所述面被布置为与所述基底的表面相对,并且所述第二入口相对于所述投影系统的光轴位于所述空间的径向外侧,并且具有多孔构件以将气流均匀地分布在所述第二区域的区域上 进口。
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公开(公告)号:US07213963B2
公开(公告)日:2007-05-08
申请号:US10857614
申请日:2004-06-01
申请人: Joeri Lof , Erik Theodorus Maria Bijlaart , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van de Kerkhof , Aleksey Yurievich Kolesnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人: Joeri Lof , Erik Theodorus Maria Bijlaart , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van de Kerkhof , Aleksey Yurievich Kolesnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
CPC分类号: G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
摘要: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
摘要翻译: 公开了一种光刻投影装置,其中投影系统和传感器之间的空间填充有液体。
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