公开(公告)号：US06522385B2

公开(公告)日：2003-02-18

申请号：US09848284

申请日：2001-05-04

申请人： Yo-Han Ahn ,  Byung-Moo Lee ,  Hyun-Joon Kim ,  Jai-Heung Choi

发明人： Yo-Han Ahn ,  Byung-Moo Lee ,  Hyun-Joon Kim ,  Jai-Heung Choi

IPC分类号： G03B2752

CPC分类号： G03F7/70908 ,  G03F7/70866 ,  G03F7/70933

摘要： An air shower head of an exposure device of photolithography equipment is free of chemical substances that could otherwise contaminate a photoresist layer on a semiconductor wafer and degrade the profile of the photoresist pattern. The air shower head is interposed between a lens system of the exposure device and a wafer stage, and has a hole in the middle thereof through which exposure light can pass to a wafer supported on the stage. The air shower head includes an upper frame defining a cavity open at the bottom thereof, and a porous bottom member covering the bottom of the upper frame. The porous member is mechanically secured to bottom ends of both the inner and outer side walls of the upper frame, i.e., without the use of chemical binders, to reduce the ability of the air shower head to serve as a source of contamination.

摘要翻译： 光刻设备的曝光装置的空气喷头不含化学物质，否则会污染半导体晶片上的光致抗蚀剂层并降低光致抗蚀剂图案的轮廓。 空气喷头插入在曝光装置的透镜系统和晶片台之间，并且在其中间具有曝光光可以通过其到支撑在平台上的晶片的孔。 空气喷头包括限定在其底部开口的空腔的上框架和覆盖上框架的底部的多孔底部构件。 多孔构件机械地固定到上框架的内侧壁和外侧壁的底端，即不使用化学粘合剂，以降低空气淋浴头作为污染源的能力。

公开(公告)号：US20070039470A1

公开(公告)日：2007-02-22

申请号：US11329913

申请日：2006-01-10

申请人： Ha-Na Kim ,  Dong-Seok Ham ,  Yo-Han Ahn ,  Chang-Min Cho ,  Kwang-Min Choi

发明人： Ha-Na Kim ,  Dong-Seok Ham ,  Yo-Han Ahn ,  Chang-Min Cho ,  Kwang-Min Choi

IPC分类号： B01D47/00

CPC分类号： B01D47/14 ,  B01D53/18

摘要： Water discharged at a top region of an eliminator flows, e.g., by gravity into, along, and between the portions of the eliminator while an air flow also travels therein, e.g., horizontally and transverse to the water flow. As the air flow encounters the water, e.g., strikes portions of the eliminator having water flowing downward therealong or encounters water falling between portions of the eliminator, contaminants pass from the air flow to the water flow. The air flow, relieved of certain contaminants, continues onward and the water flow collects at the bottom of the eliminator for filtration and re-circulation through the eliminator.

摘要翻译： 在消除器的顶部区域排出的水例如通过重力流入消除器的部分之间，并且在消除器的部分之间流动，同时气流也在其中行进，例如水平和横向于水流。 当空气流遇到水时，例如撞击具有向下流动的水的消除器的部分或遇到在消除器的部分之间落下的水，污染物从空气流传递到水流。 释放某些污染物的空气流继续向前，水流收集在消除器的底部，以过滤并通过消除器再循环。

公开(公告)号：US20060225299A1

公开(公告)日：2006-10-12

申请号：US11451315

申请日：2006-06-13

申请人： Hyun-Joo Kim ,  Yo-Han Ahn ,  Dong-Seok Ham ,  Jae-Bong Kim

发明人： Hyun-Joo Kim ,  Yo-Han Ahn ,  Dong-Seok Ham ,  Jae-Bong Kim

IPC分类号： F26B21/06

CPC分类号： H01L21/67017 ,  H01L21/67772

摘要： A method of controlling contamination in a substrate transfer chamber that is disposed between a load port for supporting a container to receive a plurality of substrates and a substrate process module for processing the substrates includes supplying a purge gas into the substrate transfer chamber to purge an interior of the substrate transfer chamber, circulating the purge gas supplied into the substrate transfer chamber through a gas circular pipe, removing particles and airborne molecular contaminants from the purge gas being circulated, and resupplying the circulated purge gas into the substrate transfer chamber.

摘要翻译： 一种控制衬底传送室中的污染物的方法，该衬底传送室设置在用于支撑容器以容纳多个衬底的负载端口和用于处理衬底的衬底处理模块之间，包括将清洗气体供应到衬底传送室中以净化内部 的衬底传送室，通过气体环形管循环供给到衬底传送室的吹扫气体，从循环的吹扫气体中除去颗粒和空气传播的分子污染物，并将循环的净化气体再供给到衬底传送室中。

公开(公告)号：US20050039600A1

公开(公告)日：2005-02-24

申请号：US10920404

申请日：2004-08-18

申请人： Chang-Su Lim ,  Yo-Han Ahn ,  Suk-Hee Im ,  Sun-Wook Park

发明人： Chang-Su Lim ,  Yo-Han Ahn ,  Suk-Hee Im ,  Sun-Wook Park

IPC分类号： F24F7/06 ,  B01D46/00 ,  B01D46/10 ,  B01D46/52 ,  B01D53/04

CPC分类号： B01D46/521 ,  B01D46/002 ,  B01D46/10 ,  B01D53/0407 ,  B01D2256/26 ,  B01D2259/4508 ,  B01D2277/20 ,  B01D2279/51

摘要： An apparatus for cleaning air, and a method for cleaning air using the apparatus, includes a housing including an air inlet through which air to be cleaned flows into the housing and an air outlet through which air that has been cleaned is exhausted from the housing, the housing isolating an interior thereof from external surroundings. A first filtering unit is disposed adjacent to the air inlet and includes a plurality of first filters for removing a first group of contaminants from the air to be cleaned. Each of the plurality of first filters is disposed substantially parallel to each other. A fan for drawing the air to be cleaned into the housing from the external surroundings is disposed in the housing.

摘要翻译： 一种用于清洁空气的装置以及使用该装置清洁空气的方法，包括壳体，该壳体包括空气入口，待清洁空气流过该进气口的空气出口和已经被清洁的空气从壳体排出的空气出口， 壳体将其内部与外部环境隔离。 第一过滤单元邻近空气入口设置，并且包括多个第一过滤器，用于从待清洁的空气中去除第一组污染物。 多个第一滤光器中的每一个基本上彼此平行地设置。 用于从外部环境将待清洁的空气吸入壳体的风扇设置在壳体中。

公开(公告)号：US08585391B2

公开(公告)日：2013-11-19

申请号：US13238805

申请日：2011-09-21

申请人： Jin-Ho Kim ,  Yo-Han Ahn ,  Jeong-In Yoon ,  Ji-Young Kim

发明人： Jin-Ho Kim ,  Yo-Han Ahn ,  Jeong-In Yoon ,  Ji-Young Kim

IPC分类号： G03F1/82 ,  G03F1/62

CPC分类号： G03F1/64 ,  B08B7/0042 ,  B23K26/0006 ,  B23K26/032 ,  B23K26/0622 ,  B23K26/142 ,  B23K26/352 ,  B23K26/361 ,  B23K2103/56 ,  G03F1/82

摘要： A photomask cleaning apparatus includes a photomask receiving stage and a laser supply unit. The photomask receiving stage is configured to receive and retain a photomask in a desired orientation. The photomask has a front face having a pellicle adhesive residue region thereon. The desired orientation is with the front face positioned to allow gravity to move particles on the front face away from the front face without interference from the front face of the photomask. The laser supply unit is configured to generate a laser beam that irradiates a target region on the front face of the photomask to remove a pellicle adhesive residue from the target region. The photomask cleaning apparatus is configured to move the target region on the front face of the photomask to irradiate the entire pellicle adhesive residue region. Methods of using the photomask cleaning apparatus are also provided.

摘要翻译： 光掩模清洁装置包括光掩模接收台和激光供给单元。 光掩模接收台被配置为以期望的方向接收和保持光掩模。 光掩模具有在其上具有防护薄膜粘合剂残留区域的前表面。 期望的取向是将前表面定位成允许重力将前表面上的颗粒移动远离前表面，而不会受到光掩模前表面的干扰。 激光供给单元被配置为产生照射光掩模的前表面上的目标区域以从目标区域去除防护薄膜组合物残留物的激光束。 光掩模清洁装置被配置为移动光掩模的前表面上的目标区域以照射整个防粘膜残留区域。 还提供了使用光掩模清洁装置的方法。

公开(公告)号：US20120219654A1

公开(公告)日：2012-08-30

申请号：US13238805

申请日：2011-09-21

申请人： Jin-Ho Kim ,  Yo-Han Ahn ,  Jeong-In Yoon ,  Ji-Young Kim

发明人： Jin-Ho Kim ,  Yo-Han Ahn ,  Jeong-In Yoon ,  Ji-Young Kim

IPC分类号： B28B17/02

CPC分类号： G03F1/64 ,  B08B7/0042 ,  B23K26/0006 ,  B23K26/032 ,  B23K26/0622 ,  B23K26/142 ,  B23K26/352 ,  B23K26/361 ,  B23K2103/56 ,  G03F1/82

摘要： A photomask cleaning apparatus includes a photomask receiving stage and a laser supply unit. The photomask receiving stage is configured to receive and retain a photomask in a desired orientation. The photomask has a front face having a pellicle adhesive residue region thereon. The desired orientation is with the front face positioned to allow gravity to move particles on the front face away from the front face without interference from the front face of the photomask. The laser supply unit is configured to generate a laser beam that irradiates a target region on the front face of the photomask to remove a pellicle adhesive residue from the target region. The photomask cleaning apparatus is configured to move the target region on the front face of the photomask to irradiate the entire pellicle adhesive residue region. Methods of using the photomask cleaning apparatus are also provided.

摘要翻译： 光掩模清洁装置包括光掩模接收台和激光供给单元。 光掩模接收台被配置为以期望的方向接收和保持光掩模。 光掩模具有在其上具有防护薄膜粘合剂残留区域的前表面。 期望的取向是将前表面定位成允许重力将前表面上的颗粒移动远离前表面，而不会受到光掩模前表面的干扰。 激光供给单元被配置为产生照射光掩模的前表面上的目标区域以从目标区域去除防护薄膜组合物残留物的激光束。 光掩模清洁装置被配置为移动光掩模的前表面上的目标区域以照射整个防粘膜残留区域。 还提供了使用光掩模清洁装置的方法。

公开(公告)号：US08146447B2

公开(公告)日：2012-04-03

申请号：US12031086

申请日：2008-02-14

申请人： Ok-Sun Lee ,  Hyung-Seok Choi ,  Yo-Han Ahn ,  Ji-Young Kim

发明人： Ok-Sun Lee ,  Hyung-Seok Choi ,  Yo-Han Ahn ,  Ji-Young Kim

IPC分类号： G01N1/14

CPC分类号： G03F1/82 ,  G01N2015/0687

摘要： A contamination analysis unit and method for inspecting pollutants remaining on a target side of an inspection object such as a reticle after cleaning the object is provided. After steeping the target side in a solution, a sampling liquid may be abstracted therefrom after a predetermined time and may be analyzed.

摘要翻译： 提供了一种污染分析单元和用于检查在清洁物体之后残留在诸如掩模版之类的检查对象的目标侧上的污染物的方法。 在将目标侧浸入溶液中之后，可以在预定时间之后从其中抽取取样液体并进行分析。

公开(公告)号：US20090180086A1

公开(公告)日：2009-07-16

申请号：US12321102

申请日：2009-01-15

申请人： Ju-A Ryu ,  Jeong-Heung Kong ,  Yang-Koo Lee ,  Hun-Hwan Ha ,  Yo-Han Ahn ,  Hweon Jin ,  Myung-Ki Lee

发明人： Ju-A Ryu ,  Jeong-Heung Kong ,  Yang-Koo Lee ,  Hun-Hwan Ha ,  Yo-Han Ahn ,  Hweon Jin ,  Myung-Ki Lee

IPC分类号： G03B27/52 ,  B08B3/04 ,  B08B3/12 ,  B08B7/00

CPC分类号： B08B1/007 ,  B08B1/04 ,  B08B3/12 ,  H01L21/67028 ,  H01L21/67057

摘要： The present inventive concept provides a substrate treating apparatus and an exposing apparatus that a chuck member, a chuck cleaning member including a cleaning tool removing a foreign substance on a substrate loading surface of the chuck member and a tool cleaning member cleaning a cleaning tool are disposed to be adjacent to each other inside a treating room. The present inventive concept also provides a method of cleaning a cleaning tool using a tool cleaning member. According to the above the apparatuses and the method, contamination of a chuck member by a cleaning tool is prevented and a defocus phenomenon caused by a particle on a chuck member during an exposing process can be minimized.

摘要翻译： 本发明构思提供了一种基板处理装置和曝光装置，其中，卡盘构件，包括清除卡盘构件的基板装载表面上的异物的清洁工具的清洁构件和清洁清洁工具的工具清洁构件 在处理室内彼此相邻。 本发明构思还提供了一种使用工具清洁构件清洁清洁工具的方法。 根据上述装置和方法，可以防止由清洁工具污染卡盘构件，并且可以使在曝光过程中由卡盘构件上的颗粒引起的散焦现象最小化。

公开(公告)号：US20080137046A1

公开(公告)日：2008-06-12

申请号：US11999526

申请日：2007-12-06

申请人： Ju-A Ryu ,  Chang-Su Lim ,  Yo-Han Ahn ,  Hyung-Seok Choi ,  Kyung-Log Moon

发明人： Ju-A Ryu ,  Chang-Su Lim ,  Yo-Han Ahn ,  Hyung-Seok Choi ,  Kyung-Log Moon

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70341

摘要： A substrate exposing apparatus includes an immersion exposure unit, disposed between a projection optical system and a substrate, including a vessel disposed on an optical path and filled with a liquid, a supply line connected to one side of the vessel to supply the liquid to the vessel, a first drain line connected to the other side of the vessel to drain the liquid from the vessel, and a monitoring unit including at least one first measuring unit connected to the first drain line to detect a property of the liquid flowing through the first drain line. The monitoring unit can include a collection line connected to the first drain line to collect the liquid, a first bath storing the collected liquid, and a first distribution line through which the liquid in the first bath can flow. The first measuring unit is installed on the first distribution line.

摘要翻译： 基板曝光装置包括设置在投影光学系统和基板之间的浸没曝光单元，包括设置在光路上并填充有液体的容器，连接到容器的一侧以将液体供应到 容器，连接到容器的另一侧的第一排出管线，以从容器排出液体;以及监测单元，其包括连接到第一排泄管线的至少一个第一测量单元，以检测流过第一流体的液体的性质 排水管线。 监视单元可以包括连接到第一排水管线以收集液体的收集管线，存储收集的液体的第一浴槽和第一浴液中的液体可以流过的第一分配管线。 第一个测量单元安装在第一个配线上。

公开(公告)号：US07258728B2

公开(公告)日：2007-08-21

申请号：US10920404

申请日：2004-08-18

申请人： Chang-Su Lim ,  Yo-Han Ahn ,  Suk-Hee Im ,  Sun-Wook Park

发明人： Chang-Su Lim ,  Yo-Han Ahn ,  Suk-Hee Im ,  Sun-Wook Park

IPC分类号： B01D46/00

CPC分类号： B01D46/521 ,  B01D46/002 ,  B01D46/10 ,  B01D53/0407 ,  B01D2256/26 ,  B01D2259/4508 ,  B01D2277/20 ,  B01D2279/51

摘要： An apparatus for cleaning air, and a method for cleaning air using the apparatus, includes a housing including an air inlet through which air to be cleaned flows into the housing and an air outlet through which air that has been cleaned is exhausted from the housing, the housing isolating an interior thereof from external surroundings. A first filtering unit is disposed adjacent to the air inlet and includes a plurality of first filters for removing a first group of contaminants from the air to be cleaned. Each of the plurality of first filters is disposed substantially parallel to each other. A fan for drawing the air to be cleaned into the housing from the external surroundings is disposed in the housing.

摘要翻译： 一种用于清洁空气的装置以及使用该装置清洁空气的方法，包括壳体，该壳体包括空气入口，待清洁空气流过该进气口的空气出口和已经被清洁的空气从壳体排出的空气出口， 壳体将其内部与外部环境隔离。 第一过滤单元邻近空气入口设置，并且包括多个第一过滤器，用于从待清洁的空气中去除第一组污染物。 多个第一滤光器中的每一个基本上彼此平行地设置。 用于从外部环境将待清洁的空气吸入壳体的风扇设置在壳体中。